JPH04371572A - Apparatus and method for producing organic thin film - Google Patents

Abstract

PURPOSE:To form org. thin films on base bodies with high accuracy under film thickness control by ionizing org. matter of a gaseous phase form with inert gas exciting species and installing an ion converging electrode to the base bodies at the time of forming the thin films of the org. matter on the surfaces of various kinds of the base bodies. CONSTITUTION:An inert gas, such as Ar, is supplied from an inlet 11 into a discharge tube 13 and a negative voltage is impressed to an internal needle- shaped electrode 12 to generate a corona discharge between this electrode and the discharge tube 13 kept at the positive voltage, by which the exciting species of the gaseous Ar are formed. The org. compd. which exists in a glass vessel 21 and is heated and evaporated by a nichrome wire 22 is irradiated with these exciting species from the outlet of the discharge tube 13 and the vapor of the org. compd. is ionized in an ion forming section 3. The evaporated matter of the ionized org. compd. forms the thin film of the org. compd. on the surface of the base body 5 mounted with a stainless steel electrode 41 as the ion converging electrode with extremely high accuracy by the regulation of the power source voltages of an inert gas exciting species forming section 1, the ion forming section 3, the ion converging electrode section 4, etc.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus and method for producing organic thin films. More specifically, the present invention relates to a new apparatus and method for manufacturing high-precision organic thin films that enable simple configuration and operation, and also enable film formation control on the micron order.

0002

[Conventional technology and its problems] Traditionally, electrical/electronic equipment,
In the field of chemical products and other various fields, methods of forming organic thin films on the surfaces of substrates such as metals, ceramics, and polymers are known, and manufacturing equipment with various configurations for this purpose has also been developed and put into practical use. ing.

[0003] As a method for manufacturing this organic thin film, liquid phase,
Various vapor phase methods have been used, but the vapor phase film forming method has been attracting attention because of its advanced functionality and ability to control film quality and thickness. CV
D. Various methods such as plasma polymerization have been put into practical use. However, in the case of conventional methods and equipment, there are restrictions on the quality and functionality of the organic thin films formed, and in many cases they are carried out under low pressure conditions in a vacuum region. Therefore, the configuration and operation of the device are troublesome and complicated, and the manufacturing cost is also high.

[0004] For example, in the case of vacuum deposition and CVD, there are major restrictions on the type of organic material used as a raw material, and for this reason, high functionality and excellent quality cannot be expected from the organic thin film produced. In addition, in the case of plasma polymerization, although the formation of a highly crosslinked and dense thin film due to plasma excitation can be expected, the degree of crosslinking is high and it is difficult to control, so the characteristic functionality of an organic thin film is lost. It had the disadvantage that it made it worse. In either case, conventional vapor phase film deposition methods require a vacuum device and its equipment to be used under low pressure conditions, and it has not been easy to control the film deposition conditions.

[0005] Therefore, the present invention eliminates the drawbacks of the conventional vapor phase manufacturing method of an organic thin film and the equipment therefor, and forms a film of excellent quality by highly expressing the functionality and characteristics of an organic thin film. The purpose of the present invention is to provide a new organic thin film manufacturing apparatus that enables simple configuration and operation, and a method using the same.

[0006]

[Means for Solving the Problems] The present invention solves the above-mentioned problems by providing a generating section for an excited species of an inert gas, a supplying section for a raw material, and ions for ionizing a raw material by the inert gas excited species. An apparatus for manufacturing an organic thin film is provided, which has a generating section and a focusing electrode section that emits the generated ions as a beam and makes them adhere to a substrate, and is capable of forming a highly precise organic thin film.

[0007] Furthermore, in the above-mentioned apparatus, the present invention aims to generate excited species in an inert gas at approximately atmospheric pressure by corona discharge using a needle-shaped electrode, and to ionize a raw material near the needle to which a voltage is applied. This is also a preferred embodiment. Furthermore, the present invention also provides a method for producing an organic thin film, characterized in that the organic thin film is formed using the above-mentioned apparatus.

The apparatus and method of the present invention will be described in more detail with reference to the accompanying drawings. FIG. 1 is a block diagram showing one embodiment of the apparatus of the present invention. As can be illustrated in FIG. an excited species generation unit (1) for generating excited species of an inert gas such as a rare gas such as krypton or nitrogen gas;
It has a raw material supply section (2), an ion generation section (3) that ionizes the raw material with an inert gas excited species, and a focusing electrode section (4) that emits ions of the generated raw material compound and makes them adhere to the substrate (5). are doing.

The excited species generating section (1) has an inlet (11) for introducing an inert gas such as argon (Ar), which can be supplied from a commercially available cylinder, at approximately atmospheric pressure, and a needle electrode (1). For example, it can be constituted by a discharge tube (13), for example a discharge tube made of stainless steel, which causes a corona discharge by applying a negative potential to 12), thereby generating excited species of inert gas. In this case, the excited species is irradiated from the outlet of the discharge tube (13) to the raw material organic compound supplied from the outlet of the raw material supply section (2).

The generation of excited species can be expressed as the following reaction equation (in the case of argon).

[0011]

[Chemical formula 1]

The raw material supply section (2), as shown in FIG. 1, for example, has a nichrome wire (22) arranged in a glass container (21) to heat and evaporate the solid raw material. Alternatively, it may be configured as a gaseous raw material supply system. Alternatively, as shown in FIG. 2, a needle-like body that can be positively or negatively applied with a potential can be used as a raw material supply section structure that is effective for producing ions from low-volatility raw materials, especially for producing large quantities of ions. (6) and the outer shell (8) with a built-in heater (7) or an external shell body (8) is charged with raw material solid, heated, and the discharge tube ( ionized by the excited species from the substrate (100) through the focusing electrode (110).
120) may be formed as a thin film. Focusing electrode (
110) may be a ring-shaped body.

[0013]The raw material supplied from the raw material supply section is ionized in the ion generation section, but at this time,
For example, ionization of a raw material (monomer) proceeds through a reaction with an inert gas excited species according to the following reaction formula, producing positive and negative ions.

[0014]

[Case 2]

The ion may be generated from a single molecule (M) of the raw material (monomer), but the ion may be generated from a cluster (n) of the raw material (monomer).
When M) evaporates, or when using the raw material introduction method shown in Figure 2, cluster ions (kM+H)+, kM+, (mM-H)-
and mM- are also produced.

[0016]

[Chemical 3]

Ion generation section (3) for positive ion generation
Preferably, a positive voltage can be applied to the needle (31) shown in FIG. 1 as an ion-generating electrode to promote the positive ion-generating reaction in the vicinity thereof. In addition, it is preferable to attach a nichrome wire (32) to the needle (31) serving as an ion-generating electrode and heat it so that the raw material does not adhere to the needle (31).

In the case of negative ion generation, the needle electrode (12) in the corona discharge tube (13) is brought out a little forward to release the electrons generated in the discharge tube. 31), a voltage opposite to that for positive ion generation is applied to the focusing electrode (41) and the substrate (5). The generated raw material compound ions are emitted in a predetermined direction in a focusing electrode part (4) having a stainless steel plate focusing electrode (41), as shown in FIG. Attach to. At this time, an insulator (50) is provided between the focusing electrode part (4) and the converging electrode part (4).

The substrate at this time is of course not limited to metals, alloys, etc., and may be materials such as ceramics with metal coatings, polymers, conductive polymers, etc., and there are no limitations on the shape. do not have. An organic thin film can be formed on the surface of a substrate having any shape such as a plate-like body, a dork body, a linear body, and the like. For example, in the above configuration,
Voltage application by the power supplies 1 to 6 in FIG. 1 can also be applied over a wide range. For example, the power source 2 for corona discharge can be set to about 700 to 800V. A plurality of focusing electrodes can also be used depending on the purpose. In any case, there are no particular limitations.

Of course, various variations of the above device are possible. Further, in order to form an organic thin film on the surface of the wire, etc., the wire base may be continuously moved relative to the convergent electrode section (4). Furthermore, a plurality of the above devices may be arranged along the production line. Positive ions and negative ions can also be reacted on the substrate.

[0021]

[Effects of the Invention] In the case of the present invention, by using the apparatus as described above, it is possible to form polyamide, polyester, polyacetylene, and various other functional organic thin films with film thickness control on the micron order using raw organic compound ions. It is also possible to form a multifunctional organic thin film using multiple types of raw materials by selectively generating ions. Continuous thin film formation is also easy.

Moreover, as shown in FIG. 1, since thin films can be formed under atmospheric pressure, the structure and operation of the apparatus are extremely simple compared to conventional vapor phase film forming methods.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional configuration diagram showing an embodiment of the apparatus of the present invention.

FIG. 2 is a partial cross-sectional view illustrating a raw material supply section effective for generating ions from low-volatility raw materials.

[Explanation of symbols]

1 Excited species generation section 2 Raw material supply department 3 Ion generation section 4 Ion focusing electrode part 5 base body 11 Inert gas inlet 12　Acicular electrode 13 Discharge tube 21 Glass container 22 Nichrome wire 31 needle 32 Nichrome wire 41 Stainless steel plate electrode 50 Insulator 6. Needle-shaped body 7 Heater 8 Outer shell 9 Gap 100 Discharge tube 110 Focusing electrode 120 bases

Claims (4)

[Claims] 1. A generating section for excited species of an inert gas, a supplying section for a raw material, an ion generating section for ionizing the raw material by the excited species of the inert gas, and a focusing electrode section for attaching the generated ions to a substrate as a beam. An apparatus for manufacturing an organic thin film, characterized in that it has the following features and is capable of forming a highly precise organic thin film. 2. The organic thin film manufacturing apparatus according to claim 1, wherein excited species of an inert gas are generated at approximately atmospheric pressure by corona discharge using a needle-like electrode. 3. The organic thin film manufacturing apparatus according to claim 1, wherein the raw material is ionized near the needle to which a voltage is applied. 4. A method for producing an organic thin film, comprising forming the organic thin film using the apparatus according to claim 1, 2, or 3.