JPH05109914A - Ultraviolet light erasing semiconductor device - Google Patents
Ultraviolet light erasing semiconductor deviceInfo
- Publication number
- JPH05109914A JPH05109914A JP9100592A JP9100592A JPH05109914A JP H05109914 A JPH05109914 A JP H05109914A JP 9100592 A JP9100592 A JP 9100592A JP 9100592 A JP9100592 A JP 9100592A JP H05109914 A JPH05109914 A JP H05109914A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cap
- semiconductor element
- less
- translucent alumina
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Non-Volatile Memory (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、メモリーカード,IC
カード用の薄型構造の紫外線消去型半導体装置に関する
ものである。BACKGROUND OF THE INVENTION The present invention relates to a memory card and an IC.
The present invention relates to a thin structure ultraviolet erasable semiconductor device for a card.
【0002】[0002]
【従来の技術】半導体装置は、種々のものが使用されて
いるが、メモリーカード,ICカード等に搭載するため
に特に厚さを薄くした半導体装置に対する要請が近年高
い。2. Description of the Related Art Various types of semiconductor devices have been used, but in recent years, there has been a great demand for semiconductor devices having a particularly thin thickness for mounting on a memory card, an IC card or the like.
【0003】しかし、従来、紫外線消去型半導体装置
は、セラミックキャップの一部に紫外線透過ガラスを埋
設したDIP型半導体装置が主であり、全体厚が厚かっ
た。However, conventionally, the ultraviolet erasing type semiconductor device is mainly a DIP type semiconductor device in which an ultraviolet transmitting glass is embedded in a part of a ceramic cap, and the whole thickness is large.
【0004】[0004]
【発明が解決しようとする課題】上述した従来のDIP
型半導体装置は、セラミックキャップの一部に紫外線透
過ガラスが埋設された構造を有している為、気密性を確
保する上で、キャップ厚を0.8mm以下にすることが
困難であり、又、全体厚が、2.5〜4.0mmとなっ
てしまう為、メモリーカード,ICカード等の薄い製品
に搭載することができなかった。DISCLOSURE OF THE INVENTION The above-mentioned conventional DIP
Since the type semiconductor device has a structure in which an ultraviolet transparent glass is embedded in a part of a ceramic cap, it is difficult to set the cap thickness to 0.8 mm or less in order to ensure airtightness. Since the total thickness is 2.5 to 4.0 mm, it cannot be mounted on thin products such as memory cards and IC cards.
【0005】[0005]
【課題を解決するための手段】本発明によれば、紫外線
消去型メモリー半導体素子を搭載する基板とこの半導体
素子を覆うように基板に対して装着されたキャップとこ
の基板と前記キャップとの間に挟持されて外部に延長
し、且つ、半導体素子に電気的に接続されたリードとを
具備する紫外線消去型半導体装置で、基板は、厚さ0.
7mm以下で凹形状の不透光アルミナで形成され、且
つ、キャップは、0.5mm以下の透光アルミナで形成
され、低融点ガラスにより気密封止されている紫外線消
去型半導体装置を得る。According to the present invention, a substrate on which an ultraviolet erasable memory semiconductor element is mounted, a cap mounted on the substrate so as to cover the semiconductor element, and a space between the substrate and the cap are provided. An ultraviolet erasable semiconductor device, comprising: a lead sandwiched between the two and extending to the outside and electrically connected to a semiconductor element, wherein the substrate has a thickness of 0.
An ultraviolet erasable semiconductor device is obtained which is made of light-transmissive alumina having a concave shape of 7 mm or less, and the cap is made of light-transmissive alumina of 0.5 mm or less and hermetically sealed with a low melting point glass.
【0006】[0006]
【実施例】次に、本発明について図面を参照して説明す
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings.
【0007】図1は本発明の一実施例の断面図、図2
は、斜視図である。FIG. 1 is a sectional view of an embodiment of the present invention, FIG.
FIG.
【0008】紫外線消去型半導体素子(11)を搭載す
る、厚さ0.7mm以下で凹形状の不透光アルミナで形
成された基板(12)上に、ガラスAgペースト,Al
ペースト等の接着剤(13)で半導体素子(11)が固
着され、半導体素子(11)の周辺の基板上に42合
金,コバール等より成る0.05〜0.20mm厚の外
部導出用リード(14)が、封止前に所望の形状に整形
されて、低融点ガラス(15)により固着されている。On a substrate (12) on which an ultraviolet erasable semiconductor element (11) is mounted and which has a thickness of 0.7 mm or less and is made of concave opaque alumina, glass Ag paste, Al
The semiconductor element (11) is fixed by an adhesive agent (13) such as paste, and a 0.05 to 0.20 mm-thick external lead (made of 42 alloy, Kovar, etc., on the substrate around the semiconductor element (11) ( 14) is shaped into a desired shape before sealing and is fixed by a low melting point glass (15).
【0009】その上に、厚さ0.15〜0.5mmの透
光アルミナで形成されたキャップ(16)が低融点ガラ
ス(15)により固着され、全体厚が1.5mm以下に
なる様、構成される。A cap (16) made of translucent alumina having a thickness of 0.15 to 0.5 mm is fixed thereon by a low melting point glass (15) so that the total thickness becomes 1.5 mm or less. Composed.
【0010】[0010]
【発明の効果】以上説明したように、本発明は、0.7
mm以下で凹形状の不透光アルミナを基板とし、キャッ
プは、0.5mm以下の透光アルミナで構成されている
ことにより、全体厚が1.5mm以下となり、又、表面
実装(SMT)が可能なSOPタイプである為、メモリ
ーカード,ICカード等に容易に実装ができ、且つ、気
密封止である為信頼性が向上する。As described above, according to the present invention, 0.7
Since the substrate is made of non-translucent alumina having a concave shape of less than 0.5 mm and the cap is made of translucent alumina of 0.5 mm or less, the total thickness is 1.5 mm or less, and the surface mounting (SMT) is Since it is a possible SOP type, it can be easily mounted on a memory card, an IC card, etc., and the reliability is improved because it is hermetically sealed.
【図1】本発明の断面図である。1 is a cross-sectional view of the present invention.
【図2】斜視図である。FIG. 2 is a perspective view.
11 紫外線消去型半導体素子 12,22 基板 13 接着剤 14,24 リード 15,25 封止ガラス 16,26 キャップ 11 Ultraviolet Erasable Semiconductor Element 12,22 Substrate 13 Adhesive 14,24 Lead 15,25 Sealing Glass 16,26 Cap
Claims (1)
する基板と前記半導体素子を覆うように前記基板に対し
て装着されたキャップと、前記基板と前記キャップとの
間に挟持されて外部に延長し、且つ前記半導体素子に電
気的に接続されたリードとを具備する半導体装置におい
て、前記基板は、厚さ0.7mm以下で凹形状の不透光
アルミナで形成され、前記キャップは、厚さ0.5mm
以下の透光アルミナで形成され、且つ前記リードが封止
前に所望の形状に整形され、全体厚が1.5mm以下で
あることを特徴とする紫外線消去型半導体装置。1. A substrate on which an ultraviolet erasable memory semiconductor element is mounted, a cap mounted on the substrate so as to cover the semiconductor element, and sandwiched between the substrate and the cap and extended to the outside. And a lead electrically connected to the semiconductor element, wherein the substrate is made of a non-translucent alumina having a concave shape with a thickness of 0.7 mm or less, and the cap has a thickness of 0 mm. 0.5 mm
An ultraviolet erasable semiconductor device, characterized in that the lead is shaped into a desired shape before encapsulation and has a total thickness of 1.5 mm or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9100592A JPH05109914A (en) | 1992-04-10 | 1992-04-10 | Ultraviolet light erasing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9100592A JPH05109914A (en) | 1992-04-10 | 1992-04-10 | Ultraviolet light erasing semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05109914A true JPH05109914A (en) | 1993-04-30 |
Family
ID=14014395
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9100592A Pending JPH05109914A (en) | 1992-04-10 | 1992-04-10 | Ultraviolet light erasing semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05109914A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110964460A (en) * | 2018-09-29 | 2020-04-07 | 北京梦之墨科技有限公司 | Ultraviolet-cured anisotropic conductive adhesive and preparation method thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6220359A (en) * | 1985-07-18 | 1987-01-28 | Nec Corp | Ultraviolet ray erasable semiconductor device |
JPS6255356B2 (en) * | 1978-12-20 | 1987-11-19 | Sanyo Electric Co |
-
1992
- 1992-04-10 JP JP9100592A patent/JPH05109914A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6255356B2 (en) * | 1978-12-20 | 1987-11-19 | Sanyo Electric Co | |
JPS6220359A (en) * | 1985-07-18 | 1987-01-28 | Nec Corp | Ultraviolet ray erasable semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110964460A (en) * | 2018-09-29 | 2020-04-07 | 北京梦之墨科技有限公司 | Ultraviolet-cured anisotropic conductive adhesive and preparation method thereof |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 19950228 |