JPH0511276A - Liquid crystal display device - Google Patents

Liquid crystal display device

Info

Publication number
JPH0511276A
JPH0511276A JP3166989A JP16698991A JPH0511276A JP H0511276 A JPH0511276 A JP H0511276A JP 3166989 A JP3166989 A JP 3166989A JP 16698991 A JP16698991 A JP 16698991A JP H0511276 A JPH0511276 A JP H0511276A
Authority
JP
Japan
Prior art keywords
liquid crystal
crystal display
display device
metal
resistance element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3166989A
Other languages
Japanese (ja)
Inventor
Tetsuya Iizuka
哲也 飯塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Development and Engineering Corp
Original Assignee
Toshiba Corp
Toshiba Electronic Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Electronic Engineering Co Ltd filed Critical Toshiba Corp
Priority to JP3166989A priority Critical patent/JPH0511276A/en
Publication of JPH0511276A publication Critical patent/JPH0511276A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)

Abstract

PURPOSE:To provide the liquid crystal display device which obviates the generation of display defects even if a dielectric breakdown is generated by the generation of static electricity. CONSTITUTION:The patterning of a lower metal 4 to constitute wiring electrodes 2 and nonlinear resistance elements 3 on a glass substrate 1 is executed. Plural groups of wiring parts 5 for drawing out and pad parts 6 for external connection of parallel equal pitches are formed. The oxide film of the nonlinear resistance elements 3 is formed on the front surface of the lower metal 4. The patterning of the upper metal 7 of the nonlinear resistance elements 3 is executed. After the thin film of ITO is formed over the entire surface, picture element display electrodes 8 are patterned. The ITO films 9 are made to remain on the pad parts 6 as well and pattern parts 10 of the solid films of a conductor are disposed between the adjacent pad parts 6 and 6.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、金属ー絶縁体ー金属
(Metal-Insulator-Metal )の非線形抵抗素子をスイッ
チング素子として基板に設けた液晶表示装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device having a metal-insulator-metal non-linear resistance element provided as a switching element on a substrate.

【0002】[0002]

【従来の技術】近年、液晶表示装置は、時計・電卓等の
比較的小容量のものから、パーソナル・コンピュータ、
ワード・プロセッサ、さらにはオフィスオートメーショ
ン用の端末機器、テレビ画像表示などの大容量表示用途
に使用されてきている。
2. Description of the Related Art In recent years, liquid crystal display devices have come from relatively small capacity devices such as watches and calculators to personal computers,
It has been used for word processors, terminal devices for office automation, and high-capacity display applications such as television image display.

【0003】そして、従来の液晶表示装置においては、
マトリクス表示のマルチプレックス駆動方式、いわゆる
単純マトリクス方式を用いるのが一般的である。ところ
が、この単純マトリクス方式では、走査線数の増加に伴
って表示部分と非表示部分のコントラスト比が劣化する
ため、大規模なマトリクス表示には不適である。
In the conventional liquid crystal display device,
It is common to use a multiplex drive system for matrix display, a so-called simple matrix system. However, this simple matrix method is not suitable for large-scale matrix display because the contrast ratio between the display portion and the non-display portion deteriorates as the number of scanning lines increases.

【0004】そこで、個々の画素をスイッチング素子に
よって駆動する、いわゆるアクティブマトリクス方式が
開発されている。スイッチング素子としては薄膜トラン
ジスタや非線形抵抗素子を用いるが、なかでも非線形抵
抗素子は基本的に二端子で構造が簡単なため、製造コス
トの面で有利である。
Therefore, a so-called active matrix system has been developed in which each pixel is driven by a switching element. A thin film transistor or a non-linear resistance element is used as the switching element. Among them, the non-linear resistance element is basically two terminals and has a simple structure, which is advantageous in terms of manufacturing cost.

【0005】また、非線形抵抗素子としては種々の方式
が開発されているが、そのなかで金属ー絶縁体ー金属
(Metal-Insulator-Metal)構造を持つもののみが、現
在唯一実用化がなされている。
Various types of nonlinear resistance elements have been developed. Among them, only those having a metal-insulator-metal structure have been put into practical use at present. There is.

【0006】そして、金属ー絶縁体ー金属構造を持つ非
線形抵抗素子を有する従来の液晶表示装置を説明する。
A conventional liquid crystal display device having a non-linear resistance element having a metal-insulator-metal structure will be described.

【0007】まず、ガラス基板1上にタンタル(Ta)
からなる第1の金属層をスパッタリング法により薄膜形
成した後、1回目のフォトリソグラフィー工程により、
図3に示すように、配線電極2およびこの配線電極2か
ら垂直方向に突設された非線形抵抗素子3を構成する下
部金属4のパターニングを行なう。このとき同時に、図
7に示すように等ピッチの複数個のグループの引き出し
用の配線部5および配線電極であるパッド部6を形成す
る。
First, tantalum (Ta) is formed on the glass substrate 1.
After forming a thin film of the first metal layer consisting of by the sputtering method, by the first photolithography step,
As shown in FIG. 3, patterning is performed on the wiring electrode 2 and the lower metal 4 constituting the nonlinear resistance element 3 protruding from the wiring electrode 2 in the vertical direction. Simultaneously with this, as shown in FIG. 7, a plurality of groups of wirings 5 having equal pitches for drawing out and a pad portion 6 which is a wiring electrode are formed.

【0008】次に、陽極酸化法等を用いて第1の金属層
にて形成された下部金属4の表面に、非線形抵抗素子3
の絶縁膜となる酸化膜を形成する。
Next, the non-linear resistance element 3 is formed on the surface of the lower metal 4 formed of the first metal layer by using the anodic oxidation method or the like.
Forming an oxide film as an insulating film.

【0009】さらに、全面に非線形抵抗素子3の上部金
属7となる第2の金属層をスパッタリング法により薄膜
形成した後、2回目のフォトリソグラフィー工程を用い
て図4に示すように、下部金属4に交差させた非線形抵
抗素子3の上部金属7のパターニングを行なう。
Further, a second metal layer to be the upper metal 7 of the non-linear resistance element 3 is formed into a thin film on the entire surface by a sputtering method, and then a second photolithography process is used, as shown in FIG. Patterning is performed on the upper metal 7 of the non-linear resistance element 3 which intersects with each other.

【0010】最後に、ITO(Indium Tin Oxide)を全
面に薄膜形成後、3回目のフォトリソグラフィー工程に
より、図5に示すように、画素表示電極8をパターニン
グする。このとき、図7に示すように、パッド部6にも
ITO膜9を残すことにより液晶表示装置が形成され
る。
Finally, after forming a thin film of ITO (Indium Tin Oxide) on the entire surface, the pixel display electrode 8 is patterned by the third photolithography process as shown in FIG. At this time, as shown in FIG. 7, the liquid crystal display device is formed by leaving the ITO film 9 also on the pad portion 6.

【0011】[0011]

【発明が解決しようとする課題】一方、本液晶表示装置
のように、非線形抵抗素子3をスイッチング素子として
用いる場合、素子の特性不良として画素表示電極8単位
の表示欠陥がいわゆる点欠陥となる。
On the other hand, when the non-linear resistance element 3 is used as a switching element as in the present liquid crystal display device, a display defect of the pixel display electrode 8 unit becomes a so-called point defect as a characteristic defect of the element.

【0012】また、素子の特性不良には様々な要因が考
えられるが、金属ー絶縁体ー金属(Metal-Insulator-Me
tal )構造を持つMIM素子である非線形抵抗素子3に
関しては、絶縁膜である酸化膜が500〜700オング
ストローム程度と薄いため、耐電圧が低く、工程中に発
生する静電気によって絶縁破壊を起こしやすい。なお、
液晶表示装置のアレイ工程中は、各配線電極2はパッド
部6の外側において、図示しないショートリングによっ
て短絡されているため、比較的静電気に対して強い。
Various factors may be considered for the defective characteristics of the element, but metal-insulator-metal (Metal-Insulator-Me
In the non-linear resistance element 3 which is a MIM element having a (tal) structure, since the oxide film which is an insulating film is as thin as about 500 to 700 angstroms, the withstand voltage is low, and dielectric breakdown is likely to occur due to static electricity generated during the process. In addition,
During the array process of the liquid crystal display device, each wiring electrode 2 is short-circuited by a short ring (not shown) on the outside of the pad portion 6, and thus is relatively resistant to static electricity.

【0013】しかしながら、ショートリングは液晶表示
装置のセル化後に切り落とされるため、セル化後は、各
配線電極2は電気的に独立となり、静電気に対して無防
備な状態となる。このため、セル工程からモジュール工
程にかけて静電気が発生した場合、パッド部6を介し
て、配線電極2に接続したスイッチング素子である非線
形抵抗素子3の絶縁破壊を引き起こし、その結果配線電
極2に沿って点欠陥が発生することがある。
However, since the short ring is cut off after the cell is formed in the liquid crystal display device, each wiring electrode 2 is electrically independent after the cell is formed, and is protected from static electricity. Therefore, when static electricity is generated from the cell process to the module process, dielectric breakdown of the nonlinear resistance element 3 which is a switching element connected to the wiring electrode 2 is caused via the pad portion 6, and as a result, along the wiring electrode 2. Point defects may occur.

【0014】とくに図7に示す液晶表示装置のように、
パッド部6を複数個のグループに分割するような場合、
パッド部6のグループ間はガラス面が露出した形となり
静電気が発生しやすい。その結果、分割部分のパッド部
6、すなわちパッド部6のグループの両端に接続された
配線電極2上の非線形抵抗素子3は絶縁破壊を起こしや
すい。したがって、このように図8に示すように、グル
ープの両端のパッド部6,6間に静電気が発生すると、
×印の部分に絶縁破壊が生じ、表示欠陥となる問題を有
している。。
In particular, as in the liquid crystal display device shown in FIG.
When the pad portion 6 is divided into a plurality of groups,
Between the groups of the pad portions 6, the glass surface is exposed and static electricity is easily generated. As a result, the pad portion 6 of the divided portion, that is, the nonlinear resistance element 3 on the wiring electrode 2 connected to both ends of the group of the pad portion 6 is likely to cause dielectric breakdown. Therefore, as shown in FIG. 8, when static electricity is generated between the pad portions 6 and 6 at both ends of the group,
There is a problem in that dielectric breakdown occurs in the portion marked with X, resulting in a display defect. .

【0015】本発明は、上記問題点に鑑みなされたもの
で、静電気が生じ絶縁破壊が生じても表示欠陥を生じに
くい液晶表示装置を提供することを目的とする。
The present invention has been made in view of the above problems, and an object of the present invention is to provide a liquid crystal display device in which a display defect is less likely to occur even if static electricity is generated and insulation breakdown occurs.

【0016】[0016]

【課題を解決するための手段】本発明の液晶表示装置
は、複数の画素表示電極と、これら複数の画素表示電極
に電気的に接続された金属ー絶縁体ー金属構造の非線形
抵抗素子と、等ピッチの複数個のグループ毎に配線電極
により前記非線形抵抗素子に接続された電極端子とが基
板上に形成された液晶表示装置において、前記電極端子
のグループ間に導電体を配設したものである。
A liquid crystal display device according to the present invention includes a plurality of pixel display electrodes, a metal-insulator-metal nonlinear resistance element electrically connected to the plurality of pixel display electrodes, In a liquid crystal display device in which electrode terminals connected to the non-linear resistance element by wiring electrodes for each of a plurality of groups of equal pitch are formed on a substrate, a conductor is arranged between the groups of electrode terminals. is there.

【0017】[0017]

【作用】本発明は、電極端子のグループ間に導電体のパ
ターンを配置することにより、電極端子のグループ間で
の基板上の静電気の発生を抑え、グループ端部での静電
破壊を防ぎ、画素表示電極の表示欠陥を防ぐ。
The present invention suppresses the generation of static electricity on the substrate between the groups of electrode terminals by arranging the conductor pattern between the groups of electrode terminals, and prevents electrostatic breakdown at the ends of the groups. Prevent display defects of pixel display electrodes.

【0018】[0018]

【実施例】以下、本発明の液晶表示電極の一実施例を図
面を参照して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the liquid crystal display electrode of the present invention will be described below with reference to the drawings.

【0019】従来例と同様に、まず、ガラス基板1上に
タンタル(Ta)からなる第1の金属層をスパッタリン
グ法により薄膜形成した後、1回目のフォトリソグラフ
ィー工程により、図3に示すように、配線電極2および
この配線電極2から垂直方向に突設された非線形抵抗素
子3を構成する下部金属4のパターニングを行なう。こ
のとき同時に、図2に示すように等ピッチの複数個のグ
ループの引き出し用の配線部5および外部接続用の電極
部であるパッド部6を形成する。
Similar to the conventional example, first, a thin film of a first metal layer made of tantalum (Ta) is formed on a glass substrate 1 by a sputtering method, and then a first photolithography process is performed, as shown in FIG. Then, patterning is performed on the wiring electrode 2 and the lower metal 4 constituting the non-linear resistance element 3 protruding from the wiring electrode 2 in the vertical direction. At this time, at the same time, as shown in FIG. 2, a wiring portion 5 for drawing out and a pad portion 6 which is an electrode portion for external connection are formed for a plurality of groups having an equal pitch.

【0020】次に、陽極酸化法等を用いて第1の金属層
にて形成された下部金属4の表面に、非線形抵抗素子3
の絶縁膜となる酸化膜を形成する。
Next, the non-linear resistance element 3 is formed on the surface of the lower metal 4 formed of the first metal layer by using the anodic oxidation method or the like.
Forming an oxide film as an insulating film.

【0021】さらに、全面に非線形抵抗素子3の上部金
属7となる第2の金属層をスパッタリング法により薄膜
形成した後、2回目のフォトリソグラフィー工程を用い
て図4に示すように、下部金属4に交差させた非線形抵
抗素子3の上部金属7のパターニングを行なう。
Further, a second metal layer to be the upper metal 7 of the non-linear resistance element 3 is formed into a thin film on the entire surface by a sputtering method, and then a second photolithography process is used, as shown in FIG. Patterning is performed on the upper metal 7 of the non-linear resistance element 3 which intersects with each other.

【0022】最後に、ITO(Indium Tin Oxide)を全
面に薄膜形成後、3回目のフォトリソグラフィー工程に
より、図5に示すように、画素表示電極8をパターニン
グする。このとき、図1に示すように、パッド部6にも
ITO膜9を残すとともに、導電体のべた膜のパターン
部10を隣接するパッド部6,6間に配置し液晶表示装置
が形成される上記実施例では、パッド部6,6間に配置
するパターン部10として画素表示電極8の材料であるI
TOを用いている。これは、パッド部6のグループ両端
にTAB法のアウターリードボンディング(Outer Lead
Bonding)用のアライメントマークを配置した場合を考
慮しており、通常光学的なアライメントを行なっている
ために、パッド部6のグループ間にパターン部10を配置
しても光学的な干渉を起こさせないためである。
Finally, after forming a thin film of ITO (Indium Tin Oxide) on the entire surface, the pixel display electrode 8 is patterned by the third photolithography process as shown in FIG. At this time, as shown in FIG. 1, the ITO film 9 is left on the pad portion 6 and the pattern portion 10 of the solid film of the conductor is arranged between the adjacent pad portions 6 and 6 to form the liquid crystal display device. In the above-described embodiment, the pattern portion 10 arranged between the pad portions 6 and 6 is made of the material I of the pixel display electrode 8.
It uses TO. This is the outer lead bonding (Outer Lead Bonding) of the TAB method at both ends of the group of pad portions 6.
Considering the case of arranging the alignment mark for Bonding), since the optical alignment is normally performed, even if the pattern part 10 is arranged between the groups of the pad parts 6, no optical interference occurs. This is because.

【0023】上記のような光学的なアライメントを行な
わない場合、パッド部6のグループ間に配置されるパタ
ーンは第1の金属層、第2の金属層、ITOのいずれの
導電体でも同様の効果が得られる。
In the case where the above optical alignment is not performed, the pattern arranged between the groups of the pad portions 6 may be any of the conductors of the first metal layer, the second metal layer and the ITO, and the same effect can be obtained. Is obtained.

【0024】上記実施例によれば、図6に示すようにパ
ッド部6,6のグループ間の基板1上で静電気の発生が
抑えられるため配線電極2を介してスイッチング素子と
なる非線形抵抗素子3に絶縁破壊される静電気が生じな
いので、画素表示電極8に表示欠陥が発生しにくい。
According to the above-mentioned embodiment, as shown in FIG. 6, since the generation of static electricity is suppressed on the substrate 1 between the groups of the pad portions 6 and 6, the nonlinear resistance element 3 serving as a switching element via the wiring electrode 2 is formed. Since no static electricity due to dielectric breakdown is generated, it is difficult for a display defect to occur in the pixel display electrode 8.

【0025】[0025]

【発明の効果】本発明の液晶表示装置によれば、電極端
子のグループ間に導電体のパターンを配置することによ
り、電極端子のグループ間での基板上の静電気の発生を
抑え、グループ端部での静電破壊を防ぎ、画素表示電極
の表示欠陥を防ぐことができる。
According to the liquid crystal display device of the present invention, by disposing the conductor pattern between the groups of the electrode terminals, it is possible to suppress the generation of static electricity on the substrate between the groups of the electrode terminals, and to suppress the end portions of the groups. It is possible to prevent electrostatic damage in the display and prevent display defects of the pixel display electrodes.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の液晶表示装置の一実施例で図2の次の
工程を示す平面図である。
FIG. 1 is a plan view showing the next step of FIG. 2 in one embodiment of the liquid crystal display device of the present invention.

【図2】同上一工程を示す平面図である。FIG. 2 is a plan view showing one process of the above.

【図3】同上画素表示電極近傍を拡大した一工程図であ
る。
FIG. 3 is an enlarged process diagram of the vicinity of the pixel display electrode of the same.

【図4】同上図3の次の工程図である。4 is a process drawing subsequent to FIG. 3 of the same.

【図5】同上図4の次の工程図である。FIG. 5 is a process drawing next to FIG. 4 above.

【図6】同上動作を示す説明図である。FIG. 6 is an explanatory diagram showing the same operation.

【図7】従来例の液晶表示装置を示す平面図である。FIG. 7 is a plan view showing a conventional liquid crystal display device.

【図8】同上動作を示す説明図である。FIG. 8 is an explanatory diagram showing the same operation.

【符号の説明】[Explanation of symbols]

2 配線電極 3 非線形抵抗素子 6 配線電極としてのパッド部 8 画素表示電極 10 導電体としてのパターン部 2 wiring electrode 3 non-linear resistance element 6 pad portion as wiring electrode 8 pixel display electrode 10 pattern portion as conductor

Claims (1)

【特許請求の範囲】 【請求項1】 複数の画素表示電極と、これら複数の画
素表示電極に電気的に接続された金属ー絶縁体ー金属構
造の非線形抵抗素子と、等ピッチの複数個のグループ毎
に配線電極により前記非線形抵抗素子に接続された電極
端子とが基板上に形成された液晶表示装置において、 前記電極端子のグループ間に導電体を配設したことを特
徴とする液晶表示装置。
Claim: What is claimed is: 1. A plurality of pixel display electrodes, a metal-insulator-metal non-linear resistance element electrically connected to the plurality of pixel display electrodes, and a plurality of equal pitches. A liquid crystal display device in which an electrode terminal connected to the non-linear resistance element by a wiring electrode for each group is formed on a substrate, wherein a conductor is arranged between the group of the electrode terminals. ..
JP3166989A 1991-07-08 1991-07-08 Liquid crystal display device Pending JPH0511276A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3166989A JPH0511276A (en) 1991-07-08 1991-07-08 Liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3166989A JPH0511276A (en) 1991-07-08 1991-07-08 Liquid crystal display device

Publications (1)

Publication Number Publication Date
JPH0511276A true JPH0511276A (en) 1993-01-19

Family

ID=15841338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3166989A Pending JPH0511276A (en) 1991-07-08 1991-07-08 Liquid crystal display device

Country Status (1)

Country Link
JP (1) JPH0511276A (en)

Similar Documents

Publication Publication Date Title
US20080198108A1 (en) Array substrate and display unit using it and production method for array substrate
KR19990070487A (en) Liquid crystal display manufacturing method and liquid crystal display device by the manufacturing method
EP0645663B1 (en) Liquid crystal display
US20030112382A1 (en) Liquid crystal display device
EP0605176B1 (en) An active matrix type liquid crystal display panel and a method for producing the same
JP3847419B2 (en) Liquid crystal display
JP2800958B2 (en) Active matrix substrate
JPH05142578A (en) Liquid crystal display device
JPH05203997A (en) Liquid crystal display device
JPH0511276A (en) Liquid crystal display device
JP2778746B2 (en) Liquid crystal display device and method of manufacturing electrode substrate
JPH04338728A (en) Active matrix substrate
JP2687967B2 (en) Liquid crystal display
KR100361624B1 (en) Liquid crystal display apparatus
JPH03212621A (en) Liquid crystal display device
JP3327739B2 (en) Active matrix substrate
JP3545879B2 (en) Display element manufacturing method
JPH04298721A (en) Liquid crystal display device
JP3418683B2 (en) Active matrix type liquid crystal display
JPH05297415A (en) Liquid crystal display device and its production
JPH04253033A (en) Liquid crystal display device
JPH05323384A (en) Liquid crystal display device
JPH0511280A (en) Liquid crystal display device
JPH0519299A (en) Liquid crystal display device
JPH0519302A (en) Manufacture of matrix array substrate

Legal Events

Date Code Title Description
FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 13

Free format text: PAYMENT UNTIL: 20080410

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090410

Year of fee payment: 14

EXPY Cancellation because of completion of term