JPH0451969B2 - - Google Patents

Info

Publication number
JPH0451969B2
JPH0451969B2 JP58029317A JP2931783A JPH0451969B2 JP H0451969 B2 JPH0451969 B2 JP H0451969B2 JP 58029317 A JP58029317 A JP 58029317A JP 2931783 A JP2931783 A JP 2931783A JP H0451969 B2 JPH0451969 B2 JP H0451969B2
Authority
JP
Japan
Prior art keywords
plane
target object
light
photomask
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58029317A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59155919A (ja
Inventor
Mineo Nomoto
Susumu Aiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58029317A priority Critical patent/JPS59155919A/ja
Publication of JPS59155919A publication Critical patent/JPS59155919A/ja
Publication of JPH0451969B2 publication Critical patent/JPH0451969B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58029317A 1983-02-25 1983-02-25 自動焦点合せ方法およびその装置 Granted JPS59155919A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58029317A JPS59155919A (ja) 1983-02-25 1983-02-25 自動焦点合せ方法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58029317A JPS59155919A (ja) 1983-02-25 1983-02-25 自動焦点合せ方法およびその装置

Publications (2)

Publication Number Publication Date
JPS59155919A JPS59155919A (ja) 1984-09-05
JPH0451969B2 true JPH0451969B2 (enrdf_load_stackoverflow) 1992-08-20

Family

ID=12272839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58029317A Granted JPS59155919A (ja) 1983-02-25 1983-02-25 自動焦点合せ方法およびその装置

Country Status (1)

Country Link
JP (1) JPS59155919A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2659704B2 (ja) * 1986-02-26 1997-09-30 株式会社東芝 露光装置
JP4802025B2 (ja) * 2006-03-29 2011-10-26 株式会社ニューフレアテクノロジー 基板のアース機構及び荷電粒子ビーム描画装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2330030A1 (fr) * 1975-10-31 1977-05-27 Thomson Csf Nouvel appareil photorepeteur de masques de haute precision

Also Published As

Publication number Publication date
JPS59155919A (ja) 1984-09-05

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