JPH04379B2 - - Google Patents

Info

Publication number
JPH04379B2
JPH04379B2 JP58106728A JP10672883A JPH04379B2 JP H04379 B2 JPH04379 B2 JP H04379B2 JP 58106728 A JP58106728 A JP 58106728A JP 10672883 A JP10672883 A JP 10672883A JP H04379 B2 JPH04379 B2 JP H04379B2
Authority
JP
Japan
Prior art keywords
semiconductor wafer
developer
temperature
nozzle
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58106728A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59232417A (ja
Inventor
Terumi Rokusha
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58106728A priority Critical patent/JPS59232417A/ja
Publication of JPS59232417A publication Critical patent/JPS59232417A/ja
Publication of JPH04379B2 publication Critical patent/JPH04379B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58106728A 1983-06-16 1983-06-16 半導体ウエ−ハのレジスト現像装置 Granted JPS59232417A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58106728A JPS59232417A (ja) 1983-06-16 1983-06-16 半導体ウエ−ハのレジスト現像装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58106728A JPS59232417A (ja) 1983-06-16 1983-06-16 半導体ウエ−ハのレジスト現像装置

Publications (2)

Publication Number Publication Date
JPS59232417A JPS59232417A (ja) 1984-12-27
JPH04379B2 true JPH04379B2 (Direct) 1992-01-07

Family

ID=14440992

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58106728A Granted JPS59232417A (ja) 1983-06-16 1983-06-16 半導体ウエ−ハのレジスト現像装置

Country Status (1)

Country Link
JP (1) JPS59232417A (Direct)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61160930A (ja) * 1985-01-09 1986-07-21 Dainippon Screen Mfg Co Ltd 基板の表面処理液供給方法
JPH0532848Y2 (Direct) * 1985-02-20 1993-08-23
JPH07111950B2 (ja) * 1988-05-31 1995-11-29 富士通株式会社 スプレィ現像装置
JPH088207B2 (ja) * 1989-06-12 1996-01-29 富士通株式会社 スプレー現像方法
JPH0390431U (Direct) * 1989-12-28 1991-09-13
US5416047A (en) * 1990-09-07 1995-05-16 Tokyo Electron Limited Method for applying process solution to substrates

Also Published As

Publication number Publication date
JPS59232417A (ja) 1984-12-27

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