JPH05109914A - Ultraviolet light erasing semiconductor device - Google Patents

Ultraviolet light erasing semiconductor device

Info

Publication number
JPH05109914A
JPH05109914A JP9100592A JP9100592A JPH05109914A JP H05109914 A JPH05109914 A JP H05109914A JP 9100592 A JP9100592 A JP 9100592A JP 9100592 A JP9100592 A JP 9100592A JP H05109914 A JPH05109914 A JP H05109914A
Authority
JP
Japan
Prior art keywords
substrate
cap
semiconductor element
less
translucent alumina
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9100592A
Other languages
Japanese (ja)
Inventor
Kazufumi Terachi
和文 寺地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP9100592A priority Critical patent/JPH05109914A/en
Publication of JPH05109914A publication Critical patent/JPH05109914A/en
Pending legal-status Critical Current

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  • Non-Volatile Memory (AREA)

Abstract

PURPOSE:To facilitate mounting on a memory card, an IC card, etc., by forming a substrate using 0.7mm or thinner concave non-translucent alumina, forming a cap using 0.5mm or thinner translucent alumina and permitting the thickness of the whole device to be 1.5mm or less. CONSTITUTION:On a substrate 12 formed of 0.7mm or thinner concave non- translucent alumina, a semiconductor element 11 is firmly fixed by adhesive 13 such as glass Ag paste and Al paste. A 0.15-0.5mm thick externally conducting lead 14 composed of 42 alloy, cobalt, etc., is formed in a desired shape before sealing and is firmly fixed in the periphery of the semiconductor element 11 on the substrate by low-melting point glass 15. A cap 16 formed of 0.15-0.5mm thick translucent alumina is firmly fixed on the lead 14 by the low-melting point glass 15 and the whole device is permitted to be 1.5mm or less. Thus, mounting on a memory card, an IC card, etc., is allowed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、メモリーカード,IC
カード用の薄型構造の紫外線消去型半導体装置に関する
ものである。
BACKGROUND OF THE INVENTION The present invention relates to a memory card and an IC.
The present invention relates to a thin structure ultraviolet erasable semiconductor device for a card.

【0002】[0002]

【従来の技術】半導体装置は、種々のものが使用されて
いるが、メモリーカード,ICカード等に搭載するため
に特に厚さを薄くした半導体装置に対する要請が近年高
い。
2. Description of the Related Art Various types of semiconductor devices have been used, but in recent years, there has been a great demand for semiconductor devices having a particularly thin thickness for mounting on a memory card, an IC card or the like.

【0003】しかし、従来、紫外線消去型半導体装置
は、セラミックキャップの一部に紫外線透過ガラスを埋
設したDIP型半導体装置が主であり、全体厚が厚かっ
た。
However, conventionally, the ultraviolet erasing type semiconductor device is mainly a DIP type semiconductor device in which an ultraviolet transmitting glass is embedded in a part of a ceramic cap, and the whole thickness is large.

【0004】[0004]

【発明が解決しようとする課題】上述した従来のDIP
型半導体装置は、セラミックキャップの一部に紫外線透
過ガラスが埋設された構造を有している為、気密性を確
保する上で、キャップ厚を0.8mm以下にすることが
困難であり、又、全体厚が、2.5〜4.0mmとなっ
てしまう為、メモリーカード,ICカード等の薄い製品
に搭載することができなかった。
DISCLOSURE OF THE INVENTION The above-mentioned conventional DIP
Since the type semiconductor device has a structure in which an ultraviolet transparent glass is embedded in a part of a ceramic cap, it is difficult to set the cap thickness to 0.8 mm or less in order to ensure airtightness. Since the total thickness is 2.5 to 4.0 mm, it cannot be mounted on thin products such as memory cards and IC cards.

【0005】[0005]

【課題を解決するための手段】本発明によれば、紫外線
消去型メモリー半導体素子を搭載する基板とこの半導体
素子を覆うように基板に対して装着されたキャップとこ
の基板と前記キャップとの間に挟持されて外部に延長
し、且つ、半導体素子に電気的に接続されたリードとを
具備する紫外線消去型半導体装置で、基板は、厚さ0.
7mm以下で凹形状の不透光アルミナで形成され、且
つ、キャップは、0.5mm以下の透光アルミナで形成
され、低融点ガラスにより気密封止されている紫外線消
去型半導体装置を得る。
According to the present invention, a substrate on which an ultraviolet erasable memory semiconductor element is mounted, a cap mounted on the substrate so as to cover the semiconductor element, and a space between the substrate and the cap are provided. An ultraviolet erasable semiconductor device, comprising: a lead sandwiched between the two and extending to the outside and electrically connected to a semiconductor element, wherein the substrate has a thickness of 0.
An ultraviolet erasable semiconductor device is obtained which is made of light-transmissive alumina having a concave shape of 7 mm or less, and the cap is made of light-transmissive alumina of 0.5 mm or less and hermetically sealed with a low melting point glass.

【0006】[0006]

【実施例】次に、本発明について図面を参照して説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings.

【0007】図1は本発明の一実施例の断面図、図2
は、斜視図である。
FIG. 1 is a sectional view of an embodiment of the present invention, FIG.
FIG.

【0008】紫外線消去型半導体素子(11)を搭載す
る、厚さ0.7mm以下で凹形状の不透光アルミナで形
成された基板(12)上に、ガラスAgペースト,Al
ペースト等の接着剤(13)で半導体素子(11)が固
着され、半導体素子(11)の周辺の基板上に42合
金,コバール等より成る0.05〜0.20mm厚の外
部導出用リード(14)が、封止前に所望の形状に整形
されて、低融点ガラス(15)により固着されている。
On a substrate (12) on which an ultraviolet erasable semiconductor element (11) is mounted and which has a thickness of 0.7 mm or less and is made of concave opaque alumina, glass Ag paste, Al
The semiconductor element (11) is fixed by an adhesive agent (13) such as paste, and a 0.05 to 0.20 mm-thick external lead (made of 42 alloy, Kovar, etc., on the substrate around the semiconductor element (11) ( 14) is shaped into a desired shape before sealing and is fixed by a low melting point glass (15).

【0009】その上に、厚さ0.15〜0.5mmの透
光アルミナで形成されたキャップ(16)が低融点ガラ
ス(15)により固着され、全体厚が1.5mm以下に
なる様、構成される。
A cap (16) made of translucent alumina having a thickness of 0.15 to 0.5 mm is fixed thereon by a low melting point glass (15) so that the total thickness becomes 1.5 mm or less. Composed.

【0010】[0010]

【発明の効果】以上説明したように、本発明は、0.7
mm以下で凹形状の不透光アルミナを基板とし、キャッ
プは、0.5mm以下の透光アルミナで構成されている
ことにより、全体厚が1.5mm以下となり、又、表面
実装(SMT)が可能なSOPタイプである為、メモリ
ーカード,ICカード等に容易に実装ができ、且つ、気
密封止である為信頼性が向上する。
As described above, according to the present invention, 0.7
Since the substrate is made of non-translucent alumina having a concave shape of less than 0.5 mm and the cap is made of translucent alumina of 0.5 mm or less, the total thickness is 1.5 mm or less, and the surface mounting (SMT) is Since it is a possible SOP type, it can be easily mounted on a memory card, an IC card, etc., and the reliability is improved because it is hermetically sealed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の断面図である。1 is a cross-sectional view of the present invention.

【図2】斜視図である。FIG. 2 is a perspective view.

【符号の説明】[Explanation of symbols]

11 紫外線消去型半導体素子 12,22 基板 13 接着剤 14,24 リード 15,25 封止ガラス 16,26 キャップ 11 Ultraviolet Erasable Semiconductor Element 12,22 Substrate 13 Adhesive 14,24 Lead 15,25 Sealing Glass 16,26 Cap

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 紫外線消去型メモリー半導体素子を搭載
する基板と前記半導体素子を覆うように前記基板に対し
て装着されたキャップと、前記基板と前記キャップとの
間に挟持されて外部に延長し、且つ前記半導体素子に電
気的に接続されたリードとを具備する半導体装置におい
て、前記基板は、厚さ0.7mm以下で凹形状の不透光
アルミナで形成され、前記キャップは、厚さ0.5mm
以下の透光アルミナで形成され、且つ前記リードが封止
前に所望の形状に整形され、全体厚が1.5mm以下で
あることを特徴とする紫外線消去型半導体装置。
1. A substrate on which an ultraviolet erasable memory semiconductor element is mounted, a cap mounted on the substrate so as to cover the semiconductor element, and sandwiched between the substrate and the cap and extended to the outside. And a lead electrically connected to the semiconductor element, wherein the substrate is made of a non-translucent alumina having a concave shape with a thickness of 0.7 mm or less, and the cap has a thickness of 0 mm. 0.5 mm
An ultraviolet erasable semiconductor device, characterized in that the lead is shaped into a desired shape before encapsulation and has a total thickness of 1.5 mm or less.
JP9100592A 1992-04-10 1992-04-10 Ultraviolet light erasing semiconductor device Pending JPH05109914A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9100592A JPH05109914A (en) 1992-04-10 1992-04-10 Ultraviolet light erasing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9100592A JPH05109914A (en) 1992-04-10 1992-04-10 Ultraviolet light erasing semiconductor device

Publications (1)

Publication Number Publication Date
JPH05109914A true JPH05109914A (en) 1993-04-30

Family

ID=14014395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9100592A Pending JPH05109914A (en) 1992-04-10 1992-04-10 Ultraviolet light erasing semiconductor device

Country Status (1)

Country Link
JP (1) JPH05109914A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110964460A (en) * 2018-09-29 2020-04-07 北京梦之墨科技有限公司 Ultraviolet-cured anisotropic conductive adhesive and preparation method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6220359A (en) * 1985-07-18 1987-01-28 Nec Corp Ultraviolet ray erasable semiconductor device
JPS6255356B2 (en) * 1978-12-20 1987-11-19 Sanyo Electric Co

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6255356B2 (en) * 1978-12-20 1987-11-19 Sanyo Electric Co
JPS6220359A (en) * 1985-07-18 1987-01-28 Nec Corp Ultraviolet ray erasable semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110964460A (en) * 2018-09-29 2020-04-07 北京梦之墨科技有限公司 Ultraviolet-cured anisotropic conductive adhesive and preparation method thereof

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