JPH05116069A - Cleaning device for abrasive cloth in polishing apparatus - Google Patents

Abstract

PURPOSE:To improve the efficiency of a cleaning work, to simplify the alignment of surface plates for moderately bringing abrasive cloth and a brush into contact with each other, and to uniformalize the pushing pressure of the brush. CONSTITUTION:A cleaning device for abrasive cloth is provided, in its polishing apparatus, with rotary surface plates 2, 3 installed in such a manner as to move in the axial direction and abrasive cloth pieces 8, 9 fixed to the surfaces of the surface plates, thereby the surface plates 2, 3 are rotated and a work A is pressed to the abrasive cloth pieces 8, 9 and held to polish the work. The cleaning device 7 comprises brush members 12, 13 and a driving means 11, thereby during non-cleaning operation, the brush members are disposed in the standby state in the side positions of the surface plates 2, 3, and during cleaning, the brush members are shifted to the positions opposite to the abrasive cloth pieces 8, 9 by the driving means 11. Elastic energzing force toward the abrasive cloth pieces 8, 9 is applied to the brush members 12, 13 by an elastic member.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing device for polishing a work such as an aluminum substrate for a magnetic disk, which is used in a polishing device for polishing a work with a polishing cloth attached to a rotary platen.

[0002]

2. Description of the Related Art Conventionally, an apparatus (51) shown in FIGS. 6 and 7 has been used as the above-described polishing apparatus for polishing an aluminum substrate for a magnetic disk, for example. That is, the polishing device (51) shown in FIG.
Is a lower surface plate (53) which is rotatably held and has an upper surface to which a donut-shaped polishing cloth (52) is attached, and a surface plate (53) above the lower surface plate (53). An upper surface plate (55), which is arranged so as to be opposed coaxially, is rotatably driven and can be moved up and down, and has a donut-shaped polishing cloth (54) attached to its lower surface, and polishing cloths (52) (54). ) Between the sun gear (57) arranged at the axial center of the polishing cloth, the internal gear (59) concentrically arranged at the radially outer position of the sun gear (57), and the internal teeth. The gear (59) and the sun gear (57) were meshed with each other and placed between the gears (57) and (59) while being placed on the polishing cloth (52) of the lower surface plate (53). It consists of a work carrier (56) with external gears.

In this polishing apparatus (51), the upper surface plate (55)
The magnetic disk substrate (A) is placed in the holding hole (60) of the work carrier (56) in a state in which the magnetic disk substrate is positioned at the upper standby position, and the upper surface plate (55) is lowered to move the magnetic disk substrate (A). Both sides of (A) are upper and lower polishing cloths (52) (54)
Is pressed into place. Then, under the supply of a predetermined polishing liquid, the sun gear (57) is rotated to rotate the work carrier (56) while rotating the sun gear (5).
It is revolved around 7) and the upper and lower surface plates (53, 55) are also rotated to polish both sides of the magnetic disk substrate (A).

By the way, in the polishing apparatus (51), although polishing dust and free abrasive grains remain during polishing, since the surface of the polishing cloth is generally formed as a porous layer made of polyurethane or the like, Polishing debris and loose abrasive grains are likely to accumulate in the surface porous layer of the polishing cloth, which causes deterioration of polishing performance with time and scratches on the surface of the work. Therefore, the polishing debris and loose abrasive particles that have accumulated on the surface of the polishing cloth are removed, and the polishing cloth (52)
(54) is being cleaned.

Conventionally, such cleaning of the polishing cloth is carried out by rotating a surface plate (53) while an operator presses a nylon brush (62) against the surface of the polishing cloth (52) as shown in FIG. It was done by driving it.

However, in the manual cleaning method as described above, the pressing pressure of the brush changes depending on the change of the force input by the operator, etc., so that the removal amount of polishing debris and the like is uneven especially in the circumferential direction. There was a problem that it was easy to become something.

Therefore, as shown in FIG. 7, an external gear-shaped carrier type brush dresser (71) having brush portions (70) on both sides in the thickness direction is used to remove the polishing cloth (52) (54). Cleaning is also performed. This method uses a brush dresser (71) as well as a work carrier (56) as well as a sun gear (5).
7) and the internal gear (59) are meshed with each other, and the upper and lower surface plates are moved to bring the polishing cloths (52) (54) into proper contact with the brush part (70) of the dresser (71). While rotating and revolving the carrier type dresser (71), the upper and lower stools (53) (55) are rotated to scrape the polishing debris of the polishing cloths (52) (54) with the brush part (70). ..

When such a carrier type brush dresser (71) is used, the pressure on the surface plate (53) (55) is increased,
Although the pressing pressure of the brush can be made uniform by lowering the pressure, the brush dresser (71) is troublesome to attach and detach, and the setup time becomes long, resulting in poor work efficiency. Moreover, if the brush part (70) wears or the thickness of the polishing cloths (52) (54) becomes unbalanced, it becomes difficult to align the upper and lower surface plates to obtain an appropriate pressing pressure. However, there is a drawback in that the time for alignment becomes long, moreover, it is difficult to obtain a uniform pressing pressure of the brush against the polishing cloth, and it is impossible to sufficiently clean the polishing cloth.

The present invention has been made in order to solve the above drawbacks, and is to improve the efficiency of the cleaning work, simplify the positioning of the surface plate for properly contacting the polishing cloth and the brush, and An object of the present invention is to provide a polishing cloth cleaning device in a polishing device which can achieve uniform pressing pressure and can sufficiently clean a polishing cloth.

[0010]

To achieve the above object, the present invention shows, as shown with reference to the drawings, rotary platens (2) and (3) provided movably in the axial direction, and the platens. The polishing cloths (8) and (9) attached to the surface of the workpiece are provided, and the surface plates (2) and (3) are rotated and the work (A) is pressed against the polishing cloths (8) and (9). A cleaning device for a polishing cloth in a polishing device for holding and polishing the work, comprising brush members (12) (13) for cleaning the polishing cloth, and the brush member for cleaning the polishing plate (2) when not cleaning. ) Driving means (11) arranged in a standby state at a side position of (3) and moving the brush member to a position facing the polishing cloths (8) and (9) during cleaning.
And a polishing cloth (8) (9) on the brush member (12) (13)
A polishing cloth cleaning device in a polishing device, comprising: an elastic member (16) for applying an elastic biasing force in a direction.

[0011]

[Function] The brush members (12) and (13) are moved to a position facing the polishing cloths (8) and (9) at the time of cleaning by the driving means (11), and automatically moved to the standby position after the cleaning is completed. Be transferred. Therefore, the work of attaching and detaching the brush members (12) (13), which is required in the conventional carrier type dresser, becomes unnecessary.

The brush members (12) and (13) are elastically biased toward the polishing cloths (8) and (9) by elastic members (16) such as springs. Since the variation of the elastic pressure of the elastic member (16) with respect to the moving distance of 3) is relatively small, the pressing pressure within a certain range can be obtained without strict positioning of the surface plate with respect to the brush members (12) (13). ..
If the brush part is partially worn or the polishing cloths (8) and (9) are worn down and the thickness is uneven, the elastic adjustment force of the elastic member (16) Since the brush members (12) (13) tilt appropriately according to the unevenness of the polishing cloth or the like, a uniform pressing pressure is secured.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment in which the present invention is applied to an apparatus for polishing an aluminum substrate for a magnetic disk will be described below with reference to the drawings.

In the polishing apparatus (1) shown in FIGS. 1 and 2, (2) is a lower surface plate, (3) is an upper surface plate, and (4).
Is a sun gear, (5) is an internal gear, (6) is a work carrier, and (7) is a polishing cloth cleaning device.

The lower surface plate (2) has a doughnut-shaped polishing cloth (8) attached to its upper surface, and can be rotated around its own axis and moved in the vertical direction by a driving device (not shown). It is supposed to be possible.

The upper surface plate (3) is coaxially opposed to the upper surface of the lower surface plate (2), and a polishing cloth (9) is also provided on the lower surface of the upper surface plate (3) of the lower surface plate (2). It is attached so as to face 8). The upper surface plate (3) can also be rotationally driven about its own axis and moved in the vertical direction by a driving device (not shown).

The sun gear (4) is composed of upper and lower surface plates (2).
It is arranged at the axial center position of the polishing cloths (8) and (9) between (3) and is driven to rotate about its own axis by a driving device (not shown).

The internal gear (5) is concentrically arranged at a radially outer position of the sun gear (4) with a donut-shaped space between the sun gear (4) and the sun gear (4).

The work carrier (6) is a thin plate-shaped external gear, and one or a plurality of the work carriers (6) are arranged in an annular space between the sun gear (4) and the internal gear (5). It is meshed with both sun and internal gears (4) and (5). The work carrier (6) is provided with one or a plurality of circular holding holes (10) along the outer peripheral shape of the magnetic disk substrate (A) at a position eccentric from the center position. The work carrier (6) is formed thinner than the magnetic disk substrate (A), and the magnetic disk substrate (A) is placed in the holding hole (10).
The upper and lower surfaces can be projected to the outside of the holding hole (10) in the state where the is arranged.

The polishing cloth cleaning device (7) is arranged at a position lateral to the upper and lower surface plates (2) and (3). This cleaning device includes an advancing / retreating actuator (11) as a driving means, and two upper and lower brush members (12) (13) attached to the tip of the advancing / retreating actuator (11).

The advancing / retreating device (11) includes a surface plate (2).
It moves horizontally in the radial direction of (3), and when the polishing cloths (8) and (9) are cleaned, it moves inward in the radial direction of the surface plate to move the brush members (12) and (13) to the sun gear. (4)
And the internal gear (5) are moved to the polishing cloth facing position, and after cleaning, they are retreated outward in the radial direction to move the brush members (12) and (13) to the stand-by position on the side of the surface plate. Play a role of The advancing / retreating operation of the advancing / retreating operation device (11) can be easily realized by a means such as a ball screw device for advancing / retreating the ball screw by combining the ball screw and the ball nut and rotating the ball nut. Further, it may be realized by using a gear device, a cylinder device or the like instead of the ball screw device.

As shown in detail in FIG. 3, the brush members (12) and (13) have a brush portion (12) made of nylon or the like on the upper surface or the lower surface of the rectangular parallelepiped base portions (12a) (13a).
b) (13b) is provided in a flocked manner. The sizes of the brush members (12) (13) are preferably set as large as possible. The brush members (12) (13) are attached to the advancing / retreating actuator (11) as follows. That is, as shown in FIG. 3, the forward / backward movement device (11) has two front and rear vertical walls (11a) (11a) and a horizontal wall (11b) connecting the vertical middle portions of the vertical walls (11a) (11a). Is formed into an H shape in a side view, whereby the brush member accommodating spaces (14) and (14) are formed above and below the horizontal wall (11b). The upper brush member (12) has its brush portion (12b) on the upper side and the lower brush member (12) (13) with the length direction thereof aligned with the radial direction of the surface plate. The member (13) has its brush portion (13b) arranged on the lower side and the brush portions protruded, and the brush material accommodating space (14) respectively.
It is housed in (14). And each brush member (12)
(13) has a base (12a) (13
A long hole (12C) (13C) is provided vertically through the (a) in the thickness direction (horizontal direction). This long hole (12C)
Shaft members (15) and (15) are attached through (13C) and through the vertical walls (11a) and (11a). As a result, the brush members (12) and (13) can be moved up and down over the vertical length range of the elongated holes (12C) and (13c). )
A plurality of compression coil springs (16) are interposed between the bases (12a) and (13a) bottom surface of (13), and the upper brush member (12) is an upward lower brush member. (13) has a downward spring bias. Therefore, the upper and lower brush members (12) (13) are located at the maximum rising position and the maximum descending position, respectively, when the polishing cloth is not clean.
At the time of cleaning, the upper brush member (12) is pressed downward and the lower brush member (13) is pressed upward by contact with the polishing cloths (8) and (9), and as a reaction thereof, an appropriate pressing force is applied to the polishing cloth (8). It is given to (9).

Next, the operation of the polishing apparatus (1) and the polishing cloth cleaning apparatus (7) in the apparatus will be described together with the control method of the apparatus.

In the polishing process, the lower platen (2) can hold the work carrier (6) in mesh with the sun gear (4) and the internal gear (5) as shown in FIG. The height position is set to a desired height position and the height position is maintained during the polishing process. Then, the magnetic disk substrate (A) is placed in the holding hole (10) of the work carrier (6) in a state where the upper surface plate (3) stands by at the upper standby position.

After the placement of the substrate (A) is completed, the upper surface plate (3)
The lower and upper polishing cloths (8)
Both (9) are brought into contact with both surfaces of the substrate (A), and are brought into a pressurized state by a pressure device (not shown). Then, under the supply of the polishing liquid, the sun gear (4) and the upper and lower surface plates (2) (3)
Is driven to rotate, whereby the work carrier (6) revolves around the sun gear (4) while rotating, and the magnetic disk substrate (A) slides on the polishing cloths (8) and (9). The substrate (A) is polished.

Then, when the substrate (A) is polished by a predetermined amount, the rotation of the sun gear (4) and the like is stopped and the upper surface plate (3) is lifted to operate the work carrier (6). ), The substrate (A) is taken out.

After that, a new substrate (A) is again placed in the holding hole (10) of the work carrier (6), and the same operation as described above is repeated to polish the substrate (A).

When the polishing cloths (8) and (9) are required to be cleaned while the upper and lower polishing cloths (8) and (9) are accumulated while the polishing process is repeated, the substrate (A), While keeping the carrier (6) as it is, the upper platen (2) is moved upward and the lower platen (3) is slightly lowered. Then brush member (12)
The (13) is moved inward in the radial direction of the surface plate by the advancing / retreating actuator (11) to a position facing the upper and lower polishing cloths.

Next, the upper surface plate (3) is lowered and the lower surface plate (2) is raised. After moving the upper surface plate (3) to the brush portion (12b) of the upper brush member (12) and the lower surface plate (2) to the brush portion (13b) of the lower brush member (13), Continue to move the upper brush member (12)
And the lower brush member (13) is pressed upward and stopped. The upper and lower brush members (12) and (13) are biased in the vertical direction by springs (16),
The upper brush member (12) moves downward and the lower brush member (13) moves upward under the pressing force from the upper and lower platens, but at the same time, the polishing cloths (8) and (9) of the upper and lower platens move to the upper brush. As a result of receiving a pressing force directed upward by the member (12) and downward by the lower brush member (13), the polishing cloths (8) (9) and the brush portions (12b) (13b) come into contact with each other with an appropriate pressing pressure. It will be. Here, since the fluctuation of the spring pressure with respect to the moving distance of the surface plate (2) (3) is relatively small, the pressing of the surface plate (b) (12b) (13b) can be performed within a certain range without strict alignment. The pressure can be obtained.

In this state, the upper and lower surface plates (2) and (3) and further the polishing cloths (8) and (9) are rotationally driven at a predetermined constant rotation speed to perform cleaning. For this cleaning, the advancing / retreating actuator (11) is reciprocally moved inward and outward in the radial direction of the surface plate, and the brush section (12b
) (13b) is performed while making sliding contact over the entire area of the polishing cloth in the radial direction. In addition, it is preferable that the brush members (12) (13) have a longer length, because the reciprocating movement distance of the advancing / retreating actuator (11) can be reduced during cleaning. Further, cleaning is performed by rotating only the upper and lower surface plates (2) and (3), and the sun gear (4) and the internal gear (5) are stopped. When the sun gear (4) and the internal gear (5) are rotated, the work carrier (6) revolves and collides with the brush members (12) and (13) to hinder the cleaning work. .. Further, since the work carrier (6) is stopped at a fixed position by stopping the sun gear (4) and the internal gear (5), it is not necessary to remove the work carrier (6) from the polishing device during cleaning, Carrier (6)
It is possible to improve work efficiency by eliminating the need for attachment and detachment time.

In the above cleaning process, the brush member (12)
(13) and the upper and lower polishing cloths (8) and (9) always maintain an appropriate pressing pressure by the action of the spring (16), so that the polishing cloths (8) and (9) are arranged in the circumferential direction. It is evenly and uniformly cleaned. At this time, the brush part (12) (13)
Even if the wear is partially worn or the polishing cloths (8) and (9) are worn out and the thickness is uneven, the brush members (12) and (13) can be adjusted by the spring. Since it tilts appropriately according to the unevenness of the polishing cloth or the like, the pressing pressure of the brush portion against the polishing cloth is kept uniform. Not only that, the polishing cloths (8) and (9) are uniformly cleaned even in the radial direction by the reciprocating operation of the advancing / retreating actuator (11) in the radial direction of the surface plate during cleaning. As a result, the polishing cloths (8) and (9) are uniformly cleaned in their entirety.

When the cleaning of the polishing cloth is completed, the advancing / retreating actuator (11) moves outward in the radial direction of the surface plate to move the brush member (12).
(13) retreats to the standby position, and then polishing of the substrate (A) is restarted. Since the polishing cloths (8) and (9) are uniformly cleaned as described above, the substrate (A) is polished to have excellent surface properties.

FIG. 4 shows another embodiment of the present invention. In this embodiment, the advancing / retreating actuator (11) is rotated in a horizontal plane parallel to the polishing surfaces of the polishing cloths (8) and (9). When cleaning, the advancing / retreating device (11) is rotated clockwise to move the brush members (12) and (13) to the polishing cloth facing position, while it is counterclockwise after cleaning. It is supposed to rotate and retreat to the standby position.

FIG. 5 shows still another embodiment of the present invention. In this embodiment, the advancing / retreating actuator (11) is rotated in a vertical plane orthogonal to the polishing surfaces of the polishing cloths (8) and (9). When cleaning, the advancing / retreating device (11) is rotated in the downward direction to move the brush members (12) and (13) to the polishing cloth facing position in the horizontal state, and after cleaning, in the upward direction. It is supposed to rotate and retreat to the vertical standby state.

1 to 3 in FIGS. 4 and 5.
The same components as those shown in are denoted by the same reference numerals, and the description thereof will be omitted.

[0036]

According to the above, the rotary platen provided so as to be movable in the axial direction and the polishing cloth attached to the surface of the platen are provided, and the platen is rotated and the work is polished. A cleaning device for a polishing cloth in a polishing device that holds a workpiece pressed against a cloth and polishes the work, comprising: a brush member for cleaning the polishing cloth; And a drive means for moving the brush member to a position facing the polishing cloth during cleaning, the drive means moves the brush portion from the standby position to the cleaning position or vice versa. Since it can be automatically transferred, the attaching / detaching work like the conventional carrier type dresser can be eliminated, and the setup time for cleaning the polishing cloth can be significantly shortened.

Moreover, since the elastic biasing force is applied to the brush member in the direction of the polishing cloth by the elastic member such as a spring, and the elastic pressure of the elastic member is relatively small with respect to the moving distance of the surface plate, the brush member is relatively small. A pressing force within a certain range can be obtained without strict positioning of the surface plate.
Therefore, since the positioning of the surface plate with respect to the brush member during cleaning can be simplified, the cleaning time as a whole can be shortened in combination with the shortening of the above-mentioned setup time, and the workpiece can be reflexively polished. The efficiency can be improved.

Further, since the brush member is provided with an elastic biasing force in the direction of the polishing cloth, the brush portion is partially worn or the polishing cloth is worn down, resulting in uneven thickness. In this case, the effect that the brush member appropriately tilts in accordance with the unevenness of the polishing cloth or the like by the elasticity adjusting force of the elastic member is provided. Therefore, the pressing pressure of the brush member can be uniformly maintained throughout the polishing cloth, and the polishing cloth can be uniformly cleaned.

[Brief description of drawings]

FIG. 1 is a perspective view of a polishing device to which a cleaning device according to an embodiment of the present invention is attached.

FIG. 2 is a plan view showing a state in which an upper surface plate of a polishing device to which a cleaning device is also attached is removed.

FIG. 3A is a side view showing a state where the upper and lower surface plate and the brush portion are in contact with each other, and FIG. 3B is a sectional view taken along line III-III of FIG.

FIG. 4 is a plan view showing a state in which an upper platen of a polishing device to which a cleaning device according to another embodiment of the present invention is attached is removed.

FIG. 5 is a vertical cross-sectional view of a polishing apparatus to which a cleaning device according to another embodiment of the present invention is attached.

FIG. 6 is a vertical cross-sectional view of a polishing apparatus showing a conventional polishing cloth cleaning operation.

FIG. 7A is a plan view showing a state in which an upper surface plate of a polishing device equipped with a conventional cleaning device is removed, and FIG. 7B is a vertical sectional view of FIG.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Polishing device 2, 3 ... Surface plate 7 ... Polishing cloth cleaning device 8, 9 ... Polishing cloth 11 ... Advancement / retraction actuating device (driving means) 12, 13 ... Brush member 16 ... Elastic member

Claims (1)

[Claims] 1. A rotary platen (2) (3) provided so as to be movable in the axial direction, and polishing cloths (8) (9) attached to the surface of the platen. 2) A polishing cloth cleaning device in a polishing device for rotating a work (3) and pressing a work (A) against the polishing cloths (8) and (9) to polish the work. Brush members (12) (13) for cleaning the polishing cloth, and when not cleaning, the brush members are placed in a standby position at the side positions of the surface plates (2) (3), and when cleaning, the brush members are polished. Cloth (8)
A driving means (11) for shifting to a position opposed to (9), and an elastic member (16) for applying an elastic biasing force to the polishing members (8), (9) to the brush members (12, 13). An apparatus for cleaning a polishing cloth in a polishing apparatus, comprising: