JPS63184336A - Washer - Google Patents
WasherInfo
- Publication number
- JPS63184336A JPS63184336A JP1651087A JP1651087A JPS63184336A JP S63184336 A JPS63184336 A JP S63184336A JP 1651087 A JP1651087 A JP 1651087A JP 1651087 A JP1651087 A JP 1651087A JP S63184336 A JPS63184336 A JP S63184336A
- Authority
- JP
- Japan
- Prior art keywords
- chemical
- tank
- vapor
- chemicals
- condensing mechanism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000126 substance Substances 0.000 claims abstract description 77
- 238000011084 recovery Methods 0.000 claims abstract description 7
- 239000007788 liquid Substances 0.000 claims description 27
- 238000004140 cleaning Methods 0.000 claims description 7
- 230000008016 vaporization Effects 0.000 claims 1
- 239000000498 cooling water Substances 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 238000001816 cooling Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 9
- 238000009833 condensation Methods 0.000 description 7
- 230000005494 condensation Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 3
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 231100000481 chemical toxicant Toxicity 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000008155 medical solution Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体製造装置に関し、特に薬液蒸気を用いて
被洗浄物を洗浄・乾燥する洗浄装置の改良に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to semiconductor manufacturing equipment, and more particularly to improvements in cleaning equipment that cleans and dries objects to be cleaned using chemical vapor.
第３図に従来の洗浄装置の断面図を示す。この種の洗浄
装置は、冷却水通路４をもつ薬液蒸気を凝縮・液化する
薬液蒸気凝縮機構５（以下、凝縮機構と称す）を薬液槽
１内の上部に具備しており、そこで凝縮・液化された薬
液を直接槽内に回収している。従って、薬液槽上方にあ
る排気ダクト７に通じる排気口６に残留蒸気として排気
される薬液については全く回収を行なっていない。被洗
浄物は、凝縮機構５の下方で、かつ薬液３に接触しない
位置で、薬液加熱用ヒータ２によって発生した薬液蒸気
で洗浄された後、上方へ移動する。被洗浄物表面に残っ
た薬液は凝縮機構５の薬液蒸気凝縮区間で凝縮・液化さ
れ、被洗浄物表面をったって下刃に落下し、被洗浄物が
乾燥する。FIG. 3 shows a sectional view of a conventional cleaning device. This type of cleaning device is equipped with a chemical vapor condensing mechanism 5 (hereinafter referred to as a condensing mechanism) that condenses and liquefies the chemical vapor having a cooling water passage 4 in the upper part of the chemical tank 1. The chemical solution is collected directly into the tank. Therefore, the chemical solution exhausted as residual vapor through the exhaust port 6 leading to the exhaust duct 7 located above the chemical solution tank is not recovered at all. The object to be cleaned is cleaned with the chemical liquid vapor generated by the chemical liquid heater 2 below the condensing mechanism 5 and at a position where it does not come into contact with the chemical liquid 3, and then moves upward. The chemical solution remaining on the surface of the object to be cleaned is condensed and liquefied in the chemical vapor condensing section of the condensing mechanism 5, and falls along the surface of the object to be cleaned onto the lower blade, thereby drying the object.
・ 上述した従来の洗浄装置の凝縮機構は、薬液槽内
で薬液蒸気を凝縮し、槽内に直接回収するだけで、残留
蒸気として排気される薬液の回収は行なっていないため
、特に、未処理時の薬液消費量が多いという欠点がある
。- The condensation mechanism of the conventional cleaning equipment described above only condenses chemical vapor in the chemical tank and collects it directly into the tank, but does not collect the chemical that is exhausted as residual vapor. The disadvantage is that the amount of chemical liquid consumed during treatment is large.
本発明の洗浄装置は、薬液槽内にある凝縮機構とは別に
、排気ダクトの途中にも残留薬液蒸気を薬液槽に回収す
るための回収装置を備えている。The cleaning device of the present invention includes, in addition to the condensing mechanism in the chemical tank, a recovery device located in the middle of the exhaust duct for recovering residual chemical vapor into the chemical tank.
〔実施例」 次に、本発明について図面を参照して説明をする。〔Example" Next, the present invention will be explained with reference to the drawings.
第１図は本発明の実施例１の断面図である。薬液槽１は
その底部に薬液加熱用ヒータ２を有し、このヒータを用
いて槽内下部罠貯溜されている薬液３を加熱することに
よって薬液の蒸気を発生させる。槽上部には槽内壁に沼
って数本の冷却水通［４を持つ凝縮機構５を有しており
、これによって余分に発生した薬液蒸気を冷却・凝縮し
、再び直接槽内に回収する。凝縮機構５の更に上方に排
気口６があり、これで残留薬液蒸気を含んだ雰囲気を排
気する。更に、排気ダクト７の途中に、薬液槽内の凝縮
機構５によって完全に回収出来なかった薬液蒸気を回収
するための排気系凝縮機構８を有し、ここで凝縮された
薬液は、薬液回収通路９を通って、薬液槽内に回収され
る。排気系凝縮機構８は、薬液槽内にある凝縮機構５と
同様に冷却水通路１０によって構成されている。FIG. 1 is a sectional view of Embodiment 1 of the present invention. The chemical liquid tank 1 has a chemical liquid heating heater 2 at its bottom, and this heater is used to heat the chemical liquid 3 stored in a trap at the bottom of the tank, thereby generating vapor of the chemical liquid. The upper part of the tank has a condensing mechanism 5 with several cooling water passages [4] running through the inner wall of the tank, which cools and condenses the excess chemical vapor and collects it directly into the tank again. . Further above the condensing mechanism 5 is an exhaust port 6, which exhausts the atmosphere containing the residual chemical vapor. Further, in the middle of the exhaust duct 7, there is an exhaust system condensing mechanism 8 for recovering the chemical vapor that could not be completely recovered by the condensing mechanism 5 in the chemical tank, and the chemical liquid condensed here is passed through the chemical liquid recovery passage. 9 and is collected into a chemical tank. The exhaust system condensation mechanism 8 is constituted by a cooling water passage 10 similarly to the condensation mechanism 5 in the chemical tank.
例えば、薬液とじ℃イソグロビルアルコール（沸点：８
２．７°０）、トリクロルエチレン（沸点二８７°Ｃ）
等を用い、排気系凝縮機構８の冷却水温度を１０〜１５
℃とした場合、本発明の排気系凝縮機構の設置により、
排気されていた薬液蒸気の４０〜５０％が回収可能とな
る。また、トリクロルエチレン等のように腐食性の薬液
を使用する場合、排気系凝縮機構により（ロ）収される
薬液蒸気が増えることで排気ダクト内の薬液蒸気濃度が
低下するため、排気ダクトの腐食を防止出来る効果があ
る。又有毒な薬液を使用する場合にも排気ダクト内の薬
液蒸気濃度が低下するために、中和処理に要する費用を
大幅に低減することが出来る。For example, when the chemical solution is stored at ℃ isoglobil alcohol (boiling point: 8
2.7°0), trichlorethylene (boiling point 287°C)
etc., to set the cooling water temperature of the exhaust system condensing mechanism 8 to 10 to 15.
℃, by installing the exhaust system condensation mechanism of the present invention,
40 to 50% of the chemical vapor that was being exhausted can be recovered. In addition, when using corrosive chemicals such as trichlorethylene, the concentration of chemical vapor in the exhaust duct decreases due to an increase in the amount of chemical vapor collected by the exhaust system condensation mechanism, causing corrosion of the exhaust duct. It has the effect of preventing Furthermore, even when a toxic chemical is used, the concentration of chemical vapor in the exhaust duct is reduced, so the cost required for neutralization treatment can be significantly reduced.
第２図は本発明の実施例２の断面図である。薬液槽１内
における薬液蒸気の発生・回収のための構造及び機能に
ついては第１図の実施例と同様である。但し本実施例で
をす薬液槽】内の凝縮機構５によって完全に回収出来な
かった薬液蒸気を回収するための排気系凝縮機構８に薬
液トラップ用フィルタ１】を用いている。このフィルタ
によってトラップされた薬液は、薬液回収通路９を通っ
て、再び薬液槽１内に回収される。FIG. 2 is a sectional view of Example 2 of the present invention. The structure and function for generating and recovering chemical liquid vapor in the chemical liquid tank 1 are the same as those in the embodiment shown in FIG. However, in this embodiment, a chemical liquid trap filter 1 is used in the exhaust system condensing mechanism 8 for recovering chemical liquid vapor that cannot be completely recovered by the condensing mechanism 5 in the chemical liquid tank. The chemical liquid trapped by this filter passes through the chemical liquid recovery passage 9 and is recovered into the chemical liquid tank 1 again.
〔発明の効果」
以上説明したように本発明は、薬液槽内の凝縮機構によ
って完全に回収出来なかった薬液蒸気を、排気ダクトに
設けた排気系薬液回収装置で回収すること罠より、薬液
の消費量、特に、未処理時の薬液消費量を低減出来る効
果がある。[Effects of the Invention] As explained above, the present invention allows the chemical vapor that could not be completely recovered by the condensation mechanism in the chemical tank to be recovered by the exhaust system chemical recovery device installed in the exhaust duct. It has the effect of reducing the consumption amount, especially the consumption amount of chemical solution when untreated.
第１図は本発明の一笑施例の断面図、第２図は本発明の
他の実施例の断面図、第３図は従来の洗浄装置の断面図
である。
］・・・・・・薬液槽、２・・・・・・薬液加熱用ヒー
タ、３・・・・・・榮液、４・・・・・・冷却水通路、
５・・・・・置薬液蒸気）凝縮機構、６・・・・・・排
気口、７・・・・・排気ダクト、８・・・・・・排気系
（薬液蒸気）凝縮機構、９・・・・・・薬液回収通路、
１０・・・・・・冷却水通路、１】・・・・・・薬液ト
ラップ用フィルタ〇FIG. 1 is a sectional view of one embodiment of the present invention, FIG. 2 is a sectional view of another embodiment of the invention, and FIG. 3 is a sectional view of a conventional cleaning device. ]... Chemical solution tank, 2... Heater for heating chemical solution, 3... Eishi liquid, 4... Cooling water passage,
5... Chemical liquid vapor) condensation mechanism, 6... Exhaust port, 7... Exhaust duct, 8... Exhaust system (chemical liquid vapor) condensing mechanism, 9...・・・・・・Medical solution collection passage,
10...Cooling water passage, 1]...Chemical solution trap filter〇
Claims (1)
の間に被洗浄物保持空間を空けて設けられた薬液蒸気凝
縮器とを有する薬液槽と、前記薬液蒸気排気用の排気ダ
クトとを備えた洗浄装置において、前記薬液槽外部の薬
液蒸気通路に、薬液を回収するための回収装置を設けた
ことを特徴とする洗浄装置。A chemical liquid tank having a heater for vaporizing the chemical liquid stored in the lower part and a chemical liquid vapor condenser provided with an object holding space between the chemical liquid surface and the chemical liquid vapor condenser, and an exhaust duct for exhausting the chemical liquid vapor. A cleaning device characterized in that a recovery device for recovering a chemical solution is provided in a chemical vapor passage outside the chemical solution tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1651087A JPS63184336A (en) | 1987-01-26 | 1987-01-26 | Washer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1651087A JPS63184336A (en) | 1987-01-26 | 1987-01-26 | Washer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63184336A true JPS63184336A (en) | 1988-07-29 |
Family
ID=11918268
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1651087A Pending JPS63184336A (en) | 1987-01-26 | 1987-01-26 | Washer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63184336A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6430685A (en) * | 1987-07-24 | 1989-02-01 | Otsuka Giken Kogyo Kk | Fleon washer |
| JP6086413B1 (en) * | 2016-04-13 | 2017-03-01 | 有限会社加藤創研 | Cleaning system for polychlorinated biphenyl contaminated transformer and cleaning method using the same |
| JP6124098B1 (en) * | 2016-09-27 | 2017-05-10 | 有限会社加藤創研 | Method and system for cleaning oil contaminated soil |
-
1987
- 1987-01-26 JP JP1651087A patent/JPS63184336A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6430685A (en) * | 1987-07-24 | 1989-02-01 | Otsuka Giken Kogyo Kk | Fleon washer |
| JPH0438466B2 (en) * | 1987-07-24 | 1992-06-24 | ||
| JP6086413B1 (en) * | 2016-04-13 | 2017-03-01 | 有限会社加藤創研 | Cleaning system for polychlorinated biphenyl contaminated transformer and cleaning method using the same |
| JP6124098B1 (en) * | 2016-09-27 | 2017-05-10 | 有限会社加藤創研 | Method and system for cleaning oil contaminated soil |
| JP2018051446A (en) * | 2016-09-27 | 2018-04-05 | 有限会社加藤創研 | Washing method and washing system of oil-contaminated soil |
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