JPH05128424A - Production of laminated magnetic head - Google Patents
Production of laminated magnetic headInfo
- Publication number
- JPH05128424A JPH05128424A JP29161691A JP29161691A JPH05128424A JP H05128424 A JPH05128424 A JP H05128424A JP 29161691 A JP29161691 A JP 29161691A JP 29161691 A JP29161691 A JP 29161691A JP H05128424 A JPH05128424 A JP H05128424A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- layer
- laminated
- film
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、各種磁気記録再生装置
に利用できる積層型磁気ヘッドの製造方法に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a laminated magnetic head which can be used in various magnetic recording / reproducing devices.
【0002】[0002]
【従来の技術】従来磁気ヘッドは、フェライトや金属磁
性体などの磁性材料を研削加工やラッピング等の機械加
工により磁気コアの製作を行い、この磁気コアを磁気空
隙を形成しつつ接着し、巻線を施して磁気ヘッドとして
いた。しかし、近年のコンピューター用外部記憶装置や
VTRに見られる小型化,大容量化に伴い線記録密度お
よび面記録密度の向上が要求されている。それを実現す
るために記録媒体では高保磁力化が図られ短波長での記
録,再生信号の出力向上を可能にしている。一方、磁気
ヘッドには高保磁力媒体を十分に飽和記録するためには
高い飽和磁束密度を有する金属磁性体で磁気コアを形成
する技術が提案されている。例えば飽和磁束密度が十分
に高い金属磁性体とSiO2等の絶縁体をスパッタリン
グ,蒸着等の方法で薄膜化し交互に積層して、その両面
を非磁性基板で挟み磁気コアブロックを形成し、この磁
気コアブロックより磁気コアを製作する積層型磁気ヘッ
ドがその一例である。以下に積層型磁気ヘッドの従来例
を図4に基づき説明する。2. Description of the Related Art In a conventional magnetic head, a magnetic core such as a magnetic material such as ferrite or a magnetic metal material is manufactured by grinding, lapping or other mechanical processing, and the magnetic core is adhered while forming a magnetic gap and wound. The line was applied to form a magnetic head. However, with the recent trend toward smaller size and larger capacity in external storage devices for computers and VTRs, there is a demand for improvement in linear recording density and areal recording density. In order to achieve this, the recording medium has a high coercive force, which makes it possible to improve the output of recording and reproducing signals at short wavelengths. On the other hand, a technique has been proposed for forming a magnetic core of a magnetic head with a metal magnetic material having a high saturation magnetic flux density in order to sufficiently perform saturation recording on a high coercive force medium. For example, a magnetic metal block having a sufficiently high saturation magnetic flux density and an insulator such as SiO 2 are formed into thin films by a method such as sputtering or vapor deposition and alternately laminated, and both surfaces thereof are sandwiched by nonmagnetic substrates to form a magnetic core block. An example is a laminated magnetic head in which a magnetic core is manufactured from a magnetic core block. A conventional example of the laminated magnetic head will be described below with reference to FIG.
【0003】図4(a)は非磁性基板1a上に磁気コア2を
高飽和磁束密度及び高透磁率を有するFe−Al−Si合
金,アモルファス磁性合金,Fe−Ni合金等の金属磁性
体第1層3aとSiO2,Al2O3等の絶縁体第1層4aと
をスパッタリング法にて順次膜付けし、以降金属磁性体
第2層3b,絶縁体第2層4b,金属磁性体第3層3c,
絶縁体第3層4cと繰り返し膜付けして磁気コア2を形
成する。次に補強材となる非磁性基板1bを絶縁体第3
層4cに接着ガラス5により接着して、磁気コアブロッ
ク6を製作する図4(b)。次に磁気コアブロック6を積
層膜に直交するように切断分離し、一方の非磁性基板の
少なくとも一方に研削加工によりコイル線巻溝7を形成
する図4(c)。その後対向面をLap法等により鏡面加
工を施し、その上にSiO2等のGap材9をスパッタリ
ング法により形成する図4(d)。この場合、対向面と同
じかそれ以下の膜厚の層がコイル巻線溝7にも形成され
る。その後ボンディングガラス10を溶着しつつ接着し図
4(e)、用途に応じた形状やギャップデプスに規制して
磁気ヘッドとする製造方法であった。一例としてハード
ディスクに使用される浮動型のヘッドを示す図4(f)。
積層型磁気ヘッドの磁気コア2は飽和磁束密度および透
磁率が高い金属磁性膜3で構成されるため、従来の磁気
ヘッドに比べ高周波帯域での透磁率の劣化が少なくイン
ダクタンスを小さくすることができる。また、金属磁性
膜3の飽和磁束密度を上げることにより、高保磁力媒体
の記録に対応出来るなど金属磁性膜の優れた特性を利用
することにより従来の磁気ヘッドに比べて多くの利点が
期待できる。FIG. 4 (a) shows a magnetic core 2 on a non-magnetic substrate 1a, which is a metal magnetic material such as Fe-Al-Si alloy, amorphous magnetic alloy or Fe-Ni alloy having a high saturation magnetic flux density and a high magnetic permeability. The first layer 3a and the insulator first layer 4a such as SiO 2 and Al 2 O 3 are sequentially deposited by a sputtering method, and thereafter, the metal magnetic second layer 3b, the insulator second layer 4b, and the metal magnetic first layer are formed. 3 layers 3c,
The magnetic core 2 is formed by repeatedly film-coating with the third insulator layer 4c. Next, the non-magnetic substrate 1b serving as a reinforcing material is attached to the insulating third layer.
The magnetic core block 6 is manufactured by adhering it to the layer 4c with the adhesive glass 5 (FIG. 4B). Next, the magnetic core block 6 is cut and separated so as to be orthogonal to the laminated film, and the coil wire wound groove 7 is formed on at least one of the one non-magnetic substrates by a grinding process (FIG. 4C). After that, the opposite surface is mirror-finished by the Lap method or the like, and the Gap material 9 such as SiO 2 is formed thereon by the sputtering method (FIG. 4D). In this case, a layer having a film thickness equal to or smaller than that of the facing surface is also formed in the coil winding groove 7. After that, the bonding glass 10 was welded and adhered to the magnetic head as shown in FIG. 4 (e), and the shape and the gap depth were regulated according to the application to obtain a magnetic head. FIG. 4 (f) showing a floating head used in a hard disk as an example.
Since the magnetic core 2 of the laminated magnetic head is composed of the metal magnetic film 3 having a high saturation magnetic flux density and a high magnetic permeability, the magnetic permeability is less deteriorated in the high frequency band and the inductance can be reduced as compared with the conventional magnetic head. .. Further, by increasing the saturation magnetic flux density of the metal magnetic film 3, it is possible to cope with recording of a high coercive force medium, and by utilizing the excellent characteristics of the metal magnetic film, many advantages can be expected as compared with the conventional magnetic head.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、上記従
来の積層型磁気ヘッドは、近年の小型化,大容量化が進
み磁気記録媒体の保磁力や磁気ヘッドと磁気記録媒体と
のスペーシング等の関係からGapデプスは小さくなる
傾向がある。特にハードディスクドライブでは磁気ヘッ
ドのGapデプスは5μm前後になってきている。従来
のVTR用へッドのようにGapデプスが20μmから30
μmあるような積層型磁気ヘッドと異なり、近年のGa
pデプスの小さい積層型磁気ヘッドにおいては図5に示
すようにGapデプスの小さい領域では従来のフェライ
ト系ヘッドと比べると記録再生特性に著しい劣化が生
じ、積層型磁気ヘッドの出力はフェライト系へッドの出
力より小さくなってしまう現象がおき、さらに孤立波形
のベースラインのノイズが増加し著しいS/N比の低下
が生じるという問題がある。Gapデプスを小さくする
必要のある積層型磁気ヘッドでは小さなギャップデプス
の領域での特性のコントロールが重要であるので前記の
問題点を解決することが必要である。本発明は上記従来
の問題を解決するもので、小さいGapデプスにおいて
もばらつきの無い良好な特性を示す積層型磁気ヘッドの
製造方法を提供することを目的とするものである。However, the above-mentioned conventional laminated magnetic head has been reduced in size and increased in capacity in recent years, and has a relationship such as a coercive force of the magnetic recording medium and a spacing between the magnetic head and the magnetic recording medium. Therefore, the Gap depth tends to be small. Especially in hard disk drives, the Gap depth of the magnetic head is around 5 μm. Gap depth is 20μm to 30 like conventional VTR head
Unlike stacked magnetic heads with μm, the recent Ga
In a stacked magnetic head having a small p-depth, as shown in FIG. 5, in a region having a small Gap depth, recording / reproducing characteristics are significantly deteriorated as compared with a conventional ferrite-based head, and the output of the stacked magnetic head is a ferrite-based head. There is a problem in that the noise becomes smaller than the output of the signal, the noise of the baseline of the isolated waveform increases, and the S / N ratio remarkably decreases. In a laminated magnetic head that needs to have a small Gap depth, it is important to control the characteristics in the region of a small gap depth, so it is necessary to solve the above problems. The present invention solves the above-mentioned conventional problems, and an object of the present invention is to provide a method of manufacturing a laminated magnetic head that exhibits good characteristics without variations even with a small Gap depth.
【0005】[0005]
【課題を解決するための手段】本発明は上記目的を達成
するために、コイル巻線溝の面に保護膜としてSiO2,
ZrO2,Al2O3等の絶縁酸化物やSiN等の窒化物によ
りボンディングガラスと反応しないように充分な性能・
膜厚を持つ保護膜を具備する積層型磁気ヘッドの構成と
したものである。SUMMARY OF THE INVENTION In order to achieve the above object, the present invention uses SiO 2 as a protective film on the surface of a coil winding groove,
Insulating oxides such as ZrO 2 and Al 2 O 3 and nitrides such as SiN have sufficient performance to prevent them from reacting with the bonding glass.
This is a structure of a laminated magnetic head including a protective film having a film thickness.
【0006】[0006]
【作用】したがって本発明によれば、従来の積層型磁気
ヘッドの製造方法では、Gap形成の時、図3の磁気コ
アの断面図に示すようにコイル巻線溝7はボンディング
ガラス10が磁気コア2を形成する金属磁性膜3と反応
し、本来の軟磁気特性を示さない反応層11が形成され、
従来のフェライトヘッドとは違い磁気コアが金属磁性膜
のみで構成されている積層型磁気ヘッドにおいては著し
い磁気コアの再生効率の低下や、ノイズの発生等の悪影
響をおよぼしていることがわかった。更に、磁気ヘッド
を加工する場合には磁気コアブロックの側面からGap
デプスの値を読み加工を行っているが、側面から読むと
きの非磁性基板上のGapデプス12は見かけ上の値であ
り磁気回路を構成する金属磁性膜のGapデプスは、図
3に示すように磁気コアの断面図で見ると反応層11があ
るために側面から所定のギャップデプス値を規制した場
合と、金属磁性膜の実質的なギャップデプスとは違う値
となって寸法上のばらつきも生じていた。上記構成によ
りコイル巻線溝の面上に保護層が形成されることにより
ボンディングガラスと金属磁性膜との反応が防止され、
ばらつきの無い優れた電磁変換特性を示し、正確なGa
pデプスのコントロールができる積層型磁気ヘッドの製
造が可能となる。Therefore, according to the present invention, in the conventional method of manufacturing a laminated magnetic head, when the gap is formed, as shown in the cross-sectional view of the magnetic core of FIG. 2 reacts with the metal magnetic film 3 forming 2 to form a reaction layer 11 that does not exhibit the original soft magnetic characteristics,
It was found that, unlike the conventional ferrite head, the laminated magnetic head in which the magnetic core is composed of only the metal magnetic film has a bad effect on the reproduction efficiency of the magnetic core and the generation of noise. Further, when processing the magnetic head, the gap is applied from the side surface of the magnetic core block.
Although the depth value is read and processed, the Gap depth 12 on the non-magnetic substrate when reading from the side is an apparent value, and the Gap depth of the metal magnetic film forming the magnetic circuit is as shown in FIG. In the cross-sectional view of the magnetic core, when the predetermined gap depth value is regulated from the side due to the presence of the reaction layer 11, the value is different from the substantial gap depth of the metal magnetic film, and the dimensional variation also occurs. It was happening. With the above configuration, the reaction between the bonding glass and the metal magnetic film is prevented by forming the protective layer on the surface of the coil winding groove,
Accurate Ga with excellent electromagnetic conversion characteristics without variation
It is possible to manufacture a laminated magnetic head capable of controlling the p depth.
【0007】[0007]
【実施例】図1は本発明の実施例における積層型磁気ヘ
ッドの製造方法を示したものである。図1(a)は非磁性
基板1aに磁気コア2を高飽和磁束密度および高透磁率
を有するFe−Al−Si合金,アモルファス磁性合金,
Fe−Ni合金等の金属磁性体第1層3aとSiO2,Al2
O3等の絶縁体第1層4aとをスパッタリング法にてそれ
ぞれ3μm、0.2〜0.5μm程度膜付し、以降金属磁性体第
2層3b,絶縁体第2層4b,金属磁性体第3層3c,絶
縁体第3層4cと繰り返し膜付けして磁気コア2を形成
する。次に補強材となる非磁性基板1bを絶縁体第3層
4cに接着ガラス5により接着して磁気コアブロック6
を作成する図1(b)。次に磁気コアブロック6を積層膜
に直交するように切断分離し、一対の非磁性基板の少な
くとも一方に研削加工によりコイル線巻溝7を形成する
図1(c)。これらは従来の構成と同じである。その後、
本発明に於いてはコイル巻線溝7に保護層となる保護膜
8をスパッタリング法により1μm程度膜付けする図1
(d)。その材料としてSiO2,ZrO2,Al2O3等の絶縁
酸化物やSiN等の窒化物を使用する。使用する材料や
膜厚はGap形成時に溶着するボンディングガラスの種
類により最適な物,膜厚を選択する。近年の低融点によ
るGap形成に使用されるボンディンガラスはPb等の
金属元素が多く含まれ、金属磁性膜と反応しやすく、保
護膜の膜厚は充分厚い膜厚にする必要がある。また、使
用する金属磁性膜の種類によっては保護層を形成する材
料とのマッチングを考えて使う材料を選ぶ必要がある。
この後、対向面をLap法等により鏡面加工を施す図1
(e)。この時前工程で膜付けした保護膜8を対向面から
完全に除去し、コイル巻線溝中のみに保護膜8が残って
いるようにする。その後Gap材9としてSiO2,Al2
O3等を対向面にスパッタリング法によりギャップ長に
なる0.3μm〜1.0μm程度形成する図1(f)。この時コイ
ル巻線溝はGap材9の膜厚より厚い膜厚の保護層が形
成されたコイル巻線溝が形成されている。この後ボンデ
ィングガラス10を溶着した際に、金属磁性膜3とボンデ
ィングガラス10の反応が防止される。その後積層膜でG
ap材を挟むように磁気空隙を形成しつつ接着し図1
(g)、用途に応じた形状やギャップデプスに規制して積
層型磁気ヘッドを形成する図1(h)。従来の技術におい
ては保護膜がなくGap材9のみが保護材として機能し
ていたがGap材が薄いため金属磁性膜3とボンディン
グガラス10との反応層11が形成されて、電磁変換特性の
劣化や実際のギャップデプスの値が把握できないという
問題点があったが、本実施例では反応層が形成されなく
なったことにより正確なギャップデプスのコントロール
が可能となる。また、反応層による効率の低下を防止で
きる。一例としてコイル巻線窓中に1μmのAl2O3保護
膜を形成し、対向面ラップ後SiO2のGap材を0.3μm
スパッタリング法にて膜付けした後550℃のGap形成
温度で積層型磁気ヘッドを作った場合、ボンディングガ
ラスと金属磁性膜の反応のない積層型磁気ヘッドを作る
ことができた。図2に本実施例で作った積層型磁気ヘッ
ドとフェライト系ヘッドのGapデプス値と規格化出力
の値の相関を示す。実施例により作られた積層型磁気ヘ
ッドは反応層のない金属磁性膜による磁気コアで構成さ
れているため効率の低下の少ない、記録再生特性の良好
な積層型磁気ヘッドとなっている。従ってGapデプス
の小さい領域でも従来のフェライト系ヘッドの出力以下
になることはない。FIG. 1 shows a method of manufacturing a laminated magnetic head according to an embodiment of the present invention. FIG. 1A shows a magnetic core 2 on a non-magnetic substrate 1a, a Fe-Al-Si alloy having a high saturation magnetic flux density and a high magnetic permeability, an amorphous magnetic alloy,
First layer 3a of metallic magnetic material such as Fe-Ni alloy and SiO 2 , Al 2
An insulating first layer 4a such as O 3 is deposited by a sputtering method to a thickness of 3 μm and 0.2 to 0.5 μm, respectively, and thereafter, a metal magnetic second layer 3b, an insulating second layer 4b, and a metal magnetic third layer. The magnetic core 2 is formed by repeatedly forming a film with 3c and the third insulating layer 4c. Next, the non-magnetic substrate 1b serving as a reinforcing material is adhered to the third insulator layer 4c by the adhesive glass 5 to bond the magnetic core block 6
Figure 1 (b). Next, the magnetic core block 6 is cut and separated so as to be orthogonal to the laminated film, and the coil wire wound groove 7 is formed on at least one of the pair of non-magnetic substrates by grinding, as shown in FIG. 1 (c). These are the same as the conventional configuration. afterwards,
In the present invention, a protective film 8 serving as a protective layer is formed on the coil winding groove 7 by sputtering to a thickness of about 1 μm.
(d). As the material, an insulating oxide such as SiO 2 , ZrO 2 , Al 2 O 3 or a nitride such as SiN is used. The optimum material and film thickness are selected according to the type of bonding glass to be welded during Gap formation. Bonding glass used for Gap formation with a low melting point in recent years contains a large amount of metal elements such as Pb and easily reacts with a metal magnetic film, so that the thickness of the protective film needs to be sufficiently large. Further, depending on the type of metal magnetic film used, it is necessary to select the material to be used in consideration of matching with the material forming the protective layer.
After that, the opposite surface is mirror-finished by the Lap method or the like.
(e). At this time, the protective film 8 applied in the previous step is completely removed from the facing surface so that the protective film 8 remains only in the coil winding groove. After that, as the Gap material 9, SiO 2 , Al 2
O 3 or the like is formed on the opposite surface by a sputtering method to a gap length of about 0.3 μm to 1.0 μm, as shown in FIG. At this time, the coil winding groove is formed with a protective layer having a film thickness larger than that of the Gap material 9. After that, when the bonding glass 10 is welded, the reaction between the metal magnetic film 3 and the bonding glass 10 is prevented. Then G
Adhesion is performed while forming a magnetic gap so as to sandwich the ap material.
(g), FIG. 1 (h) in which the laminated magnetic head is formed by controlling the shape and gap depth according to the application. In the conventional technique, there is no protective film and only the Gap material 9 functions as a protective material. However, since the Gap material is thin, the reaction layer 11 of the metal magnetic film 3 and the bonding glass 10 is formed, and the electromagnetic conversion characteristics are deteriorated. However, there is a problem that the actual value of the gap depth cannot be grasped, but in this embodiment, the gap layer can be accurately controlled because the reaction layer is not formed. Further, it is possible to prevent the efficiency from decreasing due to the reaction layer. As an example, an Al 2 O 3 protective film of 1 μm is formed in the coil winding window, and a Gap material of SiO 2 is 0.3 μm after lapping the facing surface.
When the laminated magnetic head was formed at the gap formation temperature of 550 ° C. after the film was formed by the sputtering method, the laminated magnetic head in which the bonding glass and the metal magnetic film did not react could be formed. FIG. 2 shows the correlation between the Gap depth value and the normalized output value of the laminated magnetic head and the ferrite type head manufactured in this embodiment. The multi-layer magnetic head manufactured according to the example is a multi-layer magnetic head having a small recording efficiency and a good recording / reproducing characteristic because it is composed of a magnetic core made of a metal magnetic film having no reaction layer. Therefore, the output of the conventional ferrite-based head does not become lower than the output even in the region where the Gap depth is small.
【0008】[0008]
【発明の効果】本発明は上記実施例から明らかなよう
に、積層型磁気ヘッドのコイル巻線溝の面に保護膜とし
てSiO2,ZrO2,Al2O3等の絶縁酸化物やSiN等の
窒化物によりボンディングガラスと反応しないように充
分な性能を持つ保護層を形成することにより、ボンディ
ングガラスと金属磁性膜との反応が防止され、反応層の
ない本来の金属磁性膜の磁気回路で構成される積層型磁
気ヘッドの製造が可能となるので、正確なGapデプス
コントロールができ、反応層による磁気コアの効率の低
下のない優れた特性の磁気ヘッドの提供ができるという
効果を有する。As is apparent from the above embodiments, the present invention serves as a protective film on the surface of the coil winding groove of the laminated magnetic head as an insulating oxide such as SiO 2 , ZrO 2 , Al 2 O 3 or SiN. By forming a protective layer with sufficient performance so that it will not react with the bonding glass by the nitride, the reaction between the bonding glass and the metal magnetic film is prevented, and the original magnetic circuit of the metal magnetic film without the reaction layer is formed. Since it is possible to manufacture the laminated magnetic head having the structure, the Gap depth can be accurately controlled, and the magnetic head having excellent characteristics can be provided without the efficiency of the magnetic core being lowered by the reaction layer.
【図1】本発明の一実施例における積層型磁気ヘッドの
製造方法を説明する図である。FIG. 1 is a diagram illustrating a method of manufacturing a laminated magnetic head according to an embodiment of the invention.
【図2】本発明の一実施例の積層型磁気ヘッドとフェラ
イト系ヘッドとのGapデプスと規格化出力の関係図で
ある。FIG. 2 is a diagram showing a relationship between Gap depth and standardized output of a laminated magnetic head and a ferrite head according to an embodiment of the present invention.
【図3】従来例の積層型磁気ヘッドの構成の断面図であ
る。FIG. 3 is a cross-sectional view of the configuration of a conventional laminated magnetic head.
【図4】従来例の積層型磁気ヘッドの製造方法を説明す
る図である。FIG. 4 is a diagram illustrating a method of manufacturing a conventional laminated magnetic head.
【図5】従来例の積層型磁気ヘッドとフェライト系ヘッ
ドとのGapデプスと規格化出力の関係図である。FIG. 5 is a relational diagram of Gap depth and standardized output of a conventional laminated magnetic head and a ferrite-based head.
【符号の説明】 1a,1b…非磁性基板、 2…磁気コア、 3a,3b,
3c…金属性膜、 4a,4b,4c…絶縁膜、 5…接着
ガラス、 6…磁気コアブロック、 7…コイル巻線
溝、 8…保護膜、 9…Gap材、 10…ボンディン
グガラス、 11…反応層、 12…Gapデプス。[Explanation of reference numerals] 1a, 1b ... Non-magnetic substrate, 2 ... Magnetic core, 3a, 3b,
3c ... Metallic film, 4a, 4b, 4c ... Insulating film, 5 ... Adhesive glass, 6 ... Magnetic core block, 7 ... Coil winding groove, 8 ... Protective film, 9 ... Gap material, 10 ... Bonding glass, 11 ... Reaction layer, 12 ... Gap depth.
Claims (2)
を交互に積層して積層膜を形成し、前記一対の非磁性基
板の少なくとも一方にコイル巻線溝を形成して前記積層
膜で挟むように磁気空隙を形成しつつ接着する積層形磁
気ヘッドにおいて、前記コイル巻線溝の面に保護膜を形
成することを特徴とする積層型磁気ヘッドの製造方法。1. A laminated film in which a metal magnetic film and an insulating film are alternately laminated on a pair of non-magnetic substrates to form a laminated film, and a coil winding groove is formed on at least one of the pair of non-magnetic substrates. A method of manufacturing a laminated magnetic head, wherein a protective film is formed on a surface of the coil winding groove in the laminated magnetic head that is adhered while forming a magnetic gap so as to be sandwiched by.
膜の材料としてSiO2,ZrO2,Al2O3などの絶縁酸
化物やSiNなどの窒化物を使用することを特徴とする
請求項1記載の積層型磁気ヘッドの製造方法。2. An insulating oxide such as SiO 2 , ZrO 2 , Al 2 O 3 or a nitride such as SiN is used as a material for the protective film formed on the surface of the coil winding groove. The method of manufacturing a laminated magnetic head according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29161691A JPH05128424A (en) | 1991-11-07 | 1991-11-07 | Production of laminated magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29161691A JPH05128424A (en) | 1991-11-07 | 1991-11-07 | Production of laminated magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05128424A true JPH05128424A (en) | 1993-05-25 |
Family
ID=17771262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29161691A Pending JPH05128424A (en) | 1991-11-07 | 1991-11-07 | Production of laminated magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05128424A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4817843A (en) * | 1987-11-23 | 1989-04-04 | Toray Industries, Inc. | Suction device for yarn-threading |
-
1991
- 1991-11-07 JP JP29161691A patent/JPH05128424A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4817843A (en) * | 1987-11-23 | 1989-04-04 | Toray Industries, Inc. | Suction device for yarn-threading |
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