JPH04367522A - Production of substrate equipped with quartz glass film - Google Patents

Production of substrate equipped with quartz glass film

Info

Publication number
JPH04367522A
JPH04367522A JP14304591A JP14304591A JPH04367522A JP H04367522 A JPH04367522 A JP H04367522A JP 14304591 A JP14304591 A JP 14304591A JP 14304591 A JP14304591 A JP 14304591A JP H04367522 A JPH04367522 A JP H04367522A
Authority
JP
Japan
Prior art keywords
substrate
water
film
liquid
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14304591A
Other languages
Japanese (ja)
Inventor
Hiroaki Okano
広明 岡野
Toshihide Tokunaga
徳永 利秀
Mikio Ogoshi
幹夫 大越
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP14304591A priority Critical patent/JPH04367522A/en
Publication of JPH04367522A publication Critical patent/JPH04367522A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/12Other methods of shaping glass by liquid-phase reaction processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE:To make it possible to form a glass film having >=5mum thickness. CONSTITUTION:A liquid 4 insoluble in water and having a specific gravity larger than that of water is put in a vessel 1 and a glass substrate 5 is allowed to float on the liquid 4 and simultaneously water 8 is charged and a metal alkoxide solution 9 diluted with the a solvent is put on the water 4 to form a wet gel film 10 on the interface between the metal alkoxide solution 9 and water 8 and then water in the vessel 1 is discharged and the get film 10 is allowed to stand on a substrate 5 floated on the liquid 4 and the gel film 8 is dried together with the substrate 5 and sintered to produce the objective substrate.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、基板の表面に透明なガ
ラス膜を密着性よく成膜するガラス膜付基板の製造方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a glass film-coated substrate in which a transparent glass film is formed on the surface of the substrate with good adhesion.

【0002】0002

【従来の技術】金属アルコキシド溶液を用いて基板上に
ガラス膜を成膜するゾル・ゲル法が注目されている。従
来、このゾル・ゲル法によるガラス膜の成膜例として、
金属アルコキシド溶液をガラス等の基板上にディップコ
ート法あるいはスピンコート法により塗布し、乾燥後、
加熱することによって0.1〜0,3μmの膜厚の透明
で均一なガラス膜が得られている。また、増粘剤を添加
することによって最大0.5μmの膜厚が実現されてい
る(金属アルコキシドを用いるコーティング膜の性質に
関する研究、窯業協会誌、90[6]、1982)。
2. Description of the Related Art The sol-gel method, which forms a glass film on a substrate using a metal alkoxide solution, is attracting attention. Conventionally, as an example of forming a glass film using this sol-gel method,
A metal alkoxide solution is applied onto a substrate such as glass by dip coating or spin coating, and after drying,
By heating, a transparent and uniform glass film with a thickness of 0.1 to 0.3 μm is obtained. Furthermore, a maximum film thickness of 0.5 μm has been achieved by adding a thickener (Study on the properties of coating films using metal alkoxides, Journal of the Ceramics Association, 90 [6], 1982).

【0003】上記数値は1回の浸漬、乾燥、加熱の操作
によって成膜できる膜厚値である。更に厚い膜を実現す
る方法として、上記操作の1回当りの成膜する膜厚を薄
くし、何回も繰り返し操作する方法も検討され、1.5
μm程度の膜厚が得られている。
[0003] The above numerical values are the film thickness values that can be formed by a single operation of dipping, drying, and heating. As a method to achieve an even thicker film, a method of reducing the thickness of the film formed per one operation and repeating the operation many times has been considered.
A film thickness on the order of μm has been obtained.

【0004】0004

【発明が解決しようとする課題】このように従来のディ
ップコート法やスピンコート法によるガラス膜の成膜で
は、1.5μm程度の膜厚が限界であり、それ以上の膜
厚を実現しようとすると、クラック、剥離などの欠陥が
生じることが知られている。すなわち、5μm以上の膜
厚のガラス膜を基板上に成膜することは不可能であった
[Problems to be Solved by the Invention] As described above, the film thickness of approximately 1.5 μm is the limit in forming a glass film using the conventional dip coating method or spin coating method, and attempts have been made to achieve a film thickness larger than that. It is known that this causes defects such as cracks and peeling. That is, it has been impossible to form a glass film with a thickness of 5 μm or more on a substrate.

【0005】そこで、本発明の目的は、上記課題を解決
し、5μm以上の厚さのガラス膜を成膜することができ
るガラス膜付基板の製造方法を提供することにある。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a method for manufacturing a glass film-coated substrate, which solves the above-mentioned problems and can form a glass film with a thickness of 5 μm or more.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に本発明は、容器内に水に不溶で水よりも比重の大きい
液体を入れ、該液体上にガラス基板を浮かせると共に水
を入れ、該水上に溶剤で希釈した金属アルコキシド溶液
を入れて、該金属アルコキシド溶液と水の界面にウエッ
ト状のゲル膜を形成させた後、容器内を排水してゲル膜
を液体に浮いた基板上に静置し、該ゲル膜を基板ごと乾
燥後、焼結することを特徴とする。
[Means for Solving the Problems] In order to achieve the above object, the present invention includes a container in which a liquid that is insoluble in water and has a higher specific gravity than water is placed in a container, a glass substrate is floated on the liquid, and water is also placed in the container. A metal alkoxide solution diluted with a solvent is poured onto the water to form a wet gel film at the interface between the metal alkoxide solution and the water, and then the inside of the container is drained and the gel film is placed on the substrate floating in the liquid. The gel film is allowed to stand still, and the gel film is dried along with the substrate, and then sintered.

【0007】[0007]

【作用】容器内には、水に不溶で水よりも比重の大きい
液体、水および金属アルコキシド溶液が層状に入れられ
、その最下層の液体上にはガラス基板が浮き、水と金属
アルコキシド溶液との界面にはウエット状のゲル膜が形
成される。
[Function] A liquid that is insoluble in water and has a higher specific gravity than water, water, and a metal alkoxide solution are placed in layers in the container, and a glass substrate floats on top of the liquid in the bottom layer. A wet gel film is formed at the interface.

【0008】ゲル膜が形成されたなら、容器内の水等を
排水することによりゲル膜を降下させて基板上に載せる
ため、ゲル膜を基板上に容易に静置させることが可能と
なる。その際、基板が液体上に浮いているため、容器が
水平に設置されていなくても、ゲル膜を基板上に水平に
静置させることができる。
[0008] Once the gel film is formed, the gel film is lowered and placed on the substrate by draining the water in the container, so that the gel film can be easily left still on the substrate. At this time, since the substrate is floating on the liquid, the gel film can be placed horizontally on the substrate even if the container is not installed horizontally.

【0009】そして、ゲル膜を基板表面に載せた状態で
乾燥した後、焼結するため、焼結に伴う膜の収縮の不均
衡が緩和され、膜中に発生する内部応力が小さく、クラ
ックや剥離などの欠陥が生じない。
[0009] Since the gel film is dried on the substrate surface and then sintered, the imbalance in shrinkage of the film due to sintering is alleviated, the internal stress generated in the film is small, and cracks and No defects such as peeling occur.

【0010】以上により基板表面に透明で5μm以上の
厚いガラス膜を成膜することが可能となる。
[0010] As described above, it becomes possible to form a transparent glass film with a thickness of 5 μm or more on the surface of the substrate.

【0011】[0011]

【実施例】以下、本発明方法について添付図面を参照し
て詳述する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The method of the present invention will be described in detail below with reference to the accompanying drawings.

【0012】図1は、本発明方法を説明するための工程
図で、(a)に示すように容器1内の水8の表面にウエ
ット状のゲル膜10を形成する工程と、(b)に示すよ
うにそのゲル膜10をガラス基板5の表面に載せる工程
と、(c)に示すようにゲル膜10を乾燥させる工程と
、(d)に示すように乾燥したゲル膜10を焼結してガ
ラス膜13を成膜する工程の4つの工程からなる。
FIG. 1 is a process diagram for explaining the method of the present invention, which includes the steps of forming a wet gel film 10 on the surface of water 8 in a container 1 as shown in (a), and (b) A step of placing the gel film 10 on the surface of the glass substrate 5 as shown in (c), a step of drying the gel film 10 as shown in (d), and a step of sintering the dried gel film 10 as shown in (d). The process consists of four steps: forming the glass film 13.

【0013】先ず、(a)の工程から説明すると、1は
円筒状の反応用容器1で、この容器1の側壁には底部よ
りも少し高い位置に排水弁2を有する排水口3が設けら
れている。このように排水口3を容器1の底部よりも高
い位置に設けたのは、後述するように容器1内を排水す
るときに基板5を浮かせておくための液体4の溜り部6
を確保しておくためである。なお、容器1の底部にも溜
り部6に残った液体4を排水するための排水口を設ける
ようにしてもよい。
First, to explain step (a), 1 is a cylindrical reaction vessel 1, and the side wall of this vessel 1 is provided with a drain port 3 having a drain valve 2 at a position slightly higher than the bottom. ing. The reason why the drain port 3 is provided at a higher position than the bottom of the container 1 is because the liquid 4 is stored in a reservoir 6 for keeping the substrate 5 floating when draining the inside of the container 1, as will be described later.
This is to ensure that. Note that a drain port may also be provided at the bottom of the container 1 for draining the liquid 4 remaining in the reservoir 6.

【0014】上記容器1内に水に不溶(水と混ざらない
)で、かつ水よりも比重の重い液体4を入れる。本実施
例ではこの液体4として、住友スリーエム(株)製のフ
ロリナート(FC−40)を用い、容器1内に約30g
入れた。
A liquid 4 that is insoluble in water (does not mix with water) and has a higher specific gravity than water is placed in the container 1. In this example, Fluorinert (FC-40) manufactured by Sumitomo 3M Ltd. was used as the liquid 4, and about 30g was placed in the container 1.
I put it in.

【0015】次に、その液体4上にガラス基板5を浮か
せる。基板5を液体4の表面に確実に浮かせるために基
板5の裏面に発砲スチロールからなる浮板7を貼り付け
た。また、基板5として、厚さ1mmの3インチ石英ガ
ラス板を用いた。
Next, a glass substrate 5 is floated on the liquid 4. In order to ensure that the substrate 5 floats on the surface of the liquid 4, a floating plate 7 made of styrene foam was attached to the back surface of the substrate 5. Further, as the substrate 5, a 3-inch quartz glass plate with a thickness of 1 mm was used.

【0016】次に、上記液体4上に水8を注ぎ入れる。 水8はpHが3〜13の範囲に調整され、重量が5〜3
0gの範囲であることが好ましい。本実施例では、水8
のpHを10.5とし、重量を20gとした。
Next, water 8 is poured onto the liquid 4. Water 8 has a pH adjusted to a range of 3 to 13 and a weight of 5 to 3.
A range of 0g is preferable. In this example, water 8
The pH of the sample was set to 10.5, and the weight was set to 20 g.

【0017】次に、水8の上に溶剤で希釈した金属アル
コキシド溶液9を注ぎ入れる。金属アルコキシドとして
は、Si(OCH3 )4 、Si(OC2 H5 )
4 、Si(OC4 H9 )4 などを少なくとも一
種含んだものであればよい。溶剤としては、ベンゼン、
ペンタン、ヘキサン、シクロヘキサンなどの炭化水素系
溶剤のように、金属アルコキシド液を溶かし、水に不溶
で、かつ水よりも比重の小さいものであればよい。本実
施例では、Si(OCH3 )4 7.5gをヘキサン
5gに溶かした金属アルコキシド溶液9を用いた。
Next, a metal alkoxide solution 9 diluted with a solvent is poured onto the water 8. Examples of metal alkoxides include Si(OCH3)4, Si(OC2H5)
4, Si(OC4H9)4, or the like. As a solvent, benzene,
Any hydrocarbon solvent such as pentane, hexane, cyclohexane, etc. that dissolves the metal alkoxide liquid, is insoluble in water, and has a specific gravity lower than that of water may be used. In this example, a metal alkoxide solution 9 in which 7.5 g of Si(OCH3)4 was dissolved in 5 g of hexane was used.

【0018】そして、上記容器1の上部に蓋(図示省略
)をして所定時間放置する。放置時間は、5〜30時間
の範囲が適当であり、本実施例では15時間とした。 これにより水8と溶液9の界面にはウエット状のゲル膜
10が形成される。
[0018] Then, a lid (not shown) is placed on the top of the container 1 and the container 1 is left for a predetermined period of time. The appropriate standing time is in the range of 5 to 30 hours, and in this example it was 15 hours. As a result, a wet gel film 10 is formed at the interface between the water 8 and the solution 9.

【0019】次に、排水弁2を開いて容器1内の液体4
、水8および溶液9を排水口3から徐々に排水し、ゲル
膜10を降下されて基板4の上面に静載させる。この場
合、図1の(b)に示すように容器1の底部には液体4
の溜り部6が設けられているので、ガラス基板5は最後
まで液体4上に浮いたままでいる。従って、容器1が精
密に水平に設置されていなくても、基板5は液体4の表
面に浮いて常に水平を維持されているので、基板を支持
台等の固定部に固定した場合と異なり、ゲル膜10を基
板5の表面に精密に水平に静置させることができる。
Next, the drain valve 2 is opened to drain the liquid 4 in the container 1.
, the water 8 and the solution 9 are gradually drained from the drain port 3, and the gel film 10 is lowered and statically placed on the upper surface of the substrate 4. In this case, as shown in FIG. 1(b), there is a liquid 4 at the bottom of the container 1.
Since the reservoir 6 is provided, the glass substrate 5 remains floating on the liquid 4 until the end. Therefore, even if the container 1 is not placed precisely horizontally, the substrate 5 floats on the surface of the liquid 4 and is always maintained horizontally, unlike when the substrate is fixed to a fixed part such as a support stand. The gel film 10 can be placed horizontally and precisely on the surface of the substrate 5.

【0020】次に、(c)に示すようにゲル膜10を基
板5ごとシャーレ11に移し、約20℃の温度に保って
48時間乾燥させ、水気を無くす。そして、その乾燥し
たゲル膜11を基板5ごと電気炉12に移し、約120
0〜1500℃の温度で2時間加熱して焼結すると、基
板4の表面に透明なSiO2 のガラス膜13が密着性
よく成膜されるガラス膜付基板が得られる。本実施例に
よれば、10μmという従来にない厚いガラス膜13を
基板5上に成膜することに成功した。
Next, as shown in (c), the gel film 10 together with the substrate 5 is transferred to a petri dish 11, and dried at a temperature of about 20° C. for 48 hours to remove moisture. Then, the dried gel film 11 was transferred together with the substrate 5 to an electric furnace 12, and
By heating and sintering at a temperature of 0 to 1500 DEG C. for 2 hours, a glass film coated substrate is obtained in which a transparent SiO2 glass film 13 is formed on the surface of the substrate 4 with good adhesion. According to this example, it was possible to successfully form the glass film 13 on the substrate 5, which is 10 μm, which is unprecedentedly thick.

【0021】なお、本発明方法を用いれば、種々のドー
パントを含んだ組成のガラス膜13も形成可能であり、
また表面が複雑な形状を有する基板5の表面へもガラス
膜13の成膜が可能である。
[0021] By using the method of the present invention, it is also possible to form the glass film 13 having a composition containing various dopants.
Further, the glass film 13 can also be formed on the surface of the substrate 5 whose surface has a complicated shape.

【0022】[0022]

【発明の効果】以上要するに本発明によれば、容器内に
おいて水と金属アルコキシド溶液の界面に形成したウエ
ット状のゲル膜を容器内の水等の排水により液体上に浮
いた基板上に水平に静置させることができ、そのゲル膜
を基板ごと乾燥した後、焼結することにより、基板表面
に透明で5μm以上の厚いガラス膜を密着性よく成膜す
ることができる。
In summary, according to the present invention, a wet gel film formed at the interface between water and a metal alkoxide solution in a container is horizontally spread onto a substrate floating on the liquid by draining the water in the container. By drying the gel film along with the substrate and sintering it, a transparent glass film with a thickness of 5 μm or more can be formed on the substrate surface with good adhesion.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明に係るガラス膜付基板の製造方法を示す
工程図である。
FIG. 1 is a process diagram showing a method for manufacturing a glass film-coated substrate according to the present invention.

【符号の説明】[Explanation of symbols]

1  容器 4  液体 5  ガラス基板 8  水 9  アルコキシド溶液 10  ゲル膜 1 Container 4. Liquid 5 Glass substrate 8 Water 9 Alkoxide solution 10 Gel membrane

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  容器内に水に不溶で水よりも比重の大
きい液体を入れ、該液体上にガラス基板を浮かせると共
に水を入れ、該水上に溶剤で希釈した金属アルコキシド
溶液を入れて、該金属アルコキシド溶液と水の界面にウ
エット状のゲル膜を形成させた後、容器内の水等を排水
してゲル膜を液体に浮いた基板上に静置し、該ゲル膜を
基板ごと乾燥後、焼結することを特徴とするガラス膜付
基板の製造方法。
Claim 1: A liquid that is insoluble in water and has a higher specific gravity than water is placed in a container, a glass substrate is floated on top of the liquid, water is also placed in the container, and a metal alkoxide solution diluted with a solvent is placed on top of the water. After a wet gel film is formed at the interface between the metal alkoxide solution and water, the water in the container is drained, the gel film is placed on a substrate floating in the liquid, and the gel film is dried together with the substrate. A method for manufacturing a substrate with a glass film, characterized by sintering the substrate.
【請求項2】  上記ガラス基板が、裏面に上記液体に
浮くための浮板を有していることを特徴とする請求項1
に記載のガラス膜付基板の製造方法。
2. Claim 1, wherein the glass substrate has a floating plate on its back surface for floating on the liquid.
A method for manufacturing a glass film-coated substrate according to .
JP14304591A 1991-06-14 1991-06-14 Production of substrate equipped with quartz glass film Pending JPH04367522A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14304591A JPH04367522A (en) 1991-06-14 1991-06-14 Production of substrate equipped with quartz glass film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14304591A JPH04367522A (en) 1991-06-14 1991-06-14 Production of substrate equipped with quartz glass film

Publications (1)

Publication Number Publication Date
JPH04367522A true JPH04367522A (en) 1992-12-18

Family

ID=15329627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14304591A Pending JPH04367522A (en) 1991-06-14 1991-06-14 Production of substrate equipped with quartz glass film

Country Status (1)

Country Link
JP (1) JPH04367522A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0719735A1 (en) * 1994-12-29 1996-07-03 AT&T Corp. Fabrication of a thin sheet by a sol-gel process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0719735A1 (en) * 1994-12-29 1996-07-03 AT&T Corp. Fabrication of a thin sheet by a sol-gel process

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