JPH0462452B2 - - Google Patents
Info
- Publication number
- JPH0462452B2 JPH0462452B2 JP61293158A JP29315886A JPH0462452B2 JP H0462452 B2 JPH0462452 B2 JP H0462452B2 JP 61293158 A JP61293158 A JP 61293158A JP 29315886 A JP29315886 A JP 29315886A JP H0462452 B2 JPH0462452 B2 JP H0462452B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- alignment
- pattern
- data
- reticle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61293158A JPS62169329A (ja) | 1986-12-09 | 1986-12-09 | アライメント方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61293158A JPS62169329A (ja) | 1986-12-09 | 1986-12-09 | アライメント方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57135498A Division JPS5927525A (ja) | 1982-08-03 | 1982-08-03 | アライメント方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62169329A JPS62169329A (ja) | 1987-07-25 |
| JPH0462452B2 true JPH0462452B2 (enrdf_load_stackoverflow) | 1992-10-06 |
Family
ID=17791169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61293158A Granted JPS62169329A (ja) | 1986-12-09 | 1986-12-09 | アライメント方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62169329A (enrdf_load_stackoverflow) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51111076A (en) * | 1975-03-26 | 1976-10-01 | Hitachi Ltd | Exposure device |
| JPS5541739A (en) * | 1978-09-20 | 1980-03-24 | Hitachi Ltd | Micro-projection type mask alignment device |
-
1986
- 1986-12-09 JP JP61293158A patent/JPS62169329A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62169329A (ja) | 1987-07-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3402750B2 (ja) | 位置合わせ方法及びそれを用いた素子の製造方法 | |
| US6239858B1 (en) | Exposure method, exposure apparatus and semiconductor device manufactured by using the exposure apparatus | |
| US5792580A (en) | Method of aligning reticle pattern | |
| JP3372633B2 (ja) | 位置合わせ方法及びそれを用いた位置合わせ装置 | |
| JPS6266631A (ja) | ステツプ・アンド・リピ−ト露光装置 | |
| US7224459B2 (en) | Exposure apparatus, method of controlling same, method of manufacturing devices, computer-readable memory and program | |
| JPS5927525A (ja) | アライメント方法 | |
| US6661517B2 (en) | Shot averaging for fine pattern alignment with minimal throughput loss | |
| JPH0463534B2 (enrdf_load_stackoverflow) | ||
| JP2936885B2 (ja) | アライメント方法及びそれを用いた投影露光装置 | |
| JPH0462452B2 (enrdf_load_stackoverflow) | ||
| JP3245859B2 (ja) | 半導体装置の製造装置 | |
| JP3569962B2 (ja) | 位置合わせ装置及び位置合わせ方法、それを用いた露光装置及び露光方法 | |
| US4530604A (en) | Method of aligning a mask and a wafer for manufacturing semiconductor circuit elements | |
| JPS61263123A (ja) | ステップアンドリピート露光方法 | |
| JP3168590B2 (ja) | 縮小投影露光方法 | |
| JP2964978B2 (ja) | 半導体製造方法と半導体製造システムおよびそれらにより製造された半導体デバイス | |
| JP3276608B2 (ja) | 半導体装置の製造方法 | |
| JPH0282510A (ja) | 位置合わせ方法 | |
| JPH10308434A (ja) | 位置決め装置、ミラー曲り検出方法、位置決め方法およびデバイス製造方法 | |
| JPS6254434A (ja) | 露光方法 | |
| JP3484860B2 (ja) | パターン露光方法および露光装置 | |
| JP2000195770A (ja) | 傾き補正方法およびデバイス製造方法 | |
| JPS60192945A (ja) | マスク・プリント方法 | |
| JP3013421B2 (ja) | 縮小投影露光装置 |