JPH0461331B2 - - Google Patents
Info
- Publication number
- JPH0461331B2 JPH0461331B2 JP14582685A JP14582685A JPH0461331B2 JP H0461331 B2 JPH0461331 B2 JP H0461331B2 JP 14582685 A JP14582685 A JP 14582685A JP 14582685 A JP14582685 A JP 14582685A JP H0461331 B2 JPH0461331 B2 JP H0461331B2
- Authority
- JP
- Japan
- Prior art keywords
- diffraction grating
- region
- photoresist film
- substrate
- beam interference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 16
- 230000010363 phase shift Effects 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 12
- 239000002184 metal Substances 0.000 description 11
- 230000000737 periodic effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- NCGICGYLBXGBGN-UHFFFAOYSA-N 3-morpholin-4-yl-1-oxa-3-azonia-2-azanidacyclopent-3-en-5-imine;hydrochloride Chemical compound Cl.[N-]1OC(=N)C=[N+]1N1CCOCC1 NCGICGYLBXGBGN-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14582685A JPS627002A (ja) | 1985-07-04 | 1985-07-04 | 位相シフト回折格子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14582685A JPS627002A (ja) | 1985-07-04 | 1985-07-04 | 位相シフト回折格子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS627002A JPS627002A (ja) | 1987-01-14 |
| JPH0461331B2 true JPH0461331B2 (de) | 1992-09-30 |
Family
ID=15394013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14582685A Granted JPS627002A (ja) | 1985-07-04 | 1985-07-04 | 位相シフト回折格子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS627002A (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5792528A (en) * | 1994-06-17 | 1998-08-11 | Atomic Energy Corporation Of South Africa Limited | Process for the production of plastic components for containing and/or transporting fluids |
| CN115663442A (zh) * | 2017-11-21 | 2023-01-31 | 应用材料公司 | 制造波导组合器的方法 |
| WO2019108379A1 (en) | 2017-11-29 | 2019-06-06 | Applied Materials, Inc. | Method of direct etching fabrication of waveguide combiners |
-
1985
- 1985-07-04 JP JP14582685A patent/JPS627002A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS627002A (ja) | 1987-01-14 |
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