JPH0443409B2 - - Google Patents

Info

Publication number
JPH0443409B2
JPH0443409B2 JP59163144A JP16314484A JPH0443409B2 JP H0443409 B2 JPH0443409 B2 JP H0443409B2 JP 59163144 A JP59163144 A JP 59163144A JP 16314484 A JP16314484 A JP 16314484A JP H0443409 B2 JPH0443409 B2 JP H0443409B2
Authority
JP
Japan
Prior art keywords
light
reticle
grating
lens system
incident
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59163144A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6141150A (ja
Inventor
Noboru Nomura
Makoto Kato
Ryukichi Matsumura
Midori Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16314484A priority Critical patent/JPS6141150A/ja
Publication of JPS6141150A publication Critical patent/JPS6141150A/ja
Publication of JPH0443409B2 publication Critical patent/JPH0443409B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP16314484A 1984-08-02 1984-08-02 露光装置 Granted JPS6141150A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16314484A JPS6141150A (ja) 1984-08-02 1984-08-02 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16314484A JPS6141150A (ja) 1984-08-02 1984-08-02 露光装置

Publications (2)

Publication Number Publication Date
JPS6141150A JPS6141150A (ja) 1986-02-27
JPH0443409B2 true JPH0443409B2 (enrdf_load_stackoverflow) 1992-07-16

Family

ID=15768050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16314484A Granted JPS6141150A (ja) 1984-08-02 1984-08-02 露光装置

Country Status (1)

Country Link
JP (1) JPS6141150A (enrdf_load_stackoverflow)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947413A (en) * 1988-07-26 1990-08-07 At&T Bell Laboratories Resolution doubling lithography technique
JP2995820B2 (ja) 1990-08-21 1999-12-27 株式会社ニコン 露光方法及び方法，並びにデバイス製造方法
US7656504B1 (en) * 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
JP3245882B2 (ja) * 1990-10-24 2002-01-15 株式会社日立製作所 パターン形成方法、および投影露光装置
US6710855B2 (en) 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US6252647B1 (en) * 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US5673102A (en) * 1991-02-22 1997-09-30 Canon Kabushiki Kaisha Image farming and microdevice manufacturing method and exposure apparatus in which a light source includes four quadrants of predetermined intensity
JPH088749Y2 (ja) * 1991-05-07 1996-03-13 象印マホービン株式会社 液体容器のハンドル取付け構造
US5420417A (en) * 1991-10-08 1995-05-30 Nikon Corporation Projection exposure apparatus with light distribution adjustment
JP3210123B2 (ja) * 1992-03-27 2001-09-17 キヤノン株式会社 結像方法及び該方法を用いたデバイス製造方法
US5446587A (en) * 1992-09-03 1995-08-29 Samsung Electronics Co., Ltd. Projection method and projection system and mask therefor
WO2019130418A1 (ja) * 2017-12-26 2019-07-04 三菱電機株式会社 光パターン生成装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4249366A (en) * 1979-09-11 1981-02-10 Deere & Company Forage harvester header with upper stalk control
JPS57178212A (en) * 1981-04-27 1982-11-02 Nippon Kogaku Kk <Nikon> Microscope optical system

Also Published As

Publication number Publication date
JPS6141150A (ja) 1986-02-27

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