JPH044216A - Novolak resin of phenols and curing agent for epoxy resin - Google Patents
Novolak resin of phenols and curing agent for epoxy resinInfo
- Publication number
- JPH044216A JPH044216A JP10531890A JP10531890A JPH044216A JP H044216 A JPH044216 A JP H044216A JP 10531890 A JP10531890 A JP 10531890A JP 10531890 A JP10531890 A JP 10531890A JP H044216 A JPH044216 A JP H044216A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- epoxy resin
- curing agent
- phenylphenol
- phenols
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920003986 novolac Polymers 0.000 title claims abstract description 23
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 20
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 20
- 229920005989 resin Polymers 0.000 title claims abstract description 17
- 239000011347 resin Substances 0.000 title claims abstract description 17
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 13
- 150000002989 phenols Chemical class 0.000 title abstract 3
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 claims abstract description 20
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 21
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract description 15
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 4
- 239000003377 acid catalyst Substances 0.000 abstract description 4
- 239000002904 solvent Substances 0.000 abstract description 4
- 235000010292 orthophenyl phenol Nutrition 0.000 abstract description 3
- 239000011810 insulating material Substances 0.000 abstract description 2
- 238000002156 mixing Methods 0.000 abstract description 2
- 238000010521 absorption reaction Methods 0.000 description 12
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 229920001568 phenolic resin Polymers 0.000 description 6
- 239000005011 phenolic resin Substances 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical class [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 229930040373 Paraformaldehyde Natural products 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical compound C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000004306 orthophenyl phenol Substances 0.000 description 2
- 229920002866 paraformaldehyde Polymers 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012772 electrical insulation material Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- -1 laminates Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、フェノール類ノボラック樹脂に関するもので
あり、本発明の樹脂はエポキシ樹脂の硬化剤として有用
である。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a phenolic novolak resin, and the resin of the present invention is useful as a curing agent for epoxy resins.
牲
一般にフェノール樹脂は接着へ、耐薬品性、電気特性、
機械特性、耐熱性に優れるため、電気絶縁材料、接着剤
等の硬化剤として広く使われている。In general, phenolic resins are good for adhesion, chemical resistance, electrical properties,
Due to its excellent mechanical properties and heat resistance, it is widely used as a curing agent for electrical insulation materials, adhesives, etc.
とりわけ、ICの封止剤の分野においてはフェノール樹
脂がエポキシ樹脂の硬化剤として用いられている。これ
は、フェノール樹脂が耐熱性及び吸水性の面で、他の硬
化剤よシも有利であることに起因する。Particularly, in the field of IC sealants, phenolic resins are used as curing agents for epoxy resins. This is because phenolic resins are more advantageous than other curing agents in terms of heat resistance and water absorption.
しかしながら、このフェノール樹脂を使用し硬化させた
としても、とりわけ吸水性は未だ充分ではない。However, even if this phenolic resin is used and cured, its water absorption is still insufficient.
すなわち、近年の電子材料の発展にともなう表面実装に
おいて、ハンダ浴中に硬化物が浸漬されるという過酷な
温度条件に耐え得るほどの耐熱性は満足されない。しか
も、・・ンダ浴中では、硬化物中に浸入した水分は爆発
的に蒸発し硬化物の破壊を引き起こす原因となる。従っ
て、硬化物の吸水性を低く抑えることは耐熱性とともに
極めて重要な課題である。That is, in surface mounting accompanying the recent development of electronic materials, heat resistance sufficient to withstand the harsh temperature conditions of immersing the cured product in a solder bath is not satisfied. Moreover, in the nada bath, moisture that has entered the cured product evaporates explosively, causing destruction of the cured product. Therefore, keeping the water absorption of the cured product low is an extremely important issue as well as heat resistance.
本発明者らは、これらの課題を解決する為、鋭意検討し
た結果、フェニルフェノールをノボラック化し−1しか
も低分子量体を少なくしたノボラック樹脂をエポキシ樹
脂の硬化剤として使用することによシ耐熱性と吸水性が
良好なエポキシ樹脂硬化物を得ることができることを見
い出し本発明ε完成するに至った。In order to solve these problems, the present inventors have made intensive studies and found that by converting phenylphenol into a novolak and using a novolac resin with less low molecular weight components as a curing agent for epoxy resin, the heat resistance can be improved. The present inventors have discovered that it is possible to obtain a cured epoxy resin with good water absorption properties, and have completed the present invention.
即ち、本発明は、
一般式[I)
(式中nの平均値は0〜30である。)で表わされるフ
ェニルフェノールノボラック樹脂においてn = Oの
7エニルフエノールノボラツク樹脂の含有量が20重量
%以下であることを特徴とするフェノール類ノボラック
樹脂及びこれからなるエポキシ樹脂用硬化剤に関する。That is, the present invention provides a phenylphenol novolak resin represented by the general formula [I] (in which the average value of n is 0 to 30), in which the content of the 7-enylphenol novolak resin where n = O is 20% by weight. % or less, and a curing agent for epoxy resin made from the same.
本発明のフェノール類ノボラック樹脂は、これをエポキ
シ樹脂の硬化剤として使用した場合従来のフェノール樹
脂をエポキシ樹脂の硬化剤として使用して得られるエポ
キシ樹脂の硬化物に較べて特に、吸水性の面で極めて有
利なエポキシ樹脂硬化物を与える。When the phenolic novolak resin of the present invention is used as a curing agent for epoxy resin, it has a particularly high water absorption property compared to a cured epoxy resin obtained by using conventional phenolic resin as a curing agent for epoxy resin. This provides a highly advantageous cured epoxy resin product.
本発明のフェノール類ノボラック樹脂中のn = Oの
成分は20重量%以下であるが、好ましくは15重量%
以下である。The n = O component in the phenolic novolak resin of the present invention is 20% by weight or less, preferably 15% by weight.
It is as follows.
n=oの成分が20重量%を超えると、官能基数が減少
し、本発明の目的である耐熱性を保持するという意図に
そぐわなくなる。When the content of the component where n=o exceeds 20% by weight, the number of functional groups decreases, which does not meet the objective of the present invention, which is to maintain heat resistance.
又、前記一般式〔I〕で表わされるフェニルフェノール
ノボラック樹脂のnの平均値はO〜30であるが、好ま
しくは2〜20であり、より好ましくは2〜15である
。Further, the average value of n in the phenylphenol novolac resin represented by the general formula [I] is 0 to 30, preferably 2 to 20, and more preferably 2 to 15.
前記一般式〔■〕中のフェニルフェノール成分としてハ
、オルノフェニルフェノール、バラフェニルフェノール
、メタフェニルフェノールが挙げられるが、本発明の低
分子量体を少なくする目的からはオルンフェニルフェノ
ールの使用が好ましい。Examples of the phenylphenol component in the above general formula [■] include ornophenylphenol, paraphenylphenol, and metaphenylphenol, but ornophenylphenol is preferably used for the purpose of reducing the amount of low molecular weight substances in the present invention.
本発明のフェノール類ノボラック樹脂は、たとえば次の
様にして製造することができる。The phenolic novolac resin of the present invention can be produced, for example, in the following manner.
即チ、フェニルフェノール類とホルムアルデヒドを酸触
媒の存在下に脱水縮合させ、低分子量体を熱水によシ抽
出し、低分子量体を除去することによシ得られる。That is, it can be obtained by dehydrating and condensing phenylphenols and formaldehyde in the presence of an acid catalyst, extracting the low molecular weight substances with hot water, and removing the low molecular weight substances.
酸触媒としては、公知の塩酸、硫酸、p−トルエンスル
ホン酸が使用でき、反応はベンゼン、トルエン等の溶媒
中で行うことが好ましい。As the acid catalyst, known hydrochloric acid, sulfuric acid, p-toluenesulfonic acid can be used, and the reaction is preferably carried out in a solvent such as benzene or toluene.
反応温度は50〜100℃の範囲で行うことができる。The reaction temperature can be carried out in the range of 50 to 100°C.
フェニルフェノール類とホルムアルデヒドとの反応量は
フェニルフェノール類1モルに対して、ホルムアルデヒ
ドを05〜10モル比の範囲で使用し、酸触媒はフェニ
ルフェノール類に対して01〜10重量係用いるのが好
ましい。The amount of reaction between phenylphenols and formaldehyde is preferably such that formaldehyde is used in a molar ratio of 05 to 10 per mole of phenylphenols, and the acid catalyst is preferably used in a ratio of 01 to 10 per mole of phenylphenols. .
反応終了後、使用した触媒を水洗等により除去し、溶媒
、フェニルフェノール類を減圧下留去し、更に熱水によ
り低分子量体を除去することにより、本発明のフェノー
ル類ノボラック樹脂を得る。After the reaction is completed, the used catalyst is removed by washing with water or the like, the solvent and phenylphenols are distilled off under reduced pressure, and the low molecular weight substances are further removed with hot water to obtain the phenolic novolak resin of the present invention.
本発明のフェノール類ノボラック樹脂は、耐熱性と、と
りわけ低吸水性が要求される分野、具体的には絶縁材料
、積層板、封止材料等の分野で、クレゾールノボラック
エポキシ樹脂、フェノールノボラックエポキシ樹脂など
のノボラック型エポキシ樹脂、ビスフェノールA型エポ
キシ樹脂などのビスフェノール類エポキシ樹脂等のエポ
キシ樹脂の硬化剤として用いることができる。The phenolic novolak resin of the present invention is used in fields where heat resistance and particularly low water absorption are required, specifically in the fields of insulating materials, laminates, sealing materials, etc. Cresol novolac epoxy resin, phenol novolac epoxy resin It can be used as a curing agent for epoxy resins such as novolac type epoxy resins such as, bisphenol epoxy resins such as bisphenol A type epoxy resins, etc.
以下、本発明を実施例で説明する。 The present invention will be explained below with reference to Examples.
実施例1
温度計、攪拌機を付けたガラス容器にオルソフェニルフ
ェノール170g(1モル)、パラホルムアルデヒド2
4g(o、sモル)及ヒドルエン150−を仕込み、窒
素雰囲気下で浴温80℃で攪拌した。Example 1 170 g (1 mol) of orthophenylphenol and 2 paraformaldehyde were placed in a glass container equipped with a thermometer and a stirrer.
4 g (o, s mol) and 150 mol of hidruene were charged, and the mixture was stirred at a bath temperature of 80° C. under a nitrogen atmosphere.
P−1ル工ンスルホン酸1gを発熱に注意しながら徐々
に添加した。1 g of P-1 sulfonic acid was gradually added while being careful not to generate heat.
添加後、浴温80℃のままで10時間反応を続は反応を
終了した。After the addition, the reaction was continued for 10 hours while keeping the bath temperature at 80°C, and then the reaction was completed.
その後、トルエン300II!/を加え、水で水洗し、
中性に戻した。After that, Toluene 300II! /, wash with water,
Returned to neutral.
有機層を減圧下濃縮し、生成物175gを得た。更に、
得られた生成物を500Q:の熱水で5回洗滌した。こ
の洗滌の間、生成物が出来るだけ分散するよう撹拌しな
がら行ない、デカンテーションによって熱水を排出した
。The organic layer was concentrated under reduced pressure to obtain 175 g of product. Furthermore,
The obtained product was washed five times with 500Q: hot water. During this washing, the product was stirred to disperse it as much as possible, and the hot water was removed by decantation.
この操作によシ得られた生成物(A)の軟化温度(JI
S K2425環球法)は98℃で水酸基当量(g/m
o+ )は180であった。The softening temperature (JI
S K2425 ring and ball method) is the hydroxyl equivalent (g/m
o+) was 180.
実施例2
実施例1において、パラホルムアルデヒドの量を18g
(0,6モル)に代えた以外は、実施例1と同様の操作
により生成物(B)を得た。Example 2 In Example 1, the amount of paraformaldehyde was changed to 18 g.
Product (B) was obtained in the same manner as in Example 1 except that (0.6 mol) was used.
生成物(B)の軟化温度は93℃で、水酸基当量は17
8であった。The softening temperature of the product (B) is 93°C, and the hydroxyl equivalent is 17
It was 8.
実施例3
実施例1において、オルソフェニルフェノールの代)に
バラフェニルフェノールを使用した以外は、実施例1と
同様の操作によシ生酸物(C)を得た。Example 3 A bioacid (C) was obtained in the same manner as in Example 1 except that paraphenylphenol was used in place of orthophenylphenol.
生成物(C)の軟化温度は103℃で、水酸基当量は1
78であった。The softening temperature of the product (C) is 103°C, and the hydroxyl equivalent is 1
It was 78.
比較例
実施例1において、熱水による抽出操作を行なわずに生
成物(D)を得た。Comparative Example In Example 1, product (D) was obtained without performing the extraction operation with hot water.
生成物(D)の軟化温度は90℃で、水酸基当量1i1
78であった。The softening temperature of the product (D) is 90°C, and the hydroxyl equivalent is 1i1
It was 78.
実施例1〜3及び比較例で得られた生成物(A)、CB
>、(C)、(D)をGPC分析した結果、−船蔵〔■
〕で表わされるフェニルフェノールノボランク樹脂中の
n = Oの成分の含有率及びnの平均値は次のとおり
であった。Products (A) and CB obtained in Examples 1 to 3 and Comparative Examples
As a result of GPC analysis of >, (C), and (D), -
] The content of the component n = O in the phenylphenol novolank resin and the average value of n were as follows.
(A)13 4.2
(B) 18 3.
5(C) 18 3
.7(D)25 3.1
なお分析条件は次のとおり。(A) 13 4.2 (B) 18 3.
5(C) 18 3
.. 7(D)25 3.1 The analysis conditions are as follows.
GPC装置:高滓製作所
(fy ラム: TSK−G−3000XL(1本)+
TSK−G−2000XL (2本))
溶 媒:テトラヒドロフラン1−/分
検 出: UV(254nm)
樹脂として市販のオルトクレゾールノボラック型エポキ
シ樹脂(日本化薬■製、EOCN1020、エボ−”f
−シ当量(g/rnol ) 200 、軟化温度67
℃)を、硬化剤として実施例1.2.3で得られた生成
物(A)、(B)、(C)を、硬化促進剤として2−メ
チルイミダゾールを配合して加熱硬化させた。GPC device: Takasugi Seisakusho (fy Ram: TSK-G-3000XL (1 piece) +
TSK-G-2000XL (2 bottles) Solvent: Tetrahydrofuran 1-/min Detection: UV (254 nm) Commercially available ortho-cresol novolac type epoxy resin (manufactured by Nippon Kayaku, EOCN1020, Evo-"f)
- Equivalent (g/rnol) 200, Softening temperature 67
The products (A), (B), and (C) obtained in Example 1.2.3 were blended with 2-methylimidazole as a curing accelerator and heat-cured.
応用比較例として実施例1.2.3で得られた生成物(
A)、(B)、(C)の代りに、第1表に示す配合割合
(重量部)で比較例で得られた生成物(D)、市販のフ
ェノールノボラック樹脂(日本化薬■製、軟化温度85
℃、水酸基当量(g/rnol) 105)を用いて加
熱硬化した。As an applied comparative example, the product obtained in Example 1.2.3 (
Instead of A), (B), and (C), the product (D) obtained in the comparative example at the compounding ratio (parts by weight) shown in Table 1, and a commercially available phenol novolac resin (manufactured by Nippon Kayaku ■, Softening temperature 85
C. and hydroxyl equivalent (g/rnol) 105).
尚、測定試料は、第1表に示す配合量の組成物を70℃
〜80℃で15分間ロール混線後、冷却、粉砕(タブレ
ット化し、更にトランスファー成形機により成形稜、ポ
ストキュアーを行なって作成した。The measurement sample was a composition with the amount shown in Table 1 at 70°C.
After roll mixing at ~80°C for 15 minutes, it was cooled, pulverized (formed into tablets), and further formed into ridges and post-cured using a transfer molding machine.
ポストキュアーの条件
温 度:180℃
時 間二8時間
以上の硬化物についてガラス転移温度(Tg)熱変形温
度(HDT)及び吸水率を測定し、その結果を第1表に
示した。Post-cure conditions Temperature: 180° C. Glass transition temperature (Tg), heat distortion temperature (HDT), and water absorption of the cured product after 28 hours or more were measured, and the results are shown in Table 1.
尚、ガラス転移温度、熱変形温度、吸水率の測定条件は
下記のとお沙。The measurement conditions for glass transition temperature, heat distortion temperature, and water absorption are as follows.
ガラス転移温度
熱機械測定装置(TMA):真空理工■TM−7000
昇温速度;2℃/min
熱変形温度 JIS K7207
吸 水 率 試験片 直径50IIII+厚さ 3m
円板
条件 100℃の水中で50時間煮沸した後の重量増加
量による吸水率(重量%)
〔発明の効果〕
第1表から明らかなように1本発明のフェノール類ノボ
ラック型樹脂は、従来のフェノール樹脂の耐熱性を保持
しながら、低吸水性を実現するエポキシ樹脂硬化物を与
えることから、主にエポキシ樹脂の硬化剤として有用で
あシ、低吸水性を要求される分野での工業的価値が大で
ある。Glass transition temperature thermomechanical measuring device (TMA): Vacuum Riko TM-7000 Heating rate: 2°C/min Heat deformation temperature JIS K7207 Water absorption rate Test piece Diameter 50III + Thickness 3m
Disc conditions Water absorption rate (weight %) based on weight increase after boiling in water at 100°C for 50 hours [Effects of the invention] As is clear from Table 1, the phenolic novolak type resin of the present invention has a Since it provides a cured epoxy resin that achieves low water absorption while retaining the heat resistance of phenolic resin, it is mainly useful as a curing agent for epoxy resins, and is useful in industrial fields where low water absorption is required. Great value.
Claims (2)
てn=0のフェニルフェノールノボラック樹脂の含有量
が20重量%以下であることを特徴とするフェノール類
ノボラック樹脂。(1) General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼[I] (In the formula, the average value of n is 0 to 30.) In the phenylphenol novolac resin, n = 0 phenylphenol A phenolic novolak resin, characterized in that the content of the novolak resin is 20% by weight or less.
らなることを特徴とするエポキシ樹脂用硬化剤。(2) A curing agent for epoxy resin, comprising the phenolic novolac resin according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10531890A JPH044216A (en) | 1990-04-23 | 1990-04-23 | Novolak resin of phenols and curing agent for epoxy resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10531890A JPH044216A (en) | 1990-04-23 | 1990-04-23 | Novolak resin of phenols and curing agent for epoxy resin |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH044216A true JPH044216A (en) | 1992-01-08 |
Family
ID=14404362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10531890A Pending JPH044216A (en) | 1990-04-23 | 1990-04-23 | Novolak resin of phenols and curing agent for epoxy resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH044216A (en) |
-
1990
- 1990-04-23 JP JP10531890A patent/JPH044216A/en active Pending
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