JPH0438453Y2 - - Google Patents

Info

Publication number
JPH0438453Y2
JPH0438453Y2 JP383788U JP383788U JPH0438453Y2 JP H0438453 Y2 JPH0438453 Y2 JP H0438453Y2 JP 383788 U JP383788 U JP 383788U JP 383788 U JP383788 U JP 383788U JP H0438453 Y2 JPH0438453 Y2 JP H0438453Y2
Authority
JP
Japan
Prior art keywords
ray tube
cooling water
mounting plate
ray
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP383788U
Other languages
English (en)
Japanese (ja)
Other versions
JPH01109167U (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP383788U priority Critical patent/JPH0438453Y2/ja
Publication of JPH01109167U publication Critical patent/JPH01109167U/ja
Application granted granted Critical
Publication of JPH0438453Y2 publication Critical patent/JPH0438453Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
  • X-Ray Techniques (AREA)
JP383788U 1988-01-18 1988-01-18 Expired JPH0438453Y2 (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP383788U JPH0438453Y2 (enExample) 1988-01-18 1988-01-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP383788U JPH0438453Y2 (enExample) 1988-01-18 1988-01-18

Publications (2)

Publication Number Publication Date
JPH01109167U JPH01109167U (enExample) 1989-07-24
JPH0438453Y2 true JPH0438453Y2 (enExample) 1992-09-09

Family

ID=31205823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP383788U Expired JPH0438453Y2 (enExample) 1988-01-18 1988-01-18

Country Status (1)

Country Link
JP (1) JPH0438453Y2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013051595A1 (ja) * 2011-10-04 2013-04-11 株式会社ニコン 装置、ｘ線照射方法、及び構造物の製造方法
US12480895B2 (en) * 2021-01-08 2025-11-25 Proto Patents Ltd. X-ray source for X-ray diffraction apparatus, related apparatus and method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013051595A1 (ja) * 2011-10-04 2013-04-11 株式会社ニコン 装置、ｘ線照射方法、及び構造物の製造方法
JPWO2013051595A1 (ja) * 2011-10-04 2015-03-30 株式会社ニコン 装置、ｘ線照射方法、及び構造物の製造方法
US9234855B2 (en) 2011-10-04 2016-01-12 Nikon Corporation Apparatus, X-ray irradiation method, and structure manufacturing method
US12480895B2 (en) * 2021-01-08 2025-11-25 Proto Patents Ltd. X-ray source for X-ray diffraction apparatus, related apparatus and method

Also Published As

Publication number Publication date
JPH01109167U (enExample) 1989-07-24

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