JPH049448B2 - - Google Patents
Info
- Publication number
- JPH049448B2 JPH049448B2 JP59022892A JP2289284A JPH049448B2 JP H049448 B2 JPH049448 B2 JP H049448B2 JP 59022892 A JP59022892 A JP 59022892A JP 2289284 A JP2289284 A JP 2289284A JP H049448 B2 JPH049448 B2 JP H049448B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- light source
- transfer surface
- illuminance distribution
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims 4
- 238000005286 illumination Methods 0.000 claims 1
- 230000008859 change Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000006870 function Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59022892A JPS60168026A (ja) | 1984-02-13 | 1984-02-13 | 投影露光装置 |
US07/198,587 US4799791A (en) | 1984-02-13 | 1988-05-23 | Illuminance distribution measuring system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59022892A JPS60168026A (ja) | 1984-02-13 | 1984-02-13 | 投影露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60168026A JPS60168026A (ja) | 1985-08-31 |
JPH049448B2 true JPH049448B2 (enrdf_load_stackoverflow) | 1992-02-20 |
Family
ID=12095307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59022892A Granted JPS60168026A (ja) | 1984-02-13 | 1984-02-13 | 投影露光装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60168026A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0652699B2 (ja) * | 1984-09-13 | 1994-07-06 | 株式会社ニコン | 露光装置 |
JPS62152433U (enrdf_load_stackoverflow) * | 1986-03-19 | 1987-09-28 | ||
JP2571054B2 (ja) * | 1987-04-28 | 1997-01-16 | キヤノン株式会社 | 露光装置及び素子製造方法 |
JP4641873B2 (ja) * | 2005-06-22 | 2011-03-02 | 小糸工業株式会社 | 発光状態測定装置 |
-
1984
- 1984-02-13 JP JP59022892A patent/JPS60168026A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60168026A (ja) | 1985-08-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |