JPH047535B2 - - Google Patents

Info

Publication number
JPH047535B2
JPH047535B2 JP60049634A JP4963485A JPH047535B2 JP H047535 B2 JPH047535 B2 JP H047535B2 JP 60049634 A JP60049634 A JP 60049634A JP 4963485 A JP4963485 A JP 4963485A JP H047535 B2 JPH047535 B2 JP H047535B2
Authority
JP
Japan
Prior art keywords
circuit
voltage
ion beam
diode
series circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60049634A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61208740A (ja
Inventor
Yoshizo Sakuma
Ryuzo Aihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP60049634A priority Critical patent/JPS61208740A/ja
Publication of JPS61208740A publication Critical patent/JPS61208740A/ja
Publication of JPH047535B2 publication Critical patent/JPH047535B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
JP60049634A 1985-03-12 1985-03-12 集束イオンビ−ム装置 Granted JPS61208740A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60049634A JPS61208740A (ja) 1985-03-12 1985-03-12 集束イオンビ−ム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60049634A JPS61208740A (ja) 1985-03-12 1985-03-12 集束イオンビ−ム装置

Publications (2)

Publication Number Publication Date
JPS61208740A JPS61208740A (ja) 1986-09-17
JPH047535B2 true JPH047535B2 (enrdf_load_stackoverflow) 1992-02-12

Family

ID=12836646

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60049634A Granted JPS61208740A (ja) 1985-03-12 1985-03-12 集束イオンビ−ム装置

Country Status (1)

Country Link
JP (1) JPS61208740A (enrdf_load_stackoverflow)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5662070A (en) * 1979-10-25 1981-05-27 Jeol Ltd Generating device for high voltage
JPS5662069A (en) * 1979-10-25 1981-05-27 Jeol Ltd Generating device for high voltage
JPS58158849A (ja) * 1982-03-16 1983-09-21 Jeol Ltd イオン銃用電源
JPS5944800A (ja) * 1982-09-03 1984-03-13 日本電子株式会社 直流高電圧電源

Also Published As

Publication number Publication date
JPS61208740A (ja) 1986-09-17

Similar Documents

Publication Publication Date Title
CN112136200B (zh) 致密高能离子植入系统及生成高能离子射束的设备及方法
US5945677A (en) Focused ion beam system
TWI754700B (zh) 萃取離子束的裝置
US8723451B2 (en) Accelerator for charged particles
CA2790898C (en) Dc high-voltage source and particle accelerator
EP0253533A2 (en) A circuit arrangement for producing high voltages
EP0028924B1 (en) Charged particle beam tube and method of operating the same
CN1079335A (zh) 电子束装置
US5369279A (en) Chromatically compensated particle-beam column
US2714679A (en) High voltage apparatus for generating a substantially well-collimated beam of charged particles
JPH047535B2 (enrdf_load_stackoverflow)
JPH0530015B2 (enrdf_load_stackoverflow)
JPH047534B2 (enrdf_load_stackoverflow)
KR100207334B1 (ko) 전자총 및 그의 구동회로
US3731211A (en) Particle acceleration tube having improved beam focus control
JP5142173B1 (ja) 荷電粒子加速器および荷電粒子の加速方法
JP7054633B2 (ja) 電子顕微鏡および電子顕微鏡の制御方法
Brown et al. Low energy vacuum arc ion source
JPS6266552A (ja) 集束イオンビ−ム装置
KR20030014146A (ko) 이온주입장치 및 그 운전방법
EP0574447B1 (en) Focusing means for cathode ray tubes
KR102734150B1 (ko) 플라즈마를 이용한 반도체 제조 설비에서 고전압 변조 비정현파 발생 장치 및 방법
KR102731510B1 (ko) 플라즈마를 이용한 반도체 제조 설비에서 다중레벨 고전압 비정현파 신호 발생 장치 및 방법
KR102324685B1 (ko) 단일 회로 다중 출력 고전압 전원장치
JPS62160648A (ja) 集束イオンビ−ム装置