JPH0472348B2 - - Google Patents

Info

Publication number
JPH0472348B2
JPH0472348B2 JP58025615A JP2561583A JPH0472348B2 JP H0472348 B2 JPH0472348 B2 JP H0472348B2 JP 58025615 A JP58025615 A JP 58025615A JP 2561583 A JP2561583 A JP 2561583A JP H0472348 B2 JPH0472348 B2 JP H0472348B2
Authority
JP
Japan
Prior art keywords
ion
processed surface
ion beam
electrostatic analyzer
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58025615A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59151740A (ja
Inventor
Masatoshi Yasutake
Tatsuya Adachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP58025615A priority Critical patent/JPS59151740A/ja
Publication of JPS59151740A publication Critical patent/JPS59151740A/ja
Publication of JPH0472348B2 publication Critical patent/JPH0472348B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
JP58025615A 1983-02-18 1983-02-18 複数のイオン源を用いた微細加工装置 Granted JPS59151740A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58025615A JPS59151740A (ja) 1983-02-18 1983-02-18 複数のイオン源を用いた微細加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58025615A JPS59151740A (ja) 1983-02-18 1983-02-18 複数のイオン源を用いた微細加工装置

Publications (2)

Publication Number Publication Date
JPS59151740A JPS59151740A (ja) 1984-08-30
JPH0472348B2 true JPH0472348B2 (enrdf_load_stackoverflow) 1992-11-18

Family

ID=12170786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58025615A Granted JPS59151740A (ja) 1983-02-18 1983-02-18 複数のイオン源を用いた微細加工装置

Country Status (1)

Country Link
JP (1) JPS59151740A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0752293B2 (ja) * 1987-02-27 1995-06-05 株式会社日立製作所 イオンビ−ム加工方法及びその装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS595551A (ja) * 1982-06-30 1984-01-12 Jeol Ltd 荷電粒子線装置

Also Published As

Publication number Publication date
JPS59151740A (ja) 1984-08-30

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