JPH04369604A - Defect part correcting method for color filter - Google Patents

Defect part correcting method for color filter

Info

Publication number
JPH04369604A
JPH04369604A JP3147111A JP14711191A JPH04369604A JP H04369604 A JPH04369604 A JP H04369604A JP 3147111 A JP3147111 A JP 3147111A JP 14711191 A JP14711191 A JP 14711191A JP H04369604 A JPH04369604 A JP H04369604A
Authority
JP
Japan
Prior art keywords
color
protective film
film layer
light
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3147111A
Other languages
Japanese (ja)
Inventor
Akio Sonehara
章夫 曽根原
Soichi Matsuo
松尾 壮一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP3147111A priority Critical patent/JPH04369604A/en
Publication of JPH04369604A publication Critical patent/JPH04369604A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Optical Filters (AREA)

Abstract

PURPOSE:To correct a defect part which is generated in the manufacture process of the color filter. CONSTITUTION:After a protective layer 13 is formed of a material with good peelability and flexibility at the defect part with which foreign matter 9 is mixed, the defect part is irradiated with a laser beam to remove the peripheral part of the foreign matter 9 and then the removed part is coated with a light- shielding material 14 corresponding to the color of a color pattern layer 3; and then the protection film layer 13 is mechanically peeled to leave a light shield material 14 at the removed part. Lastly, the light shield material 14 is cured with ultraviolet rays or heat.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、液晶表示装置用のカラ
ーフィルタを製造する工程において、カラーフィルタに
生じる突起部や白欠陥部を修正する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for correcting protrusions and white defects that occur in color filters during the process of manufacturing color filters for liquid crystal display devices.

【0002】0002

【従来の技術】先ず、図4によりカラーフィルタの製造
方法の1例について説明する。ガラス等の透明基板1上
に例えばスクリーン印刷にて、線幅60μm、ピッチ2
00μm、膜厚2μm程度のストライブ状パターンから
なるブラック遮光層2を形成する(A)。このブラック
遮光層は設けなくてもよい。次に、ブラック遮光層2の
上から、1色目、例えばレッドの着色用感材を塗布した
後、フォトマスクを配置し露光した後、現像を行いレッ
ドパターン層3を形成し(B)、2色目以降は例えば、
グリーン、ブルーの着色用感材を塗布した後、フォトマ
スクを配置し露光した後、現像を行いグリーン、ブルー
のパターン層4、5を形成する(C、D)。各カラーパ
ターン層は長手方向の両側がブラック遮光層2に対して
20〜30μm程度の重なりを持ち膜厚は2μm程度で
ある。次に、物理化学的保護、表面の整面化、平坦化を
目的として、カラーパターン層の上に光硬化性樹脂を塗
布して保護膜層6を膜厚2〜3μm程度に形成する(E
)。さらに、保護膜層6の上に真空成膜法を用いて酸化
インジウム錫(ITO)を成膜した後、マスク蒸着法、
エッチング法等により電極パターン加工を行い、透明電
極層7を形成してカラーフィルタを製造する(F)。
2. Description of the Related Art First, an example of a method for manufacturing a color filter will be explained with reference to FIG. For example, by screen printing on a transparent substrate 1 such as glass, a line width of 60 μm and a pitch of 2 are printed.
A black light-shielding layer 2 consisting of a striped pattern with a thickness of about 00 μm and a film thickness of about 2 μm is formed (A). This black light-shielding layer may not be provided. Next, a first color, for example, a red coloring sensitive material is applied from above the black light-shielding layer 2, a photomask is placed, exposed, and developed to form a red pattern layer 3 (B). For example, after the color,
After coating green and blue coloring sensitive materials, a photomask is placed and exposed, followed by development to form green and blue pattern layers 4 and 5 (C, D). Each color pattern layer overlaps the black light-shielding layer 2 by about 20 to 30 μm on both sides in the longitudinal direction, and has a film thickness of about 2 μm. Next, for the purpose of physicochemical protection, surface smoothing, and flattening, a photocurable resin is applied on the color pattern layer to form a protective film layer 6 with a thickness of about 2 to 3 μm (E
). Furthermore, after forming a film of indium tin oxide (ITO) on the protective film layer 6 using a vacuum film forming method, a mask vapor deposition method,
Electrode pattern processing is performed using an etching method or the like to form a transparent electrode layer 7 to manufacture a color filter (F).

【0003】0003

【発明が解決しようとする課題】上記カラーフィルタの
製造工程において、図5に示すように着色用感材の塗布
工程において、ゴミ等の異物9が混入しこれがカラーパ
ターン層3に残留したり、カラーパターン層5の表面に
ゴミ等の異物10が付着すると、カラーパターン層の上
に保護膜層6を形成したとき、ゴミ等の異物9、10に
対応する部分に突起部11が形成されてしまう。また、
フォトマスクにゴミが付着するとカラーパターン層4に
白欠陥部12が生じてしまう。このような欠陥は、カラ
ーフィルタの表面に設けられる液晶セル内の液晶の配向
を阻害したり、撮像した映像や表示する映像の欠陥にな
り、カラーフィルタを使用した製品が不良になってしま
う。そこで、例えば、保護膜層を形成した後にレーザー
により保護膜に穴をあけ、これを塞ぐ方法を採用するこ
とが考えられるが、保護膜層は着色層の凹凸を平坦化し
、透明電極を形成しやすくする必要があり、前述の方法
を採用すると保護膜層の平滑性は極めて劣化してしまう
という問題を生じる。また、保護膜層は、透明電極を形
成する等の熱履歴を経るため、熱的に安定でなければな
らず、保護膜層形成後の修正は、熱的な歪等が発生した
場合には、クラック等の欠陥が発生するきっかけとなる
可能性があり、また、液晶層と着色層の化学的な分離の
点でも不利になる。
[Problems to be Solved by the Invention] In the manufacturing process of the above-mentioned color filter, as shown in FIG. If foreign matter 10 such as dust adheres to the surface of the color pattern layer 5, when the protective film layer 6 is formed on the color pattern layer, protrusions 11 will be formed in the portions corresponding to the foreign matter 9, 10 such as dust. Put it away. Also,
If dust adheres to the photomask, white defect portions 12 will occur in the color pattern layer 4. Such defects may disturb the alignment of liquid crystals in liquid crystal cells provided on the surface of the color filter, or cause defects in captured images or displayed images, resulting in products using the color filter being defective. Therefore, for example, it may be possible to adopt a method of forming a protective film layer and then drilling holes in the protective film with a laser and sealing the holes. However, the protective film layer flattens the unevenness of the colored layer and forms a transparent electrode. If the above-mentioned method is adopted, the problem arises that the smoothness of the protective film layer is extremely deteriorated. In addition, the protective film layer must be thermally stable because it undergoes a thermal history such as forming a transparent electrode, and corrections after the formation of the protective film layer should be avoided in case thermal distortion occurs. This may lead to the occurrence of defects such as cracks, and is also disadvantageous in terms of chemical separation of the liquid crystal layer and the colored layer.

【0004】本発明は上記問題を解決するものであって
、保護膜層を形成する前にレーザーにより欠陥部を除去
することにより、カラーフィルタの製造工程で生じる欠
陥部を容易に修正することができる方法を提供すること
を目的とする。
[0004] The present invention solves the above problem, and by removing the defective parts with a laser before forming the protective film layer, it is possible to easily correct the defective parts that occur during the manufacturing process of color filters. The purpose is to provide a method that can be used.

【0005】[0005]

【課題を解決するための手段】そのために、請求項1に
記載のカラーフィルタの欠陥部修正方法は、カラーパタ
ーン層の欠陥部表面に保護膜層を形成し、該欠陥部へレ
ーザービームを照射して欠陥部を除去した後、該除去部
分に前記カラーパターン層の色に対応した遮光性材料を
塗布し、次に、前記保護膜層を機械的に剥離させて前記
除去部分に遮光性材料を残留させ、最後に、遮光性材料
を紫外線又は熱により硬化させることを特徴とし、請求
項2に記載のカラーフィルタの欠陥部修正方法は、カラ
ーパターン層の欠陥部表面に保護膜層を形成し、該欠陥
部へレーザービームを照射して欠陥部を除去した後、該
除去部分に前記カラーパターン層の色に対応した遮光性
材料を塗布し、次に、該遮光性材料を紫外線又は熱によ
り硬化させ、最後に、前記保護膜層を機械的に剥離させ
て前記除去部分に遮光性材料を残留させることを特徴と
し、請求項3に記載のカラーフィルタの欠陥部修正方法
は、カラーパターン層の表面に仮の保護膜層を形成した
後、カラーパターン層の欠陥部にレーザービームを照射
して欠陥部を除去し、次に、前記仮の保護膜層を溶剤洗
浄で除去し、最後に、カラーフィルタの真の保護膜層を
形成することを特徴とする。
[Means for Solving the Problem] To this end, the method for repairing defective parts of a color filter according to claim 1 includes forming a protective film layer on the surface of the defective part of the color pattern layer, and irradiating the defective part with a laser beam. After removing the defective part, a light-shielding material corresponding to the color of the color pattern layer is applied to the removed part, and then the protective film layer is mechanically peeled off and a light-shielding material is applied to the removed part. remains, and finally, the light-shielding material is cured by ultraviolet rays or heat. After removing the defective part by irradiating the defective part with a laser beam, a light-shielding material corresponding to the color of the color pattern layer is applied to the removed part, and then the light-shielding material is exposed to ultraviolet rays or heat. and finally, the protective film layer is mechanically peeled off to leave the light-shielding material in the removed portion. After forming a temporary protective film layer on the surface of the layer, the defective part of the color pattern layer is irradiated with a laser beam to remove the defective part, then the temporary protective film layer is removed by solvent cleaning, and finally The method is characterized in that it forms a true protective film layer of the color filter.

【0006】[0006]

【作用】本発明においては、例えば図2に示すように、
異物9が混入した欠陥部に剥離性及び可撓性の良い材料
からなる保護膜層13を形成した後、欠陥部へレーザー
ビームを照射して異物9の周囲部分を除去した後、除去
部分にカラーパターン層3の色に対応した遮光性材料1
4を塗布し、次に、保護膜層13を機械的に剥離すると
除去部分に遮光性材料14が残る。最後に、遮光性材料
14が顔料等により着色された光硬化性樹脂の場合には
、透明基板1の表側又は裏側から紫外線を照射して遮光
性材料14を硬化させ、遮光性材料14が顔料等により
着色された熱硬化性樹脂の場合には、オーブンに入れて
遮光性材料14を硬化させ修正を終える。なお、透明基
板1の表側又は裏側からアンダー露光により紫外線を照
射して遮光性材料14の一部を硬化させた後、保護膜層
13を機械的に剥離するようにしてもよい。
[Operation] In the present invention, for example, as shown in FIG.
After forming a protective film layer 13 made of a material with good removability and flexibility on the defective part where the foreign matter 9 has entered, the defective part is irradiated with a laser beam to remove the surrounding part of the foreign matter 9, and then the removed part is covered with a protective film layer 13. Light-shielding material 1 corresponding to the color of color pattern layer 3
4 is applied, and then the protective film layer 13 is mechanically peeled off, leaving the light-shielding material 14 in the removed portion. Finally, if the light-shielding material 14 is a photocurable resin colored with a pigment or the like, ultraviolet rays are irradiated from the front or back side of the transparent substrate 1 to cure the light-shielding material 14. In the case of a colored thermosetting resin, the light-shielding material 14 is cured by placing it in an oven to complete the modification. Note that the protective film layer 13 may be mechanically peeled off after a part of the light-shielding material 14 is cured by irradiating ultraviolet rays from the front side or the back side of the transparent substrate 1 by under-exposure.

【0007】[0007]

【実施例】以下、本発明の実施例を図面を参照しつつ説
明する。図1及び図2は本発明のカラーフィルタの欠陥
部修正方法の1実施例を示し、図1は修正方法を説明す
るための図、図2は修正工程を示す拡大断面図である。
Embodiments Hereinafter, embodiments of the present invention will be described with reference to the drawings. 1 and 2 show one embodiment of the method for correcting defective portions of a color filter according to the present invention, FIG. 1 is a diagram for explaining the repair method, and FIG. 2 is an enlarged sectional view showing the repair process.

【0008】図2(A)において、1は透明基板、2は
ブラック遮光層、3はカラーパターン層を示し、カラー
パターン層3に異物9が混入した状態を示している。先
ず図1のステップ21及び図2(B)に示すように、異
物9が混入した欠陥部に保護膜層13をスポイト又はデ
ィスペンサにより塗布後、乾燥して形成する。この保護
膜層13は、カラーパターン層3に対して剥離性及び可
撓性の良い材料を用いる。本実施例においては、塩化ビ
ニル酢酸ビニル共重合体をトルエンとメチルエチルケト
ンの混合溶媒に固形分が15重量%となるように希釈し
た合成樹脂溶液を用いた。
In FIG. 2A, 1 is a transparent substrate, 2 is a black light-shielding layer, and 3 is a color pattern layer, and shows a state in which foreign matter 9 has been mixed into the color pattern layer 3. First, as shown in step 21 of FIG. 1 and FIG. 2(B), a protective film layer 13 is applied to the defective portion where the foreign matter 9 has entered using a dropper or dispenser, and then dried to form the protective film layer 13. This protective film layer 13 is made of a material with good peelability and flexibility with respect to the color pattern layer 3. In this example, a synthetic resin solution was used in which a vinyl chloride vinyl acetate copolymer was diluted in a mixed solvent of toluene and methyl ethyl ketone so that the solid content was 15% by weight.

【0009】次に、ステップ22及び図2(C)に示す
ように、欠陥部へレーザービームを照射して異物9の周
囲部分を除去した後、ステップ23及び図2(D)に示
すように、除去部分にカラーパターン層3の色に対応し
た遮光性材料14を塗布する。なお、欠陥部がブラック
遮光層であればブラックを塗布する。この遮光性材料1
4は光硬化性樹脂又は熱硬化性樹脂からなる。次に、ス
テップ24、25及び図2(E)に示すように、保護膜
層13を機械的に剥離すると除去部分に遮光性材料14
が残る。最後に、遮光性材料14が顔料等により着色さ
れた光硬化性樹脂の場合には、透明基板1の表側又は裏
側から紫外線を照射して遮光性材料14を硬化させ修正
を終える。また、遮光性材料14が顔料等により着色さ
れた熱硬化性樹脂の場合には、オーブンに入れて遮光性
材料14を硬化させ修正を終える。
Next, as shown in step 22 and FIG. 2(C), the defect area is irradiated with a laser beam to remove the surrounding part of the foreign object 9, and then, as shown in step 23 and FIG. 2(D), A light-shielding material 14 corresponding to the color of the color pattern layer 3 is applied to the removed portion. Note that if the defective portion is a black light-shielding layer, black is applied. This light-shielding material 1
4 is made of photocurable resin or thermosetting resin. Next, as shown in steps 24 and 25 and FIG.
remains. Finally, if the light-shielding material 14 is a photocurable resin colored with a pigment or the like, ultraviolet rays are irradiated from the front or back side of the transparent substrate 1 to harden the light-shielding material 14 and the modification is completed. If the light-shielding material 14 is a thermosetting resin colored with a pigment or the like, it is placed in an oven to harden the light-shielding material 14 and the correction is completed.

【0010】なお、ステップ24とステップ25を逆に
して、透明基板1の表側又は裏側からアンダー露光によ
り紫外線を照射して遮光性材料14の一部を硬化させた
後、保護膜層13を機械的に剥離するようにしてもよい
。また、上記実施例においては突起の原因となる異物9
の除去、修正について説明しているが、図5で説明した
白欠陥部12の修正についても同様の方法で修正可能で
ある。
Note that steps 24 and 25 are reversed, and after curing a part of the light-shielding material 14 by irradiating ultraviolet rays from the front or back side of the transparent substrate 1 by under-exposure, the protective film layer 13 is mechanically removed. It may also be peeled off. In addition, in the above embodiment, the foreign matter 9 that causes the protrusion is
Although the removal and correction of the white defect portion 12 explained in FIG.

【0011】次に図3により本発明の他の実施例につい
て説明する。本実施例は異物の除去に適用される。カラ
ーパターンが形成されている表面は、凹凸が大きくカラ
ーパターン形成時の異物による欠陥が観察しにくく、表
面を滑らかにして異物の検出を容易にするために、先ず
、ステップ31において、溶剤洗浄で除去可能な仮の保
護膜層をスピンコート法により形成する。この保護膜層
としては、異物の検出が容易にできる樹脂を選定する。 本実施例においては商品名レノタックを用いた。次に、
ステップ32において、観察が容易になった異物にレー
ザービームを20μm程度のスポットで照射して異物の
周囲部分を除去した後、ステップ33において、仮の保
護膜層を溶剤洗浄で除去し、最後にステップ34におい
て、ITO耐性の良好な真の保護膜層をスピンコート法
により形成する。本実施例においては、欠陥部が20μ
m程度の白抜きのスポットになるが、肉眼では判別でき
ないためカラーパターンの修正は行わない。なお、欠陥
部が20μm程度以上の大きさの場合には、図2に示す
方法で修正する。
Next, another embodiment of the present invention will be explained with reference to FIG. This embodiment is applied to removing foreign matter. The surface on which the color pattern is formed has large irregularities that make it difficult to observe defects caused by foreign matter during color pattern formation.In order to smooth the surface and make it easier to detect foreign matter, first, in step 31, solvent cleaning is performed. A removable temporary protective film layer is formed by spin coating. For this protective film layer, a resin is selected that allows easy detection of foreign substances. In this example, the trade name Renotac was used. next,
In step 32, the foreign object that has become easier to observe is irradiated with a laser beam in a spot of about 20 μm to remove the surrounding area of the foreign object.In step 33, the temporary protective film layer is removed by solvent cleaning, and finally In step 34, a true protective film layer with good ITO resistance is formed by spin coating. In this example, the defective part is 20μ
The color pattern will not be corrected because it will be a white spot with a size of about m, but it cannot be distinguished with the naked eye. Note that if the defective portion has a size of approximately 20 μm or more, it is corrected by the method shown in FIG. 2.

【0012】0012

【発明の効果】以上の説明から明らかなように本発明に
よれば、保護膜層を形成する前にレーザーにより欠陥部
を除去するため、修正による多少の凹凸は次の工程での
保護膜形成により平坦化されるという効果を有し、また
、保護膜層形成後の修正のように、熱的な歪等が発生す
る恐れがないと共に、液晶層と着色層の化学的な分離の
点でも不利になることがない。そして、カラーフィルタ
の製造工程で生じる欠陥部を容易に修正することができ
る。
[Effects of the Invention] As is clear from the above description, according to the present invention, defects are removed by laser before forming a protective film layer, so that some irregularities caused by correction can be removed by forming the protective film in the next step. This has the effect of flattening the liquid crystal layer, and there is no risk of thermal distortion occurring during modification after the formation of the protective film layer. You will never be at a disadvantage. In addition, defects that occur during the color filter manufacturing process can be easily corrected.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の欠陥部修正方法の1実施例を説明する
ための図
[Fig. 1] A diagram for explaining one embodiment of the defect repair method of the present invention.

【図2】本発明の欠陥部修正方法の1実施例示す拡大断
面図
FIG. 2 is an enlarged sectional view showing one embodiment of the defect repair method of the present invention.

【図3】本発明の欠陥部修正方法の他の実施例を説明す
るための図
FIG. 3 is a diagram for explaining another embodiment of the defect repair method of the present invention.

【図4】カラーフィルタの製造方法を説明するための拡
大断面図
[Fig. 4] Enlarged cross-sectional view for explaining the method of manufacturing a color filter

【図5】カラーフィルタの欠陥部を説明するための拡大
断面図
[Fig. 5] Enlarged cross-sectional view for explaining defective parts of color filters

【符号の説明】[Explanation of symbols]

1…透明基板、2…ブラック遮光層、3…カラーパター
ン層、9…異物、13…保護膜層、14…遮光性材料。
DESCRIPTION OF SYMBOLS 1... Transparent substrate, 2... Black light shielding layer, 3... Color pattern layer, 9... Foreign matter, 13... Protective film layer, 14... Light blocking material.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】カラーパターン層の欠陥部表面に保護膜層
を形成し、該欠陥部へレーザービームを照射して欠陥部
を除去した後、該除去部分に前記カラーパターン層の色
に対応した遮光性材料を塗布し、次に、前記保護膜層を
機械的に剥離させて前記除去部分に遮光性材料を残留さ
せ、最後に、遮光性材料を紫外線又は熱により硬化させ
ることを特徴とするカラーフィルタの欠陥部修正方法。
1. A protective film layer is formed on the surface of the defective part of the color pattern layer, and after the defective part is removed by irradiating the defective part with a laser beam, the removed part is coated with a color corresponding to the color of the color pattern layer. A light-shielding material is applied, then the protective film layer is mechanically peeled off to leave the light-shielding material in the removed portion, and finally, the light-shielding material is cured by ultraviolet rays or heat. How to repair defects in color filters.
【請求項2】カラーパターン層の欠陥部表面に保護膜層
を形成し、該欠陥部へレーザービームを照射して欠陥部
を除去した後、該除去部分に前記カラーパターン層の色
に対応した遮光性材料を塗布し、次に、該遮光性材料を
紫外線又は熱により硬化させ、最後に、前記保護膜層を
機械的に剥離させて前記除去部分に遮光性材料を残留さ
せることを特徴とするカラーフィルタの欠陥部修正方法
2. A protective film layer is formed on the surface of the defective part of the color pattern layer, and after the defective part is removed by irradiating the defective part with a laser beam, the removed part is coated with a color corresponding to the color of the color pattern layer. A light-shielding material is applied, then the light-shielding material is cured by ultraviolet rays or heat, and finally, the protective film layer is mechanically peeled off to leave the light-shielding material in the removed portion. A method for repairing defects in color filters.
【請求項3】カラーパターン層の表面に仮の保護膜層を
形成した後、カラーパターン層の欠陥部にレーザービー
ムを照射して欠陥部を除去し、次に、前記仮の保護膜層
を溶剤洗浄で除去し、最後に、カラーフィルタの真の保
護膜層を形成することを特徴とするカラーフィルタの欠
陥部修正方法。
3. After forming a temporary protective film layer on the surface of the color pattern layer, the defective part of the color pattern layer is irradiated with a laser beam to remove the defective part, and then the temporary protective film layer is removed. A method for correcting defects in a color filter, which comprises removing the defects by solvent cleaning and finally forming a true protective film layer of the color filter.
JP3147111A 1991-06-19 1991-06-19 Defect part correcting method for color filter Pending JPH04369604A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3147111A JPH04369604A (en) 1991-06-19 1991-06-19 Defect part correcting method for color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3147111A JPH04369604A (en) 1991-06-19 1991-06-19 Defect part correcting method for color filter

Publications (1)

Publication Number Publication Date
JPH04369604A true JPH04369604A (en) 1992-12-22

Family

ID=15422776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3147111A Pending JPH04369604A (en) 1991-06-19 1991-06-19 Defect part correcting method for color filter

Country Status (1)

Country Link
JP (1) JPH04369604A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0707231A2 (en) 1994-10-13 1996-04-17 Shinto Paint Co., Ltd. Method for repairing a defective color filter
CN1099041C (en) * 1994-03-31 2003-01-15 佳能株式会社 Repairing method for color filter and equipment, color filter, liquid crystal displayer, and equipment with liquid crystal displayer
JP2003066218A (en) * 2001-08-28 2003-03-05 Canon Inc Method for repairing defect in color filter
KR100447379B1 (en) * 1994-03-28 2004-11-02 샤프 가부시키가이샤 Method for correcting defects in color filters
JP2007101809A (en) * 2005-10-03 2007-04-19 Sharp Corp Method of correcting color filter
JP2009145533A (en) * 2007-12-13 2009-07-02 Toppan Printing Co Ltd Correcting method for color filter
JP4664446B2 (en) * 2009-02-10 2011-04-06 パナソニック株式会社 Manufacturing method of organic EL display

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100447379B1 (en) * 1994-03-28 2004-11-02 샤프 가부시키가이샤 Method for correcting defects in color filters
CN1099041C (en) * 1994-03-31 2003-01-15 佳能株式会社 Repairing method for color filter and equipment, color filter, liquid crystal displayer, and equipment with liquid crystal displayer
EP0707231A2 (en) 1994-10-13 1996-04-17 Shinto Paint Co., Ltd. Method for repairing a defective color filter
EP0707231A3 (en) * 1994-10-13 1996-07-17 Shinto Paint Co Ltd Method for repairing a defective color filter
JP2003066218A (en) * 2001-08-28 2003-03-05 Canon Inc Method for repairing defect in color filter
JP2007101809A (en) * 2005-10-03 2007-04-19 Sharp Corp Method of correcting color filter
JP2009145533A (en) * 2007-12-13 2009-07-02 Toppan Printing Co Ltd Correcting method for color filter
JP4664446B2 (en) * 2009-02-10 2011-04-06 パナソニック株式会社 Manufacturing method of organic EL display

Similar Documents

Publication Publication Date Title
US6828069B1 (en) Method for correcting defects on color filter
JPH04369604A (en) Defect part correcting method for color filter
JPH0527111A (en) Defect correcting method for color filter in color liquid crystal display device
JP2008145828A (en) Method for recorrecting color filter
JP3683785B2 (en) Liquid crystal display device and manufacturing method thereof
JPH03274504A (en) Method for correcting color filter and color filter already corrected
JPH07120613A (en) Manufacture of color filter
JPH05303014A (en) Correcting method for color filter
JP5668439B2 (en) Color filter substrate defect correcting method and color filter substrate
JP4924118B2 (en) How to re-correct the color filter
JP2993772B2 (en) Common defect inspection method for color filters
JP5488170B2 (en) Color filter correction method and color filter
JPH0829615A (en) Correcting method of pattern
JPH02262603A (en) Method for correcting pattern
JP2008058579A (en) Method of manufacturing color filter
JP4578194B2 (en) Color filter and manufacturing method thereof
JPH0643468A (en) Method for controlling gap in liquid crystal cell
JP5200577B2 (en) Color filter defect correction method
JPH07270808A (en) Production of liquid crystal display device
JP3159475B2 (en) Inspection method for color filter defects
JP2002072187A (en) Liquid crystal display device
JP2013080148A (en) Correction method for color filter
JP2006047800A (en) Color filter
JP2005024880A (en) Manufacturing method of color filter, and color filter
JPH0829770A (en) Production of color filter substrate for liquid crystal display device