JPH0477229U - - Google Patents

Info

Publication number
JPH0477229U
JPH0477229U JP12077090U JP12077090U JPH0477229U JP H0477229 U JPH0477229 U JP H0477229U JP 12077090 U JP12077090 U JP 12077090U JP 12077090 U JP12077090 U JP 12077090U JP H0477229 U JPH0477229 U JP H0477229U
Authority
JP
Japan
Prior art keywords
sample
plasma
processing apparatus
supply pipe
angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12077090U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12077090U priority Critical patent/JPH0477229U/ja
Publication of JPH0477229U publication Critical patent/JPH0477229U/ja
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
JP12077090U 1990-11-20 1990-11-20 Pending JPH0477229U (hu)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12077090U JPH0477229U (hu) 1990-11-20 1990-11-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12077090U JPH0477229U (hu) 1990-11-20 1990-11-20

Publications (1)

Publication Number Publication Date
JPH0477229U true JPH0477229U (hu) 1992-07-06

Family

ID=31868657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12077090U Pending JPH0477229U (hu) 1990-11-20 1990-11-20

Country Status (1)

Country Link
JP (1) JPH0477229U (hu)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000514136A (ja) * 1996-06-28 2000-10-24 ラム リサーチ コーポレイション 高密度プラズマ化学蒸着装置および方法
US8307781B2 (en) 2003-11-07 2012-11-13 Shimadzu Corporation Surface wave excitation plasma CVD system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63229711A (ja) * 1987-03-19 1988-09-26 Yasuo Tarui 成膜装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63229711A (ja) * 1987-03-19 1988-09-26 Yasuo Tarui 成膜装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000514136A (ja) * 1996-06-28 2000-10-24 ラム リサーチ コーポレイション 高密度プラズマ化学蒸着装置および方法
US8307781B2 (en) 2003-11-07 2012-11-13 Shimadzu Corporation Surface wave excitation plasma CVD system

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