JPH0444721B2 - - Google Patents
Info
- Publication number
- JPH0444721B2 JPH0444721B2 JP59254590A JP25459084A JPH0444721B2 JP H0444721 B2 JPH0444721 B2 JP H0444721B2 JP 59254590 A JP59254590 A JP 59254590A JP 25459084 A JP25459084 A JP 25459084A JP H0444721 B2 JPH0444721 B2 JP H0444721B2
- Authority
- JP
- Japan
- Prior art keywords
- zinc oxide
- transparent
- film
- aluminum
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 73
- 239000011787 zinc oxide Substances 0.000 claims description 36
- 239000010409 thin film Substances 0.000 claims description 35
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 31
- 229910052782 aluminium Inorganic materials 0.000 claims description 30
- 239000010408 film Substances 0.000 claims description 28
- 230000000903 blocking effect Effects 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 18
- 239000012780 transparent material Substances 0.000 claims description 18
- 230000005540 biological transmission Effects 0.000 claims description 12
- 238000010030 laminating Methods 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229920003023 plastic Polymers 0.000 claims description 4
- 239000002985 plastic film Substances 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 3
- 229920006255 plastic film Polymers 0.000 claims description 3
- 239000012779 reinforcing material Substances 0.000 claims description 2
- 238000010521 absorption reaction Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 239000005357 flat glass Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000000411 transmission spectrum Methods 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000019612 pigmentation Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Optical Filters (AREA)
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は紫外線及び赤外線透過阻止用透明材
料、特に、窓やシヨーウインド等の構造用透明材
料として有用な紫外線及び赤外線阻止用透明材料
に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a transparent material for blocking ultraviolet and infrared rays, particularly to a transparent material for blocking ultraviolet and infrared rays useful as a transparent material for structures such as windows and shutter windows.
（従来の技術）
一般に、家屋やビル等の建築物あるいは自動
車、航空機、電車等の交通機関の窓、又はシヨー
ウイドなどに使用される構造用透明材料として
は、ガラスその他の透明材料が使用されている
が、この種の透明材料は、近紫外域から約4μmの
近赤外域までの電磁波を透過させ、赤外線を殆ど
吸収する性質を持つている。(Prior Art) In general, glass and other transparent materials are used as structural transparent materials used for windows and windows of buildings such as houses and buildings, or transportation systems such as automobiles, airplanes, and trains. However, this type of transparent material has the property of transmitting electromagnetic waves from the near-ultraviolet region to the near-infrared region of about 4 μm, and absorbing most of the infrared rays.
（発明が解決しようとする問題点）
しかしながら、この種の透明材料は紫外線を透
過させるため物体に退色を生じさせ、シヨーウイ
ンドウ内の商品や車内のシートカバー等の価値を
急速に低下させる一方、赤外線の透過や吸収によ
り発熱や温度上昇を引き起こし、炎天下の車内の
温度上昇やビル等の夏季の冷房効果の低下など建
築物設計上の重大な問題となつている。従つて、
これらの問題を解決するには、太陽光の紫外域お
よび赤外域の光線を阻止し、可視光域の光線のみ
を透過する特性をもつものが理想であるが、これ
を現在汎用されている窓用ガラスやプラスチツク
等の透明材料で実現することは不可能である。(Problems to be Solved by the Invention) However, since this type of transparent material transmits ultraviolet rays, it causes discoloration of objects, rapidly reducing the value of products in show windows, seat covers in cars, etc. The transmission and absorption of infrared rays causes heat generation and temperature rise, which has become a serious problem in building design, such as rising temperatures inside cars under the scorching sun and reducing the effectiveness of cooling buildings in the summer. Therefore,
To solve these problems, it would be ideal to have a material that blocks sunlight's ultraviolet and infrared rays and transmits only visible light. This is impossible to achieve with transparent materials such as glass and plastic.
他方、前記要件をある程度満足させる透明材料
としては、酸化インジウム一酸化スズ系透明導電
膜（ITO膜）が知られているが、このITO膜は材
料の本質的な欠陥として、波長約300nm以上を透
過させるため、十分な紫外線阻止特性が得難く、
しかも次のような欠点があるため、航空機の窓用
等の特殊な用途を除き、広く実用に供し難いとい
う問題がある。即ち、
(1) 原材料が高価である。特に、希少金属のイン
ジウムが組成の大部分を占めるため、原材料が
高価な上に資源的にも問題がある。 On the other hand, an indium tin oxide based transparent conductive film (ITO film) is known as a transparent material that satisfies the above requirements to some extent. It is difficult to obtain sufficient ultraviolet blocking properties because of the
Moreover, due to the following drawbacks, it is difficult to put it into practical use in a wide range of applications except for special applications such as aircraft windows. (1) Raw materials are expensive. In particular, since the rare metal indium makes up most of the composition, the raw materials are expensive and there are resource issues.
(2) 赤外線に対して良好な反射特性を得るために
は、製造上300〜600℃程度の高温処理が必要で
ある。(2) In order to obtain good reflection characteristics against infrared rays, high-temperature treatment of approximately 300 to 600°C is required for manufacturing.
(3) 表面の平滑な膜が得難く、膜表面も化学的に
不安定なため、ITO膜上に他の膜を形成する
際、光学的特性が悪影響を受ける場合がある。(3) Since it is difficult to obtain a film with a smooth surface and the film surface is also chemically unstable, optical properties may be adversely affected when other films are formed on the ITO film.
従つて、本発明は、安価に、かつ容易に製造で
き、紫外線及び赤外線の透過を十分に阻止し可視
光のみを透過させる透明材料を得ることを目的と
する。 Therefore, an object of the present invention is to obtain a transparent material that can be manufactured inexpensively and easily, sufficiently blocks the transmission of ultraviolet rays and infrared rays, and transmits only visible light.
（問題点を解決するための手段）
本発明は、前記問題を解決する手段として、透
明基体上に、酸化亜鉛薄膜と亜鉛原子に対し１−
20原子％のアルミニウムを含有するアルミニウム
含有酸化亜鉛薄膜とを積層してなる紫外線及び赤
外線阻止膜を設けるようにしたものである。(Means for Solving the Problems) The present invention provides, as a means for solving the above problems, a thin film of zinc oxide and a zinc atom of 1-1 on a transparent substrate.
An ultraviolet and infrared blocking film is provided by laminating an aluminum-containing zinc oxide thin film containing 20 atom % of aluminum.
即ち、本願発明は、透明基体上に酸化亜鉛薄膜
を形成すると、酸化亜鉛薄膜が紫外線吸収特性を
示すためその透過は阻止できるが、赤外線の吸収
及び透過を阻止できないことに鑑み、種各々研究
した結果、酸化亜鉛にアルミニウムを導入する
と、成膜速度は低下するが、アルミニウムがドナ
ーとして働くため、酸化亜鉛薄膜中の電子密度を
高めることができ、赤外線反射特性を付与するこ
とができるという知見に基づき、アルミニウム含
有酸化亜鉛薄膜を酸化亜鉛薄膜と積層してなる紫
外線及び赤外線阻止膜を透明基体上に設けるよう
にしたものである。 That is, in the present invention, when a zinc oxide thin film is formed on a transparent substrate, since the zinc oxide thin film exhibits ultraviolet absorption characteristics, it can block the transmission of ultraviolet rays, but it cannot block the absorption and transmission of infrared rays, and various researches have been carried out. As a result, we found that when aluminum is introduced into zinc oxide, the film formation rate decreases, but since aluminum acts as a donor, it is possible to increase the electron density in the zinc oxide thin film and impart infrared reflective properties. Based on this, an ultraviolet and infrared blocking film formed by laminating an aluminum-containing zinc oxide thin film and a zinc oxide thin film is provided on a transparent substrate.
本発明に係る透明材料に於ける紫外線及び赤外
線阻止膜は、スパツタ法、真空蒸着法、化学気相
成長法、陽極酸化法など公知の任意の薄膜形成方
法により形成することができる。この紫外線及び
赤外線阻止膜は、前記のように酸化亜鉛薄膜とア
ルミニウム含有酸化亜鉛薄膜との積層体で構成さ
れるが、透明基体上への積層順序は任意に設定で
きる。例えば、比較的肉厚のある透明基体上に酸
化亜鉛薄膜を直接形成した後にアルミニウム含有
酸化亜鉛薄膜を積層することによつて形成しても
良く、あるいはその逆にアルミニウム含有酸化亜
鉛薄膜を形成した後に酸化亜鉛薄膜を積層するこ
とによつて形成するようにしても良い。更に、透
明プラスチツクフイルムの上に前記２層を積層
し、これを他の厚肉の透明材料など透明補強材の
表面に張り付けるようにしても良い。 The ultraviolet and infrared blocking film in the transparent material according to the present invention can be formed by any known thin film forming method such as sputtering, vacuum evaporation, chemical vapor deposition, and anodic oxidation. This ultraviolet and infrared blocking film is composed of a laminate of a zinc oxide thin film and an aluminum-containing zinc oxide thin film as described above, but the order of lamination on the transparent substrate can be set arbitrarily. For example, it may be formed by directly forming a zinc oxide thin film on a relatively thick transparent substrate and then laminating an aluminum-containing zinc oxide thin film, or vice versa. It may be formed by later laminating a zinc oxide thin film. Furthermore, the two layers described above may be laminated on a transparent plastic film, and this may be applied to the surface of a transparent reinforcing material such as another thick transparent material.
透明基体としては、市販のガラスあるいはプラ
スチツク製透明材料等を使用すれば良い。 As the transparent substrate, commercially available transparent materials such as glass or plastic may be used.
また、酸化亜鉛薄膜中にアルミニウムを含有さ
せる方法としては、前記薄膜形成過程で原材料に
アルミニウム金属、酸化物、有機金属およびハロ
ゲン化物等の形態で導入するのが好適であるが、
酸化亜鉛薄膜形成後にアルミニウムを熱拡散させ
ることも可能である。 Further, as a method for incorporating aluminum into the zinc oxide thin film, it is preferable to introduce aluminum in the form of aluminum metal, oxide, organic metal, halide, etc. into the raw material during the thin film formation process.
It is also possible to thermally diffuse aluminum after forming the zinc oxide thin film.
（作用）
酸化亜鉛（ZnO）は、室温で約3.3eVのエネル
ギーギヤツプを持つ直接遷移形半導体で、真性格
子欠陥によるドナー準位により縮退したｎ型半導
体が得られ、比較的容易に結晶質薄膜が形成さ
れ、非常に急峻な紫外線吸収特性を示す。他方、
酸化亜鉛は、その電子密度を1020cm-3のオーダー
より大きくすることは困難であるため、十分な赤
外線反射特性を得ることができないが、これに所
定量のアルミニウムを導入すると、アルミニウム
がドナーとして働き1021cm-3オーダーの電子密度
が実現でき、良好な赤外線反射特性を示すため、
このアルミニウム含有酸化亜鉛薄膜が赤外線の透
過及び吸収を阻止する作用をもたらす。なお、直
接遷移形であつても結晶性の乱れが大きい場合や
非晶質の場合には急峻な紫外線吸収端を得ること
ができない。(Function) Zinc oxide (ZnO) is a direct transition type semiconductor with an energy gap of approximately 3.3 eV at room temperature, and a degenerate n-type semiconductor is obtained by donor levels due to intrinsic lattice defects, and it is relatively easy to crystallize. A thin film is formed and exhibits extremely steep ultraviolet absorption characteristics. On the other hand,
Since it is difficult to increase the electron density of zinc oxide to more than the order of 10 20 cm -3 , it is difficult to obtain sufficient infrared reflection properties. However, when a certain amount of aluminum is introduced into zinc oxide, aluminum becomes a donor. It can achieve an electron density on the order of 10 21 cm -3 and exhibits good infrared reflection characteristics.
This aluminum-containing zinc oxide thin film has the effect of blocking the transmission and absorption of infrared rays. Note that even if it is a direct transition type, it is not possible to obtain a steep ultraviolet absorption edge if the crystallinity is highly disordered or if it is amorphous.
アルミニウム含有酸化亜鉛薄膜中のアルミニウ
ムの含有量を亜鉛原子に対し１−20原子％、好ま
しくは、２−４原子％としたのは、アルミニウム
含有量が１原子％未満では、その添加効果が得ら
れず、20原子％を越えると、結晶性が悪化し、所
望の特性が得られなくなるからである。なお、ア
ルミニウムの含有量は、アルミニウム含有膜の全
構成元素に対し、0.4〜10原子％となる。 The reason why the aluminum content in the aluminum-containing zinc oxide thin film is set to 1-20 atomic %, preferably 2-4 atomic %, based on zinc atoms is that when the aluminum content is less than 1 atomic %, the effect of its addition is not obtained. If the content exceeds 20 atomic %, crystallinity deteriorates and desired characteristics cannot be obtained. Note that the aluminum content is 0.4 to 10 atomic % based on all the constituent elements of the aluminum-containing film.
次に本発明の実施例について説明する。 Next, examples of the present invention will be described.
実施例 １
厚さ２mmの窓ガラスを透明基体として用い、酸
化亜鉛をターゲツトとして室温に保持した透明基
体上に約200nm厚の酸化亜鉛薄膜を高周波マグネ
トロンスパツタリング装置により形成した後、そ
の上にアルミニウムをZn原子に対して、約３原
子％含有するターゲツトを用いてスパツタリング
して約500nm厚のアルミニウム含有酸化亜鉛薄膜
を積層して透明膜を得た。得られた透明膜の光学
的特性を第１図及び第２図に示す。第２図におい
て、実線は透過スペクトルを示し、破線は赤外域
での反射スペクトルを示す。Example 1 Using a window glass with a thickness of 2 mm as a transparent substrate, a zinc oxide thin film with a thickness of about 200 nm was formed on the transparent substrate kept at room temperature using zinc oxide as a target using a high frequency magnetron sputtering device, and then A transparent film was obtained by depositing an aluminum-containing zinc oxide thin film with a thickness of about 500 nm by sputtering using a target containing about 3 atom % of aluminum based on Zn atoms. The optical properties of the obtained transparent film are shown in FIGS. 1 and 2. In FIG. 2, the solid line shows the transmission spectrum, and the broken line shows the reflection spectrum in the infrared region.
第１図及び第２図に示す結果から明らかなよう
に、本発明に係る透明膜は、波長が約390nm以下
の紫外線を完全に吸収または反射し、約900nm以
上の赤外線を殆ど反射するため、急峻な紫外線及
び赤外線透過阻止特性を示す。 As is clear from the results shown in FIGS. 1 and 2, the transparent film according to the present invention completely absorbs or reflects ultraviolet rays with a wavelength of about 390 nm or less, and almost reflects infrared rays with a wavelength of about 900 nm or more. Shows sharp ultraviolet and infrared transmission blocking properties.
この透明膜を形成した窓ガラスを窓にはめ、晴
天の太陽光の照射による温度上昇を測定したとこ
ろ、従来の窓ガラス単体に比べ、温度上昇が著し
く少なく、顕著な赤外線透過防止効果が認められ
た。また、本発明に係る透明膜を形成した窓ガラ
スを透過した太陽光をカラー印刷物及びカラー衣
類に１ケ月にわたつて照射したところ、窓ガラス
単体を透過した太陽光を照射した場合に比べ、色
素の退色が著しく少なく、顕著な紫外線透過防止
効果が認められた。 When we fitted window glass with this transparent film into a window and measured the temperature rise due to irradiation with sunlight on a clear day, we found that the temperature rise was significantly lower than that of conventional window glass alone, and it was found to have a remarkable effect of preventing infrared transmission. Ta. In addition, when colored printed matter and colored clothing were irradiated with sunlight that had passed through a window glass on which the transparent film of the present invention had been formed over a period of one month, it was found that the pigmentation was significantly lower than when sunlight that had passed through a window glass alone was irradiated. The fading of color was significantly reduced, and a remarkable effect of preventing UV transmission was observed.
実施例 ２
透明基体材料として、市販のプラスチツクフイ
ルム（サランラツプ、旭化成(株)製合成樹脂シート
の商品名、厚さ約20μm）を用い、実施例１と同
様にして厚さ100nmの酸化亜鉛薄膜と、アルミニ
ウムを約1.5原子％含有する厚さ約600nmのアル
ミニウム含有酸化亜鉛薄膜を基体上に重ねて形成
した。得られた紫外線及び赤外線阻止用透明膜の
透過スペクトル及び吸収スペクトルは、実施例１
のものとほぼ同様であつた。Example 2 A commercially available plastic film (Saranlap, trade name of synthetic resin sheet manufactured by Asahi Kasei Corporation, thickness approximately 20 μm) was used as the transparent substrate material, and a zinc oxide thin film with a thickness of 100 nm was used in the same manner as in Example 1. , an aluminum-containing zinc oxide thin film with a thickness of about 600 nm containing about 1.5 at% aluminum was formed on the substrate. The transmission spectrum and absorption spectrum of the obtained ultraviolet and infrared blocking transparent film are as shown in Example 1.
It was almost the same as that of .
実施例 ３
透明基体材料として、市販のプラスチツクフイ
ルム（マスター(株)製、厚さ約125μm）を用い、実
施例１と同様にして基体上に厚さ100nmの酸化亜
鉛薄膜を形成した後、その上にアルミニウムを約
1.5原子％含有する厚さ約600nmのアルミニウム
含有酸化亜鉛薄膜を積層して紫外線および赤外線
阻止用透明膜を得た。得られた紫外線及び赤外線
阻止用透明膜は、実施例１のものと同様な透過ス
ペクトル及び吸収スペクトル特性を示した。Example 3 A commercially available plastic film (manufactured by Master Co., Ltd., approximately 125 μm thick) was used as the transparent substrate material, and a zinc oxide thin film with a thickness of 100 nm was formed on the substrate in the same manner as in Example 1. Aluminum on top approx.
A transparent film for blocking ultraviolet and infrared rays was obtained by laminating aluminum-containing zinc oxide thin films with a thickness of about 600 nm containing 1.5 at%. The obtained ultraviolet and infrared blocking transparent film exhibited transmission spectrum and absorption spectrum characteristics similar to those of Example 1.
（発明の効果）
以上の説明から明らかなように、本発明に係る
紫外線及び赤外線阻止膜を設けた構造用透明材料
は、酸化亜鉛薄膜を主原料として採用しているた
め、極めて急峻な紫外線透過阻止特性及び赤外線
透過阻止特性を実現できる。また、原材料の亜鉛
及びアルミニウムはインジウムに比べて極めて安
価であり、資源的にも豊富で、公害を招くことも
極めて少なく、しかも紫外線及び赤外線阻止膜を
構成する酸化亜鉛薄膜とアルミニウム含有酸化亜
鉛薄膜とは、基本的には同一の結晶質酸化亜鉛で
形成されているため、膜中のストレスが少なく良
質の結晶性薄膜が形成され、機械的にも非常に安
定で、製造コストが安価となる。更に、酸化亜鉛
薄膜及びアルミニウム含有酸化亜鉛薄膜共に室温
から150℃程度の低い温度で作成したものでも、
良好な紫外線吸収及び赤外線反射特性が得られる
ので、製造が容易である。また、酸化亜鉛薄膜及
びアルミニウム含有酸化亜鉛薄膜の表面は、極め
て平滑で、かつ薄膜のガラス等の基体に対する付
着力が強く、化学的に、また熱的にも機械的にも
安定であるので、保護膜等の多層コーテイングを
必要とする用途にも最適である。(Effects of the Invention) As is clear from the above explanation, the structural transparent material provided with the ultraviolet and infrared blocking film according to the present invention uses a zinc oxide thin film as the main raw material, and therefore has extremely steep ultraviolet transmission. It is possible to achieve blocking properties and infrared transmission blocking properties. In addition, the raw materials zinc and aluminum are extremely cheap and abundant resources compared to indium, and cause very little pollution. Moreover, the zinc oxide thin film and aluminum-containing zinc oxide thin film that make up the ultraviolet and infrared blocking film Because they are basically made of the same crystalline zinc oxide, a high-quality crystalline thin film is formed with less stress in the film, and is extremely stable mechanically, resulting in low manufacturing costs. . Furthermore, even if both the zinc oxide thin film and the aluminum-containing zinc oxide thin film were created at temperatures as low as 150°C from room temperature,
Since good ultraviolet absorption and infrared reflection properties are obtained, manufacturing is easy. In addition, the surfaces of zinc oxide thin films and aluminum-containing zinc oxide thin films are extremely smooth, have strong adhesion to substrates such as glass, and are chemically, thermally, and mechanically stable. It is also ideal for applications requiring multilayer coatings such as protective films.
第１図は本発明に係る紫外線及び赤外線阻止用
透明膜による透過阻止率と波長との関係を示すグ
ラフ、第２図は本発明に係る紫外線及び赤外線阻
止用透明膜の光学特性を示すグラフである。
FIG. 1 is a graph showing the relationship between the transmission blocking rate and wavelength of the transparent film for blocking ultraviolet rays and infrared rays according to the present invention, and FIG. 2 is a graph showing the optical characteristics of the transparent film for blocking ultraviolet rays and infrared rays according to the present invention. be.
Claims (1)
のアルミニウムを含有するアルミニウム含有酸化
亜鉛薄膜とを積層してなる紫外線及び赤外線阻止
膜を透明基体上に設けたことを特徴とする紫外線
及び赤外線透過阻止用透明材料。 ２ 前記透明基体がガラスからなる特許請求の範
囲第１項記載の透明材料。 ３ 前記透明基体がプラスチツクからなる特許請
求の範囲第１項記載の透明材料。 ４ 前記紫外線及び赤外線阻止膜をプラスチツク
フイルムからなる透明基体上に積層し、該透明基
体を透明補強材に張着してなる特許請求の範囲第
１項記載の透明材料。[Claims] 1. 1-20 atomic % based on zinc oxide thin film and zinc atoms
1. A transparent material for blocking ultraviolet and infrared transmission, characterized in that an ultraviolet and infrared blocking film is provided on a transparent substrate by laminating an aluminum-containing zinc oxide thin film containing aluminum. 2. The transparent material according to claim 1, wherein the transparent substrate is made of glass. 3. The transparent material according to claim 1, wherein the transparent substrate is made of plastic. 4. The transparent material according to claim 1, wherein the ultraviolet and infrared blocking film is laminated on a transparent substrate made of plastic film, and the transparent substrate is adhered to a transparent reinforcing material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25459084A JPS61132902A (en) | 1984-11-30 | 1984-11-30 | Transparent film for blocking ultraviolet ray and infrared ray |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25459084A JPS61132902A (en) | 1984-11-30 | 1984-11-30 | Transparent film for blocking ultraviolet ray and infrared ray |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61132902A JPS61132902A (en) | 1986-06-20 |
| JPH0444721B2 true JPH0444721B2 (en) | 1992-07-22 |
Family
ID=17267153
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25459084A Granted JPS61132902A (en) | 1984-11-30 | 1984-11-30 | Transparent film for blocking ultraviolet ray and infrared ray |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61132902A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2696874B2 (en) * | 1988-02-04 | 1998-01-14 | 株式会社ブリヂストン | Heat shielding material and heat shielding glass |
| JPH01245201A (en) * | 1988-03-28 | 1989-09-29 | Matsushita Electric Works Ltd | Ultraviolet ray cut filter |
| JP2746598B2 (en) * | 1988-04-25 | 1998-05-06 | グンゼ株式会社 | Visible light selective transmission film |
| WO2006117979A1 (en) * | 2005-04-12 | 2006-11-09 | Tokai Kogaku Co., Ltd. | Infrared blocking filter |
| WO2007020729A1 (en) * | 2005-08-18 | 2007-02-22 | Yamanashi University | Process for producing zinc oxide thin-film and production apparatus |
| JP2007065232A (en) * | 2005-08-31 | 2007-03-15 | National Institute Of Advanced Industrial & Technology | Ultraviolet and heat-ray reflection multilayer film |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51107289A (en) * | 1975-03-18 | 1976-09-22 | Kogyo Gijutsuin | Hishotai oyobi ketsushotaikitaihyomenno kodokairyoho |
| JPS51112488A (en) * | 1975-03-28 | 1976-10-04 | Matsushita Electric Ind Co Ltd | Method of producing a zinc oxide film |
| JPS51126384A (en) * | 1975-04-28 | 1976-11-04 | Agency Of Ind Science & Technol | A method of forming a thin film by sputtering |
| JPS5244082A (en) * | 1975-10-01 | 1977-04-06 | Gen Electric | Highly reinforced lamp |
-
1984
- 1984-11-30 JP JP25459084A patent/JPS61132902A/en active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51107289A (en) * | 1975-03-18 | 1976-09-22 | Kogyo Gijutsuin | Hishotai oyobi ketsushotaikitaihyomenno kodokairyoho |
| JPS51112488A (en) * | 1975-03-28 | 1976-10-04 | Matsushita Electric Ind Co Ltd | Method of producing a zinc oxide film |
| JPS51126384A (en) * | 1975-04-28 | 1976-11-04 | Agency Of Ind Science & Technol | A method of forming a thin film by sputtering |
| JPS5244082A (en) * | 1975-10-01 | 1977-04-06 | Gen Electric | Highly reinforced lamp |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61132902A (en) | 1986-06-20 |
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