JPH0481855B2 - - Google Patents

Info

Publication number
JPH0481855B2
JPH0481855B2 JP59248162A JP24816284A JPH0481855B2 JP H0481855 B2 JPH0481855 B2 JP H0481855B2 JP 59248162 A JP59248162 A JP 59248162A JP 24816284 A JP24816284 A JP 24816284A JP H0481855 B2 JPH0481855 B2 JP H0481855B2
Authority
JP
Japan
Prior art keywords
mask
film
aluminum nitride
ray
nitride film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59248162A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61126551A (ja
Inventor
Hideo Kato
Masaaki Matsushima
Keiko Matsuda
Hirofumi Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59248162A priority Critical patent/JPS61126551A/ja
Priority to US06/794,180 priority patent/US4677042A/en
Priority to DE19853539201 priority patent/DE3539201A1/de
Publication of JPS61126551A publication Critical patent/JPS61126551A/ja
Publication of JPH0481855B2 publication Critical patent/JPH0481855B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP59248162A 1984-11-05 1984-11-26 Ｘ線リソグラフイ−用マスク構造体の製造方法 Granted JPS61126551A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP59248162A JPS61126551A (ja) 1984-11-26 1984-11-26 Ｘ線リソグラフイ−用マスク構造体の製造方法
US06/794,180 US4677042A (en) 1984-11-05 1985-11-01 Mask structure for lithography, method for preparation thereof and lithographic method
DE19853539201 DE3539201A1 (de) 1984-11-05 1985-11-05 Maskenstruktur fuer die lithografie, verfahren zu ihrer herstellung und lithografieverfahren

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59248162A JPS61126551A (ja) 1984-11-26 1984-11-26 Ｘ線リソグラフイ−用マスク構造体の製造方法

Publications (2)

Publication Number Publication Date
JPS61126551A JPS61126551A (ja) 1986-06-14
JPH0481855B2 true JPH0481855B2 (en, 2012) 1992-12-25

Family

ID=17174137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59248162A Granted JPS61126551A (ja) 1984-11-05 1984-11-26 Ｘ線リソグラフイ−用マスク構造体の製造方法

Country Status (1)

Country Link
JP (1) JPS61126551A (en, 2012)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0795512B2 (ja) * 1987-05-14 1995-10-11 沖電気工業株式会社 Ｘ線露光マスク用メンブレンの製造方法
US5196283A (en) * 1989-03-09 1993-03-23 Canon Kabushiki Kaisha X-ray mask structure, and x-ray exposure process
US6284411B1 (en) 1996-10-02 2001-09-04 Japan Storage Battery Co., Ltd. Valve regulated type battery and producing method thereof

Also Published As

Publication number Publication date
JPS61126551A (ja) 1986-06-14

Similar Documents

Publication Publication Date Title
US4677042A (en) Mask structure for lithography, method for preparation thereof and lithographic method
JPS599921A (ja) Ｘ線マスク用フイルム及びその製造方法
US4837123A (en) Mask structure for lithography, method of preparation thereof and lithographic method
US4253029A (en) Mask structure for x-ray lithography
JPH02208601A (ja) 光学用窓材及びその製造方法
US4170512A (en) Method of manufacture of a soft-X-ray mask
JPH0481855B2 (en, 2012)
JPH0481852B2 (en, 2012)
JPH0481856B2 (en, 2012)
JPH0690998B2 (ja) Ｘ線リソグラフィー用マスク構造体の製造方法
JPH0481853B2 (en, 2012)
JPH0481854B2 (en, 2012)
JPH0482048B2 (en, 2012)
JPH0656831B2 (ja) リソグラフィー用マスク構造体の製造方法、及び薄膜の製造方法
JPH0482049B2 (en, 2012)
JPS62119924A (ja) 透過マスクの作製方法
JPH03105912A (ja) Ｘ線マスクブランクス及びｘ線マスク構造体
JPH0482047B2 (en, 2012)
JPS61249056A (ja) リソグラフイ−用マスク構造体
GB2288272A (en) X-ray windows
JPH0430737B2 (en, 2012)
JP3032262B2 (ja) Ｘ線マスクの製造方法
JPH0423819B2 (en, 2012)
JPH0428132B2 (en, 2012)
JPS63169026A (ja) リソグラフイ−用マスク構造体