JPH0469465U - - Google Patents
Info
- Publication number
- JPH0469465U JPH0469465U JP11073390U JP11073390U JPH0469465U JP H0469465 U JPH0469465 U JP H0469465U JP 11073390 U JP11073390 U JP 11073390U JP 11073390 U JP11073390 U JP 11073390U JP H0469465 U JPH0469465 U JP H0469465U
- Authority
- JP
- Japan
- Prior art keywords
- plasma cvd
- electrode
- electrode structure
- metal plate
- glow discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 4
- 239000012212 insulator Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11073390U JPH0469465U (ru) | 1990-10-22 | 1990-10-22 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11073390U JPH0469465U (ru) | 1990-10-22 | 1990-10-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0469465U true JPH0469465U (ru) | 1992-06-19 |
Family
ID=31858115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11073390U Pending JPH0469465U (ru) | 1990-10-22 | 1990-10-22 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0469465U (ru) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06333849A (ja) * | 1993-05-19 | 1994-12-02 | Tokyo Electron Ltd | プラズマ処理装置 |
JPH07122502A (ja) * | 1993-10-21 | 1995-05-12 | Nec Corp | プラズマ加工装置 |
JP2002093721A (ja) * | 2000-09-14 | 2002-03-29 | Canon Inc | 堆積膜形成方法及び装置 |
JP2007258379A (ja) * | 2006-03-22 | 2007-10-04 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2013538284A (ja) * | 2010-07-02 | 2013-10-10 | アプライド マテリアルズ インコーポレイテッド | 堆積装置および堆積の非対称性を低減させる方法 |
-
1990
- 1990-10-22 JP JP11073390U patent/JPH0469465U/ja active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06333849A (ja) * | 1993-05-19 | 1994-12-02 | Tokyo Electron Ltd | プラズマ処理装置 |
JPH07122502A (ja) * | 1993-10-21 | 1995-05-12 | Nec Corp | プラズマ加工装置 |
JP2002093721A (ja) * | 2000-09-14 | 2002-03-29 | Canon Inc | 堆積膜形成方法及び装置 |
JP4557400B2 (ja) * | 2000-09-14 | 2010-10-06 | キヤノン株式会社 | 堆積膜形成方法 |
JP2007258379A (ja) * | 2006-03-22 | 2007-10-04 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2013538284A (ja) * | 2010-07-02 | 2013-10-10 | アプライド マテリアルズ インコーポレイテッド | 堆積装置および堆積の非対称性を低減させる方法 |
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