JPH0481723B2 - - Google Patents
Info
- Publication number
- JPH0481723B2 JPH0481723B2 JP1208586A JP1208586A JPH0481723B2 JP H0481723 B2 JPH0481723 B2 JP H0481723B2 JP 1208586 A JP1208586 A JP 1208586A JP 1208586 A JP1208586 A JP 1208586A JP H0481723 B2 JPH0481723 B2 JP H0481723B2
- Authority
- JP
- Japan
- Prior art keywords
- optical monitoring
- window
- optical
- light
- film formation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 95
- 238000012544 monitoring process Methods 0.000 claims description 53
- 238000001514 detection method Methods 0.000 claims description 27
- 230000015572 biosynthetic process Effects 0.000 claims description 21
- 238000005259 measurement Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 3
- 230000035945 sensitivity Effects 0.000 claims 1
- 239000010408 film Substances 0.000 description 36
- 230000003321 amplification Effects 0.000 description 11
- 238000003199 nucleic acid amplification method Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000012937 correction Methods 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 238000012806 monitoring device Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Investigating Or Analysing Materials By Optical Means (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61012085A JPS62170839A (ja) | 1986-01-24 | 1986-01-24 | 光学モニタ方法および装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61012085A JPS62170839A (ja) | 1986-01-24 | 1986-01-24 | 光学モニタ方法および装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62170839A JPS62170839A (ja) | 1987-07-27 |
| JPH0481723B2 true JPH0481723B2 (cg-RX-API-DMAC7.html) | 1992-12-24 |
Family
ID=11795743
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61012085A Granted JPS62170839A (ja) | 1986-01-24 | 1986-01-24 | 光学モニタ方法および装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62170839A (cg-RX-API-DMAC7.html) |
-
1986
- 1986-01-24 JP JP61012085A patent/JPS62170839A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62170839A (ja) | 1987-07-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |