KR20160003957A - Grinding system for glass plate - Google Patents

Grinding system for glass plate Download PDF

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Publication number
KR20160003957A
KR20160003957A KR1020140081853A KR20140081853A KR20160003957A KR 20160003957 A KR20160003957 A KR 20160003957A KR 1020140081853 A KR1020140081853 A KR 1020140081853A KR 20140081853 A KR20140081853 A KR 20140081853A KR 20160003957 A KR20160003957 A KR 20160003957A
Authority
KR
South Korea
Prior art keywords
dressing
glass plate
polishing
body frame
plate
Prior art date
Application number
KR1020140081853A
Other languages
Korean (ko)
Inventor
정욱
Original Assignee
주식회사 엘지화학
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to KR1020140081853A priority Critical patent/KR20160003957A/en
Publication of KR20160003957A publication Critical patent/KR20160003957A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/095—Cooling or lubricating during dressing operation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12—Dressing tools; Holders therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass

Abstract

Disclosed is a grinding system for a glass plate, comprising: a main body frame; a lower surface plate which is installed on one side of the main body frame to be rotated and supports a glass plate to be ground; an upper surface plate which has a grinding pad to grind the flat surface of the glass plate on the top of the lower surface plate; and a dressing surface plate which is installed in the main body frame and has a dressing carrier to support a dressing tool for dressing the grinding pad. Therefore, the present invention improves the installation structure of a dressing device to rapidly perform the dressing of the grinding pad.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a grinding apparatus,

The present invention relates to a glass plate polishing system, and more particularly, to a glass plate polishing system having an improved structure of a dressing apparatus for dressing a surface of a polishing pad used for flat polishing of a glass plate.

It is very important to keep the flatness of the surface at a certain level in order to accurately implement the image of the glass plate applied to the substrates of various displays. Therefore, fine irregularities or undulations present on the surface of the float glass plate molded through the float chamber must be removed by a polishing process.

1, which is a schematic view of a glass plate polishing apparatus according to the prior art, a known polishing apparatus 10 comprises a glass plate G to be polished using a carrier 4 on a rotating polishing stage 2 The abrasive plate 8 with the abrasive pad 6 is brought into contact with the glass plate G and the abrasive plate 8 is moved in the horizontal direction while the abrasive plate 8 is held between the abrasive plate 8 and the glass plate G So that the glass plate G is polished. To this end, the conventional polishing apparatus 10 has a plurality of slot holes 8a formed in the polishing plate 8 and a plurality of slot holes 8a formed in the polishing plate 8, The polishing liquid is supplied.

The polishing pad used in the polishing process consumes the pad surface as the use time increases, and the glass dust generated by the polishing of the glass plate adheres to the pad surface, thereby gradually losing the polishing function. To solve this problem, after using the polishing pad for a long time, the surface of the polishing pad is usually flattened by using an electrodeposited diamond tool and a dressing operation is performed to expose new abrasive particles.

Published Documents Related to Dressing Processing for a Polishing Pad of a Glass Plate are disclosed in Japanese Patent Laid-Open Publication No. 2008-0110471 and Korean Patent Laid-Open Publication No. 2009-0026920.

Japanese Patent Application Laid-Open No. 2008-0110471 discloses a substrate polishing apparatus capable of polishing a substrate such as a large glass substrate with a high degree of flatness, and washing and drying the substrate. The polishing apparatus includes a turntable provided with a polishing pad, Discloses a substrate polishing apparatus having a pusher mechanism portion for transferring a substrate and a dresser unit that makes the surface of the polishing pad suitable for polishing the substrate.

Korean Patent Laid-Open Publication No. 2009-0026920 discloses a glass substrate polishing apparatus having a dressing apparatus capable of performing a dressing operation on a polishing apparatus for grinding an edge of an LCD, a PDP, and glass substrates.

However, the conventional glass plate polishing system has a drawback that the apparatus is complicated and the dressing operation can not be performed quickly because it is difficult to quickly move the dressing apparatus. This problem is a major cause of deteriorating the productivity in manufacturing a thin glass plate.

The present invention has been made in view of the above problems, and it is an object of the present invention to provide a glass plate polishing system improved in the installation structure of a dressing apparatus so that a dressing operation can be rapidly performed on a polishing pad in performing a surface polishing process on a glass plate It has its purpose.

Another object of the present invention is to provide a glass plate polishing system capable of smoothly discharging glass dust from a dressing tool during a dressing operation and improving cooling performance.

According to an aspect of the present invention, A lower plate rotatably installed on one side of the body frame to support a glass plate to be polished; And an abrasive pad capable of abrading a plane of the glass plate at an upper portion of the lower half; And a dressing table provided on the body frame and having a dressing carrier for supporting a dressing tool capable of dressing the polishing pad.

The dressing tool may be formed by assembling a plurality of electrodeposited diamond tool pieces on a support plate.

Preferably, a gap is formed between the plurality of electrodeposited diamond tool pieces for foreign matter discharge and cooling.

The glass plate polishing system according to the present invention may further include a transfer unit for moving the dressing table in the horizontal and vertical directions.

The dressing platen may be fixed to the body frame, and the supposition plate may be movably installed between an upper portion of the lower platen and an upper portion of the dressing platen.

The dressing base may be provided with a brush arrangement space having a groove or a hole structure, and the brush arrangement space may be provided with a brush capable of brushing the surface of the polishing pad.

The dressing base is provided with a nozzle arrangement space of a groove or a hole structure, and the cleaning arrangement high-pressure nozzle may be provided in the nozzle arrangement space.

The glass plate polishing system according to the present invention has the following effects.

First, a dressing apparatus is provided in the glass plate polishing system itself, and dressing work can be performed promptly when a dressing operation is required for the polishing pad.

Secondly, since the dressing tool is composed of a plurality of electrodeposited diamond tool pieces that are divided into each other, the glass dust generated during the dressing operation can be rapidly discharged from the tool, and the cooling efficiency can be increased through the gap between the tool pieces.

Third, the efficiency of the dressing operation can be increased by the brush and the high-pressure nozzle disposed on the dressing base.

Fourth, the size of the dressing tool can be easily miniaturized, and manufacturing cost can be reduced.

BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate preferred embodiments of the invention and, together with the description of the invention given below, serve to further the understanding of the technical idea of the invention. And should not be construed as limiting.
BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic diagram of a general glass plate polishing system,
FIG. 2 is a main structural view of a glass plate polishing system according to a preferred embodiment of the present invention,
Fig. 3 is a plan view showing a configuration example of the dressing table in Fig. 2,
FIG. 4 is a plan view showing a configuration example of a dressing table according to another embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. Prior to this, terms and words used in the present specification and claims should not be construed as limited to ordinary or dictionary terms, and the inventor should appropriately interpret the concepts of the terms appropriately It should be construed in accordance with the meaning and concept consistent with the technical idea of the present invention based on the principle that it can be defined. Therefore, the embodiments described in this specification and the configurations shown in the drawings are merely the most preferred embodiments of the present invention and do not represent all the technical ideas of the present invention. Therefore, It is to be understood that equivalents and modifications are possible.

2 is a side view showing a main configuration of a glass plate polishing system according to a preferred embodiment of the present invention.

2, a glass plate polishing system according to a preferred embodiment of the present invention includes a body frame 100 having a predetermined shape, a lower plate 110 installed on the body frame 100 and supporting a glass plate G to be polished, And a dressing table 130 having a dressing carrier 133 for dressing the polishing pad 124 and a dressing table 120 having a polishing pad 124 capable of polishing the plane of the glass plate G, ).

The lower stage 110 has a supporting portion capable of supporting the glass plate G and is connected to the rotating shaft of the driving means 111 fixed to the main frame 100 to receive rotational force.

The anticipation unit 120 is attached to the lower end of a rotatably installed spindle 127. The inference unit 120 is divided into a fixed platter 121, a middle platter 122, and a separation platter 123, each of which is formed in a disc shape as a whole. The fixed platter 121 is fixed to the lower end of the spindle 127 and the middle platter 122 and the separation platter 123 are disposed apart from the fixed platter 121 so as to be movable with respect to the fixed platter 121. The separation platter 123 is installed to be selectively detachable in an adsorption manner with respect to the middle platter 122. [

A plurality of air springs 125 arranged in a predetermined pattern are provided between the stationary platter 121 and the middle platter 122 in order to uniformly maintain the pressure of each part of the supposition plate 120 at the time of polishing.

The dimensions (the diameter in the case of a disc shape) of the polishing pad 124 attached to the imaginary circle 120 are smaller than the dimensions (horizontal and vertical length) of the glass plate G in the rectangular shape.

The movable unit 128 is connected to a predetermined stage that supports the spindle 127 to move the imaginary plane 120 in the horizontal and vertical directions.

An abrasive liquid supply unit 129 is connected to the assumed chamber 120. The abrasive liquid supply unit 129 is provided with a plurality of abrasive blades 123 formed to penetrate the stationary platters 121, the middle platters 122 and the separating platters 123 to supply abrasive liquid in the form of a slurry in the form of a liquid, And a liquid supply path 126. The polishing liquid supplied through the polishing liquid supply unit 129 is supplied to the center of the plating unit 120, that is, to a point immediately below the spindle 124 and to a plurality of points formed with a predetermined radius around the spindle 127.

The dressing base 130 is installed on the body frame 100 at a predetermined interval from the lower face 110. Here, the size relationship and positional relationship between the dressing table 130 and the dressing table 120 may be variously modified as needed. In FIG. 2, the dressing table 130 and the lower table 110 are shown side by side for the sake of understanding. The dressing surface plate 130 is connected to a predetermined driving device and is configured to be rotatable or fixed type.

A dressing carrier 133 capable of supporting a dressing tool (see 134 in FIG. 3) is provided at an upper portion of the dressing base 130. The dressing tool 134 mounted on the dressing carrier 133 is provided by an electrodeposited diamond capable of dressing the polishing pad 124.

As shown in Fig. 3, the dressing tool 134 is formed by gathering a plurality of electrodeposited diamond tool pieces, for example, on a support plate made of SUS. Here, the plurality of electrodeposited diamond tool pieces are preferably arranged in a mutually divided form. That is, fine gaps are formed between the electrodeposited diamond tool pieces to enhance smooth external discharge and cooling performance against foreign substances such as glass dust generated during dressing. In order to maximize utilization efficiency of the area of the limited dressing tool 134, it is preferred that the electrodeposited diamond tool pieces are each arranged to have a square body and to be arranged in a matrix as a whole.

The dressing tool 134 and the dressing carrier 133 supporting the dressing tool 134 are preferably configured to have an area smaller than that of the glass plate for a commercialized eighth generation (G8) liquid crystal panel in view of the maneuverability of the dressing apparatus.

The dressing table 130 for supporting the dressing carrier 133 is provided with a sliding driving mechanism 131 for providing a moving function in the horizontal direction and an up-down driving mechanism 132 for providing a moving function in the vertical direction. As a technical means of the sliding drive mechanism 131 and the up-down drive mechanism 132, a common technique can be employed, and a detailed description thereof will be omitted. The polishing pad 124 attached to the imaginary circle 120 can be aligned with the dressing tool 134 as the dressing surface 130 moves along the sliding driving mechanism 131 as shown in FIG. The dressing base 130 may be positioned between the upper half 120 and the lower half 110. However, the present invention is not limited to this example.

According to another embodiment of the present invention, a glass plate polishing system having a configuration in which a brush 140 and a cleaning high-pressure nozzle 150 are provided on a dressing surface plate 130 as shown in FIG. 4 to further increase the efficiency of a dressing operation / RTI > The dressing table 130 is fixed to the body frame 100 and the polishing pad 124 and the supporting table 120 supporting the polishing pad 124 are reciprocated between the upper portion of the lower table 110 and the upper portion of the dressing table 130, And is movably installed.

The dressing surface plate 130 is provided with a brush arrangement space 135 having a groove structure formed on the upper surface thereof or a hole structure penetrating therethrough in the thickness direction and the surface of the polishing pad 124 is brushed in the brush arrangement space 135 A brush 140 is installed.

A nozzle arrangement space 136 having a groove or a hole structure is provided at a position spaced from the brush arrangement space 135 by a predetermined distance in the dressing surface plate 130. Inside the nozzle arrangement space 136, (150). The cleaning high-pressure nozzle 150 functions to remove glass dust adhered to the surface of the polishing pad 124 by spraying high-pressure cleaning water, air, microbubbles, or the like.

In the glass plate polishing system having the above-described configuration, when the polishing pad 124 is in contact with the surface to be polished of the glass plate G, the lower polishing table 110 is rotated and the moving unit 128 is moved in a horizontal direction And the abrasive liquid is supplied from the abrasive liquid supply unit 129 and the entire surface to be polished of the glass plate G is uniformly supplied Is polished.

If the surface of the polishing pad 124 is to be dressed by the polishing process for a long period of time, the dresser 120 may be moved to the upper portion of the dressing table 130 provided in the system, And the dressing table 130 or the dressing table 120 is rotated while the polishing pad 124 is in contact with the dressing tool 134 provided on the dressing table 130 to perform the dressing operation .

The foreign matter such as glass dust that has fallen off the surface of the polishing pad 124 during the dressing operation is smoothly discharged to the outside through the gap formed between the electrodeposited diamond tool pieces constituting the dressing tool 134, .

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not to be limited to the details thereof and that various changes and modifications will be apparent to those skilled in the art. And various modifications and variations are possible within the scope of the appended claims.

G: Glass plate 100: Body frame
110: Lower and upper stage 111: Driving means
120: Assumption part 124: Polishing pad
127: spindle 128: moving unit
129: polishing liquid supply unit 130: dressing plate
131: Sliding drive mechanism 132: Up-down drive mechanism
133: dressing carrier 134: dressing tool
140: Brush 150: High pressure nozzle for cleaning

Claims (7)

A glass plate polishing system for polishing a flat surface of a glass plate,
Body frame;
A lower plate rotatably installed on one side of the body frame to support a glass plate to be polished;
And an abrasive pad capable of abrading a plane of the glass plate at an upper portion of the lower half; And
And a dressing base provided on the body frame and having a dressing carrier for supporting a dressing tool capable of dressing the polishing pad. The method according to claim 1,
Wherein the dressing tool is formed by assembling a plurality of electrodeposited diamond tool pieces on a support plate. 3. The method of claim 2,
And a gap is formed between the plurality of electrodeposited diamond tool pieces for foreign matter discharge and cooling. The method according to claim 1,
And a transfer unit for moving the dressing table in the horizontal and vertical directions. The method according to claim 1,
Wherein the dressing table is fixed to the body frame,
Wherein the supposition half is installed movably between an upper portion of the lower half and an upper portion of the dressing base. 6. The method according to claim 1 or 5,
Wherein the dressing base is provided with a brush arrangement space of a groove or a hole structure,
Wherein the brush arrangement space is provided with a brush capable of brushing the surface of the polishing pad. The method according to claim 6,
The dressing base is provided with a nozzle arrangement space of a groove or a hole structure,
Wherein the nozzle arrangement space is provided with a cleaning high-pressure nozzle.
KR1020140081853A 2014-07-01 2014-07-01 Grinding system for glass plate KR20160003957A (en)

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KR1020140081853A KR20160003957A (en) 2014-07-01 2014-07-01 Grinding system for glass plate

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Application Number Priority Date Filing Date Title
KR1020140081853A KR20160003957A (en) 2014-07-01 2014-07-01 Grinding system for glass plate

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102027814B1 (en) * 2018-05-23 2019-10-02 주식회사 앤아이윈 Upper platen of chemical mechanical polishing Equipment of large area glass for display device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102027814B1 (en) * 2018-05-23 2019-10-02 주식회사 앤아이윈 Upper platen of chemical mechanical polishing Equipment of large area glass for display device

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