JPH0474876B2 - - Google Patents
Info
- Publication number
- JPH0474876B2 JPH0474876B2 JP57108706A JP10870682A JPH0474876B2 JP H0474876 B2 JPH0474876 B2 JP H0474876B2 JP 57108706 A JP57108706 A JP 57108706A JP 10870682 A JP10870682 A JP 10870682A JP H0474876 B2 JPH0474876 B2 JP H0474876B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- window
- region
- layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
- H01S5/2234—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
Landscapes
- Semiconductor Lasers (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10870682A JPS58225681A (ja) | 1982-06-23 | 1982-06-23 | 半導体レ−ザ素子 |
US06/476,844 US4546481A (en) | 1982-05-28 | 1983-03-18 | Window structure semiconductor laser |
DE8383301600T DE3376936D1 (en) | 1982-05-28 | 1983-03-22 | Semiconductor laser |
EP83301600A EP0095826B1 (en) | 1982-05-28 | 1983-03-22 | Semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10870682A JPS58225681A (ja) | 1982-06-23 | 1982-06-23 | 半導体レ−ザ素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58225681A JPS58225681A (ja) | 1983-12-27 |
JPH0474876B2 true JPH0474876B2 (en, 2012) | 1992-11-27 |
Family
ID=14491540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10870682A Granted JPS58225681A (ja) | 1982-05-28 | 1982-06-23 | 半導体レ−ザ素子 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58225681A (en, 2012) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61289689A (ja) * | 1985-06-18 | 1986-12-19 | Mitsubishi Electric Corp | 半導体発光装置 |
JP2823228B2 (ja) * | 1988-11-29 | 1998-11-11 | 三洋電機株式会社 | 半導体レーザ装置及びその製造方法 |
JPH02148786A (ja) * | 1988-11-29 | 1990-06-07 | Sanyo Electric Co Ltd | 半導体レーザ装置 |
DE68909779T2 (de) * | 1989-06-16 | 1994-05-05 | Ibm | Methode zur Verbesserung der Ebenheit geätzter Spiegelfacetten. |
JP2009105184A (ja) | 2007-10-23 | 2009-05-14 | Sharp Corp | 窒化物系半導体レーザ素子とその製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55150288A (en) * | 1979-05-10 | 1980-11-22 | Sony Corp | Semiconductor laser |
-
1982
- 1982-06-23 JP JP10870682A patent/JPS58225681A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58225681A (ja) | 1983-12-27 |
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