JPH05315626A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH05315626A
JPH05315626A JP4117303A JP11730392A JPH05315626A JP H05315626 A JPH05315626 A JP H05315626A JP 4117303 A JP4117303 A JP 4117303A JP 11730392 A JP11730392 A JP 11730392A JP H05315626 A JPH05315626 A JP H05315626A
Authority
JP
Japan
Prior art keywords
substrate
electrode portion
optical semiconductor
semiconductor element
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4117303A
Other languages
Japanese (ja)
Inventor
Masanobu Takasuka
正信 高須賀
Masaki Taniguchi
正記 谷口
Nobuyuki Iwamoto
伸行 岩元
Masayuki Yamaguchi
正之 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP4117303A priority Critical patent/JPH05315626A/en
Publication of JPH05315626A publication Critical patent/JPH05315626A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Abstract

PURPOSE:To provide a small-and-thin type semiconductor device suitable for high density mounting. CONSTITUTION:The underface of an optical semiconductor element 1 consisting of a silicon photodetector is placed on an element loading part 11 of a substrate 5a consisting of a light transmitting flexible substrate in order to electrically connect an element loading part 11 to a second electrode part 8 by thermocompression. Then, the substrate 5a is bent for being taken out on the upper part of the first electrode parts 2 of an optical semiconductor element 1 so as to position the outgoing electrode parts 6 on the upper part in order to electrically connect the outgoing electrode parts 6 and the first electrode parts by thermocompression bonding. Thereby, since a light transmitting raw material is used as the substrate 5a, a loss of light is small while requiring no lead, wire and resin for electric connection, an upper limit of the number of electrodes is heightened so that a small and thin type semiconductor device of improved reliability can be obtained.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、光電変換機能を有す
る半導体素子(以下、「光半導体素子」という。)を基
板に一体化させた半導体装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device in which a semiconductor element having a photoelectric conversion function (hereinafter referred to as "optical semiconductor element") is integrated with a substrate.

【0002】[0002]

【従来の技術】従来、高密度実装を要求される産業機器
には、図5に示す半導体装置が用いられている。図5は
従来の半導体装置の構成を示す断面図である。図5にお
いて、1は上面および下面に電極部2,8を有した光半
導体素子、30はAu線からなるワイヤ、40はリー
ド、50は表面に所定パターン形状の引出し電極部60
を有した基板、70は半田、100は樹脂である。
2. Description of the Related Art Conventionally, a semiconductor device shown in FIG. 5 has been used for industrial equipment which requires high-density mounting. FIG. 5 is a sectional view showing the structure of a conventional semiconductor device. In FIG. 5, 1 is an optical semiconductor element having electrode portions 2 and 8 on the upper and lower surfaces, 30 is a wire made of Au wire, 40 is a lead, and 50 is a lead electrode portion 60 having a predetermined pattern on the surface.
Board 70, solder 70, and resin 100.

【0003】図5に示すように、光半導体素子1の上面
に形成した電極部2(アノード電極)と、リード40と
はワイヤ30により電気的に接続されている。また、リ
ード40は、基板50に形成された引出し電極部6に半
田70により電気的に接続されている。また、光半導体
素子1の下面の電極部80は、リード40の素子搭載部
9にマウントされている。そして、光半導体素子1の周
囲を樹脂100で封止することで、ワイヤ30等を保護
している。
As shown in FIG. 5, an electrode portion 2 (anode electrode) formed on the upper surface of the optical semiconductor element 1 and a lead 40 are electrically connected by a wire 30. Further, the lead 40 is electrically connected to the extraction electrode portion 6 formed on the substrate 50 by the solder 70. The electrode portion 80 on the lower surface of the optical semiconductor element 1 is mounted on the element mounting portion 9 of the lead 40. Then, the wire 30 and the like are protected by sealing the periphery of the optical semiconductor element 1 with the resin 100.

【0004】このように従来の半導体装置は、光半導体
素子1の電極部8をリード40に電気的に接続し、かつ
基板50上に形成した引出し電極部60に、ワイヤ30
およびリード40を介して電極部2を電気的に接続し、
さらに樹脂100により封止したものである。
As described above, in the conventional semiconductor device, the electrode portion 8 of the optical semiconductor element 1 is electrically connected to the lead 40, and the lead electrode portion 60 formed on the substrate 50 is connected to the wire 30.
And electrically connecting the electrode portion 2 via the lead 40,
Further, it is sealed with resin 100.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、このよ
うに構成された従来の半導体装置では、光半導体素子1
の上面の電極部2と、基板50上の引出し電極部60を
電気的に接続するために、リード40およびワイヤ30
が必要となるため、電極部2の数すなわち電極数をあま
り多くすることができず、また、ワイヤ30を保護する
ために樹脂100が必要となり、小型化および薄型化が
困難であるという問題があった。
However, in the conventional semiconductor device having such a configuration, the optical semiconductor element 1 is used.
In order to electrically connect the electrode part 2 on the upper surface of the substrate and the extraction electrode part 60 on the substrate 50,
Therefore, the number of electrode portions 2, that is, the number of electrodes cannot be increased so much, and the resin 100 is required to protect the wire 30, which makes it difficult to reduce the size and thickness. there were.

【0006】この発明の目的は、上記問題点に鑑み、高
密度実装に適した小型で薄型の半導体装置を提供するこ
とである。
In view of the above problems, an object of the present invention is to provide a small and thin semiconductor device suitable for high density mounting.

【0007】[0007]

【課題を解決するための手段】請求項1記載の半導体装
置は、上面および下面に第1および第2の電極部を有す
る光半導体素子と、光を透過し所定間隔を設けて素子搭
載部および所定パターン形状の引出し電極部を有した基
板とを備え、素子搭載部上に光半導体素子を載置して素
子搭載部に第2の電極部を電気的に接続するとともに、
基板を折り曲げて光半導体素子の上部に引出し電極部を
位置決めして引出し電極部に第1の電極部を電気的に接
続したものである。
According to a first aspect of the present invention, there is provided a semiconductor device having an optical semiconductor element having first and second electrode portions on an upper surface and a lower surface, an element mounting portion which transmits light and is provided at a predetermined interval. A substrate having a lead-out electrode portion having a predetermined pattern, and mounting an optical semiconductor element on the element mounting portion to electrically connect the second electrode portion to the element mounting portion,
The substrate is bent, the extraction electrode portion is positioned above the optical semiconductor element, and the extraction electrode portion is electrically connected to the first electrode portion.

【0008】請求項2記載の半導体装置は、上面および
下面に第1および第2の電極部を有する光半導体素子
と、所定間隔を有して素子搭載部および所定パターン形
状の引出し電極部を有し、かつこの引出し電極部近傍に
開口窓を有した基板とを備え、素子搭載部上に光半導体
素子を載置して素子搭載部に第2の電極部を電気的に接
続するとともに、基板を折り曲げて光半導体素子の上部
に開口窓および引出し電極部を位置決めして引出し電極
部に第1の電極部を電気的に接続したものである。
According to a second aspect of the present invention, there is provided a semiconductor device having an optical semiconductor element having first and second electrode portions on an upper surface and a lower surface, an element mounting portion having a predetermined interval and a lead electrode portion having a predetermined pattern shape. And a substrate having an opening window in the vicinity of the extraction electrode portion, an optical semiconductor element is mounted on the element mounting portion to electrically connect the second electrode portion to the element mounting portion, and the substrate Is bent to position the opening window and the extraction electrode portion above the optical semiconductor element, and the first electrode portion is electrically connected to the extraction electrode portion.

【0009】[0009]

【作用】この発明の構成によれば、基板の素子搭載部上
に光半導体素子を載置して第2の電極部を素子搭載部に
電気的に接続し、基板を折り曲げて光半導体素子の上部
に第1の電極部を位置決めして第1の電極部を引出し電
極部に電気的に接続したため、従来の半導体装置におけ
るリード,ワイヤおよび樹脂が不要となる。
According to the structure of the present invention, the optical semiconductor element is placed on the element mounting portion of the substrate, the second electrode portion is electrically connected to the element mounting portion, and the substrate is bent to form the optical semiconductor element. Since the first electrode portion is positioned on the upper portion and the first electrode portion is electrically connected to the extraction electrode portion, the lead, wire and resin in the conventional semiconductor device are unnecessary.

【0010】[0010]

【実施例】図1はこの発明の第1の実施例の半導体装置
の構成を示す断面図である。図1に示す光半導体素子1
は、チップ厚0.3〔mm〕のシリコン受光素子であ
り、上面には受光面である光電変換部13およびAuか
らなる第1の電極部(アノード電極)2を有し、下面に
Auからなる第2の電極部8を有したものである。
1 is a sectional view showing the structure of a semiconductor device according to a first embodiment of the present invention. Optical semiconductor device 1 shown in FIG.
Is a silicon light receiving element having a chip thickness of 0.3 [mm], has a photoelectric conversion portion 13 which is a light receiving surface and a first electrode portion (anode electrode) 2 made of Au on the upper surface, and is made of Au on the lower surface. The second electrode part 8 is formed.

【0011】また、基板5aは、光を透過する厚さ0.
2〔mm〕のフレキシブル基板であり、赤外光の損失が
10%以下と小さいものである。表面には、所定間隔を
設けて素子搭載部11およびAuからなる所定パターン
形状の引出し電極部6を有している。このような基板5
aの素子搭載部11上に、光半導体素子1の下面を載置
し、熱圧着法により素子搭載部11と第2の電極部8と
を電気的に接続してある。そして、基板5aを折り曲げ
て光半導体素子1の第1の電極部2の上部に引出し電極
部6を位置決めし、熱圧着法により引出し電極部6と第
1の電極部2とを電気的に接続したものである。
The substrate 5a has a thickness of 0.
It is a flexible substrate of 2 mm and has a small loss of infrared light of 10% or less. On the surface, there are provided lead-out electrode portions 6 having a predetermined pattern shape, which are made of Au and are provided with element mounting portions 11 at predetermined intervals. Such a substrate 5
The lower surface of the optical semiconductor element 1 is placed on the element mounting portion 11 of a, and the element mounting portion 11 and the second electrode portion 8 are electrically connected by thermocompression bonding. Then, the substrate 5a is bent to position the extraction electrode portion 6 on the first electrode portion 2 of the optical semiconductor element 1, and the extraction electrode portion 6 and the first electrode portion 2 are electrically connected by thermocompression bonding. It was done.

【0012】このように光半導体素子1の下面の第2の
電極部8を基板5aの素子搭載部11に固着させて接続
し、基板5aを折り曲げて光半導体素子1の上面の第1
の電極部2を基板5aの引出し電極部6に固着させて接
続したことで、従来の半導体装置におけるリード40,
ワイヤ30および樹脂100が不要となる。また、基板
5aとして赤外光を良好に透過させる材質を用いること
で、光半導体素子1の光電変換部13での光の損失は小
さなものとなる。
In this way, the second electrode portion 8 on the lower surface of the optical semiconductor element 1 is fixedly connected to the element mounting portion 11 of the substrate 5a, the substrate 5a is bent and the first electrode on the upper surface of the optical semiconductor element 1 is bent.
Since the electrode portion 2 of the above is fixedly connected to the lead electrode portion 6 of the substrate 5a, the leads 40 in the conventional semiconductor device,
The wire 30 and the resin 100 are unnecessary. Further, by using a material that transmits infrared light favorably as the substrate 5a, the loss of light in the photoelectric conversion unit 13 of the optical semiconductor element 1 becomes small.

【0013】次に、図2および図3を参照しながら、こ
の発明の第2の実施例の半導体装置について説明する。
なお、図2は同半導体装置の構成を示す断面図、図3は
同半導体装置の構成を示す斜視図であり、図1と同符号
の部分は同様の部分を示す。図2および図3に示す基板
5bは、光を透過しにくいフレキシブル基板であり、光
半導体素子1の光電変換部13の領域よりも大きな1m
m平方の開口窓12を有したものである。また、表面に
は、所定間隔を設けて素子搭載部11およびAuからな
る所定パターン形状の引出し電極部6を有している。
Next, a semiconductor device according to a second embodiment of the present invention will be described with reference to FIGS.
2 is a cross-sectional view showing the structure of the same semiconductor device, FIG. 3 is a perspective view showing the structure of the same semiconductor device, and the same symbols as in FIG. 1 indicate the same parts. The substrate 5b shown in FIGS. 2 and 3 is a flexible substrate that does not easily transmit light, and is 1 m larger than the region of the photoelectric conversion unit 13 of the optical semiconductor element 1.
It has an opening window 12 of m square. Further, on the surface, there are provided lead-out electrode portions 6 each having a predetermined pattern and formed of element mounting portions 11 and Au at predetermined intervals.

【0014】このような基板5bの素子搭載部11上
に、光半導体素子1の下面を載置し、熱圧着法により素
子搭載部11と第2の電極部8とを電気的に接続してあ
る。そして、基板5bを折り曲げて光半導体素子1の第
1の電極部2の上部に引出し電極部6を位置決めし、か
つ光半導体素子1の光電変換部13の上部に開口窓12
を位置決めし、熱圧着法により引出し電極部6と第1の
電極部2とを電気的に接続したものである。この開口窓
12は外部から光電変換部13への光の透過経路とな
る。
The lower surface of the optical semiconductor element 1 is placed on the element mounting portion 11 of the substrate 5b, and the element mounting portion 11 and the second electrode portion 8 are electrically connected by thermocompression bonding. is there. Then, the substrate 5b is bent to position the extraction electrode portion 6 above the first electrode portion 2 of the optical semiconductor element 1, and the opening window 12 is provided above the photoelectric conversion portion 13 of the optical semiconductor element 1.
Is positioned, and the extraction electrode portion 6 and the first electrode portion 2 are electrically connected by the thermocompression bonding method. The opening window 12 serves as a transmission path of light from the outside to the photoelectric conversion unit 13.

【0015】このように、光半導体素子1の下面の第2
の電極部8を基板5bの素子搭載部11に固着させて接
続し、基板5bを折り曲げて光半導体素子1の上面の第
1の電極部2を基板5bの引出し電極部6に固着させて
接続することで、従来の半導体装置におけるリード4
0,ワイヤ30および樹脂100が不要となる。また、
光を透過しにくい基板5bであっても、基板5bに開口
窓12を設けることで光半導体素子1の光電変換部13
に良好に受光させることができ、光の損失は小さい。
As described above, the second surface of the lower surface of the optical semiconductor element 1 is
The electrode part 8 is fixedly connected to the element mounting part 11 of the substrate 5b, the substrate 5b is bent, and the first electrode part 2 on the upper surface of the optical semiconductor device 1 is fixedly connected to the extraction electrode part 6 of the substrate 5b. By doing so, the lead 4 in the conventional semiconductor device is
No wire 0, wire 30 and resin 100 are required. Also,
Even if the substrate 5b does not easily transmit light, the photoelectric conversion unit 13 of the optical semiconductor element 1 is provided by providing the opening window 12 in the substrate 5b.
The light can be received well, and the light loss is small.

【0016】次に、図4を参照しながら、この発明の第
3の実施例の半導体装置について説明する。なお、図4
は同半導体装置の構成を示す断面図であり、図2と同符
号の部分は同様の部分を示す。図4において、5cは基
板、14は接着剤となる導電性樹脂である。図4に示す
基板5cは、光を透過しにくいフレキシブル基板であ
り、光半導体素子1の光電変換部13の領域よりも大き
な1mm平方の開口窓12および直径0.2〔mm〕の
スルーホール15を有したものである。また、表面およ
び裏面には、所定間隔を設けて素子搭載部11およびス
ルーホール15を介して形成したAuからなる所定パタ
ーン形状の引出し電極部6を有している。
Next, a semiconductor device according to a third embodiment of the present invention will be described with reference to FIG. Note that FIG.
FIG. 3 is a cross-sectional view showing the configuration of the same semiconductor device, and the parts having the same reference numerals as those in FIG. In FIG. 4, 5c is a substrate, and 14 is a conductive resin serving as an adhesive. The substrate 5c shown in FIG. 4 is a flexible substrate that does not easily transmit light, and has a 1 mm square opening window 12 and a through hole 15 having a diameter of 0.2 [mm] larger than the area of the photoelectric conversion unit 13 of the optical semiconductor element 1. With. Further, on the front surface and the back surface, there are provided lead-out electrode portions 6 of a predetermined pattern shape made of Au formed through the element mounting portion 11 and the through holes 15 at predetermined intervals.

【0017】このような基板5cの素子搭載部11上
に、光半導体素子1の下面を載置し、導電性樹脂14に
より素子搭載部11と第2の電極部8とを電気的に接続
してある。そして、基板5cを折り曲げて光半導体素子
1の第1の電極部2の上部に引出し電極部6を形成した
スルーホール15を位置決めし、かつ光半導体素子1の
光電変換部13の上部に開口窓12を位置決めし、導電
性樹脂14により引出し電極部6と第1の電極部2とを
電気的に接続したものである。この開口窓12は外部か
ら光電変換部13への光の透過経路となる。
The lower surface of the optical semiconductor element 1 is placed on the element mounting portion 11 of the substrate 5c, and the element mounting portion 11 and the second electrode portion 8 are electrically connected by the conductive resin 14. There is. Then, the substrate 5c is bent to position the through hole 15 in which the extraction electrode portion 6 is formed above the first electrode portion 2 of the optical semiconductor element 1, and the opening window is provided above the photoelectric conversion portion 13 of the optical semiconductor element 1. 12 is positioned, and the extraction electrode portion 6 and the first electrode portion 2 are electrically connected by the conductive resin 14. The opening window 12 serves as a transmission path of light from the outside to the photoelectric conversion unit 13.

【0018】このように、光半導体素子1の下面の第2
の電極部8を基板5cの素子搭載部11に固着させて接
続し、基板5cを折り曲げて光半導体素子1の上面の第
1の電極部2を基板5cの引出し電極部6に固着させて
接続することで、従来の半導体装置におけるリード4
0,ワイヤ30および樹脂100が不要となる。また、
光を透過しにくい基板5cであっても、基板5cに開口
窓12を設けることで光半導体素子1の光電変換部13
に受光させることができ、光の損失は小さい。
In this way, the second semiconductor layer on the lower surface of the optical semiconductor element 1 is
Electrode portion 8 of the substrate 5c is fixedly connected to the element mounting portion 11 of the substrate 5c, the substrate 5c is bent and the first electrode portion 2 of the upper surface of the optical semiconductor element 1 is fixedly connected to the extraction electrode portion 6 of the substrate 5c. By doing so, the lead 4 in the conventional semiconductor device is
No wire 0, wire 30 and resin 100 are required. Also,
Even if the substrate 5c does not easily transmit light, the photoelectric conversion unit 13 of the optical semiconductor element 1 is provided by providing the opening window 12 in the substrate 5c.
The light loss is small.

【0019】以上、第1,第2および第3の実施例によ
れば、素子搭載部11に光半導体素子1を載置して第2
の電極部8を素子搭載部11に電気的に接続し、基板5
a,5bまたは5cを折り曲げて光半導体素子1の上部
に第1の電極部2を位置決めして第1の電極部2を引出
し電極部6に電気的に接続することで、従来の半導体装
置におけるリード40,ワイヤ30および樹脂100が
不要となる。
As described above, according to the first, second and third embodiments, the optical semiconductor element 1 is mounted on the element mounting portion 11 and the second optical semiconductor element 1 is mounted.
Of the substrate 5 by electrically connecting the electrode portion 8 of the
By bending a, 5b or 5c to position the first electrode portion 2 on the optical semiconductor element 1 and electrically connecting the first electrode portion 2 to the extraction electrode portion 6, the conventional semiconductor device The lead 40, the wire 30, and the resin 100 are unnecessary.

【0020】その結果、従来と比較して光半導体素子1
の電極数の上限が高まり、信頼性が向上するとともに小
型で薄型の半導体装置を得ることができる。なお、第1
の実施例では、光半導体素子1の下面の第2の電極部8
および基板5aの素子搭載部11と、光半導体素子1の
上面の第1の電極部2および基板5aの引出し電極部6
とを熱圧着により電気的に接続したが、第3の実施例の
ように基板5aの所定位置にスルーホールを形成し、接
着剤となる導電性樹脂14により固着させて電気的に接
続しても良い。
As a result, the optical semiconductor element 1 is different from the conventional one.
The upper limit of the number of electrodes is increased, the reliability is improved, and a small and thin semiconductor device can be obtained. The first
In the embodiment, the second electrode portion 8 on the lower surface of the optical semiconductor element 1 is
And the element mounting portion 11 of the substrate 5a, the first electrode portion 2 on the upper surface of the optical semiconductor element 1, and the extraction electrode portion 6 of the substrate 5a.
Although they were electrically connected by thermocompression bonding, a through hole was formed at a predetermined position of the substrate 5a as in the third embodiment, and the electrically conductive resin 14 serving as an adhesive was used to fix and electrically connect. Is also good.

【0021】[0021]

【発明の効果】この発明の半導体装置によれば、基板の
素子搭載部上に光半導体素子を載置して第2の電極部を
素子搭載部に電気的に接続し、基板を折り曲げて光半導
体素子の上部に第1の電極部を位置決めして第1の電極
部を引出し電極部に電気的に接続したため、従来の半導
体装置におけるリード,ワイヤおよび樹脂が不要とな
る。
According to the semiconductor device of the present invention, the optical semiconductor element is mounted on the element mounting portion of the substrate, the second electrode portion is electrically connected to the element mounting portion, and the substrate is bent to form the optical device. Since the first electrode portion is positioned above the semiconductor element and the first electrode portion is electrically connected to the lead electrode portion, the lead, wire and resin in the conventional semiconductor device are not required.

【0022】その結果、従来と比較して光半導体素子の
電極数の上限が高まり、信頼性を向上させることができ
るとともに、高密度実装に適応した小型で薄型の半導体
装置を得ることができる。
As a result, the upper limit of the number of electrodes of the optical semiconductor element is increased as compared with the conventional one, reliability can be improved, and a small and thin semiconductor device adapted for high-density mounting can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の第1の実施例の半導体装置の構成を
示す断面図である。
FIG. 1 is a sectional view showing a configuration of a semiconductor device according to a first embodiment of the present invention.

【図2】この発明の第2の実施例の半導体装置の構成を
示す断面図である。
FIG. 2 is a sectional view showing the structure of a semiconductor device according to a second embodiment of the present invention.

【図3】同半導体装置の構成を示す斜視図である。FIG. 3 is a perspective view showing a configuration of the same semiconductor device.

【図4】この発明の第3の実施例の半導体装置の構成を
示す断面図である。
FIG. 4 is a sectional view showing the structure of a semiconductor device according to a third embodiment of the present invention.

【図5】従来の半導体装置の構成を示す断面図である。FIG. 5 is a cross-sectional view showing a configuration of a conventional semiconductor device.

【符号の説明】[Explanation of symbols]

1 光半導体素子 2 第1の電極部 5a 基板 5b 基板 5c 基板 6 引出し電極部 8 第2の電極部 11 素子搭載部 12 開口窓 1 Optical Semiconductor Element 2 First Electrode Section 5a Substrate 5b Substrate 5c Substrate 6 Extraction Electrode Section 8 Second Electrode Section 11 Element Mounting Section 12 Opening Window

フロントページの続き (72)発明者 山口 正之 大阪府門真市大字門真1006番地 松下電子 工業株式会社内Front page continued (72) Inventor Masayuki Yamaguchi 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electronics Industrial Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 上面および下面に第1および第2の電極
部を有する光半導体素子と、光を透過し所定間隔を設け
て素子搭載部および所定パターン形状の引出し電極部を
有した基板とを備え、 前記素子搭載部上に前記光半導体素子を載置して前記素
子搭載部に前記第2の電極部を電気的に接続するととも
に、前記基板を折り曲げて前記光半導体素子の上部に前
記引出し電極部を位置決めして前記引出し電極部に前記
第1の電極部を電気的に接続した半導体装置。
1. An optical semiconductor element having first and second electrode portions on its upper and lower surfaces, and a substrate having an element mounting portion and a lead electrode portion having a predetermined pattern and transmitting light and having a predetermined interval. The optical semiconductor element is mounted on the element mounting portion to electrically connect the second electrode portion to the element mounting portion, and the substrate is bent to extend the optical semiconductor element to the upper portion. A semiconductor device in which an electrode portion is positioned and the lead electrode portion is electrically connected to the first electrode portion.
【請求項2】 上面および下面に第1および第2の電極
部を有する光半導体素子と、所定間隔を有して素子搭載
部および所定パターン形状の引出し電極部を有し、かつ
この引出し電極部近傍に開口窓を有した基板とを備え、 前記素子搭載部上に前記光半導体素子を載置して前記素
子搭載部に前記第2の電極部を電気的に接続するととも
に、前記基板を折り曲げて前記光半導体素子の上部に前
記開口窓および前記引出し電極部を位置決めして前記引
出し電極部に前記第1の電極部を電気的に接続した半導
体装置。
2. An optical semiconductor element having first and second electrode portions on an upper surface and a lower surface, an element mounting portion having a predetermined interval and a lead electrode portion having a predetermined pattern, and the lead electrode portion. A substrate having an opening window in the vicinity thereof, the optical semiconductor element is placed on the element mounting portion to electrically connect the second electrode portion to the element mounting portion, and the substrate is bent. A semiconductor device in which the opening window and the extraction electrode portion are positioned above the optical semiconductor element to electrically connect the first electrode portion to the extraction electrode portion.
JP4117303A 1992-05-11 1992-05-11 Semiconductor device Pending JPH05315626A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4117303A JPH05315626A (en) 1992-05-11 1992-05-11 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4117303A JPH05315626A (en) 1992-05-11 1992-05-11 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH05315626A true JPH05315626A (en) 1993-11-26

Family

ID=14708417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4117303A Pending JPH05315626A (en) 1992-05-11 1992-05-11 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH05315626A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0690515A1 (en) * 1994-06-30 1996-01-03 Eastman Kodak Company Optoelectronic assembly and methods for producing and using the same
CN100449721C (en) * 2005-08-30 2009-01-07 南茂科技股份有限公司 Structure and method for packaging image sensor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0690515A1 (en) * 1994-06-30 1996-01-03 Eastman Kodak Company Optoelectronic assembly and methods for producing and using the same
CN100449721C (en) * 2005-08-30 2009-01-07 南茂科技股份有限公司 Structure and method for packaging image sensor

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