JPH0454618B2 - - Google Patents
Info
- Publication number
- JPH0454618B2 JPH0454618B2 JP60028899A JP2889985A JPH0454618B2 JP H0454618 B2 JPH0454618 B2 JP H0454618B2 JP 60028899 A JP60028899 A JP 60028899A JP 2889985 A JP2889985 A JP 2889985A JP H0454618 B2 JPH0454618 B2 JP H0454618B2
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- hydrated
- acid
- mineral acid
- phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002994 raw material Substances 0.000 claims description 54
- 239000002253 acid Substances 0.000 claims description 40
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 37
- 239000011707 mineral Substances 0.000 claims description 37
- 235000012239 silicon dioxide Nutrition 0.000 claims description 29
- 239000007791 liquid phase Substances 0.000 claims description 21
- 239000007788 liquid Substances 0.000 claims description 19
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 19
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000012071 phase Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical group CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 4
- 238000006482 condensation reaction Methods 0.000 claims description 3
- 125000005372 silanol group Chemical group 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 29
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 20
- 239000000377 silicon dioxide Substances 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 150000007513 acids Chemical class 0.000 description 8
- 235000019353 potassium silicate Nutrition 0.000 description 8
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000000741 silica gel Substances 0.000 description 6
- 229910002027 silica gel Inorganic materials 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 5
- 230000005484 gravity Effects 0.000 description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 229910021426 porous silicon Inorganic materials 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/124—Preparation of adsorbing porous silica not in gel form and not finely divided, i.e. silicon skeletons, by acidic treatment of siliceous materials
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60028899A JPS61191515A (ja) | 1985-02-16 | 1985-02-16 | 含水珪酸の製造方法 |
| IT19398/86A IT1191978B (it) | 1985-02-16 | 1986-02-13 | Procedimento per produrre acido silicico idrato |
| DE3604732A DE3604732C2 (de) | 1985-02-16 | 1986-02-14 | Verfahren zur Herstellung von wasserhaltiger Kieselsäure |
| NO860560A NO172229C (no) | 1985-02-16 | 1986-02-14 | Fremgangsmaate ved fremstilling av vannholdig kiselsyre |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60028899A JPS61191515A (ja) | 1985-02-16 | 1985-02-16 | 含水珪酸の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61191515A JPS61191515A (ja) | 1986-08-26 |
| JPH0454618B2 true JPH0454618B2 (it) | 1992-08-31 |
Family
ID=12261251
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60028899A Granted JPS61191515A (ja) | 1985-02-16 | 1985-02-16 | 含水珪酸の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS61191515A (it) |
| DE (1) | DE3604732C2 (it) |
| IT (1) | IT1191978B (it) |
| NO (1) | NO172229C (it) |
-
1985
- 1985-02-16 JP JP60028899A patent/JPS61191515A/ja active Granted
-
1986
- 1986-02-13 IT IT19398/86A patent/IT1191978B/it active
- 1986-02-14 NO NO860560A patent/NO172229C/no unknown
- 1986-02-14 DE DE3604732A patent/DE3604732C2/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| IT8619398A0 (it) | 1986-02-13 |
| DE3604732A1 (de) | 1986-08-21 |
| IT1191978B (it) | 1988-03-31 |
| IT8619398A1 (it) | 1987-08-13 |
| NO172229B (no) | 1993-03-15 |
| JPS61191515A (ja) | 1986-08-26 |
| NO860560L (no) | 1986-08-18 |
| DE3604732C2 (de) | 1994-07-28 |
| NO172229C (no) | 1993-06-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |