JPH05129628A - Production of nonvolatile semiconductor storage element - Google Patents

Abstract

PURPOSE:To allow high integration and stable readout operation and improve insulation between a floating gate and a control gate. CONSTITUTION:A floating gate 7a whose top plane is projected in a curve is formed by self-alignment in a transistor area. The one edge of a common gate 10a is arranged on the floating gate through an insulating film 8 and the other edge is arranged on a gate oxide film 9. A drain diffused layer 11 and a source diffused layer 12 which are also used as a memory transistor and a select transistor are formed by self-alignment by using the common gate 10a as a mask. The one edge of the common gate 10a operates as the control gate for the memory transistor and the other edge of the common gate 10a operates as the gate for the select transistor.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The present invention relates to an EEPROM (electr
The present invention relates to a method for manufacturing a non-volatile semiconductor memory device such as an ical erasable and programmable ROM.

[0002]

2. Description of the Related Art Conventionally, as a nonvolatile semiconductor memory element of this type, a full-future type EEPROM and a flash type EEPROM are known.

FIG. 6 shows a full-future type EEPROM.
FIG. 7 shows an equivalent circuit diagram of a memory device in which the elements are connected in a matrix. As shown in FIG. 6, this element includes a P-well 2 formed on an N-type silicon substrate 1 and a memory cell including a memory transistor MTr and a select transistor STr. The memory transistor MTr has a gate structure including a tunnel oxide film 30, a floating gate 31, an insulating film 32, and a control gate 33, and N ⁺ diffusion layers 34 and 35 formed in the P well 2 on both sides of the gate structure. ing. On the other hand, the select transistor STr has a gate structure composed of the gate oxide film 36 and the gate 37 and the N ⁺ diffusion layer 3 formed in the P well 2 on both sides thereof.
5, 38.

Data writing / erasing / reading to / from a full-feature type EEPROM will be described below with reference to FIG. Data writing is performed as follows. The memory line ML connected to the control gate 33 of the memory transistor MTr of the selection element
Then, a positive voltage is applied to each bit line BL. At this time, a positive voltage is applied to the word line WL connected to the gate 37 of the select transistor STr of the selection element, and the source line SL is grounded. As a result, hot electrons generated in the vicinity of the N ⁺ diffusion layer (drain) 34 of the memory transistor MTr are generated in the tunnel oxide film 30.
Is injected into the floating gate 31 via and the signal charge is written.

Data is erased as follows.
A positive voltage is applied to the bit line BL of the selection element and the memory line ML is grounded. As a result, the charges accumulated in the floating gate 3 are transferred to the tunnel oxide film 3.
The signal charges are erased by being pulled out to the N ⁺ diffusion layer 34 via 0.

Data reading is performed as follows. The source line SL of the selection element is grounded, a positive voltage is applied to the word line WL, a positive voltage is applied to the bit line BL of the selection element, and a positive low voltage is applied to the memory line ML. At this time, the select transistor S
If no current flows through Tr, the memory transistor MTr
, The data "1" is read out. On the other hand, if a current flows through the select transistor STr, the non-write state of the memory transistor MTr,
That is, the data “0” is read.

Next, the structure of the flash type EEPROM will be described. Typical examples are the stack gate structure shown in FIG. 8 and the split gate structure shown in FIG.

The flash type EEPROM having the stack gate structure shown in FIG. 8 has a gate structure composed of a tunnel oxide film 40, a floating gate 41, an insulating film 42, and a control gate 43, and P wells 2 on both sides of the gate structure. N ⁺ diffusion layers 44 and 45 are formed. Between the N ⁺ diffusion layer 44 which is the drain and the P well 2,
A P ⁺ diffusion layer 46 is formed to increase the injection efficiency of hot electrons. Further, an N ⁻ diffusion layer 47 is formed between the N ⁺ diffusion layer 45 which is the source and the P well 2 in order to suppress the generation of hot holes due to the band-to-band tunnel effect at the time of data erasing.

Flash EEP having a stack gate structure
Data writing in the ROM is performed by applying a positive voltage to the gate G and the drain D, grounding the source S, and injecting hot electrons into the floating gate 41 from the vicinity of the drain. To erase data, a signal voltage is extracted from the floating gate 41 by applying a positive voltage to the source S commonly connected to each element on the substrate. Data is read by applying a positive voltage to each of the gate G and the drain D to determine whether or not a current flows between the drain and the source.

The flash type EEPROM having the split gate structure shown in FIG. 9 includes a floating gate 51 on the tunnel oxide film 50 on the drain D side, and a select gate 53 on the floating gate 51 via an insulating film 52. Are formed. Writing of data to this element is performed by applying a positive voltage to the gate G and the drain D and injecting hot electrons into the floating gate 51. To erase data, the gate G is grounded or a negative voltage is applied and a positive voltage is applied to the drain D, so that the signal charge accumulated in the floating gate 51 is extracted to the drain D. To read data, apply a positive low voltage to the gate G
It is performed depending on whether or not a current flows between the drain and the source by applying a positive voltage to the drain D, respectively. A flash type EEP with a split gate structure
Since the ROM includes the selection gate 53, a flash type EEPROM having a stack gate structure will be described later.
The problem of over-erasure as seen in 1. does not occur.

[0011]

However, the conventional example having such a structure has the following problems.

In a full-feature type EEPROM,
Since one memory cell is composed of the memory transistor MTr and the select transistor STr, there is a problem that the cell area becomes large and it is disadvantageous for high integration.

Further, in the flash type EEPROM having the stack gate structure, one cell and one transistor are advantageous for integration, but all cells on the substrate or all cells in the P well are erased at once, so that a signal The entire erasing time is set to be long in accordance with the element that requires the longest time to erase the charges. Therefore, in an element in which the signal charge is erased relatively quickly, the signal charge is excessively extracted, so that a phenomenon occurs in which the positive charge is accumulated in the floating gate 41 of the element. This is so-called over-erasure. When over-erasing occurs, the threshold value at the time of reading the signal charge varies among the elements, and the reading operation becomes unstable. For example, when over-erasing occurs, even if it is a non-selected element, a channel is formed by the positive charge accumulated in the floating gate and the source-
It causes a problem that current flows between the drains.

On the other hand, in the flash type EEPROM having the split gate structure, even if positive charges are accumulated in the floating gate 51 due to excessive erasing, no channel is formed in the P well 2 immediately below the select gate 53, so that the source-drain is formed. There is no problem of current flowing between them. However, there is a problem in that the degree of integration is inferior to the flash type EEPROM having a stack gate structure because of the device structure.

Further, the conventional E shown in FIGS. 6, 8 and 9 is used.
In the EPROM, the area of the insulating film between the floating gate and the control gate, the floating gate and the P
The area of the tunnel oxide film between the wells is almost the same. That is, the electrostatic capacitance C ₀ between the floating gate and the control gate is substantially the same as the electrostatic capacitance C ₀ between the floating gate and the P well. Therefore,
The voltage applied to the control gate is divided into approximately the same value in the insulating film and the tunnel oxide film. In order to efficiently inject and release electrons into the floating gate, the partial pressure applied to the tunnel oxide film may be increased.
Therefore, it is conceivable to reduce the thickness of the insulating film between the floating gate and the control gate to increase the capacitance ratio C ₀ / C. However, if this is done, the insulating property between the floating gate and the control gate will decrease and leakage will occur. This causes the problem of increased current.

The present invention has been made in view of the above circumstances, and it is possible to realize high integration, to stabilize the read operation, and to improve the insulation between the floating gate and the control gate. It is an object of the present invention to provide a method for manufacturing a non-volatile semiconductor memory device capable of achieving the above.

[0017]

The present invention has the following constitution in order to achieve such an object. That is, the present invention is a method of manufacturing a non-volatile semiconductor memory device including a memory transistor that performs non-volatile storage by storing and releasing electrons to and from a floating gate through a tunnel insulating film, and a select transistor that selects the memory transistor. In the method, a step of depositing a thin film on a semiconductor substrate in which a device region is separately formed, the thin film in a common gate region of both transistors is etched away, and an end of the remaining thin film is located in the floating gate portion. Forming a tunnel insulating film on the substrate in the common gate region, depositing a first conductive film on the substrate on which the tunnel insulating film is formed, By anisotropically etching the substrate on which the first conductive film is deposited, the first conductive film is attached to the end of the thin film. Of a floating film having a convex curved surface formed of a conductive film in a self-aligned manner, forming an inter-gate insulating film on the upper surface of the floating gate, and a substrate corresponding to a gate region other than the floating gate region A step of forming a gate insulating film thereon, a step of depositing a second conductive film on the substrate on which the inter-gate insulating film and the gate insulating film are formed, and a gate region portion of the second conductive film By masking and removing the other portion by etching, one end is on the floating gate through the inter-gate insulating film, and the other end is on the gate insulating film. Forming a gate, and using the common gate as a mask, a first impurity diffusion layer that is also used as a drain and a source of the both transistors Forming in self-alignment with the second impurity diffusion layer, said first impurity diffusion layer, the second
And the step of forming wirings that are individually connected to the impurity diffusion layer and the common gate, respectively.

[0018]

The operation of the present invention is as follows. That is,
According to the present invention, the first impurity diffusion layer and the second impurity diffusion layer which also serve as the drain and the source of the memory transistor and the select transistor, and the tunnel insulating film are formed in the vicinity of the first impurity diffusion layer. A floating gate formed by self-alignment and having a convex curved upper surface, and one end disposed on the upper surface of the floating gate via an insulating film and the other end having gate insulation near the second impurity diffusion layer. A non-volatile semiconductor memory element having a common gate that is also used as a control gate of a memory transistor and a gate of a select transistor, which is arranged via a film, can be obtained.

According to this non-volatile semiconductor memory device, the first impurity diffusion layer and the second impurity diffusion layer also serve as the drain and source of each of the memory transistor and the select transistor, and the substrate between the both impurity layers. A floating gate formed by self-alignment and a common gate having one end located above the floating gate and serving as a control gate of the memory transistor and the other end serving as a gate of the select transistor. Therefore, two transistors are formed in one transistor region.

Further, ON / OF of the select transistor
Since the memory transistor can be selected by F, data is erased in bit units, there is no problem of excessive erasure, and the read operation is stable.

Further, since the upper surface of the floating gate has a convex curved surface shape, the electrostatic capacitance C ₀ between the floating gate and the common gate is larger than the electrostatic capacitance C between the floating gate and the substrate. In other words, when a voltage is applied to the common gate, the partial pressure that acts on the tunnel insulating film becomes larger than the partial pressure that acts on the insulating film between the floating gate and the common gate, so that the efficiency of carrier injection into the floating gate is high. Will increase. Therefore, when writing / erasing data, the voltage applied to the word line connected to the common gate can be set to be relatively small.

On the contrary, if the capacitance C ₀ and the capacitance C are made substantially the same and the same carrier injection efficiency as in the conventional case can be obtained, the area between the floating gate and the control gate becomes large. Since the thickness of the insulating film between both gates can be increased correspondingly, the insulating property between the floating gate and the control gate is improved, and the leak current can be reduced.

[0023]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a plan view of a memory cell of an EEPROM manufactured by a method according to an embodiment of the present invention, and FIG. 2 is A of FIG.
FIG. 6 is a cross-sectional view taken along line A-A.

In the figure, reference numeral 1 is an N-type silicon substrate, and 2 is P.
Wells 3 are field oxide films. An N ⁺ drain diffusion layer 11 and an N ⁺ source diffusion layer 12 are formed in the element formation region separated by the field oxide film 3. On the tunnel oxide film 6 near the drain diffusion layer 11,
There is a floating gate 7a formed by self-alignment and having a convex curved upper surface. 10a is a common gate, one end on the drain side is located on the upper surface of the floating gate 7a via the insulating film 8, and the other end on the source side is located on the gate oxide film 9. In the figure, reference numeral 14 is a metal wiring electrically connected to the drain diffusion layer 11 and the source diffusion layer 12, and 16 is a common gate 10a.
And metal wirings 13 and 15 which are electrically connected to.

As shown in FIG. 2, the memory cell according to this embodiment includes a memory transistor and a select transistor in one transistor area. The drain diffusion layer 11 and the source diffusion layer 12 are also used as the drain and the source of the both transistors. The gate structure of the memory transistor is composed of the tunnel oxide film 6, the floating gate 7a, the insulating film 8 and the common gate 10a described above, and one end of the common gate 10a on the drain side serves as a control gate. The gate structure of the select transistor is composed of the gate oxide film 9 and the other end on the source side of the common gate 10a described above.

The operation of this embodiment will be described below with reference to FIG. FIG. 3 shows a random access EE according to the embodiment.
FIG. 3 is an equivalent circuit diagram showing a part of a storage device using a PROM. One memory cell includes a memory transistor MTr and a select transistor STr, and the memory cells are arranged in a matrix. Both transistors MTr, common gate 10a of the STr is connected word line W _n corresponding to each to W _{n +} 1, W _{n + 2,} the drain of the memory transistor MTr (drain diffusion layer 11)
Are connected to the bit lines B _m and B _{m + 1,} and the source (source diffusion layer 12) of the select transistor STr is connected to the source lines S _m and S _{m + 1} . In the figure, reference numeral 20 denotes a word line _{W n, W n + 1,} W n + 2 X decoder for selecting, 21 is a Y decoder for selecting the source line S _m, the S m _{+ 1} .

Data writing to the memory cell (n, m) shown in FIG. 3 is performed as follows. Bit line B
_{m is set} to the write voltage V _p , the word line W _{n is set} to the “H” level, and the source line S _m is grounded. For the memory cell (n, m + 1) connected to the same word line W _n as the memory cell (n, m), the bit line B _{m + 1} and the source line S _{m + 1} are opened or grounded, Writing is prohibited. In the other memory cells (n + 1, m) and (n + 1, m + 1), since the word line W _{n + 1} is grounded or at the “L” level, the select transistor STr is turned off and writing does not occur.

In the write memory cell (n, m), hot electrons are injected into the floating gate 7a as follows. That is, the drain diffusion layer 1
When the write voltage V _p is applied to 1, the source diffusion layer 12 is grounded, and the common gate 10a becomes the “H” level,
A channel is formed from the source diffusion layer 12 toward the drain diffusion layer 11. By properly setting the write voltage V _p , this channel is crossed over the lower part of the select transistor STr (that is, immediately below the gate oxide film 9 on the right side of the common gate 10a in FIG. 2) and the drain diffusion layer 11 is formed. Extend to a position that does not reach. Then, the electric field concentrates immediately below the floating gate 7a, and a large number of hot electrons are generated. Although some of the hot electrons flow into the drain diffusion layer 11, some of them are accelerated by the electric field of the common gate 10 a and injected into the floating gate 7 a via the tunnel oxide film 6.
This is the data write state.

Since the upper surface of the floating gate 7a of the memory cell according to this embodiment has a convex curved surface, the area of the upper surface is larger than that of the lower surface.
That is, the common gate 10a and the floating gate 7
The capacitance C ₀ between the floating gate 7a and the floating gate 7a
Is larger than the capacitance C between the P well 2 and the P well 2. The voltage applied to the common gate 10a is divided between the tunnel oxide film 6 and the insulating film 8, and the voltage division value acting on the tunnel oxide film 6 is proportional to the capacitance ratio C ₀ / C. Therefore, as compared with the conventional memory cell in which the electrostatic capacitances C ₀ and C above and below the floating gate are substantially the same, in the memory cell of this embodiment, the tunnel oxide film 6 has a larger capacitance ratio C ₀ / C. The acting partial pressure becomes large, and hot electrons are efficiently injected into the floating gate 7a. In other words, if hot electrons are injected with the same efficiency as that of the conventional memory cell, the voltage applied to the common gate 10a (word line) can be set to a small value. The configuration can be simplified. Further, when the capacitances C ₀ and C are set to the same level, the thickness of the insulating film 8 can be increased by the amount of the increased area between the floating gate 7a and the common gate 10a. The insulation between the gate 7a and the common gate 10a is improved, and the leak current between both gates can be reduced.

The data in the memory cell (n, m) is erased as follows. The erase voltage V _E is applied to the word line W _n at “L” level and the bit line B _m and the source line S _m , respectively. In the memory cell (n, m + 1) connected to the same word line W _n as the memory cell (n, m), the bit line B _{m + 1} and the source line S _{m + 1} are grounded or open. Erase is prohibited. In addition, other memory cells (n +
1, m) and (n + 1, m + 1) are word lines W _{n + 1}
Since it is at "H" level, erasure does not occur. When the common gate 10a of the memory cell (n, m) is set to the "L" level and the erase voltage V _E is applied to the drain diffusion layer 11, the electrons accumulated in the floating gate 7a are tunnel oxide film 6. The data is erased by being pulled out to the drain diffusion layer 11 via the.

Data is read from the memory cell (n, m) as follows. The source line S _m is grounded, the sense voltage V _SENSE is applied to the word line W _n , and the voltage V _CC is applied to the bit line B _m via a resistor to detect the presence or absence of a potential drop. That is,
If data is written in the memory cell (n, m),
Since the memory transistor MTr is turned off, the voltage drop does not occur, that is, the data “1” is read. On the other hand, if the data is not written in the memory cell (n, m), the memory transistor MTr is turned on.
As a result, the voltage drop occurs, that is, the data “0” is read.

Hereinafter, a method of manufacturing the memory cell according to the above-described embodiment will be described with reference to FIGS.

Referring to FIG. Here, after forming the P well 2 in the N-type silicon substrate 1, the field oxide film 3 for element region isolation and the oxide film 4 are formed.

Reference will be made to FIG. For example, a silicon oxide film 5 corresponding to a thin film in the method of the present invention is formed on the silicon substrate 1 in which the element regions are separately formed as described above.
It is deposited by the VD (Chemical Vapor Deposition) method.

Next, the oxide film 5 is anisotropically etched, and the region corresponding to the common gate of the memory transistor and the select transistor is etched and removed. At this time, patterning is performed so that the end portion of the oxide film 5 is located at the portion where the floating gate 7a is formed.

Referring to FIG. Here, in order to remove the roughness of the substrate surface, the substrate surface is re-oxidized, and then the oxide film is removed by wet etching. Subsequently, for example, a tunnel oxide film 6 corresponding to the tunnel insulating film of the method of the present invention is formed in the transistor region.

On the substrate on which the tunnel oxide film 6 is formed,
A polysilicon film 7 corresponding to the first conductive film of the method of the present invention is deposited. The polysilicon film 7 has conductivity by being doped with phosphorus (P) or arsenic (As), for example.

Reference will be made to FIG. Here, etching back is performed until the polysilicon film 7 on the oxide film 5 is completely removed. As a result, a sidewall of polysilicon is formed on the end surface of the oxide film 5. Among these, the sidewall formed in the common gate region becomes the floating gate 7a of the memory transistor MTr described above. The gate length of the floating gate 7a is
By changing the thickness of the oxide film 5 and the etching conditions, it is possible to control the dimensions within the design rule.

Reference will be made to FIG. Here, the substrate on which the floating gate 7a is formed is re-oxidized,
An insulating film (silicon oxide film) 8 corresponding to the inter-gate insulating film in the method of the present invention is formed on the floating gate 7a. Then, after removing the oxide film on the substrate corresponding to the gate region other than the region of the floating gate 7a by the photoetching method, the gate oxide film 9 corresponding to the gate insulating film in the method of the present invention is formed. Then, a polysilicon film 10 corresponding to the second conductive film in the method of the present invention is deposited. A portion of the polysilicon film 10 corresponding to the gate region is masked with the photoresist 17 and the other portion is removed by anisotropic etching, so that one end of the floating gate 7 is covered with the insulating film 8.
A common gate 10a is formed on the gate oxide film 9 and the other end is on the gate oxide film 9.

Reference will be made to FIG. Here, after removing the oxide film 9 in the drain and source regions, the common gate 10a and the field oxide film 3 are used as a mask.
By implanting N-type impurities such as phosphorus and arsenic,
The drain diffusion layer 11 and the source diffusion layer 12 are formed by self-alignment.

Referring to FIG. After ion implantation of the drain and source, thermal oxidation is performed again to form an oxide film on the substrate surface. Then, after depositing an interlayer insulating film 13 such as phosphor glass (PSG), contact holes are formed in the drain and source regions, and a metal film such as Al—Si is deposited. This metal film is patterned by a photoetching method to form metal wiring 14 electrically connected to the drain and the source.

Reference is made to FIG. Here, after further depositing the interlayer insulating film 15, a contact hole is formed in the gate region and a metal layer is further deposited. By patterning this metal layer, the metal wiring 16 connected to the common gate 10a is formed.

Although the above embodiment has been described by taking the N-channel type EEPROM as an example, it goes without saying that the present invention can be applied to the P-channel type EEPROM.

Further, as described in the conventional example shown in FIGS. 8 and 9, also in the memory cell shown in FIG. 2, hot electron injection efficiency is increased between the drain diffusion layer 11 and the P well 2. A P ⁺ diffusion layer may be provided for this purpose. Further, an N ⁻ diffusion layer may be provided between the source diffusion layer 12 and the P well 2 in order to improve the breakdown voltage.

[0045]

As is apparent from the above description, according to the method of the present invention, it is possible to easily realize a non-volatile semiconductor memory device having two transistors, a memory transistor and a select transistor, in one transistor region. As a result, the area of the memory cell is reduced and the degree of integration of the semiconductor memory device can be increased.

Further, the nonvolatile semiconductor memory element realized by the method of the present invention has a select transistor ON / OFF.
Since the data can be erased bit by bit, the problem of excessive erasure unlike the conventional flash EEPROM having a stack gate structure does not occur, and the data read operation is stabilized.

Furthermore, since the upper surface of the floating gate has a convex curved surface, the capacitance between the floating gate and the common gate becomes larger than the capacitance between the floating gate and the substrate, and the tunnel insulating film is formed. The partial pressure acting on is increased. As a result, the efficiency of injecting carriers into the floating gate is increased, and the voltage applied to the word line at the time of writing / erasing data can be set to be relatively small, and the structure of the booster circuit of the memory device is simplified accordingly.

When the carrier injection / emission efficiency to the floating gate is set to the same as the conventional one, the thickness of the insulating film between both gates is increased by the increase in the area between the floating gate and the control gate. Since the thickness can be increased, the insulating property between both gates is improved and the leak current can be reduced.

[Brief description of drawings]

FIG. 1 is a plan view showing an element structure of an example of a nonvolatile semiconductor memory element according to the present invention.

FIG. 2 is a sectional view taken along the line AA of FIG.

FIG. 3 is an equivalent circuit diagram showing a part of a memory device configured by using a random access EEPROM according to an embodiment.

FIG. 4 is an explanatory diagram of the manufacturing method of the memory cell according to the embodiment.

FIG. 5 is an explanatory diagram of the manufacturing method of the memory cell according to the embodiment.

FIG. 6 is a full-feature type EEPROM according to a conventional example.
3 is a cross-sectional view showing the element structure of FIG.

FIG. 7 is an equivalent circuit diagram of the device shown in FIG.

FIG. 8 is a sectional view showing an element structure of a flash type EEPROM having a stack gate structure according to a conventional example.

FIG. 9 is a sectional view showing an element structure of a flash type EEPROM having a split gate structure according to a conventional example.

[Explanation of symbols]

 1 ... Silicon substrate 2 ... P well 3 ... Field oxide film 6 ... Tunnel oxide film 7a ... Floating gate 8 ... Insulating film 9 ... Gate oxide film 10a ... Common gate 11 ... Drain diffusion layer (first impurity diffusion layer) 12 ... Source diffusion layer (second impurity diffusion layer) 13, 15 ... Interlayer insulating film 14, 16 ... Metal wiring

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁵ Identification code Internal reference number FI technical display location G11C 16/04

Claims (1)

[Claims] 1. A method of manufacturing a non-volatile semiconductor memory device comprising a memory transistor for performing non-volatile storage by storing / releasing electrons to / from a floating gate through a tunnel insulating film, and a select transistor for selecting the memory transistor. In a step of depositing a thin film on a semiconductor substrate in which a device region is formed separately, etching the thin film in a common gate region of both transistors, and an end portion of the remaining thin film is located in the floating gate portion. Forming a tunnel insulating film on the substrate in the common gate region; depositing a first conductive film on the substrate on which the tunnel insulating film is formed; By anisotropically etching the substrate on which the conductive film of A self-aligned process of forming a floating gate having a convex curved upper surface, a step of forming an inter-gate insulating film on the upper surface of the floating gate, and a step of forming a gate area other than the floating gate area on the substrate. Forming a gate insulating film, depositing a second conductive film on the substrate on which the intergate insulating film and the gate insulating film are formed, and masking a gate region portion of the second conductive film Then, the other portion is removed by etching to form a common gate of both transistors, one end of which is on the floating gate through the inter-gate insulating film and the other end of which is on the gate insulating film. A step of forming the first impurity diffusion layer and the first impurity diffusion layer, which are also used as the drain and the source of the both transistors, using the common gate as a mask. A second impurity diffusion layer is formed in a self-aligned manner; and a step of forming a wiring individually connected to the first impurity diffusion layer, the second impurity diffusion layer, and the common gate, respectively. A method for manufacturing a non-volatile semiconductor memory device characterized by the above.