JPH0455749U - - Google Patents
Info
- Publication number
- JPH0455749U JPH0455749U JP9760790U JP9760790U JPH0455749U JP H0455749 U JPH0455749 U JP H0455749U JP 9760790 U JP9760790 U JP 9760790U JP 9760790 U JP9760790 U JP 9760790U JP H0455749 U JPH0455749 U JP H0455749U
- Authority
- JP
- Japan
- Prior art keywords
- ion
- ionization chamber
- ion source
- exit port
- injection gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000956 alloy Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 229910001285 shape-memory alloy Inorganic materials 0.000 claims description 3
- 238000002347 injection Methods 0.000 claims 3
- 239000007924 injection Substances 0.000 claims 3
- 238000010884 ion-beam technique Methods 0.000 claims 1
Landscapes
- Electron Sources, Ion Sources (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9760790U JPH0455749U (ru) | 1990-09-19 | 1990-09-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9760790U JPH0455749U (ru) | 1990-09-19 | 1990-09-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0455749U true JPH0455749U (ru) | 1992-05-13 |
Family
ID=31838120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9760790U Pending JPH0455749U (ru) | 1990-09-19 | 1990-09-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0455749U (ru) |
-
1990
- 1990-09-19 JP JP9760790U patent/JPH0455749U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2426693A3 (en) | Ion source | |
| KR960702167A (ko) | 스퍼터 에칭 제어용 플라즈마 성형 플러그(Plasma shaping plug for control of spuffer etching) | |
| JPH0455749U (ru) | ||
| GB792043A (en) | Improvements relating to mass spectrometers | |
| JPH01158573U (ru) | ||
| JP2879342B2 (ja) | 電子ビーム励起イオン源 | |
| JPS6253558U (ru) | ||
| JPS62152086U (ru) | ||
| JPS5912258U (ja) | 電子線照射装置 | |
| JPH02138839U (ru) | ||
| JPH0166741U (ru) | ||
| JPH0217549U (ru) | ||
| Horiike et al. | Ion Source and Ion Etching Process. | |
| JPS62175559U (ru) | ||
| JPH0292658U (ru) | ||
| JPH0388257U (ru) | ||
| JPS6174950U (ru) | ||
| JPS617542A (ja) | マイクロ波イオン源 | |
| JPH03118600U (ru) | ||
| JPH0435344U (ru) | ||
| JPS6247781U (ru) | ||
| JPH01164760U (ru) | ||
| JPS63150460U (ru) | ||
| JPS63172050U (ru) | ||
| JPH0310459U (ru) |