JPH0438466B2 - - Google Patents
Info
- Publication number
- JPH0438466B2 JPH0438466B2 JP62185960A JP18596087A JPH0438466B2 JP H0438466 B2 JPH0438466 B2 JP H0438466B2 JP 62185960 A JP62185960 A JP 62185960A JP 18596087 A JP18596087 A JP 18596087A JP H0438466 B2 JPH0438466 B2 JP H0438466B2
- Authority
- JP
- Japan
- Prior art keywords
- fluorocarbon
- tank
- vapor
- liquefaction
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 88
- 238000004140 cleaning Methods 0.000 claims description 30
- 239000007788 liquid Substances 0.000 claims description 30
- 238000001816 cooling Methods 0.000 claims description 22
- 239000002904 solvent Substances 0.000 claims description 16
- 230000003134 recirculating effect Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000005484 gravity Effects 0.000 description 5
- 239000003507 refrigerant Substances 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 238000003915 air pollution Methods 0.000 description 3
- 238000011038 discontinuous diafiltration by volume reduction Methods 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000007872 degassing Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Coating Apparatus (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【発明の詳細な説明】
(イ) 発明の分野
この発明は、例えばフロン溶剤としてR113（Ｒ
−113にエタノール等を混合した溶剤を含む）を
用い、半導体や電子機器その他のワークを洗浄す
るようなフロン洗浄機に関する。[Detailed Description of the Invention] (a) Field of the Invention This invention relates to R113 (R113) as a fluorocarbon solvent, for example.
-113 (including a solvent mixed with ethanol, etc.) to clean semiconductors, electronic devices, and other workpieces.
(ロ) 発明の背景
従来、上述例の半導体や電子機器その他の各種
ワークの洗浄には、毒性が少なく、化学的にも安
定していて、かつ洗浄物に損傷を与える心配がな
いフロン溶剤、たとえば、R113が用いられてい
る。(b) Background of the Invention Conventionally, for cleaning semiconductors, electronic devices, and other various workpieces as described above, fluorocarbon solvents, which are less toxic, chemically stable, and do not cause damage to the items being cleaned, have been used. For example, R113 is used.
しかし、フロンR113は、その沸騰点が47.6℃
と低いため、洗浄中にフロン蒸気が大気中に流出
することがある。 However, Freon R113 has a boiling point of 47.6℃.
Freon vapor may escape into the atmosphere during cleaning.
このようなフロン蒸気の流出を防止し、同フロ
ン蒸気中より発生したガスを回収するため、従来
においては活性炭（アクテイブカーボン）はハニ
カム状（ハチの巣状）に成形した吸着ロータを有
する活性炭吸着装置などの大型の回収装置が用い
られていたが、管理が煩雑なうえ、コスト高とな
り、加えてフロン洗浄機とのユニツト化が困難と
なる等の諸種の問題点を有していた。 In order to prevent such outflow of fluorocarbon vapor and recover the gas generated from the fluorocarbon vapor, activated carbon has been used as an adsorbent with an adsorption rotor shaped like a honeycomb. Although large-scale recovery devices such as fluorocarbon recovery devices have been used, they have various problems, such as being complicated to manage, high costs, and difficult to integrate into a unit with a fluorocarbon cleaning machine.
(ハ) 発明の目的
この発明は、フロン蒸気中より発生したガスの
回収再利用ができて、フロン溶剤の消費量の低減
を図ると共に、フロンガスによる大気汚染を防止
し、また被洗浄物としてのワークがフロンを持ち
出す持出し量の低減を図り、加えて、洗浄機との
ユニツト化が容易で、装置コストの低減を図るこ
とができるフロン洗浄機の提供を目的とする。(c) Purpose of the invention This invention enables the recovery and reuse of gas generated from fluorocarbon vapor, reduces consumption of fluorocarbon solvents, prevents air pollution caused by fluorocarbon gas, and makes it possible to use the gas as an object to be cleaned. To provide a fluorocarbon cleaning machine which can reduce the amount of fluorocarbons taken out by a workpiece, and can also be easily combined with a cleaning machine to reduce equipment costs.
(ニ) 発明の構成
この発明は、フロン溶剤を貯溜したフロン洗浄
槽の上部に、該フロン洗浄槽の略全長にわたる冷
却手段を配設して、フロン液面と前記冷却手段間
にフロン蒸気層を形成し、前記冷却手段近傍部の
フロン蒸気槽側部に、フロン蒸気を吸引する吸気
ダクトの上端開口部を設け、この吸気ダクトを下
部に設けた液化タンクと連通すると共に、上記液
化タンク内にはフロン蒸気槽より発生したガスを
冷却液化する蒸発器を配設し、かつ液化タンク底
部と上方のフロン洗浄槽との間には、冷却液化し
てタンク内に貯溜されたフロン溶剤をフロン洗浄
槽内に還流するリターン路を形成し、このリター
ン路中にフロン液還流用の液体ポンプを介設した
フロン洗浄機であることを特徴とする。(d) Structure of the Invention The present invention provides a cooling means that extends substantially over the entire length of a fluorocarbon cleaning tank in the upper part of the fluorocarbon cleaning tank that stores a fluorocarbon solvent, thereby creating a fluorocarbon vapor layer between the fluorocarbon liquid surface and the cooling means. An upper end opening of an intake duct for sucking the fluorocarbon vapor is provided on the side of the fluorocarbon vapor tank in the vicinity of the cooling means, and this intake duct communicates with the liquefaction tank provided at the bottom, and the inside of the liquefaction tank is connected to the liquefaction tank. An evaporator is installed to cool and liquefy the gas generated from the fluorocarbon vapor tank, and between the bottom of the liquefaction tank and the upper fluorocarbon cleaning tank, the fluorocarbon solvent that has been cooled and liquefied and stored in the tank is evaporated into fluorocarbons. The fluorocarbon cleaning machine is characterized in that a return path is formed in the cleaning tank, and a liquid pump for refluxing the fluorocarbon liquid is interposed in the return path.
(ホ) 発明の作用
この発明によれば、被洗浄用ワークの移動によ
り、上方に流動して大気中に流出しようとするフ
ロン蒸気中より発生した高濃度のガスは、フロン
蒸気槽の側部に開口した吸気ダクトとから、下方
に位置する液化タンクへの自然流下と、温度差お
よび凝縮液化による体積縮小によつて効率良く吸
引され、流動する。そしてこの吸気ダクトから吸
引されて液化タンクに至つた高濃度のフロン蒸気
は、蒸発器の作用で冷却液化されて液化タンク内
に留められる。(e) Effect of the Invention According to this invention, the highly concentrated gas generated from the fluorocarbon vapor that flows upward and tries to flow out into the atmosphere due to the movement of the workpiece to be cleaned is removed from the side of the fluorocarbon vapor tank. The air is efficiently sucked and flows by natural flow from the air intake duct opened at the bottom to the liquefaction tank located below, and by volume reduction due to temperature difference and condensation and liquefaction. The highly concentrated fluorocarbon vapor that is sucked through the intake duct and reaches the liquefaction tank is cooled and liquefied by the action of the evaporator, and is retained in the liquefaction tank.
この冷却液化され、液化タンク内に留められた
フロン液によつて蒸発器の冷却を促進しながら、
定量ずつ液体ポンプの作用により、リターン路を
介してフロン洗浄槽に還流し、再利用に供され
る。 While promoting the cooling of the evaporator by this cooling liquefied Freon liquid and retained in the liquefaction tank,
By the action of the liquid pump, a fixed amount is returned to the fluorocarbon cleaning tank via the return path, where it is reused.
(ヘ) 発明の効果
この結果、上述のフロン蒸気槽より発生した高
濃度ガスを良好に回収して、再利用に供すること
ができるので、フロン溶剤の消費量の低減を図る
ことができると共に、フロンガスによる大気汚染
を防止することができ、さらに被洗浄物としての
ワークがフロンを持ち出す持出し量を著しく低減
することができる。(f) Effects of the invention As a result, the high concentration gas generated from the above-mentioned fluorocarbon steam tank can be recovered and reused, so it is possible to reduce the amount of fluorocarbon solvent consumed, and Air pollution caused by fluorocarbon gas can be prevented, and the amount of fluorocarbons carried out by the work to be cleaned can be significantly reduced.
また上述の吸気ダクトの開口部を、冷却手段近
傍部のフロン蒸気槽側部に設けるので、フロン洗
浄槽の上面を広く開口したワーク出入口に設定す
ることができる。 Further, since the opening of the above-mentioned air intake duct is provided on the side of the fluorocarbon vapor tank near the cooling means, the upper surface of the fluorocarbon cleaning tank can be set as a widely opened workpiece entrance/exit.
特にフロン洗浄槽内上部の高濃度のフロン蒸気
を、吸気ダクトの上端開口部で吸引し、下方に位
置する液化タンクへと、フロン蒸気の凝縮液化に
よる体積縮小によつて比重が大きくなることに起
因する自然流下作用で、効率良く下方に導き、液
化タンクに至つた高濃度フロン蒸気を、蒸発器で
冷却液化してタンク内に一時貯溜する。そして冷
却液化されたフロン液で蒸発器自体を冷却させ、
この冷却によつて蒸発器自体の冷却が促進され
て、フロン蒸気の液化が効率良く行なわれると共
に、フロン液はリターン通路を介して液体ポンプ
で上方のフロン洗浄槽に還元し、再利用に供する
ことができる。 In particular, the high concentration of fluorocarbon vapor in the upper part of the fluorocarbon cleaning tank is sucked through the upper opening of the intake duct and transferred to the liquefaction tank located below, where the specific gravity increases due to volume reduction due to condensation and liquefaction of the fluorocarbon vapor. The resulting gravity flow efficiently guides the high-concentration CFC vapor downward and reaches the liquefaction tank, where it is cooled and liquefied in the evaporator and temporarily stored in the tank. Then, the evaporator itself is cooled with the cooled Freon liquid,
This cooling promotes the cooling of the evaporator itself, efficiently liquefying the fluorocarbon vapor, and the fluorocarbon liquid is returned to the upper fluorocarbon cleaning tank via the return passage with a liquid pump for reuse. be able to.
(ト) 発明の実施例
この発明の一実施例を以下図面に基づいて詳述
する。(g) Embodiment of the invention An embodiment of the invention will be described in detail below based on the drawings.
図面はフロン超音波洗浄装置を示し、図面にお
いて、上面を広く開口したワーク出入口１を有す
るフロン洗浄槽２を設けている。 The drawing shows a fluorocarbon ultrasonic cleaning device, and in the drawing, a fluorocarbon cleaning tank 2 having a workpiece entrance/exit 1 with a wide upper surface opening is provided.
このフロン洗浄槽２は、内部にヒータ３を配設
した蒸溜槽４と、外部に27〜200KHzの振動周波
数で超音波振動する複数の超音波振動子５……を
１個乃至５個を配設した第１および第２の各超音
波槽６，７と、水分離槽８とを備え、この水分離
槽８と第２超音波槽７との間に脱気槽（蒸気発生
槽）９を配設し、この脱気槽９内には、フロン溶
剤中に混入した空気を加熱脱泡作用により脱気す
る加熱手段としてのヒータ１０を配設している。 This fluorocarbon cleaning tank 2 includes a distillation tank 4 equipped with a heater 3 inside, and a plurality of ultrasonic vibrators 5 that vibrate ultrasonically at a vibration frequency of 27 to 200 KHz outside. A deaeration tank (steam generation tank) 9 is provided between the water separation tank 8 and the second ultrasonic tank 7, and a water separation tank 8. A heater 10 is provided in the degassing tank 9 as a heating means for degassing the air mixed in the fluorocarbon solvent by a heating defoaming action.
上述の各槽４，６，７，９，８はそれぞれ流下
仕切板１１，１２，１３，１４で仕切ると共に、
これら各槽内には化学式CCl2Ｆ・CClF2で示され
るフロン溶剤としてのR113（化学名１，１，２−
トリクロル−１，２，２−トリフルオルエタン）
を貯溜している。 Each of the above-mentioned tanks 4, 6, 7, 9, 8 is partitioned by downstream partition plates 11, 12, 13, 14, respectively, and
Inside each of these tanks is R113 (chemical name 1,1,2-
trichloro-1,2,2-trifluoroethane)
is accumulating.
また前述の水分離槽８の上部に凝縮コイル１５
を配置すると共に、フロン洗浄槽２の上部には、
同槽２の略全長にわたる冷却手段１６を水平に配
設している。 In addition, a condensing coil 15 is installed above the water separation tank 8.
In addition, at the top of the Freon cleaning tank 2,
A cooling means 16 extending substantially over the entire length of the tank 2 is arranged horizontally.
この冷却手段１６としては、例えば冷却コイ
ル、冷却ジヤケツト等を用い、その冷却源として
は冷媒による冷凍装置やチラー（冷水発生装置）
を用いることができる。つまり、冷却手段１６と
して冷却パイプを用いる際にはパイプ表面温度を
約12℃〜０℃に保温する構造であればよい。 As the cooling means 16, for example, a cooling coil, a cooling jacket, etc. are used, and the cooling source is a refrigeration device using a refrigerant or a chiller (chilled water generator).
can be used. That is, when a cooling pipe is used as the cooling means 16, it is sufficient to have a structure that keeps the pipe surface temperature at about 12°C to 0°C.
上述の冷却手段１６と各槽４，６，７，９，８
内のR113液面との間にはフロン蒸気槽１７を形
成する。 The above-mentioned cooling means 16 and each tank 4, 6, 7, 9, 8
A fluorocarbon vapor tank 17 is formed between the inner R113 liquid level and the R113 liquid level.
また上述の各槽４，６，７，９，８の下部に
は、それぞれドレン用のバルブ１８……を取付け
ている。 Furthermore, drain valves 18 are attached to the lower portions of the above-mentioned tanks 4, 6, 7, 9, and 8, respectively.
ところで、前述の第１超音波槽６の下部には、
同槽６内のフロン溶剤R113を所定温度たとえば
20℃以下、望ましくは10〜15℃に保持するための
循環系１９を取付けている。 By the way, in the lower part of the first ultrasonic tank 6 mentioned above,
The fluorocarbon solvent R113 in the same tank 6 is heated to a predetermined temperature, for example.
A circulation system 19 is installed to maintain the temperature below 20°C, preferably between 10 and 15°C.
この循環系１９は、出口ポート２０にバルブ２
１を介設したライン２２を接続し、このライン２
２を循環ポンプ２３の吸入側に接続し、かつ上述
の循環ポンプ２３の吐出側にはバルブ２４を介し
てフイルタ２５を接続すると共に、このフイルタ
２５の出口側と、入口ポート２６との間には、４
つのライン２７，２８，２９，３０を並列接続し
ている。 This circulation system 19 has a valve 2 at an outlet port 20.
Connect line 22 with 1 interposed, and connect this line 2
2 is connected to the suction side of the circulation pump 23, and a filter 25 is connected to the discharge side of the circulation pump 23 through the valve 24, and a filter 25 is connected between the outlet side of the filter 25 and the inlet port 26. is 4
Three lines 27, 28, 29, and 30 are connected in parallel.
上述の４つのライン２７，２８，２９，３０の
うち、第１ライン２７は、電磁弁３１と熱交換器
３２とを直接接続して構成し、第２ライン２８は
電磁弁３３と熱交換器３４とを直列接続して構成
し、第３ライン２９はバルブ３５と熱交換器３６
とを直列接続して構成し、第４ライン３０はバル
ブ３７を介設して構成している。 Among the four lines 27, 28, 29, and 30 described above, the first line 27 is configured by directly connecting the solenoid valve 31 and the heat exchanger 32, and the second line 28 is configured by directly connecting the solenoid valve 33 and the heat exchanger 32. The third line 29 connects the valve 35 and the heat exchanger 36 in series.
The fourth line 30 is constructed by connecting them in series, and the fourth line 30 is constructed by interposing a valve 37.
そして、この循環系１９は温度センサ（図示せ
ず）によりライン２２内のR113の液温を検知し、
この検知出力に基づいて適宜駆動制御される。 Then, this circulation system 19 detects the liquid temperature of R113 in the line 22 with a temperature sensor (not shown),
Drive control is performed as appropriate based on this detection output.
同様に、前述の第２超音波槽７の下部にも、同
槽７内のフロン溶剤R113を所定温度に保持する
ための循環系３８を取付けている。 Similarly, a circulation system 38 for maintaining the fluorocarbon solvent R113 in the second ultrasonic tank 7 at a predetermined temperature is also installed at the bottom of the second ultrasonic tank 7 described above.
この循環系３８は、出口ポート３９にバルブ４
０を介設したライン４１を接続し、このライン４
１を循環ポンプ４２の吸入側に接続し、かつ上述
の循環ポンプ４２の吐出側にはバルブ４３を介し
てフイルタ４４を接続すると共に、このフイルタ
４４の出口側と、入口ポート４５との間には、バ
ルブ４６を有するライン４７と、バルブ４８およ
び熱交換器４９を直列接続したライン５０とを並
列に接続して構成する。 This circulation system 38 has a valve 4 at an outlet port 39.
0 is connected to the line 41, and this line 4
1 is connected to the suction side of the circulation pump 42, and a filter 44 is connected to the discharge side of the circulation pump 42 through a valve 43, and a filter 44 is connected between the outlet side of the filter 44 and the inlet port 45. is constructed by connecting in parallel a line 47 having a valve 46 and a line 50 having a valve 48 and a heat exchanger 49 connected in series.
この循環系３８も、前述の循環系１９と同様
に、温度センサ（図示せず）によりR113の液温
を検知し、この検知出力に基づいて適宜駆動制御
される。 Similar to the above-mentioned circulation system 19, this circulation system 38 also detects the liquid temperature of R113 by a temperature sensor (not shown), and is appropriately driven and controlled based on this detection output.
ところで、前述のフロン洗浄槽２におけるフロ
ン蒸気層１７の側部、詳しくは前述の冷却手段１
６配設位置の近傍部には、フロン蒸気を温度差と
比重により吸引する吸気ダクト５１の上端開口部
５２を臨ませている。 By the way, the side part of the fluorocarbon vapor layer 17 in the above-mentioned fluorocarbon cleaning tank 2, specifically the above-mentioned cooling means 1
An upper end opening 52 of an air intake duct 51 that draws in fluorocarbon vapor based on the temperature difference and specific gravity is exposed near the 6 arrangement position.
この吸気ダクト５１は、下部に設けた液化タン
ク５３に連通させると共に、この液化タンク５３
内には後述する冷凍機５４の蒸発器５５、いわゆ
るエバポレータを配設している。 The intake duct 51 communicates with a liquefaction tank 53 provided at the bottom, and the liquefaction tank 53
An evaporator 55 of a refrigerator 54 (described later), a so-called evaporator, is disposed inside.
また上述の液化タンク５３の下部にはドレン用
のバルブ５６を取付けると共に、この液化タンク
５３底部と水分離槽８上部との間には、蒸発器５
５で冷却液化され、液体タンク５３内に一時貯溜
されたフロン溶剤を還流するリターン路５７を形
成し、このリターン路５７にはフロン液還流用の
液体ポンプ５８を介設している。 In addition, a drain valve 56 is installed at the bottom of the liquefaction tank 53, and an evaporator 5 is installed between the bottom of the liquefaction tank 53 and the top of the water separation tank 8.
A return path 57 is formed for refluxing the fluorocarbon solvent which has been cooled and liquefied in step 5 and temporarily stored in the liquid tank 53, and a liquid pump 58 for refluxing the fluorocarbon liquid is interposed in the return path 57.
ここで、上述の冷凍機５４はフロンＲ−11，Ｒ
−12，Ｒ−22等の冷媒を用いる冷凍機で、この冷
凍機５４は圧縮機５９の吐出側に凝縮器６０、受
液器６１、液電磁弁６２、膨張機構としての膨張
弁６３を介して前述の蒸発器５５を接続し、この
蒸発器５５の後位をアキユームレータ６４を介し
て圧縮機５９の吸引側に接続した冷凍サイクルで
ある。 Here, the above-mentioned refrigerator 54 has Freon R-11, R
This refrigerator 54 uses a refrigerant such as -12 or R-22, and the refrigerator 54 has a condenser 60, a liquid receiver 61, a liquid electromagnetic valve 62, and an expansion valve 63 as an expansion mechanism on the discharge side of a compressor 59. This is a refrigerating cycle in which the evaporator 55 described above is connected to the evaporator 55, and the rear part of the evaporator 55 is connected to the suction side of a compressor 59 via an accumulator 64.
そして、上述の冷凍機５４は周知の如く、圧縮
機５９の駆動により、同圧縮機５９で圧縮され高
圧となつた冷媒が、凝縮器６０に送られ、ここで
液化して受液器６１に至つた後に、この高圧冷媒
液は液電磁弁６２を介して膨張弁６３に導びか
れ、この弁６３で絞り膨張されて低圧となつた冷
媒は蒸発器５５内に入り、周囲より熱を奪つて蒸
発して蒸発ガスとなり、アキユムレータ６４を介
して再び圧縮機５９に吸い込まれる。 As is well known in the above-mentioned refrigerator 54, when the compressor 59 is driven, the refrigerant compressed by the compressor 59 and made high pressure is sent to the condenser 60, where it is liquefied and sent to the liquid receiver 61. After that, this high-pressure refrigerant liquid is led to an expansion valve 63 via a liquid electromagnetic valve 62, and the refrigerant, which is throttled and expanded by this valve 63 and has a low pressure, enters the evaporator 55 and removes heat from the surroundings. It evaporates into vaporized gas, which is sucked into the compressor 59 again via the accumulator 64.
上述の冷凍機５４は液化タンク５３に配設した
温度センサ（図示せず）により駆動制御され、こ
の冷凍機５４のうち、被冷却体より熱を奪い取る
蒸発器５５の作用で、液化タンク５３内のフロン
蒸気を例えば−20〜−30℃に冷却してフロン液に
すると同時に、冷却されたフロン液により蒸発器
５５を冷却して、液化効率を高める。 The above-mentioned refrigerator 54 is driven and controlled by a temperature sensor (not shown) provided in the liquefaction tank 53, and the inside of the liquefaction tank 53 is controlled by the action of the evaporator 55, which removes heat from the object to be cooled. The fluorocarbon vapor is cooled to, for example, -20 to -30°C to form a fluorocarbon liquid, and at the same time, the evaporator 55 is cooled by the cooled fluorocarbon liquid to improve liquefaction efficiency.
図示実施例は上記の如く構成するものにして、
以下作用を説明する。 The illustrated embodiment is configured as described above,
The action will be explained below.
いま前述の蒸溜槽４に介設したヒータ３に通電
すると、R113が加熱され、液面と冷却手段１６
との間には前述のフロン蒸気層１７が形成され
る。 When the heater 3 installed in the distillation tank 4 is energized, R113 is heated, and the liquid level and the cooling means 16 are heated.
The aforementioned fluorocarbon vapor layer 17 is formed between the two.
そこで、前述のワーク出入口１からフロン蒸気
層１７を介して被洗浄物としてのワークを第１、
第２の各超音波槽６，７に順次浸漬操作すると、
このワークの超音波洗浄が行なわれ、かつワーク
を取出すとき、同ワークはフロン蒸気層のフロン
蒸気により蒸気洗浄および加熱されて乾燥時間の
短縮を図る。 Therefore, the workpiece to be cleaned is passed from the workpiece inlet/outlet 1 through the fluorocarbon vapor layer 17 to the first
When immersed in the second ultrasonic baths 6 and 7 in sequence,
This workpiece is subjected to ultrasonic cleaning, and when the workpiece is taken out, the workpiece is steam cleaned and heated by the fluorocarbon vapor in the fluorocarbon vapor layer, thereby shortening the drying time.
ところで、上述のワークの上方への移動時にフ
ロン蒸気槽より発生したガスは、上方へ流動して
大気中に流出しようとするが、このフロン蒸気中
より発生したガスは47.6℃と−20〜−30℃との温
度差に起因し、凝縮液化による体積縮小によつて
比重が大きくなり、吸気ダクト５１の上端開口部
５２から矢印で示すように、自然に下方に流下
し、効率良く吸込まれる。 By the way, the gas generated from the fluorocarbon vapor tank during the above-mentioned upward movement of the workpiece flows upward and tries to flow out into the atmosphere, but the gas generated from this fluorocarbon vapor has a temperature of 47.6℃ and -20 to - Due to the temperature difference from 30°C, the specific gravity increases due to volume reduction due to condensation and liquefaction, and as shown by the arrow from the upper end opening 52 of the intake duct 51, it naturally flows downward and is efficiently sucked in. .
そして、この吸気ダクト５１から液化タンク５
３に流下した濃度の濃いフロン蒸気は、蒸発器５
５の作用によつて冷却されて液化される。 Then, from this intake duct 51 to the liquefaction tank 5
The highly concentrated fluorocarbon vapor flowing down to evaporator 5
It is cooled and liquefied by the action of step 5.
この液化されたフロン液は、液化タンク５３内
の一時貯溜されて蒸発器５５を冷却するが、この
フロン液を液体ポンプ５８の駆動により、リター
ン路５７を介して上方の水分離槽８内に還流し、
再利用に供される。 This liquefied fluorocarbon liquid is temporarily stored in the liquefaction tank 53 and cools the evaporator 55, but this fluorocarbon liquid is pumped into the upper water separation tank 8 through the return path 57 by driving the liquid pump 58. Reflux,
Provided for reuse.
このように、上述のフロン蒸気中より発生した
ガスを良好に回収して、再利用に供することがで
きるので、フロン溶剤R113の消費量の低減を図
ることができると共に、フロンガスによる大気汚
染を防止することができ、しかも被洗浄物として
のワークがフロンを持ち出す持出し量の低減を図
ることができる。 In this way, the gas generated from the fluorocarbon vapor mentioned above can be effectively recovered and reused, making it possible to reduce the amount of fluorocarbon solvent R113 consumed and preventing air pollution caused by fluorocarbon gas. Moreover, it is possible to reduce the amount of Freon carried out by the work as the object to be cleaned.
また上述の吸気ダクト５１の開口部５２をフロ
ン蒸気層１７側部に設けるので、フロン洗浄槽２
の上面を広く開口したワーク出入口１に設定する
ことができて、ワークの出し入れに支承をきたさ
ない。 Furthermore, since the opening 52 of the intake duct 51 described above is provided on the side of the fluorocarbon vapor layer 17, the fluorocarbon cleaning tank 2
The workpiece entrance/exit 1 can be set with a wide upper surface opening, and the workpieces can be taken in and taken out without any support.
さらに上述の吸気ダクト５１は、上方に開口部
５２を設け、下方に蒸発器５５を内蔵した液化タ
ンク５３としているので、フロン蒸気の吸引は、
温度差、換言すれば比重差および凝縮液化による
体積の縮小による吸引となるから、何等特別な吸
引駆動手段を必要とせず、自然に下方に流下し、
効率良く吸引液化が行なえる。 Furthermore, since the above-mentioned intake duct 51 has an opening 52 at the top and a liquefaction tank 53 with a built-in evaporator 55 at the bottom, the fluorocarbon vapor can be sucked.
Since the suction is caused by the difference in temperature, in other words, the difference in specific gravity and the reduction in volume due to condensation and liquefaction, it naturally flows downward without the need for any special suction driving means.
Suction and liquefaction can be performed efficiently.
加えて、簡単な装置および配管としての吸気ダ
クト５１等の付加により、前述のフロン洗浄槽２
に容易に取付けることができるので、全体を一体
ユニツト化することができる。 In addition, by adding a simple device and an intake duct 51 etc. as piping, the above-mentioned fluorocarbon cleaning tank 2
Since it can be easily attached to the machine, the whole can be integrated into an integrated unit.
この発明の構成と、上述の実施例との対応にお
いて、
この発明のフロン洗浄機は、実施例のフロン超
音波洗浄装置に対応し、
以下同様に、
フロン溶剤は、フロンR113に対応するも、
この発明は上述の実施例の構成のみに限定され
るものではない。 In terms of the correspondence between the structure of the present invention and the above-described embodiments, the fluorocarbon cleaning machine of the present invention corresponds to the fluorocarbon ultrasonic cleaning device of the embodiment, and similarly, the fluorocarbon solvent corresponds to fluorocarbon R113. The present invention is not limited to the configuration of the above-described embodiment.
例えば、上述のフロンＲ−113にエタノールを
４重量％混合した混合溶剤やフロンＲ−113にエ
チレンクロライドを50重量％混合した混合溶剤等
を洗浄用途に応じて用いることは勿論である。つ
まりフロンＲ−113をベースにしたその他のフロ
ン溶剤であつてもよいことは云うまでもない。 For example, it goes without saying that a mixed solvent in which 4% by weight of ethanol is mixed with the above-mentioned Freon R-113 or a mixed solvent in which 50% by weight of ethylene chloride is mixed in with Freon R-113 may be used depending on the cleaning purpose. In other words, it goes without saying that other fluorocarbon solvents based on Freon R-113 may be used.
図面はこの発明の一実施例を示すフロン超音波
洗浄装置の系統図である。
２……フロン洗浄槽、１７……フロン蒸気層、
５１……吸気ダクト、５３……液化タンク、５５
……蒸発器、５７……リターン路、５８……液体
ポンプ。
The drawing is a system diagram of an ultrasonic fluorocarbon cleaning device showing an embodiment of the present invention. 2...Freon cleaning tank, 17...Freon vapor layer,
51...Intake duct, 53...Liquification tank, 55
...Evaporator, 57...Return path, 58...Liquid pump.
Claims (1)
に、該フロン洗浄槽の略全長にわたる冷却手段１
６を配設して、フロン液面と前記冷却手段間にフ
ロン蒸気層１７を形成し、 前記冷却手段１６近傍部のフロン蒸気槽側部
に、フロン蒸気を吸引する吸気ダクト５１の上端
開口部５２を設け、この吸気ダクト５１を下部に
設けた液化タンク５３と連通すると共に、 上記液化タンク内にはフロン蒸気槽より発生し
たガスを冷却液化する蒸発器５５を配設し、 かつ液化タンク底部と上方のフロン洗浄槽との
間には、冷却液化してタンク内に貯溜されたフロ
ン溶剤をフロン洗浄槽内に還流するリターン路５
７を形成し、 このリターン路５７中にフロン液還流用の液体
ポンプを介設した フロン洗浄機。[Scope of Claims] 1. Cooling means 1 is provided at the upper part of a fluorocarbon cleaning tank 2 that stores a fluorocarbon solvent and extends over substantially the entire length of the fluorocarbon cleaning tank.
6 to form a fluorocarbon vapor layer 17 between the fluorocarbon liquid level and the cooling means, and an upper end opening of an intake duct 51 for sucking fluorocarbon vapor into the side of the fluorocarbon vapor tank near the cooling means 16. 52 is provided, and this intake duct 51 communicates with a liquefaction tank 53 provided at the bottom, and an evaporator 55 for cooling and liquefying the gas generated from the fluorocarbon vapor tank is disposed within the liquefaction tank, and at the bottom of the liquefaction tank. A return path 5 is provided between the fluorocarbon cleaning tank and the upper fluorocarbon cleaning tank, through which the fluorocarbon solvent that has been cooled and liquefied and stored in the tank is returned to the fluorocarbon cleaning tank.
7, and a fluorocarbon cleaning machine in which a liquid pump for recirculating the fluorocarbon liquid is interposed in the return path 57.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18596087A JPS6430685A (en) | 1987-07-24 | 1987-07-24 | Fleon washer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18596087A JPS6430685A (en) | 1987-07-24 | 1987-07-24 | Fleon washer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6430685A JPS6430685A (en) | 1989-02-01 |
| JPH0438466B2 true JPH0438466B2 (en) | 1992-06-24 |
Family
ID=16179889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18596087A Granted JPS6430685A (en) | 1987-07-24 | 1987-07-24 | Fleon washer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6430685A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102022208975A1 (en) | 2021-09-03 | 2023-03-09 | Okuma Corporation | Accuracy analysis system for a machine tool |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2833893B2 (en) * | 1991-11-20 | 1998-12-09 | 山口日本電気株式会社 | Cleaning equipment |
| CN103084352B (en) * | 2012-12-10 | 2015-09-30 | 周庆芬 | A kind of cleaning device |
| JP6979244B1 (en) * | 2021-05-21 | 2021-12-08 | ジャパン・フィールド株式会社 | Cleaning equipment |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63184336A (en) * | 1987-01-26 | 1988-07-29 | Nec Corp | Washer |
-
1987
- 1987-07-24 JP JP18596087A patent/JPS6430685A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63184336A (en) * | 1987-01-26 | 1988-07-29 | Nec Corp | Washer |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102022208975A1 (en) | 2021-09-03 | 2023-03-09 | Okuma Corporation | Accuracy analysis system for a machine tool |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6430685A (en) | 1989-02-01 |
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