JP3323242B2 - Hot and cold bath cleaning equipment - Google Patents

Hot and cold bath cleaning equipment

Info

Publication number
JP3323242B2
JP3323242B2 JP22791092A JP22791092A JP3323242B2 JP 3323242 B2 JP3323242 B2 JP 3323242B2 JP 22791092 A JP22791092 A JP 22791092A JP 22791092 A JP22791092 A JP 22791092A JP 3323242 B2 JP3323242 B2 JP 3323242B2
Authority
JP
Japan
Prior art keywords
cleaning
liquid
tank
temperature
storage area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP22791092A
Other languages
Japanese (ja)
Other versions
JPH0655152A (en
Inventor
康嗣 梶原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHIN-OHTSUKA CO., LTD.
Original Assignee
SHIN-OHTSUKA CO., LTD.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHIN-OHTSUKA CO., LTD. filed Critical SHIN-OHTSUKA CO., LTD.
Priority to JP22791092A priority Critical patent/JP3323242B2/en
Publication of JPH0655152A publication Critical patent/JPH0655152A/en
Application granted granted Critical
Publication of JP3323242B2 publication Critical patent/JP3323242B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、例えば、半導体やプ
リント基板、ディスク基板等のワークに付着した異物を
洗浄除去するために用いられる温冷浴洗浄装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hot / cold bath cleaning apparatus used for cleaning and removing foreign substances adhering to a work such as a semiconductor, a printed circuit board, and a disk board.

【0002】[0002]

【従来の技術】従来、上述例のようなワークを洗浄する
装置としては、例えば、気密状態に密閉された洗浄室内
に温浴槽と冷浴槽とを独立して設け、一方の温浴槽に貯
液された高温の洗浄液中にワーク全体を浸漬して温浴洗
浄処理した後、他方の冷浴槽に貯液された低温の洗浄液
中にワーク全体を浸漬して冷浴洗浄処理するので、同各
槽に貯液された洗浄液の温度差によりワーク全体が膨脹
収縮され、複数枚重合してなる各ワークの隙間部分に洗
浄液を侵入させて、同各ワークに付着した研磨粉や油分
等の異物を洗浄除去する装置がある。
2. Description of the Related Art Conventionally, as an apparatus for cleaning a work as described above, for example, a hot tub and a cold tub are independently provided in a cleaning chamber hermetically sealed, and a liquid is stored in one of the hot tubs. After the entire work is immersed in the high-temperature cleaning solution and subjected to the hot-bath cleaning process, the entire work is immersed in the low-temperature cleaning solution stored in the other cold bath to perform the cold-bath cleaning process. The entire work expands and contracts due to the difference in temperature of the stored cleaning liquid, and the cleaning liquid penetrates into the gaps between the workpieces formed by polymerization of a plurality of sheets, thereby cleaning and removing foreign substances such as abrasive powder and oil attached to the respective workpieces. There is a device to do.

【0003】[0003]

【発明が解決しようとする課題】しかし、上述のように
ワークの温浴洗浄処理と冷浴洗浄処理とを専用の各処理
槽で行うため、独立して設けられた温浴槽と冷浴槽とに
ワークを移動させなければならず、ワークの洗浄作業に
手間及び時間が掛かる。且つ、移動途中に於いてワーク
の表面温度が変化するので、洗浄液の温度差による効果
が損なわれてしまい、ワークの隙間部分に付着した異物
を確実に洗浄除去することが困難であるという問題点を
有している。また、洗浄室内に温浴槽と冷浴槽とを設置
するだけの広いスペースが必要であり、装置が大型化す
るという問題点も有している。
However, as described above, since the warm bath cleaning treatment and the cold bath cleaning treatment of the work are performed in the respective treatment tanks, the work is separately provided in the warm bath tub and the cold bath tub. Must be moved, and the work for cleaning the work takes time and effort. In addition, since the surface temperature of the workpiece changes during the movement, the effect of the temperature difference of the cleaning liquid is lost, and it is difficult to reliably remove and remove the foreign matter attached to the gap between the workpieces. have. In addition, a large space for installing a hot tub and a cold tub is required in the cleaning room, and there is a problem that the apparatus becomes large.

【0004】この発明は上記問題に鑑み、一つの洗浄槽
内に貯液された洗浄液中にワーク全体を浸漬して温浴洗
浄処理と冷浴洗浄処理とを連続して行うことより、ワー
クの隙間部分に付着した研磨粉、フラックス、油分等の
異物を確実に洗浄除去することができ、処理能力の向上
及び装置の小型化を図ることができる温冷浴洗浄装置の
提供を目的とする。
[0004] In view of the above problems, the present invention immerses the entire work in a cleaning solution stored in one cleaning tank and continuously performs a hot bath cleaning process and a cold bath cleaning process, thereby reducing the gap between the works. It is an object of the present invention to provide a hot / cold bath cleaning apparatus capable of reliably cleaning and removing foreign matters such as abrasive powder, flux, oil, and the like adhered to a portion, improving the processing capacity and reducing the size of the apparatus.

【0005】[0005]

【課題を解決するための手段】この発明の請求項1記載
の発明は、洗浄室内の洗浄槽に貯液された洗浄液中にワ
ーク全体を浸漬して洗浄処理する洗浄装置であって、上
方貯液領域に上方から供給される高温の洗浄液を所定量
貯液し、下方貯液領域に低温の洗浄液を所定量貯液する
洗浄槽を設け、上記洗浄槽内に上方からワークを浸漬移
動させ、上方貯液領域の高温洗浄液内で温浴洗浄した
後、下方の低温洗浄液内で冷浴洗浄する温冷浴洗浄装置
であることを特徴とする。
According to the first aspect of the present invention, there is provided:
The invention of the present application discloses that the cleaning liquid stored in the cleaning tank in the cleaning chamber contains water.
Cleaning equipment for immersing the entire workpiece
A predetermined amount of high-temperature cleaning liquid supplied from above to the liquid storage area
Stores a predetermined amount of low-temperature cleaning liquid in the lower storage area
A cleaning tank is provided, and the work is immersed and transferred into the cleaning tank from above.
To perform warm bath cleaning in the high-temperature cleaning solution in the upper reservoir area.
After that, it is a hot / cold bath cleaning device for performing a cold bath cleaning in a low temperature cleaning solution below .

【0006】この発明の請求項2記載の発明は、上記請
求項1記載の構成と併せて、上記洗浄槽の上方貯液領域
と下方貯液領域とを、該洗浄槽に貯液された洗浄液を下
方貯液領域から上方貯液領域に向けて循環供給する液循
環路で接続した請求項1記載の温冷浴洗浄装置であるこ
とを特徴とする。
The invention according to claim 2 of the present invention is characterized in that
A liquid storage area above the washing tank in combination with the configuration according to claim 1.
And the lower storage area, and the cleaning liquid stored in the cleaning tank is
Liquid circulation from the one-sided storage area to the upper-sided storage area
The hot and cold bath cleaning device according to claim 1, wherein the cleaning device is connected by a loop.
And features.

【0007】[0007]

【作用】請求項1記載の温冷浴洗浄装置は、洗浄槽内に
上方からワークを浸漬移動させ、洗浄槽の上方貯液領域
に貯液された高温の洗浄液中にワーク全体を浸漬して温
浴洗浄処理し、同洗浄槽内の下方貯液領域に貯液された
低温の洗浄液中ワーク全体を浸漬して冷浴洗浄処理す
るので、上下貯液領域に貯液した洗浄液の温度差により
ワーク全体が膨脹収縮して、ワークの隙間部分に洗浄液
が確実に侵入するため、ワークに付着した研磨粉や油分
等の異物を洗浄除去することができる。
According to the first aspect of the present invention, there is provided a hot / cold bath cleaning apparatus provided in a cleaning tank.
The work was immersed and moved from above , and the entire work was immersed in the high-temperature cleaning liquid stored in the upper liquid storage area of the cleaning tank to perform a warm bath cleaning process, and stored in the lower liquid storage area in the same cleaning tank. Since the entire work is immersed in the low-temperature cleaning liquid and subjected to the cold bath cleaning process, the entire work expands and contracts due to the temperature difference between the cleaning liquids stored in the upper and lower liquid storage areas, and the cleaning liquid reliably enters the gaps between the works. Therefore, it is possible to wash and remove foreign substances such as abrasive powder and oil attached to the work.

【0008】請求項2記載の温冷浴洗浄装置は、上記の
請求項1記載の作用と併せて、低温洗浄液を、洗浄槽の
下方貯液領域から上方貯液領域に向けて液循環路を介し
て循環供給し、高温洗浄液と低温洗浄液との割合を一定
に保つ。
[0008] The hot and cold bath cleaning apparatus according to claim 2 is the above-described apparatus.
In addition to the operation of claim 1, the low-temperature cleaning liquid is supplied to the cleaning tank.
From the lower storage area to the upper storage area via the liquid circulation path
To circulate and supply a constant ratio of high-temperature cleaning solution to low-temperature cleaning solution.
To keep.

【0009】[0009]

【発明の効果】この発明によれば、ワークを、一つの洗
浄槽内に貯液された高温洗浄液と低温洗浄液とに上方か
ら浸漬移動して、温浴洗浄処理と冷浴洗浄処理とを連続
して行うので、従来例のようにワークを温浴槽と冷浴槽
とに順次浸漬したり、高温洗浄液と低温洗浄液とを入れ
換えたりする手間及び作業が省けると共に、洗浄作業に
要する処理時間が大幅に短縮され、処理能力の向上及び
装置の小型化を図ることができる。しかも、洗浄槽内に
貯液された洗浄液の温度差によりワーク全体を膨脹収縮
させるので、ワークの隙間部分に付着した研磨粉、フラ
ックス、油分等の異物を洗浄除去するのに最適である。
且つ、洗浄液を、洗浄槽の上方貯液領域と下方貯液領域
との間で循環させるので、貯液量の変動が少なく、高温
洗浄液と低温洗浄液との割合を一定に保つことができ、
洗浄液の温度差による洗浄効果が安定して得られる。
According to the present invention, the work can be washed by one washing operation.
Check whether the high-temperature cleaning liquid and low-temperature cleaning liquid stored in the
Immersed in the bath, and the hot bath cleaning process and the cold bath cleaning process are continuously performed.
Therefore, the work is immersed in a hot tub and a cold tub sequentially as in the conventional example, or a high-temperature cleaning liquid and a low-temperature cleaning liquid are
The labor and work for replacement can be saved, and the processing time required for the cleaning operation can be greatly reduced, so that the processing capacity can be improved and the apparatus can be downsized. In addition, since the entire work expands and contracts due to the temperature difference of the cleaning liquid stored in the cleaning tank, it is most suitable for cleaning and removing foreign substances such as abrasive powder, flux, and oil adhering to gaps in the work.
In addition, the cleaning liquid is supplied to the upper storage area and the lower storage area of the cleaning tank.
Circulates between the reservoir and the reservoir, so there is little
The ratio between the cleaning liquid and the low-temperature cleaning liquid can be kept constant,
The cleaning effect due to the temperature difference of the cleaning liquid is stably obtained.

【0010】[0010]

【実施例】この発明の一実施例を以下図面に基づいて詳
述する。図面は一つの洗浄槽内に貯液された洗浄液でワ
ークを温浴洗浄処理及び冷浴洗浄処理するときに用いら
れる温冷浴洗浄装置を示し、図1に於いて、この温冷浴
洗浄装置1は、気密状態に密閉される洗浄室2の底部
に、メチレンクロライド等の洗浄液Aを蒸発気化するた
めの煮沸槽3と、同一の洗浄液Aを上下貯液領域に分離
貯液するための洗浄槽4とを配設すると共に、同室内の
上方蒸気領域と対応する側部壁面に溶剤及び水分を分離
するための水分離槽5を連設している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below in detail with reference to the drawings. The drawing shows a hot / cold bath cleaning device used when performing a hot bath cleaning process and a cold bath cleaning process on a workpiece with a cleaning liquid stored in one cleaning tank. In FIG. A boiling tank 3 for evaporating and evaporating a washing liquid A such as methylene chloride at the bottom of a washing chamber 2 hermetically sealed, and a washing tank for separating and storing the same washing liquid A in an upper and lower storage area. 4 and a water separation tank 5 for separating solvent and moisture is connected to the side wall surface corresponding to the upper steam region in the same room.

【0011】上述の洗浄室2は、同室上面にワークBを
出入れするためのワーク出入口2aを開口すると共に、
同ワーク出入口2aを密閉する大きさに形成した密閉蓋
2bを開閉自在に嵌合又は連結している。且つ、同室内
の上方蒸気領域と対応する側部内壁面に沿って蒸気Ac
を冷却凝縮するための冷却ジャケット6,6を上下段に
配設し、同室側部に連設した水分離槽5内の上方蒸気領
域と対応する側部内壁面に蒸気Acを凝縮液化するため
の冷却コイル7を配設すると共に、後述する冷凍装置で
適宜温度に冷却された冷媒(図示省略)を冷却ジャケッ
ト6及び冷却コイル7に循環供給して、洗浄室2内の上
方蒸気領域に放出された蒸気Ac及び室内に侵入する大
気中の水分が冷却凝縮する温度に冷却ジャケット6を保
温し、且つ、水分離槽5内の上方蒸気領域に放出された
蒸気Acが凝縮液化する温度に冷却コイル7を保温して
いる。
The above-mentioned cleaning chamber 2 has a work entrance 2a for opening and closing the work B on the upper surface of the same chamber,
A sealing lid 2b formed in a size that seals the work entrance 2a is fitted or connected to be openable and closable. And, along the side inner wall surface corresponding to the upper steam region in the same room, the steam Ac
Cooling jackets 6 and 6 for cooling and condensing the water are provided in the upper and lower stages, and are used to condense and liquefy the vapor Ac on the side inner wall surface corresponding to the upper steam region in the water separation tank 5 connected to the side of the same chamber. A cooling coil 7 is provided, and a coolant (not shown) cooled to an appropriate temperature by a refrigerating device described later is circulated and supplied to the cooling jacket 6 and the cooling coil 7, and is discharged to the upper steam area in the cleaning chamber 2. The cooling jacket 6 is kept at a temperature at which the cooled steam Ac and the moisture in the air entering the room are cooled and condensed, and the cooling coil is cooled to a temperature at which the steam Ac discharged into the upper steam region in the water separation tank 5 is condensed and liquefied. 7 is kept warm.

【0012】前述の煮沸槽3は、同槽底部の中央部内壁
面に洗浄液Aを蒸発気化するための加熱ヒータ8を配設
し、例えば、適宜温度に加熱されたオイルや水溶液等の
加熱媒体(図示省略)を加熱ヒータ8に循環供給して、
メチレンクロライド等の洗浄液Aが蒸発気化する温度
(例えば40.4℃)に加熱ヒータ8を加熱する。
The above-mentioned boiling tank 3 is provided with a heater 8 for evaporating and evaporating the cleaning liquid A on a central inner wall surface at the bottom of the tank, and for example, a heating medium such as oil or aqueous solution heated to an appropriate temperature. (Not shown) to the heater 8 in a circulating manner,
The heater 8 is heated to a temperature (for example, 40.4 ° C.) at which the cleaning liquid A such as methylene chloride evaporates.

【0013】前述の洗浄槽4は、同槽内部の上方貯液領
域に貯液された洗浄液Aを高温に加温し、同槽内部の下
方貯液領域に貯液された洗浄液Aを低温に保温して、上
方貯液領域に高温洗浄液Aaを所定量貯液し、下方貯液
領域に低温洗浄液Abを所定量貯液すると共に、上下貯
液領域に貯液した高温洗浄液Aaと低温洗浄液Abとを
比重差により上下領域に分離している。且つ、同槽底部
の中央部内壁面に、例えば、27KHz 〜200KHz の振
動周波数で超音波振動する超音波振動子9を配設してい
る。
The above-described cleaning tank 4 heats the cleaning liquid A stored in the upper liquid storage area inside the tank to a high temperature, and lowers the cleaning liquid A stored in the lower liquid storage area inside the same tank. While maintaining the temperature, a predetermined amount of the high-temperature cleaning liquid Aa is stored in the upper liquid storage area, a predetermined amount of the low-temperature cleaning liquid Ab is stored in the lower liquid storage area, and the high-temperature cleaning liquid Aa and the low-temperature cleaning liquid Ab stored in the upper and lower liquid storage areas are stored. Are separated into upper and lower regions by a difference in specific gravity. In addition, an ultrasonic vibrator 9 that ultrasonically vibrates at a vibration frequency of, for example, 27 KHz to 200 KHz is disposed on a central inner wall surface at the bottom of the tank.

【0014】すなわち、冷却ジャケット6で凝縮液化さ
れた高温の洗浄液Aを滴下し、水分離槽5で蒸留された
高温の洗浄液Aをオーバーフローして、蒸留された高温
の洗浄液Aを洗浄槽4に供給する。且つ、洗浄槽4の上
方貯液領域と対応する側部壁面と、同槽の下方貯液領域
と対応する底部壁面とを、電磁弁10,11と、循環ポ
ンプ12と、フィルター13と、熱交換器14とを介し
て液循環路15で接続し、同循環ポンプ12の移送力に
より、洗浄槽4に貯液された洗浄液Aをフィルター13
で清浄濾過すると共に、熱交換器14で冷却処理された
低温の洗浄液Aを洗浄槽4内に循環供給する。
That is, the high-temperature cleaning liquid A condensed and liquefied in the cooling jacket 6 is dropped, and the high-temperature cleaning liquid A distilled in the water separation tank 5 overflows. Supply. Further, the side wall surfaces corresponding to the upper liquid storage area of the washing tank 4 and the bottom wall surfaces corresponding to the lower liquid storage area of the same tank are connected to the electromagnetic valves 10 and 11, the circulation pump 12, the filter 13, The cleaning liquid A stored in the cleaning tank 4 is connected to the filter 13 by the transfer force of the circulation pump 12 through the liquid circulation path 15 via the exchanger 14.
, And the low-temperature cleaning liquid A cooled in the heat exchanger 14 is circulated and supplied into the cleaning tank 4.

【0015】前述の水分離槽5は、同槽内部に仕切り板
5aを立設して各分離槽5b,5cを分割形成し、上方
蒸気領域の冷却ジャケット6及び冷却コイル7で凝縮液
化された高温の洗浄液Aを水分離槽5の分離槽5bに滴
下して、液面上に浮上した比重の軽い水分のみを分離槽
5bから槽外部に排出し、液面下に降下した比重の重い
高温の洗浄液Aを分離槽5cからオーバーフローして洗
浄槽4に返還する。
In the above-mentioned water separation tank 5, a partition plate 5a is erected inside the tank to separate the separation tanks 5b and 5c, and condensed and liquefied by the cooling jacket 6 and the cooling coil 7 in the upper steam area. The high-temperature washing liquid A is dropped into the separation tank 5b of the water separation tank 5, and only light water having a specific gravity floating on the liquid surface is discharged from the separation tank 5b to the outside of the tank. Of the washing liquid A overflows from the separation tank 5c and is returned to the washing tank 4.

【0016】前述の冷却ジャケット6及び冷却コイル7
は冷凍装置16の蒸発器(エバポレータ)により構成さ
れ、この冷凍装置16は、圧縮機17の吸引側にアキュ
ムレータ18を介して冷却ジャケット6及び冷却コイル
7を並列接続し、圧縮機17の吐出側に凝縮器19と、
受液器20と、電磁弁21と、膨脹弁22(キャピラリ
ーチューブ)とを介して冷却ジャケット6及び冷却コイ
ル7を並列接続している。すなわち、圧縮機17を駆動
して、圧縮され高圧となった冷媒を凝縮器19に送り、
ここで液化して受液器20に至った後に、この高圧冷媒
液は電磁弁21を介して膨脹弁22に導びかれ、同膨脹
弁22で絞り膨脹されて低圧となった冷媒は冷却ジャケ
ット6及び冷却コイル7に夫々供給され、周囲より熱を
奪って蒸発気化し、アキュムレータ18を介して再び圧
縮機17に吸引される。
The aforementioned cooling jacket 6 and cooling coil 7
Is constituted by an evaporator (evaporator) of a refrigerating device 16. The refrigerating device 16 has a cooling jacket 6 and a cooling coil 7 connected in parallel to a suction side of a compressor 17 via an accumulator 18, and a discharge side of the compressor 17. And a condenser 19,
The cooling jacket 6 and the cooling coil 7 are connected in parallel via a liquid receiver 20, an electromagnetic valve 21, and an expansion valve 22 (capillary tube). That is, the compressor 17 is driven to send the compressed high-pressure refrigerant to the condenser 19,
After being liquefied and reaching the liquid receiver 20, this high-pressure refrigerant liquid is guided to an expansion valve 22 via an electromagnetic valve 21, and the refrigerant which has been throttled and expanded to a low pressure by the expansion valve 22 is cooled by a cooling jacket. 6 and the cooling coil 7, each of which takes heat from the surroundings, evaporates, and is again sucked into the compressor 17 via the accumulator 18.

【0017】図示実施例は上記の如く構成するものとし
て、以下、温冷浴洗浄装置1によるワークBの洗浄方法
を説明する。先ず、図1に示すように、洗浄室2内の煮
沸槽3に配設した加熱ヒータ8を加熱して、同煮沸槽3
内に貯液された洗浄液Aを蒸発気化させ、各槽3,4,
5と対応する上方蒸気領域に蒸発気化した蒸気Acを放
出する。この後、洗浄室2のワーク出入口2aを一部開
放又は全部開放して、複数枚の各ワークB…を重合した
状態のまま洗浄室2内に搬入し、同室内に放出された蒸
気Ac中を通過させて、洗浄槽4内に貯液された洗浄液
A中にワークB全体を上方から浸漬する。
Assuming that the illustrated embodiment is configured as described above, a method of cleaning the work B by the hot and cold bath cleaning apparatus 1 will be described below. First, as shown in FIG. 1, a heater 8 disposed in the boiling tank 3 in the cleaning chamber 2 is heated to
The cleaning liquid A stored in the tank is evaporated and vaporized, and each of the tanks 3, 4,
The evaporating vapor Ac is discharged to the upper vapor region corresponding to 5. Thereafter, the work entrance / exit 2a of the cleaning chamber 2 is partially or completely opened, and the plurality of works B are carried into the cleaning chamber 2 in a superposed state. , And the entire work B is immersed from above into the cleaning liquid A stored in the cleaning tank 4 .

【0018】すなわち、洗浄室2のワーク出入口2aを
完全密閉した後、洗浄槽4内の上方貯液領域に貯液され
た高温洗浄液Aa中から下方貯液領域に貯液された低温
洗浄液Ab中にワークBを一定速度で移動して、同槽内
の上方貯液領域に貯液された高温洗浄液Aa中にワーク
B全体を一定時間浸漬して温浴洗浄処理し、この後、同
槽内の下方貯液領域に貯液された低温洗浄液Ab中にワ
ークB全体を一定時間浸漬して冷浴洗浄処理するので、
上下貯液領域に貯液した高温洗浄液Aaと低温洗浄液A
bとの温度差によりワークBが膨脹収縮して、複数枚重
合してなる各ワークB…が分離するため、同各ワークB
…の隙間部分に洗浄液Aが確実に侵入して、ワークBに
付着した研磨粉、フラックス、油分等の異物を洗浄除去
することができる。なお、浸漬時に於いて、洗浄槽4底
部に配設した超音波振動子9を振動させて超音波洗浄す
るもよい。
That is, after completely closing the work inlet / outlet 2a of the cleaning chamber 2, the high-temperature cleaning liquid Aa stored in the upper storage area in the cleaning tank 4 and the low-temperature cleaning liquid Ab stored in the lower storage area in the cleaning tank 4 are removed. Then, the work B is moved at a constant speed, and the entire work B is immersed in the high-temperature washing liquid Aa stored in the upper storage area in the same tank for a certain time to perform a warm bath cleaning treatment. Since the entire work B is immersed in the low-temperature cleaning liquid Ab stored in the lower storage area for a certain period of time to perform the cold bath cleaning processing,
High-temperature cleaning liquid Aa and low-temperature cleaning liquid A stored in upper and lower liquid storage areas
b, the work B expands and contracts due to the temperature difference between the work B and the work B.
The cleaning liquid A surely penetrates into the gaps of..., And foreign substances such as abrasive powder, flux, oil and the like adhering to the work B can be cleaned and removed. At the time of immersion, the ultrasonic cleaning may be performed by vibrating the ultrasonic vibrator 9 disposed at the bottom of the cleaning tank 4.

【0019】同時に、洗浄室2内の上方蒸気領域に放出
された蒸気Acを冷却ジャケット6及び冷却コイル7で
凝縮液化して、蒸留した高温の洗浄液Aを洗浄槽4内に
返還供給するので、洗浄槽4内に貯液された洗浄液Aを
常時連続蒸留しながら洗浄処理することができる。且
つ、循環ポンプ12を駆動して、洗浄槽4に貯液された
洗浄液Aをフィルター13で清浄濾過し、熱交換器14
で冷却処理した低温の洗浄液Aを洗浄槽4内に循環供給
するので、洗浄槽4内に貯液された洗浄液Aを常時連続
濾過しながら洗浄処理することができる。
At the same time, the vapor Ac discharged into the upper vapor region in the cleaning chamber 2 is condensed and liquefied by the cooling jacket 6 and the cooling coil 7, and the distilled high-temperature cleaning liquid A is returned and supplied into the cleaning tank 4. The cleaning treatment can be performed while continuously distilling the cleaning liquid A stored in the cleaning tank 4. Further, the circulating pump 12 is driven to clean and filter the cleaning liquid A stored in the cleaning tank 4 with the filter 13, and the heat exchanger 14
Since the low-temperature cleaning liquid A cooled in the above is circulated and supplied into the cleaning tank 4, the cleaning processing can be performed while continuously filtering the cleaning liquid A stored in the cleaning tank 4.

【0020】次に、洗浄処理終了後、洗浄室2のワーク
出入口2aを一部開放又は全部開放して、洗浄槽4内に
貯液された洗浄液A中から洗浄処理済みのワークBを取
り出すと共に、洗浄室2内に放出された蒸気Acでワー
クBを沸点温度や蒸気温度等の適宜温度に加熱してから
室外に搬出する。
Next, after the completion of the cleaning process, the work inlet / outlet 2a of the cleaning chamber 2 is partially or completely opened to take out the cleaned work B from the cleaning liquid A stored in the cleaning tank 4. Then, the work B is heated to an appropriate temperature such as a boiling point temperature or a steam temperature with the steam Ac discharged into the cleaning chamber 2 and then carried out of the room.

【0021】以上のように、ワークBを、一つの洗浄槽
4内の上方貯液領域に貯液された高温洗浄液Aaと、同
槽内の下方貯液領域に貯液された低温洗浄液Abとに上
方から浸漬移動して、温浴洗浄処理と冷浴洗浄処理とを
連続して行うので、従来例のようにワークBを温浴槽と
冷浴槽とに順次浸漬したり、高温洗浄液Aaと低温洗浄
液Abとを入れ換えたりする手間及び作業が省けると共
に、洗浄作業に要する処理時間が大幅に短縮され、処理
能力の向上及び装置の小型化を図ることができる。しか
も、洗浄槽4内に貯液された高温洗浄液Aaと低温洗浄
液Abとの温度差によりワークB全体を膨脹収縮させる
ので、ワークBの隙間部分に付着した研磨粉、フラック
ス、油分等の異物を洗浄除去するのに最適である。
つ、液循環路15を介して、洗浄槽4の上方貯液領域と
下方貯液領域との間で洗浄液Aを循環させるので、貯液
量の変動が少なく、高温洗浄液Aaと低温洗浄液Abと
の割合を一定に保つことができ、洗浄液Aの温度差によ
る洗浄効果が安定して得られる。
As described above, the work B is placed in one cleaning tank.
4 and the high-temperature cleaning liquid Aa stored in the upper liquid storage area.
Above the low-temperature cleaning liquid Ab stored in the lower storage area in the tank.
Immersion from the side to perform the hot bath cleaning process and the cold bath cleaning process.
Since it is performed continuously , the work B is sequentially immersed in a hot tub and a cold tub as in the conventional example, or the high temperature cleaning solution Aa and the low temperature cleaning are performed.
It saves the labor and work of replacing the liquid Ab
In addition, the processing time required for the cleaning operation is greatly reduced, so that the processing capacity can be improved and the size of the apparatus can be reduced. In addition, since the entire work B expands and contracts due to the temperature difference between the high-temperature cleaning liquid Aa and the low-temperature cleaning liquid Ab stored in the cleaning tank 4, foreign substances such as abrasive powder, flux, and oil adhering to the gaps of the work B can be removed. Ideal for cleaning and removal. And
And a liquid storage area above the cleaning tank 4 via the liquid circulation path 15.
Since the cleaning liquid A is circulated between the lower storage area and the lower storage area,
The amount of fluctuation is small, and the high-temperature cleaning liquid Aa and the low-temperature cleaning liquid Ab
Ratio can be kept constant, and the temperature
A stable cleaning effect can be obtained.

【0022】この発明の構成と、上述の実施例との対応
において、この発明の洗浄液は、実施例の洗浄液Aに対
応し、以下同様に、高温の洗浄液は、高温洗浄液Aaに
対応し、低温の洗浄液は、低温洗浄液Abに対応する
も、この発明は、上述の実施例の構成のみに限定される
ものではない。
In the correspondence between the structure of the present invention and the above-described embodiment, the cleaning liquid of the present invention corresponds to the cleaning liquid A of the embodiment, and similarly, the high-temperature cleaning liquid corresponds to the high-temperature cleaning liquid Aa, The cleaning liquid corresponds to the low-temperature cleaning liquid Ab, but the present invention is not limited only to the configuration of the above-described embodiment.

【0023】例えば、洗浄槽4の上方貯液領域と対応す
る外面部分に加熱ヒータ等の加熱手段を装着し、同洗浄
槽4の下方貯液領域と対応する外面部分に冷却コイル等
の冷却手段を装着して、洗浄槽4内に貯液された洗浄液
Aを各手段で加温又は冷却するもよい。
For example, a heating means such as a heater is mounted on an outer surface of the cleaning tank 4 corresponding to the upper liquid storage area, and a cooling means such as a cooling coil is provided on the outer surface of the cleaning tank 4 corresponding to the lower liquid storage area. May be attached, and the cleaning liquid A stored in the cleaning tank 4 may be heated or cooled by various means.

【図面の簡単な説明】[Brief description of the drawings]

【図1】温冷浴洗浄装置を構成する各槽の配管系統図。FIG. 1 is a piping diagram of each tank constituting a hot / cold bath cleaning apparatus.

【符号の説明】[Explanation of symbols]

A…洗浄液 Aa…高温洗浄液 Ab…低温洗浄液 B…ワーク 1…温冷浴洗浄装置 2…洗浄室 3…煮沸槽 4…洗浄槽 5…水分離槽 A: Cleaning liquid Aa: High-temperature cleaning liquid Ab: Low-temperature cleaning liquid B: Workpiece 1: Hot / cold bath cleaning device 2: Cleaning chamber 3: Boiler tank 4: Cleaning tank 5: Water separation tank

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) B08B 1/00 - 7/04 H01L 21/304 H05K 3/26 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. 7 , DB name) B08B 1/00-7/04 H01L 21/304 H05K 3/26

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】洗浄室内の洗浄槽に貯液された洗浄液中に
ワーク全体を浸漬して洗浄処理する洗浄装置であって、上方貯液領域に上方から供給される高温の洗浄液を所定
量貯液し、下方貯液領域に低温の洗浄液を所定量貯液す
る洗浄槽を設け、 上記洗浄槽内に上方からワークを浸漬移動させ、上方貯
液領域の高温洗浄液内で温浴洗浄した後、下方の低温洗
浄液内で冷浴洗浄する 温冷浴洗浄装置。
1. A cleaning apparatus for performing a cleaning process by immersing an entire work in a cleaning liquid stored in a cleaning tank in a cleaning chamber, wherein a high-temperature cleaning liquid supplied from above to an upper storage area is supplied to a predetermined area.
And store a predetermined amount of low-temperature washing liquid in the lower storage area.
A work tank is immersed and moved from above in the wash tank,
After washing with a hot bath in the high-temperature cleaning solution in the liquid area,
A hot / cold bath washing device that performs a cold bath washing in the purified liquid.
【請求項2】上記洗浄槽の上方貯液領域と下方貯液領域
とを、該洗浄槽に貯液された洗浄液を下方貯液領域から
上方貯液領域に向けて循環供給する液循環路で接続した
請求項1記載の温冷浴洗浄装置。
2. An upper liquid storage area and a lower liquid storage area of the washing tank.
And the cleaning liquid stored in the cleaning tank from the lower storage area.
Connected by a liquid circulation path that circulates and supplies toward the upper liquid storage area
The hot and cold bath cleaning device according to claim 1.
JP22791092A 1992-08-03 1992-08-03 Hot and cold bath cleaning equipment Expired - Lifetime JP3323242B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22791092A JP3323242B2 (en) 1992-08-03 1992-08-03 Hot and cold bath cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22791092A JP3323242B2 (en) 1992-08-03 1992-08-03 Hot and cold bath cleaning equipment

Publications (2)

Publication Number Publication Date
JPH0655152A JPH0655152A (en) 1994-03-01
JP3323242B2 true JP3323242B2 (en) 2002-09-09

Family

ID=16868221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22791092A Expired - Lifetime JP3323242B2 (en) 1992-08-03 1992-08-03 Hot and cold bath cleaning equipment

Country Status (1)

Country Link
JP (1) JP3323242B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4573043B2 (en) * 2005-09-30 2010-11-04 栗田工業株式会社 Sulfuric acid recycling cleaning system
KR101774185B1 (en) * 2013-09-25 2017-09-01 시바우라 메카트로닉스 가부시끼가이샤 Substrate treatment device, method for separating bonded substrate, and method for removing adhesive

Also Published As

Publication number Publication date
JPH0655152A (en) 1994-03-01

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