JPH0448627Y2 - - Google Patents

Info

Publication number
JPH0448627Y2
JPH0448627Y2 JP2368387U JP2368387U JPH0448627Y2 JP H0448627 Y2 JPH0448627 Y2 JP H0448627Y2 JP 2368387 U JP2368387 U JP 2368387U JP 2368387 U JP2368387 U JP 2368387U JP H0448627 Y2 JPH0448627 Y2 JP H0448627Y2
Authority
JP
Japan
Prior art keywords
ion beam
aperture plate
scanning
deflection electrode
blanking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2368387U
Other languages
English (en)
Japanese (ja)
Other versions
JPS63131060U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2368387U priority Critical patent/JPH0448627Y2/ja
Publication of JPS63131060U publication Critical patent/JPS63131060U/ja
Application granted granted Critical
Publication of JPH0448627Y2 publication Critical patent/JPH0448627Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2368387U 1987-02-20 1987-02-20 Expired JPH0448627Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2368387U JPH0448627Y2 (enrdf_load_stackoverflow) 1987-02-20 1987-02-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2368387U JPH0448627Y2 (enrdf_load_stackoverflow) 1987-02-20 1987-02-20

Publications (2)

Publication Number Publication Date
JPS63131060U JPS63131060U (enrdf_load_stackoverflow) 1988-08-26
JPH0448627Y2 true JPH0448627Y2 (enrdf_load_stackoverflow) 1992-11-16

Family

ID=30822212

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2368387U Expired JPH0448627Y2 (enrdf_load_stackoverflow) 1987-02-20 1987-02-20

Country Status (1)

Country Link
JP (1) JPH0448627Y2 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7005657B1 (en) * 2005-02-04 2006-02-28 Varian Semiconductor Equipment Associates, Inc. Wafer-scanning ion implanter having fast beam deflection apparatus for beam glitch recovery
US7361913B2 (en) * 2005-04-02 2008-04-22 Varian Semiconductor Equipment Associates, Inc. Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control

Also Published As

Publication number Publication date
JPS63131060U (enrdf_load_stackoverflow) 1988-08-26

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