JPH0469414B2 - - Google Patents
Info
- Publication number
- JPH0469414B2 JPH0469414B2 JP59013251A JP1325184A JPH0469414B2 JP H0469414 B2 JPH0469414 B2 JP H0469414B2 JP 59013251 A JP59013251 A JP 59013251A JP 1325184 A JP1325184 A JP 1325184A JP H0469414 B2 JPH0469414 B2 JP H0469414B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- bias
- plasma
- high frequency
- microwave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P50/00—
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59013251A JPS60158629A (ja) | 1984-01-30 | 1984-01-30 | マイクロ波プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59013251A JPS60158629A (ja) | 1984-01-30 | 1984-01-30 | マイクロ波プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60158629A JPS60158629A (ja) | 1985-08-20 |
| JPH0469414B2 true JPH0469414B2 (member.php) | 1992-11-06 |
Family
ID=11827987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59013251A Granted JPS60158629A (ja) | 1984-01-30 | 1984-01-30 | マイクロ波プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60158629A (member.php) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2680065B2 (ja) * | 1988-09-22 | 1997-11-19 | 株式会社日立製作所 | プラズマクリーニング方法 |
| JP3542514B2 (ja) * | 1999-01-19 | 2004-07-14 | 株式会社日立製作所 | ドライエッチング装置 |
-
1984
- 1984-01-30 JP JP59013251A patent/JPS60158629A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60158629A (ja) | 1985-08-20 |
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