JPH0462192B2 - - Google Patents

Info

Publication number
JPH0462192B2
JPH0462192B2 JP57139038A JP13903882A JPH0462192B2 JP H0462192 B2 JPH0462192 B2 JP H0462192B2 JP 57139038 A JP57139038 A JP 57139038A JP 13903882 A JP13903882 A JP 13903882A JP H0462192 B2 JPH0462192 B2 JP H0462192B2
Authority
JP
Japan
Prior art keywords
substrate
metal alkoxide
magnetoresistive element
hydrolyzate
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57139038A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5928395A (ja
Inventor
Nobuyuki Hayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP57139038A priority Critical patent/JPS5928395A/ja
Publication of JPS5928395A publication Critical patent/JPS5928395A/ja
Publication of JPH0462192B2 publication Critical patent/JPH0462192B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices

Landscapes

  • Magnetic Heads (AREA)
  • Hall/Mr Elements (AREA)
JP57139038A 1982-08-10 1982-08-10 磁気抵抗効果素子の製造方法 Granted JPS5928395A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57139038A JPS5928395A (ja) 1982-08-10 1982-08-10 磁気抵抗効果素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57139038A JPS5928395A (ja) 1982-08-10 1982-08-10 磁気抵抗効果素子の製造方法

Publications (2)

Publication Number Publication Date
JPS5928395A JPS5928395A (ja) 1984-02-15
JPH0462192B2 true JPH0462192B2 (enrdf_load_stackoverflow) 1992-10-05

Family

ID=15236001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57139038A Granted JPS5928395A (ja) 1982-08-10 1982-08-10 磁気抵抗効果素子の製造方法

Country Status (1)

Country Link
JP (1) JPS5928395A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5928395A (ja) 1984-02-15

Similar Documents

Publication Publication Date Title
JPS63195816A (ja) 薄膜ヘツドの製造方法
US4777074A (en) Grooved magnetic substrates and method for producing the same
JPH10102003A (ja) 絶縁膜および絶縁膜形成用塗布液
JP2982261B2 (ja) 薄膜層にオーディオ、ビデオ及びコンピュータ用磁気ヘッドのポール・ピース及びギャップを形成する方法
JPH0462192B2 (enrdf_load_stackoverflow)
US6403160B1 (en) Ferroelectric thin film, production method thereof and coating liquid for making thin film
JPH0118496B2 (enrdf_load_stackoverflow)
US5271768A (en) Coating for forming an oxide coating
EP0671728A2 (en) Improvement in magnetic recording medium
JPS62219220A (ja) 薄膜磁気ヘッドの製造方法
JPS59168643A (ja) 酸化膜の緻密化処理法
JPH1112542A (ja) シリカ系被膜形成用塗布液、シリカ系被膜及びそれを用いた半導体装置
JPH05225523A (ja) 薄膜磁気ヘッド及びその製造方法
JPH0517715B2 (enrdf_load_stackoverflow)
JPS5925245A (ja) 半導体装置の製造方法
US5989442A (en) Wet etching
EP0136631B1 (en) A process for forming a magnetic record member and a magnetic record member
JP2574768B2 (ja) 光磁気記録媒体
JPH06291253A (ja) 半導体素子の電荷蓄積部の誘電体絶縁膜の形成方法
Fujikawa et al. Formation of stacked insulation films on rough metal surfaces
JPS58164238A (ja) 半導体装置の製造方法
JPH0724249B2 (ja) 磁性体薄膜及びその製造方法
JPH06195641A (ja) 磁気ヘッド及びその製造方法
JPH02267979A (ja) 磁電変換素子の製造方法
JP2806284B2 (ja) 薄膜磁気ヘッド