JPH05102665A - Vapor phase reduction apparatus for internal layer plate - Google Patents

Vapor phase reduction apparatus for internal layer plate

Info

Publication number
JPH05102665A
JPH05102665A JP28359391A JP28359391A JPH05102665A JP H05102665 A JPH05102665 A JP H05102665A JP 28359391 A JP28359391 A JP 28359391A JP 28359391 A JP28359391 A JP 28359391A JP H05102665 A JPH05102665 A JP H05102665A
Authority
JP
Japan
Prior art keywords
inner layer
layer plate
gas
vapor phase
supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28359391A
Other languages
Japanese (ja)
Inventor
Takamasa Kawakami
殷正 川上
Takeo Kaneoka
威雄 金岡
Norio Sayama
憲郎 佐山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP28359391A priority Critical patent/JPH05102665A/en
Publication of JPH05102665A publication Critical patent/JPH05102665A/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To manufacture a multiplaye printed wiring board with high productivity and without causing pollution by a method wherein a net driven by a roll or an endless porous belt is employed as a conveying means and entrance and exit parts are respectively composed of gaps which are larger than the thickness of an internal layer plate and are located in front and rear parts and inert gas supply parts which are located in approximately central parts between the gaps. CONSTITUTION:When an operation is started, nonoxidizing gas is supplied to a reduction chamber 2 and the air in the reduction chamber 2 and entrance shielding parts 11, 12, 31 and 32 is completely replaced by the nonoxidizing gas. The supply of the nonoxidizing gas through the nonoxidizing gas inlets 12 and 32 of the entrance shielding parts 11, 12, 31 and 32 is started and the supply of nonoxidizing gas containing reducing gas to the reduction chamber is started. A circulating recycle apparatus and the like are operated properly to obtain the predetermined concentration and temperature of the reducing gas. An endless porous belt which is provided along the route of a supply table 1, the reduction chamber 2 and a take out table 3 is moved at a predetermined speed. With this constitution, multilayer printed wiring boards can automatically and continuously be processed under a relatively low temperature and, further, hazardous waste is not produced practically.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、内層板を一枚づつ連続
的に気相還元処理する新規な気相還元装置であり、多層
プリント配線板用の内層板の銅箔表面に酸化銅微細凹凸
膜を形成し、これを気相還元して多層化積層成形に用い
ることより『ピンクリング』を実質的に無くした多層板
を製造するために好適に使用される。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is a novel vapor-phase reduction apparatus for continuously performing vapor-phase reduction treatment on inner layer plates one by one. Fine copper oxide is formed on the copper foil surface of the inner layer plate for a multilayer printed wiring board. It is preferably used for producing a multilayer board in which the "pink ring" is substantially eliminated by forming a concave-convex film and subjecting it to a gas phase reduction for multilayer lamination molding.

【0002】[0002]

【従来の技術】多層プリント配線板は、主に(a).マスラ
ミネート方式と(b).ピンラミネート方式とにより製造さ
れ、これらは内層用プリント配線板(以下「内層板」と
記す)を製造し、この内層板、プリプレグ及び銅箔或い
は片面銅張積層板を組み合わせて多層化積層成形して両
面が銅箔からなる多層板とし、スルーホール加工、外層
プリント配線加工などの工程により製造されている。
2. Description of the Related Art Multi-layer printed wiring boards are mainly manufactured by (a). Mass lamination method and (b). Pin lamination method, which are printed wiring boards for inner layers (hereinafter referred to as "inner layer boards"). It is manufactured, and the inner layer board, prepreg and copper foil or single-sided copper clad laminate is combined to form a multi-layered laminate to form a multilayer board made of copper foil on both sides, which is manufactured by processes such as through hole processing and outer layer printed wiring processing. ing.

【0003】この多層プリント板において、内層板の多
層化接着力を向上させるため、予め両面が凹凸化された
銅箔を用いる方法;内層用のプリント配線網を形成した
後、.酸化処理水溶液により銅箔表面を酸化銅微細凹
凸膜とする方法、.銅箔面をシランカップリング剤や
有機チタネートカップリング剤で処理する方法などが知
られている。従来は接着性と経済性の点から通常、光沢
面を有する銅張積層板に内層用のプリント配線網を形成
した後、酸化性のアルカリ水溶液で処理して褐色或いは
黒色の酸化銅微細凹凸膜を形成したものが用いられてい
る。
In this multilayer printed board, a method of using a copper foil whose both surfaces are preliminarily roughened in order to improve the multilayer adhesive strength of the inner layer board; after forming a printed wiring network for the inner layer ,. A method of forming a copper oxide fine concavo-convex film on the surface of a copper foil with an oxidizing treatment aqueous solution ,. A method of treating the copper foil surface with a silane coupling agent or an organic titanate coupling agent is known. Conventionally, from the viewpoint of adhesiveness and economical efficiency, usually, after forming a printed wiring network for the inner layer on a copper clad laminate having a glossy surface, it is treated with an oxidizing alkaline aqueous solution to give a brown or black copper oxide fine uneven film. What is formed is used.

【0004】ところが、この酸化銅微細凹凸膜、特に酸
化第2銅は塩酸、硫酸などの酸性水溶液に溶け易く、脆
いものである。このため、積層成形された多層板に小孔
をあけ、スルーホールメッキ工程や無電解メッキ又はそ
の後の電解メッキ工程などの際に、孔壁に露出した酸化
銅微細凹凸膜から順次内部に向かって酸性液により侵さ
れる、いわゆる『ハロー』或いは『ピンクリング』が発
生し、絶縁性などのプリント配線板の信頼性の低下の原
因となる欠点があった。
However, this copper oxide fine uneven film, particularly cupric oxide, is easily dissolved in an acidic aqueous solution such as hydrochloric acid or sulfuric acid, and is brittle. For this reason, small holes are made in the laminated multilayer board, and during the through-hole plating step or electroless plating or the subsequent electroplating step, the copper oxide fine uneven film exposed on the hole wall is sequentially turned inward. A so-called "halo" or "pink ring" is generated which is attacked by the acid solution, and there is a drawback that causes deterioration of the reliability of the printed wiring board such as insulation.

【0005】この褐色或いは黒色の酸化銅微細凹凸膜を
用いた場合に発生するハロー或いはピンクリングを防止
する方法として、.で得られた銅箔表面の酸化銅微
細凹凸膜を還元剤水溶液で還元して亜酸化銅或いは金属
銅に変更する方法(特開昭56-153797 号など) が開示さ
れている。これらの方法は、実用化可能なレベルの接着
力とすることが可能であるが、新たな液相還元処理工程
を必要とし、かつ、褐色或いは黒色の酸化銅微細凹凸膜
より接着力が低下するので実用化に耐える接着力とする
ための還元条件が極めて厳密とする必要がある。さら
に、『ピンクリング』の発生防止効果にバラツキがあ
り、また、新たに還元剤水溶液の廃液処理の問題が発生
するものであった。
As a method for preventing the halo or pink ring which occurs when this brown or black copper oxide fine uneven film is used. There is disclosed a method of changing the copper oxide fine uneven film on the surface of the copper foil obtained in the above step to a cuprous oxide or metallic copper by reducing it with an aqueous solution of a reducing agent (JP-A-56-153797, etc.). These methods can achieve a practical level of adhesive strength, but require a new liquid-phase reduction treatment step, and the adhesive strength is lower than that of a brown or black copper oxide fine uneven film. Therefore, it is necessary to make the reducing conditions extremely strict to obtain an adhesive strength that can be put to practical use. Further, there is a variation in the effect of preventing the "pink ring" from occurring, and a new problem of waste liquid treatment of the reducing agent aqueous solution occurs.

【0006】[0006]

【発明が解決しようとする課題】本発明者らは、褐色或
いは黒色酸化処理された酸化銅微細凹凸膜を還元処理し
て『ピンクリング』の防止効果にバラツキがなく、接着
力の低下が少ないか又はなく、かつ、廃液処理の新たな
課題の生じない方法について鋭意検討した。
DISCLOSURE OF THE INVENTION The inventors of the present invention have performed a reduction treatment on a copper oxide fine uneven film that has been subjected to a brown or black oxidation treatment, and there is no variation in the effect of preventing "pink rings", and there is little decrease in adhesive strength. There was no such problem, and a thorough study was made on a method that does not cause a new problem of waste liquid treatment.

【0007】その結果、気相還元法を完成し、特願平2-
199210、同2-277884、同2-277885、同2-284203として特
許出願した。ところが、これら発明の工業的実施は、当
該分野において通常、馴染みの浅い還元性ガスを取り扱
うことを必須とする。この点から、還元室 (系) への空
気の混入や大気中へのガス漏れのない安全性、さらに安
全性のみでなく生産性の点からも連続の自動化した装置
とすることが好ましいとの観点から検討した結果、本発
明を完成するに至った。
As a result, the vapor phase reduction method was completed, and Japanese Patent Application No. 2-
Patent applications were filed as 199210, 2-277884, 2-277885, and 2-284203. However, the industrial practice of these inventions generally requires the handling of reducing gases, which are relatively unfamiliar in the art. From this point, it is preferable to use a continuous automated device from the viewpoint of safety without air mixing into the reduction chamber (system) and gas leakage into the atmosphere, and not only safety but also productivity. As a result of examination from the viewpoint, the present invention has been completed.

【0008】[0008]

【課題を解決するための手段】すなわち、本発明は、プ
リント配線網を形成した多層プリント配線板用の内層板
の銅箔面を化学的に酸化し褐色或いは黒色の酸化銅微細
凹凸膜を形成した後、還元性ガス存在雰囲気中で該酸化
銅微細凹凸膜を実質的に常圧下に還元する内層板の気相
回分還元装置であって、該内層板の供給台(1) 、非酸化
性ガスによる入口遮蔽部(11)、還元性ガス供給装置、不
活性ガス供給或いは処理循環装置、必要に応じて廃棄ガ
ス処理装置を接続してなる還元室(2) 、非酸化性ガスに
よる出口遮蔽部(31)、還元された内層板の取出台(3) を
直列に設けて成り、該内層板を供給台(1) 、還元室(2)
、取出台(3) へ順次移送する移送手段(5) を設けてな
る内層板の気相還元装置である。
That is, the present invention is to form a brown or black copper oxide fine uneven film by chemically oxidizing a copper foil surface of an inner layer board for a multilayer printed wiring board on which a printed wiring network is formed. After that, a vapor phase batch reduction apparatus for the inner layer plate that reduces the copper oxide fine irregularity film in a reducing gas presence atmosphere under substantially normal pressure, wherein the inner layer plate supply table (1) is non-oxidizing. Inlet shielding part (11) by gas, reducing gas supply device, inert gas supply or processing circulation device, reduction chamber (2) connecting waste gas processing device if necessary, outlet shielding by non-oxidizing gas Part (31), which is provided in series with the take-out table (3) for the reduced inner layer plate, and the inner layer plate is supplied to the feeding table (1) and the reducing chamber (2).
, A vapor phase reduction apparatus for the inner layer plate, which is provided with a transfer means (5) for sequentially transferring to the unloading table (3).

【0009】また、本発明においては該移送手段(5)
が、ロールにより駆動される網或いは多孔を有する無端
ベルトであること、該入口及び出口遮蔽部(11,31) が、
それぞれ前後に内層板の厚さより大きい間隙とその略中
央に該間隙への不活性ガス供給部とから構成されたもの
であること、さらに該遮蔽部(31)と該取出台(3) との間
に、更に後処理室(4) を設けてなることを特徴とする内
層板の気相還元装置である。
In the present invention, the transfer means (5)
Is an endless belt having a mesh or perforations driven by a roll, and the entrance and exit shields (11, 31) are
Each of them is composed of a gap larger than the thickness of the inner layer plate in the front and rear and an inert gas supply part to the gap approximately in the center thereof, and further, the shielding part (31) and the extraction table (3) This is a vapor phase reduction apparatus for an inner layer plate, further comprising a post-treatment chamber (4) provided therebetween.

【0010】以下、本発明の構成を説明する。本発明の
気相還元装置は、通常、一枚づつ連続的に内層板を気相
還元室に投入し、還元処理し、取り出す装置であり、還
元室内部の内層板の保持時間が比較的短時間で還元する
場合のものである。
The structure of the present invention will be described below. The vapor-phase reduction apparatus of the present invention is generally an apparatus for continuously putting the inner layer plates into the gas-phase reduction chamber one by one, performing reduction treatment, and taking out, and the holding time of the inner layer plates in the reduction chamber is relatively short. It is a case of reducing in time.

【0011】まず、本発明の装置に於ける還元室(2) に
は、当然、還元性ガス供給装置、不活性ガス供給装置或
いは循環再使用用の処理装置を接続され、更に好適には
還元時間をより短くするために内層板面への還元性ガス
存在ガスの吹きつけ部、廃棄ガス処理装置を設けてな
る。また、還元室雰囲気と外部雰囲気とを遮断する遮断
部、更に内層板の連続的な投入、取り出しを含めて制御
する制御機器を設ける。
First, the reducing chamber (2) in the apparatus of the present invention is, of course, connected to a reducing gas supply device, an inert gas supply device or a processing device for circulation and reuse, and more preferably, a reduction device. In order to further shorten the time, a part for spraying the reducing gas present gas to the inner layer plate surface and a waste gas treatment device are provided. Further, a shutoff unit for shutting off the atmosphere in the reducing chamber and the external atmosphere, and a control device for controlling the continuous loading and unloading of the inner layer plate are provided.

【0012】移送手段(5) は、具体的にはロールなどに
より駆動されるベルト状物や多数のロールが挙げられ
る。他に、酸化銅微細凹凸の形成方法において、枠や固
定用の孔を用いる方法を使用する場合には、これらをそ
のまま本発明の気相還元装置に用いるのが好ましく、枠
の内側に固定した内層板や固定用の孔などをもった内層
板を両側に設けた移送具に固定して移送する方法なども
挙げられる。
Specific examples of the transfer means (5) include a belt-like material driven by rolls and a large number of rolls. In addition, in the method of forming copper oxide fine irregularities, when using a method of using a frame or holes for fixing, it is preferable to use these as they are in the vapor phase reduction apparatus of the present invention, fixed to the inside of the frame There is also a method of fixing the inner layer plate or the inner layer plate having holes for fixing, etc. to a transfer tool provided on both sides and transferring.

【0013】ベルト状物の場合には、内層板はベルト状
物上を前後左右に動くことは実質的にないので、投入時
以外に酸化銅微細凹凸膜を傷付ける可能性が少ない点か
ら好適であるが、ベルト状物と接触する下面側について
は還元性ガスとの接触機会が上面に比較して少なくな
り、上下面の還元速度がことなることが生じやすい。こ
のため、ベルト状物としては、網状物や還元性ガスが容
易に流動することが可能な大きさの多数の孔、溝、その
他を有するものがよい。
In the case of a belt-shaped material, the inner layer plate does not substantially move back and forth, left and right on the belt-shaped material, so that there is little possibility of damaging the copper oxide fine concavo-convex film except when it is charged, which is preferable. However, on the lower surface side that comes into contact with the belt-shaped material, the chance of contact with the reducing gas is less than that on the upper surface, and the reduction rates of the upper and lower surfaces are likely to differ. For this reason, the belt-like material preferably has a net-like material or a large number of holes, grooves, and the like having a size that allows the reducing gas to easily flow.

【0014】ロールの場合、その表面を軟質のもので構
成し酸化銅微細凹凸膜を傷つけないようにすることが必
須であり、また、ロール間を移動するときに、ロール間
の回転速度の差などがあると還元が不十分な場合には酸
化銅微細凹凸膜が傷つけられるので、特に還元室の中間
部までのロール間の回転速度(表面速度)は厳密に同一
となるようにする。
In the case of rolls, it is essential that the surface of the rolls is made of a soft material so as not to damage the copper oxide fine uneven film, and when the rolls are moved, the difference in rotation speed between the rolls is required. If the reduction is insufficient, the copper oxide fine concavo-convex film is damaged. Therefore, the rotation speed (surface speed) between the rolls to the intermediate portion of the reduction chamber is set to be exactly the same.

【0015】また、枠の内側に固定した内層板を両側に
設けた移送具などに固定して移送する場合の移送具とし
ては、ベルト、ロープ或いはチェーン、ロール或いは歯
車、スクリューなどの手段が挙げられ、枠などの形によ
り好適なものを選択する。また、内層板に設けた孔や内
層板の淵部分を利用する場合には、内層板の移送用固定
治具に内層板を固定し、該移送用固定治具を供給台(1)
→非酸化性ガスによる入口遮蔽部(11)→還元室(2) →非
酸化性ガスによる出口遮蔽部(31)→還元された内層板の
取出台(3) →供給台(1) のように循環することによる。
また、この場合には垂直に立てた状態で移送することが
より好適である。
When the inner layer plate fixed to the inside of the frame is fixed to the transfer tools provided on both sides and transferred, means such as belt, rope or chain, roll or gear, screw and the like can be mentioned. Then, a suitable one is selected depending on the shape of the frame. Further, when using the holes provided in the inner layer plate or the edge portion of the inner layer plate, the inner layer plate is fixed to a fixing jig for transferring the inner layer plate, and the fixing jig for transfer is supplied to the supply table (1).
→ Non-oxidizing gas inlet shielding part (11) → Reduction chamber (2) → Non-oxidizing gas outlet shielding part (31) → Reduced inner layer plate take-out stand (3) → Supply stand (1) By cycling to.
Further, in this case, it is more preferable to transfer the paper in a vertically standing state.

【0016】還元室雰囲気と外部雰囲気とを遮断する非
酸化性ガスを用いた入口及び出口遮蔽手段(11,31) は、
典型的には常圧よりやや圧力の高い非酸化性ガス導入部
(12)とその両側に内層板が通過可能な平板状の間隙(ス
リット)を設けてなるガス流カーテンにより行なう。
The inlet and outlet shielding means (11, 31) using a non-oxidizing gas for shutting off the atmosphere of the reducing chamber and the external atmosphere are
Non-oxidizing gas introduction part, which is typically slightly higher than normal pressure
(12) and a gas flow curtain provided with a flat plate-like gap (slit) on both sides thereof through which the inner layer plate can pass.

【0017】このスリット及び非酸化性ガス導入部(12)
と同等のシール機能を果たすものとして、酸化銅微細凹
凸膜を傷つけることのないような表面のロールやベルト
などを用い、移送速度と同一速度で回転や移動をさせる
こと;極めて軽量のロールや軽量な帯状板体の端に軟質
の関となるカーテンを設けたものとして導入不活性ガス
程度の圧力差により容易にフロートできるようにするこ
と;連続多孔質のロールを用い内層板や多層板との接触
或いは近接部のみを残してシールした状態としてなるロ
ールを用い、不活性ガスの吹き出しをこの多孔から行う
こと;ロールとしてその表面層部分を大気圧よりも数mm
Hg程度に加圧したエアバックなどで形成したものとする
こと;などが例示される。
The slit and the non-oxidizing gas introduction part (12)
As a seal function equivalent to that, use a roll or belt with a surface that does not damage the copper oxide fine uneven film, and rotate or move at the same speed as the transfer speed; extremely lightweight roll or lightweight A flexible strip curtain should be provided at the end of the strip so that it can be easily floated due to the pressure difference of the inert gas introduced. Use a roll that is in contact with or sealed only in the vicinity, and blow out an inert gas from this porous; the surface layer part of the roll is several mm above atmospheric pressure.
It should be formed by an air bag or the like pressurized to about Hg;

【0018】次に、上記装置で還元する本発明の内層板
とは、多層プリント配線板の内層用として用いるプリン
ト配線板である。この内層板としては、層間接着用に内
層プリント配線網銅箔表面を酸化処理し、通常、黒色或
いは褐色の酸化銅微細凹凸を形成したものであることの
他は、基材、マトリックス樹脂、その他従来公知のもの
が使用でき、特に限定されないものである。
Next, the inner layer board of the present invention reduced by the above apparatus is a printed wiring board used as an inner layer of a multilayer printed wiring board. As this inner layer board, a base material, a matrix resin, etc., except that the inner layer printed wiring network copper foil surface is subjected to an oxidation treatment for interlayer adhesion to form black or brown copper oxide fine irregularities Conventionally known ones can be used and are not particularly limited.

【0019】プリント配線網銅箔面を褐色或いは黒色の
酸化銅微細凹凸膜−−酸化銅からなるサブミクロンオー
ダーの針、クサビ、オノ、錨などが密集した微細凹凸膜
−−とする方法は公知であり、通常、内層板の銅箔面を
研磨或いは洗浄した後、塩化銅又は過硫酸アンモニウム
などの水溶液によりプレエッチング(ソフトエッチン
グ、化学研磨)し、アルカリ性の酸化性水溶液で酸化処
理することによる。
A method of making a printed wiring network copper foil surface into a brown or black copper oxide fine uneven film--a fine uneven film of copper oxide having submicron-order needles, wedges, ono, anchors, etc .-- is known. Usually, after the copper foil surface of the inner layer plate is polished or washed, pre-etching (soft etching, chemical polishing) is performed with an aqueous solution of copper chloride or ammonium persulfate, and an oxidizing treatment is performed with an alkaline oxidizing aqueous solution.

【0020】公知の褐色或いは黒色の酸化銅微細凹凸膜
を形成する方法の内、実用化されている具体的な方法は
得られた酸化銅微細凹凸膜のままで、又はこれらを液相
で還元処理して多層化積層成形した場合に良好な接着力
を示す条件である。
Among the known methods for forming a brown or black copper oxide fine concavo-convex film, a specific method which has been put into practical use is the obtained copper oxide fine concavo-convex film as it is, or these are reduced in a liquid phase. It is a condition under which a good adhesive force is obtained when treated and multilayer-laminated.

【0021】しかし、本発明は、この酸化銅微細凹凸膜
を従来にない気相還元して使用することから、酸化銅微
細凹凸膜又はそれを液相で還元した表面として、その接
着強度が最良のものが還元後最良と必ずしもなるもので
はない。酸化銅微細凹凸膜としては、従来に比較して凹
凸度が大きく、脆いために接着力が劣ったり、或いは積
層材セットをレイアップする時に酸化銅が一部脱落して
非プリント配線部に付着して汚染させるようなトラブル
を発生するものであっても、金属銅まで還元すれば、こ
のようなトラブルの原因は無くなるのでより高い接着力
を示すものとして用いることができる。
However, according to the present invention, since this copper oxide fine unevenness film is used after vapor phase reduction which has never been used before, the copper oxide fine unevenness film or the surface reduced in the liquid phase has the best adhesive strength. Things are not always the best after reduction. As a copper oxide fine uneven film, the unevenness is large compared to the conventional one and the adhesive strength is poor because it is brittle, or when copper oxide is partly dropped off when laminating the laminate set, it adheres to the non-printed wiring part. Even if a trouble that causes contamination is generated, if the metal copper is reduced, the cause of such trouble disappears, so that it can be used as one showing higher adhesive strength.

【0022】しかしながら、本発明では、これらの内層
板をそのままベルト等の上に置いて移送することから、
該投入において微細凹凸面が傷付いて欠点となることは
避ける必要がある。従って、容易に傷などの欠陥を生じ
やすい酸化銅微細凹凸膜を形成した内層板を用いる場合
には、上記したように、枠などを用い、プリント配線網
表面に機器その他が接触しないような方法を用いる。
However, in the present invention, since these inner layer plates are placed as they are on the belt or the like and transferred,
It is necessary to avoid that the fine uneven surface is scratched and becomes a defect in the charging. Therefore, when using the inner layer plate on which the copper oxide fine concavo-convex film that easily causes defects such as scratches is used, as described above, a method is used in which a frame or the like is used and the device or the like does not come into contact with the printed wiring network surface. To use.

【0023】また、本発明は、比較的短時間の還元処理
により還元するものであることから還元速度が不足する
場合には、還元前、例えば酸化処理終了後の後半の水洗
時、その他の時期に白金族触媒を酸化銅微細凹凸に付与
することにより、還元温度を低下させたり、速度を早く
することができる。また、本発明では酸化銅微細凹凸を
形成する内層板の酸化銅を本発明の気相還元装置で還元
し、好ましくは実質的に金属銅からなる微細凹凸とす
る。
Further, according to the present invention, since reduction is carried out by a relatively short time reduction treatment, when the reduction rate is insufficient, before the reduction, for example, in the latter half of the washing after the completion of the oxidation treatment, other time By applying the platinum group catalyst to the copper oxide fine irregularities, the reduction temperature can be lowered or the speed can be increased. Further, in the present invention, the copper oxide of the inner layer plate which forms the copper oxide fine irregularities is reduced by the vapor phase reduction apparatus of the present invention, and preferably the fine irregularities substantially composed of metallic copper are formed.

【0024】本発明の気相還元は、還元性ガス存在雰囲
気にて行う。還元性ガス存在雰囲気は、水素、一酸化炭
素などの還元性ガス、その他のガス化可能な還元性化合
物、例えば、ヒドラジンのガスなどが存在する雰囲気で
あり、通常は非酸化性のガスで希釈し、常圧での操作を
可能とした気相雰囲気である。気相還元の温度、時間等
は用いる還元性ガスの種類とその量(絶対圧力或いは分
圧)、白金属触媒の付与の有無などにより適宜選択可能
である。
The gas phase reduction of the present invention is carried out in an atmosphere containing a reducing gas. The atmosphere in which a reducing gas is present is an atmosphere in which a reducing gas such as hydrogen or carbon monoxide or any other gasifiable reducing compound such as hydrazine gas is present, and is usually diluted with a non-oxidizing gas. However, it is a gas phase atmosphere that enables operation at normal pressure. The temperature, time, etc. of the gas phase reduction can be appropriately selected depending on the type and amount (absolute pressure or partial pressure) of the reducing gas used, the presence or absence of the white metal catalyst.

【0025】一般的には、水素などのように室温では還
元力の小さいガスを用いる場合、80℃〜300 ℃の範囲、
特に 100〜160 ℃で、特に上限温度は処理すべき内層板
の寸法安定性を考慮した温度の範囲から選択され、処理
時間 1分間〜24時間、好ましくは10分間〜3 時間の範囲
から適宜選択され、白金属触媒を付与してより低温でよ
り高速とすることが好ましい。
Generally, when a gas having a small reducing power at room temperature such as hydrogen is used, the temperature is in the range of 80 ° C to 300 ° C,
In particular, the temperature is 100 to 160 ° C, and the upper limit temperature is particularly selected from the range of temperature considering the dimensional stability of the inner layer plate to be treated, and the treatment time is appropriately selected from the range of 1 minute to 24 hours, preferably 10 minutes to 3 hours. Therefore, it is preferable to add a white metal catalyst to accelerate the reaction at a lower temperature.

【0026】又、ヒドラジンなどの室温でも還元能力を
有する化合物の場合、通常 160℃〜室温の範囲、好まし
くは 140℃〜60℃、特に 120℃〜80℃の範囲、処理時間
30秒〜3 時間、好ましくは 1〜60分間、特に 2〜30分
間の範囲から適宜選択され、この場合にも白金続触媒の
付与により高速の還元が可能となる。
In the case of a compound having a reducing ability even at room temperature, such as hydrazine, it is usually in the range of 160 ° C. to room temperature, preferably 140 ° C. to 60 ° C., particularly 120 ° C. to 80 ° C., and the treatment time.
It is appropriately selected from the range of 30 seconds to 3 hours, preferably 1 to 60 minutes, and particularly 2 to 30 minutes. In this case, too, reduction can be carried out at high speed by adding a platinum catalyst.

【0027】特にヒドラジンガスを用いる場合、雰囲気
自体は気相であっても、酸化銅微細凹凸膜にヒドラジン
ガスが凝縮したり又は還元反応で生成した水が気化せず
に液膜を形成したりして、還元反応が液膜中で進行する
場合があり、高速あるいは低温の還元反応の場合には液
膜形成が起こりやすい。ところが、液膜が生じると、銅
元素の移動が生じ、酸化銅微細凹凸膜の微細凹凸が破壊
され、結果として接着力のない還元膜となるものであ
る。
Particularly when hydrazine gas is used, even if the atmosphere itself is in the gas phase, hydrazine gas is condensed on the copper oxide fine uneven film or water produced by the reduction reaction does not vaporize to form a liquid film. Then, the reduction reaction may proceed in the liquid film, and in the case of the high-speed or low-temperature reduction reaction, the liquid film formation is likely to occur. However, when the liquid film is formed, the copper element is moved, and the fine unevenness of the copper oxide fine uneven film is destroyed, resulting in a reducing film having no adhesive force.

【0028】従って、ヒドラジンガスの分圧は、その処
理温度における飽和蒸気圧の50%以下、好ましくは20%
以下、特に 5%以下の低めに、また、水蒸気の分圧は、
その処理温度における飽和蒸気圧の50%以下、好ましく
は30%以下、特に10%以下の低めに設定し、かつ、還元
反応で生成した水が凝縮して液相を形成しないように気
化促進のための送風・攪拌を行うのが好ましい。
Therefore, the partial pressure of the hydrazine gas is 50% or less, preferably 20%, of the saturated vapor pressure at the processing temperature.
Below, especially below 5%, and the partial pressure of water vapor is
50% or less, preferably 30% or less, particularly 10% or less of the saturated vapor pressure at the treatment temperature is set to a low value, and vaporization is promoted so that water produced in the reduction reaction does not condense to form a liquid phase. It is preferable to perform air blowing and stirring for this purpose.

【0029】この送風攪拌における風速としては 0.01m
/sec以上、好ましくは 0.1m/sec 以上であり、内層板の
表面の気流速度がこの範囲以上となるようにすることが
特に好適である。また、特にヒドラジンを用いる場合に
は、非酸化性ガスを多量に媒体として使用することとな
るので、これを必要に応じて再生処理して循環使用する
ことは特に好ましいものであり、循環使用のためには、
特にそのガス中の水蒸気分圧が 10 mmHg以下となるよう
にして用いるのが好ましい。
The wind speed in this blast stirring is 0.01 m
/ sec or more, preferably 0.1 m / sec or more, and it is particularly preferable that the airflow velocity on the surface of the inner layer plate is in this range or more. Further, particularly when hydrazine is used, since a large amount of non-oxidizing gas is used as a medium, it is particularly preferable to recycle it if necessary and recycle it. In order to
Particularly, it is preferable to use it so that the partial pressure of water vapor in the gas is 10 mmHg or less.

【0030】上記により好適には金属銅まで還元された
微細凹凸膜は、酸化銅微細凹凸膜に比較してさらに微細
な凹凸である。そのため特に微細な凹凸は、その巨大な
比表面積により酸化されやすく、保存中などに酸化銅に
変質し、接着強度を劣化させる原因となりやすい。
More preferably, the fine concavo-convex film reduced to metallic copper has finer concavo-convex as compared with the copper oxide fine concavo-convex film. Therefore, particularly fine irregularities are likely to be oxidized due to their huge specific surface area, and are likely to be deteriorated in adhesive strength by being transformed into copper oxide during storage.

【0031】従って、酸化を防止して、保存が容易とす
るために防錆処理をすることは好ましい。この方法とし
ては、取り出し後、直ちに通常の防錆剤水溶液で処理
し、乾燥する方法があるが、本発明では、液体を用いな
い徐酸化(=表面に極めて薄い緻密な酸化膜を形成する
方法)が特に好適である。徐酸化は、通常、酸素分圧を
数mmHgとし 120℃程度以上の温度で処理により容易に実
施可能であり、還元室より取り出し後、実質的に還元性
ガスのない取り出し部において、内層板の温度が低下す
る前に微量の酸素が混入されるようにすることにより実
施可能となる。
Therefore, in order to prevent oxidation and facilitate storage, it is preferable to carry out rust prevention treatment. As this method, there is a method of treating with an ordinary rust preventive aqueous solution immediately after taking out and drying, but in the present invention, gradual oxidation without using a liquid (= method of forming an extremely thin and dense oxide film on the surface) ) Is particularly preferred. Gradual oxidation can usually be easily carried out by treating with an oxygen partial pressure of several mmHg and at a temperature of about 120 ° C. or higher. This can be done by allowing a trace amount of oxygen to be mixed in before the temperature drops.

【0032】以上、本発明の装置にて気相還元を行った
内層板は、通常、そのまま多層化積層成形に使用して両
面が銅箔である多層シールド板とされ、ついで、穴明
け、研磨、デスミア処理、無電解メッキ、電解メッキな
どされた後、両表面のプリント配線パターンを形成する
などの方法によりハローのない多層プリント配線板とさ
れる。
As described above, the inner layer plate which has been subjected to the vapor phase reduction by the apparatus of the present invention is usually used as it is for the multi-layer lamination molding to be a multi-layer shield plate having copper foil on both sides, and then punched and polished. After being subjected to desmear treatment, electroless plating, electrolytic plating, etc., a halo-free multilayer printed wiring board is obtained by forming printed wiring patterns on both surfaces.

【0033】[0033]

【実施例】次に、添付の図面を用いて実施例を説明す
る。図1は、本発明の気相還元装置の断面図であり、図
2は、その平面図である。また、図3は後処理部分を付
加した気相還元装置の断面図である。図1、図2、図3
の符号はそれぞれ、1:供給台、2:還元室、3:取出
台、4:後処理室、11:入口遮蔽部、12:非酸化性ガス
導入部、21:ガス吹き出し口、31:出口遮蔽部、32:非
酸化性ガス導入部、41:簡易シールを示す。なお、図1
〜3においては、還元ガス供給装置、不活性ガス供給装
置或いは循環再使用処理装置、排気処理装置、その他コ
ントロール装置などの周辺の諸設備は省略した。
EXAMPLES Examples will be described below with reference to the accompanying drawings. FIG. 1 is a cross-sectional view of the gas phase reduction apparatus of the present invention, and FIG. 2 is a plan view thereof. Further, FIG. 3 is a cross-sectional view of a gas phase reduction apparatus having a post-treatment portion added. 1, 2, and 3
The reference symbols are, respectively, 1: supply stage, 2: reduction chamber, 3: extraction stage, 4: post-treatment chamber, 11: inlet shielding part, 12: non-oxidizing gas introduction part, 21: gas outlet, 31: outlet. Shielding part, 32: non-oxidizing gas introduction part, 41: simple seal. Note that FIG.
In Nos. 3 to 3, peripheral equipments such as a reducing gas supply device, an inert gas supply device, a circulation reuse treatment device, an exhaust treatment device, and a control device are omitted.

【0034】図1、図2において、まず、運転開始にあ
たり、還元室(2) に非酸化性ガスが供給され、還元室
(2) 、出入口遮蔽部(11,12,31,32) を完全に非酸化性ガ
スに置換する。ついで、出入口遮蔽部(11,12,31,32) の
非酸化性ガス導入部(12,32)から非酸化性ガスを、ま
た、還元室(2) には還元性ガス存在非酸化性ガスの供給
を開始し、適宜、循環再使用装置等を運転して所定の還
元性ガス濃度、温度とされ、また、供給台(1) →還元室
(2) →取出台(3) に設けた多孔の無端ベルトを所定速度
で可動させる。
In FIGS. 1 and 2, first, at the start of operation, the reducing chamber (2) is supplied with a non-oxidizing gas and
(2) The inlet / outlet shielding part (11, 12, 31, 32) is completely replaced with non-oxidizing gas. Next, a non-oxidizing gas is introduced from the non-oxidizing gas introducing part (12, 32) of the entrance / exit shielding part (11, 12, 31, 32), and a reducing gas exists in the reducing chamber (2). Of the recycle gas is started and the circulating reuse device, etc. is appropriately operated to reach the predetermined reducing gas concentration and temperature.
(2) → Move the perforated endless belt provided on the take-out base (3) at a predetermined speed.

【0035】供給台(1) に酸化銅微細凹凸膜を形成し・
乾燥した内層板を置く、内層板は、供給台(1) →還元室
(2) →取出台(3) の順に多孔の無端ベルトにより移送さ
れ、所定の還元をされて、外部に取り出される。
Form a copper oxide fine uneven film on the supply table (1)
Place the dried inner layer plate, the inner layer plate is the supply table (1) → reduction chamber
(2) The transfer is carried out in the order of the take-out table (3) by the porous endless belt, the predetermined reduction is performed, and the product is taken out to the outside.

【0036】また、図3は、上記図1、図2の出口遮蔽
部(31)と取出台(3) との間に後処理室(4) を設けたもの
であり、この後処理室(4) において、還元処理された内
層板は、積極的に徐酸化により、微細銅凹凸表面の銅を
微量酸化し、保存安定性を向上させるようにしたもので
ある。なお、徐酸化に変えて微量の酸素存在下で冷却を
行うとにより、銅表面の過剰酸化を防止することでもよ
い。
Further, FIG. 3 shows a post-processing chamber (4) provided between the outlet shielding part (31) and the unloading table (3) shown in FIGS. In 4), the reduction-treated inner layer plate is configured to positively oxidize a small amount of copper on the uneven surface of fine copper to improve storage stability. It is also possible to prevent excessive oxidation of the copper surface by cooling in the presence of a slight amount of oxygen instead of gradual oxidation.

【0037】なお、本発明の気相還元により銅まで還元
した内層板を用いた場合にも『ピンクリング』が確認さ
れる場合の主な原因は、積層材料の保存状態や多層化積
層成形条件、ドリリング条件、その他の他に起因する可
能性が高いものである。
The main cause of the "pink ring" being confirmed even when the inner layer plate reduced to copper by the vapor phase reduction of the present invention is confirmed is the storage state of the laminated material and the multilayered lamination molding condition. , Drilling conditions, and others.

【0038】[0038]

【発明の効果】以上、詳細な説明および実施例から本発
明の気相還元装置は、極めて簡便であり、かつ、連続的
に自動処理するものである。本発明の気相還元装置は、
実質的に大気圧で運転され、120 ℃程度の比較的低温で
実施できるものであり、しかも、有害な廃棄物は実質的
に発生しない。
As described above, from the detailed description and the examples, the gas phase reduction apparatus of the present invention is extremely simple and continuously and automatically processes. The gas phase reduction apparatus of the present invention is
It is operated at substantially atmospheric pressure and can be carried out at a relatively low temperature of about 120 ° C, and practically no harmful waste is generated.

【0039】更に、還元性ガスの量は、極めて微量で充
分であり、ガスとして保存など必要が実質的にない。例
えば、市販のアンモニア分解による水素発生装置などに
より所要量をその場で発生させつつ供給することが極め
て容易である。また、ヒドラジンの場合には、爆発限界
を遙に下回るガス分圧で操作可能であって、漏れだした
場合にも爆発などが起こらない条件が使用できる。
Furthermore, the amount of the reducing gas is extremely small, and there is no need to store it as a gas. For example, it is extremely easy to supply the required amount while generating the required amount on the spot by using a commercially available hydrogen generator by decomposing ammonia. Further, in the case of hydrazine, it is possible to operate at a gas partial pressure far below the explosion limit, and it is possible to use conditions under which no explosion or the like will occur even if a leak occurs.

【0040】しかも、本発明の気相還元を行った内層板
を用いた多層プリント板は、多層板のプリント配線間の
電気的導通を行うスルーホールメッキ工程において、メ
ッキ液に褐色或いは黒色酸化銅が溶解して電気的短絡な
どの不良発生の原因となりやすい『ハロー』の発生が大
幅に減少するか、又は全く無くなる。以上であり、本発
明の内層板の気相回分還元装置によれば、信頼性に優れ
た多層プリント配線板を生産性よく、無公害で製造でき
るもので、工業的な意義は極めて高いものである。
Moreover, the multilayer printed board using the vapor-phase-reduced inner layer board of the present invention has a brown or black copper oxide as the plating solution in the through-hole plating step for electrically connecting the printed wirings of the multilayer board. The occurrence of "halos", which tend to melt and melt and cause defects such as electrical shorts, is greatly reduced or eliminated altogether. As described above, according to the vapor phase batch reducing apparatus for an inner layer board of the present invention, a highly reliable multilayer printed wiring board can be produced with good productivity and pollution-free, and has an extremely high industrial significance. is there.

【0041】[0041]

【図面の簡単な説明】[Brief description of drawings]

【図1】 断面図本発明の気相還元装置の内層板移送を
説明する断面図である。
FIG. 1 is a cross-sectional view illustrating the transfer of an inner layer plate of a vapor phase reduction apparatus according to the present invention.

【図2】 平面図本発明の気相還元装置の内層板移送を
説明する平面図である。
FIG. 2 is a plan view for explaining the inner layer plate transfer of the vapor phase reduction apparatus of the present invention.

【図3】 断面図本発明の気相還元装置の内層板移送を
説明する断面図である。
FIG. 3 is a sectional view for explaining the inner layer plate transfer of the vapor phase reduction apparatus of the present invention.

【符号の説明】[Explanation of symbols]

符号はそれぞれ、1:供給台、2:還元室、3:取出
台、4:後処理室、11:入口遮蔽部、12:非酸化性ガス
導入部、21:ガス吹き出し口、31:出口遮蔽部、32:非
酸化性ガス導入部、41:簡易シールを示す。
The reference numerals are, respectively, 1: supply stage, 2: reduction chamber, 3: extraction stage, 4: post-treatment chamber, 11: inlet shielding part, 12: non-oxidizing gas introduction part, 21: gas outlet, 31: outlet shielding Part, 32: non-oxidizing gas introduction part, 41: simple seal.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 プリント配線網を形成した多層プリント
配線板用の内層板の銅箔面を化学的に酸化し褐色或いは
黒色の酸化銅微細凹凸膜を形成した後、還元性ガス存在
雰囲気中で該酸化銅微細凹凸膜を実質的に常圧下に還元
する内層板の気相還元装置であって、該内層板の供給台
(1) 、非酸化性ガスによる入口遮蔽部(11)、還元性ガス
供給装置、不活性ガス供給或いは処理循環装置、所望に
より廃棄ガス処理装置を接続してなる還元室(2) 、非酸
化性ガスによる出口遮蔽部(31)、還元された内層板の取
出台(3) を直列に設けて成り、該内層板を供給台(1) 、
還元室(2) 、取出台(3) へ順次移送する移送手段(5) を
設けてなる内層板の気相還元装置
1. A copper foil surface of an inner layer board for a multilayer printed wiring board on which a printed wiring network is formed is chemically oxidized to form a brown or black copper oxide fine concavo-convex film, and then in a reducing gas atmosphere. A vapor phase reduction apparatus for an inner layer plate, which substantially reduces the copper oxide fine uneven film under normal pressure, comprising a supply base for the inner layer plate.
(1), inlet shielding part (11) with non-oxidizing gas, reducing gas supply device, inert gas supply or processing circulation device, reduction chamber (2) connected with waste gas processing device if desired, non-oxidizing An outlet shielding part (31) with a volatile gas, and an extraction table (3) for the reduced inner layer plate are provided in series, and the inner layer plate is supplied to the supply table (1),
Vapor phase reduction device for inner layer plate, which is provided with a reduction chamber (2) and a transfer means (5) for sequentially transferring to the extraction table (3)
【請求項2】 該移送手段(5) が、ロールにより駆動さ
れる網或いは多孔の無端ベルトである請求項1記載の内
層板の気相還元装置
2. The vapor phase reduction apparatus for an inner layer plate according to claim 1, wherein said transfer means (5) is a net driven by rolls or a perforated endless belt.
【請求項3】 該入口及び出口遮蔽部(11,31) が、それ
ぞれ前後に内層板の厚さより大きい間隙とその略中央に
該間隙への不活性ガス供給部とから構成されたものであ
る請求項1記載の内層板の気相還元装置
3. The inlet and outlet shields (11, 31) are each composed of a front and rear gap, which is larger than the thickness of the inner layer plate, and an inert gas supply part to the gap at substantially the center thereof. The vapor phase reduction apparatus for an inner layer plate according to claim 1.
【請求項4】 該遮蔽部(31)と該取出台(3) との間に、
更に後処理室(4) を設けてなる請求項1記載の内層板の
気相還元装置
4. Between the shielding part (31) and the extraction table (3),
The vapor phase reduction apparatus for an inner layer plate according to claim 1, further comprising a post-treatment chamber (4).
JP28359391A 1991-10-03 1991-10-03 Vapor phase reduction apparatus for internal layer plate Pending JPH05102665A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28359391A JPH05102665A (en) 1991-10-03 1991-10-03 Vapor phase reduction apparatus for internal layer plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28359391A JPH05102665A (en) 1991-10-03 1991-10-03 Vapor phase reduction apparatus for internal layer plate

Publications (1)

Publication Number Publication Date
JPH05102665A true JPH05102665A (en) 1993-04-23

Family

ID=17667517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28359391A Pending JPH05102665A (en) 1991-10-03 1991-10-03 Vapor phase reduction apparatus for internal layer plate

Country Status (1)

Country Link
JP (1) JPH05102665A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7750654B2 (en) 2002-09-02 2010-07-06 Octec Inc. Probe method, prober, and electrode reducing/plasma-etching processing mechanism

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7750654B2 (en) 2002-09-02 2010-07-06 Octec Inc. Probe method, prober, and electrode reducing/plasma-etching processing mechanism

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