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Individual
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Priority to JP17642784ApriorityCriticalpatent/JPS6156868A/ja
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Publication of JPH0459108B2publicationCriticalpatent/JPH0459108B2/ja
Vorrichtung zur zuführung von teilchen und/oder körnchen für die gestaltung einer schicht mit einer vorbestimmten stärke sowie verfahren zur herstellung von gemusterten, geformten artikeln mittels der vorrichtung
Process for depositing a pattern of material on a substrate and use of this process for forming a patterned mask structure on a semiconductor substrate