JPH0477899B2 - - Google Patents

Info

Publication number
JPH0477899B2
JPH0477899B2 JP59191448A JP19144884A JPH0477899B2 JP H0477899 B2 JPH0477899 B2 JP H0477899B2 JP 59191448 A JP59191448 A JP 59191448A JP 19144884 A JP19144884 A JP 19144884A JP H0477899 B2 JPH0477899 B2 JP H0477899B2
Authority
JP
Japan
Prior art keywords
organic layer
forming method
pattern forming
layer
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59191448A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6170720A (ja
Inventor
Takao Iwayagi
Norio Hasegawa
Toshihiko Tanaka
Hiroshi Shiraishi
Takumi Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59191448A priority Critical patent/JPS6170720A/ja
Priority to KR1019850006265A priority patent/KR930010248B1/ko
Publication of JPS6170720A publication Critical patent/JPS6170720A/ja
Priority to US07/060,323 priority patent/US4835089A/en
Publication of JPH0477899B2 publication Critical patent/JPH0477899B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59191448A 1984-09-14 1984-09-14 パタ−ン形成方法 Granted JPS6170720A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP59191448A JPS6170720A (ja) 1984-09-14 1984-09-14 パタ−ン形成方法
KR1019850006265A KR930010248B1 (ko) 1984-09-14 1985-08-29 패턴 형성 방법
US07/060,323 US4835089A (en) 1984-09-14 1987-06-10 Resist pattern forming process with dry etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59191448A JPS6170720A (ja) 1984-09-14 1984-09-14 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6170720A JPS6170720A (ja) 1986-04-11
JPH0477899B2 true JPH0477899B2 (en, 2012) 1992-12-09

Family

ID=16274790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59191448A Granted JPS6170720A (ja) 1984-09-14 1984-09-14 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6170720A (en, 2012)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU6790000A (en) 1999-08-26 2001-03-19 Brewer Science, Inc. Improved fill material for dual damascene processes
US20040034134A1 (en) 1999-08-26 2004-02-19 Lamb James E. Crosslinkable fill compositions for uniformly protecting via and contact holes
JP4654544B2 (ja) * 2000-07-12 2011-03-23 日産化学工業株式会社 リソグラフィー用ギャップフィル材形成組成物
WO2004061526A1 (ja) * 2002-12-26 2004-07-22 Nissan Chemical Industries, Ltd. アルカリ溶解型リソグラフィー用ギャップフィル材形成組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59114824A (ja) * 1982-12-21 1984-07-03 Agency Of Ind Science & Technol 半導体装置の平坦化方法

Also Published As

Publication number Publication date
JPS6170720A (ja) 1986-04-11

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