JPH0447422B2 - - Google Patents

Info

Publication number
JPH0447422B2
JPH0447422B2 JP57071822A JP7182282A JPH0447422B2 JP H0447422 B2 JPH0447422 B2 JP H0447422B2 JP 57071822 A JP57071822 A JP 57071822A JP 7182282 A JP7182282 A JP 7182282A JP H0447422 B2 JPH0447422 B2 JP H0447422B2
Authority
JP
Japan
Prior art keywords
pulse
pulses
unit
generation circuit
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57071822A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58188043A (ja
Inventor
Kyoshi Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inoue Japax Research Inc
Original Assignee
Inoue Japax Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inoue Japax Research Inc filed Critical Inoue Japax Research Inc
Priority to JP57071822A priority Critical patent/JPS58188043A/ja
Publication of JPS58188043A publication Critical patent/JPS58188043A/ja
Publication of JPH0447422B2 publication Critical patent/JPH0447422B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Beam Exposure (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP57071822A 1982-04-28 1982-04-28 ビ−ム加工装置 Granted JPS58188043A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57071822A JPS58188043A (ja) 1982-04-28 1982-04-28 ビ−ム加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57071822A JPS58188043A (ja) 1982-04-28 1982-04-28 ビ−ム加工装置

Publications (2)

Publication Number Publication Date
JPS58188043A JPS58188043A (ja) 1983-11-02
JPH0447422B2 true JPH0447422B2 (enrdf_load_stackoverflow) 1992-08-03

Family

ID=13471626

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57071822A Granted JPS58188043A (ja) 1982-04-28 1982-04-28 ビ−ム加工装置

Country Status (1)

Country Link
JP (1) JPS58188043A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4796313B2 (ja) * 2005-03-03 2011-10-19 富士通株式会社 カーボンナノチューブの成長方法及びトランジスタ

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5728686A (en) * 1980-07-28 1982-02-16 Daihen Corp Working apparatus by charged particle beam

Also Published As

Publication number Publication date
JPS58188043A (ja) 1983-11-02

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