JPH048780B2 - - Google Patents
Info
- Publication number
- JPH048780B2 JPH048780B2 JP10704084A JP10704084A JPH048780B2 JP H048780 B2 JPH048780 B2 JP H048780B2 JP 10704084 A JP10704084 A JP 10704084A JP 10704084 A JP10704084 A JP 10704084A JP H048780 B2 JPH048780 B2 JP H048780B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- scanning
- pulses
- signal
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000007547 defect Effects 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 17
- 238000001514 detection method Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 238000007689 inspection Methods 0.000 description 8
- 230000015654 memory Effects 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 230000002159 abnormal effect Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59107040A JPS60250629A (ja) | 1984-05-25 | 1984-05-25 | マスクの検査方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59107040A JPS60250629A (ja) | 1984-05-25 | 1984-05-25 | マスクの検査方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60250629A JPS60250629A (ja) | 1985-12-11 |
| JPH048780B2 true JPH048780B2 (ko) | 1992-02-18 |
Family
ID=14448993
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59107040A Granted JPS60250629A (ja) | 1984-05-25 | 1984-05-25 | マスクの検査方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60250629A (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11104618B2 (en) | 2015-07-20 | 2021-08-31 | Sabic Global Technologies B.V. | Fertilizer composition and methods of making and using same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62263646A (ja) * | 1986-05-12 | 1987-11-16 | Toshiba Corp | ウエハ検査装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50127574A (ko) * | 1974-03-27 | 1975-10-07 | ||
| JPS5681413A (en) * | 1979-12-06 | 1981-07-03 | Fujitsu Ltd | Inspection system for pattern |
| JPS5961136A (ja) * | 1982-09-30 | 1984-04-07 | Toshiba Corp | マスク欠陥検査装置 |
-
1984
- 1984-05-25 JP JP59107040A patent/JPS60250629A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50127574A (ko) * | 1974-03-27 | 1975-10-07 | ||
| JPS5681413A (en) * | 1979-12-06 | 1981-07-03 | Fujitsu Ltd | Inspection system for pattern |
| JPS5961136A (ja) * | 1982-09-30 | 1984-04-07 | Toshiba Corp | マスク欠陥検査装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11104618B2 (en) | 2015-07-20 | 2021-08-31 | Sabic Global Technologies B.V. | Fertilizer composition and methods of making and using same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60250629A (ja) | 1985-12-11 |
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