JPH0367978B2 - - Google Patents

Info

Publication number
JPH0367978B2
JPH0367978B2 JP1516183A JP1516183A JPH0367978B2 JP H0367978 B2 JPH0367978 B2 JP H0367978B2 JP 1516183 A JP1516183 A JP 1516183A JP 1516183 A JP1516183 A JP 1516183A JP H0367978 B2 JPH0367978 B2 JP H0367978B2
Authority
JP
Japan
Prior art keywords
titanium
glass
oxide film
titanium oxide
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1516183A
Other languages
Japanese (ja)
Other versions
JPS59141441A (en
Inventor
Hideo Kawahara
Hisao Pponda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP1516183A priority Critical patent/JPS59141441A/en
Publication of JPS59141441A publication Critical patent/JPS59141441A/en
Publication of JPH0367978B2 publication Critical patent/JPH0367978B2/ja
Granted legal-status Critical Current

Links

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  • Surface Treatment Of Glass (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は酸化チタン膜被覆ガラスを製造する方
法、更に詳しくは液相での析出現象を利用してガ
ラス表面に酸化チタン膜を形成する方法に関す
る。従来によりガラスに金属酸化物被覆加工を行
ない、ガラスに所望の光学的性質ないしは電気的
性質を付与することが行なわれている。 中でも酸化チタン膜は高屈析率故光学的反射率
が高く、かつその反射色調も美しいシルバー調で
あることから、近年熱線反射ガラスとして多く用
いられるようになつてきた。また、酸化チタン膜
の化学的安定性を利用し、ガラス表面に形成した
他の被膜の保護膜または絶縁膜として用いること
も注目されている。 酸化チタン膜被覆ガラスを製造する方法は高温
のガラス表面にチタニウムアセチルアセトナー
ト、チタニウムオクチレングリコールなどの有機
チタン化合物を含む溶液を吹付けて被膜を形成す
るスプレー法、高温のガラス表面に四塩化チタン
の蒸気を吹付けて被膜を形成するCVD法、また
はチタニウムイソプロポキサイド等を含む溶液に
ガラスを浸漬し、引上げた後、ガラスを高温に加
熱して被膜を形成する浸漬塗布法等が知られてい
る。 しかしながら、これらの方法では大面積のガラ
スに酸化チタン膜を均一に形成させるのが困難で
例えば浸漬塗布法の場合、浸漬液の組成・粘性管
理、ガラス引上速度の均一化、浸漬液面の波立ち
防止など多くの面で様々な工夫が試みられている
が、厚味不均一は依然として大きな問題であつ
た。更には有機溶媒又はチタン化合物などの蒸気
の着火・作業環境悪化も重大な問題であつた。 本発明はかかる問題に鑑み新しい酸化チタン膜
被覆ガラスの製造方法を提供するもので、1当
り1.0モル以下のチタンフツ化水素酸を含む酸化
亜鉛を飽和した水溶液に、ホウ酸を1当り0.4
乃至1.0モル添加するとガラスを浸漬することに
より酸化チタン膜被覆ガラスを製造する方法であ
る。 本発明において、チタンフツ化水素酸は水で希
釈され、その濃度は1.0モル/以下に調整され
る。チタンフツ化水素酸の濃度が1.0モル/を
超えると、酸化チタン膜は形成されなかつたり、
その形成速度が遅かつたりする欠点がある。特に
チタンフツ化水素酸の濃度を0.3乃至1.0モル/
にすれば形成される酸化チタン膜は形成速度が早
く、緻密度が高くなる。前記の如く好適に調整さ
れたチタンフツ化水素酸の水溶液は酸化亜鉛で飽
和され40℃以下の温度で保存される。 また本発明において、チタンフツ化水素酸を含
む酸化亜鉛の飽和水溶液に添加するホウ酸はチタ
ンフツ化水素酸の濃度により最適添加量が変わ
り、この添加量は少なすぎるとガラスがエツチン
グされ、この添加量が多すぎると溶液中に酸化チ
タンの微結晶が析出し、溶液が白濁し、いずれの
場合にもガラス表面への酸化チタン膜の形成は起
らない。チタンフツ化水素酸の濃度を1.0モル/
以下のときホウ酸の添加量は0.4乃至1.0モル/
、特に好ましくは0.4乃至0.75モル/である。 以上の如き濃度のチタンフツ化水素酸とホウ酸
とを含む酸化亜鉛の飽和溶液にガラスを接触、あ
るいは浸漬する3時間経過後にガラス表面に均一
な酸化チタン膜が形成できる。 このようにして製造された酸化チタン膜被覆ガ
ラスは通常300乃至600℃、好ましくは500乃至550
℃で10分間以上加熱焼成して酸化チタン膜の付着
強度を強化される。 以下に本発明の実施例と比較例について詳述す
る。 チタンフツ化水素酸の濃度が3モル/である
水溶液1に酸化亜鉛粉末400gを添加し撹拌し
The present invention relates to a method for producing glass coated with a titanium oxide film, and more particularly to a method for forming a titanium oxide film on a glass surface by utilizing a precipitation phenomenon in the liquid phase. BACKGROUND OF THE INVENTION Conventionally, glass has been coated with metal oxides to impart desired optical or electrical properties to the glass. Among them, titanium oxide film has a high optical reflectance due to its high refractive index, and its reflection color is a beautiful silver tone, so it has recently come to be widely used as heat ray reflective glass. Furthermore, utilizing the chemical stability of the titanium oxide film, it is also attracting attention to use it as a protective film or an insulating film for other films formed on the glass surface. The methods for producing glass coated with titanium oxide film include the spray method, in which a solution containing organic titanium compounds such as titanium acetylacetonate and titanium octylene glycol is sprayed onto the high-temperature glass surface to form a film; The CVD method, in which a film is formed by spraying titanium vapor, or the dip coating method, in which the glass is immersed in a solution containing titanium isopropoxide, etc., pulled up, and then heated to a high temperature to form a film, are known. It is being However, with these methods, it is difficult to uniformly form a titanium oxide film on a large area of glass. Although various efforts have been made to prevent ripples and other aspects, uneven thickness remains a major problem. Furthermore, ignition of vapors from organic solvents or titanium compounds and deterioration of the working environment were also serious problems. In view of this problem, the present invention provides a new method for producing glass coated with a titanium oxide film, in which 0.4 mole of boric acid is added to an aqueous solution saturated with zinc oxide containing 1.0 mole or less of titanium hydrofluoric acid.
When 1.0 mol to 1.0 mol of titanium oxide is added, the glass is immersed to produce titanium oxide film-coated glass. In the present invention, titanium hydrofluoric acid is diluted with water, and its concentration is adjusted to 1.0 mol/or less. When the concentration of titanium hydrofluoric acid exceeds 1.0 mol/cm, a titanium oxide film is not formed or
The disadvantage is that the formation speed is slow and the formation rate is slow. In particular, the concentration of titanium hydrofluoric acid should be adjusted from 0.3 to 1.0 mol/
If this is done, the titanium oxide film formed will be formed at a faster rate and will have a higher density. The titanium hydrofluoric acid aqueous solution suitably prepared as described above is saturated with zinc oxide and stored at a temperature below 40°C. In addition, in the present invention, the optimum amount of boric acid to be added to a saturated aqueous solution of zinc oxide containing titanium hydrofluoric acid changes depending on the concentration of titanium hydrofluoric acid, and if this amount is too small, the glass will be etched. If the amount is too large, fine crystals of titanium oxide will precipitate in the solution, making the solution cloudy, and in either case, no titanium oxide film will be formed on the glass surface. The concentration of titanium hydrofluoric acid is 1.0 mol/
In the following cases, the amount of boric acid added is 0.4 to 1.0 mol/
, particularly preferably from 0.4 to 0.75 mol/. A uniform titanium oxide film can be formed on the glass surface after 3 hours of contacting or immersing the glass in a saturated solution of zinc oxide containing titanium hydrofluoric acid and boric acid at the above concentrations. The titanium oxide film-coated glass produced in this way is usually heated at a temperature of 300 to 600°C, preferably 500 to 550°C.
The adhesion strength of the titanium oxide film is strengthened by heating and baking at ℃ for 10 minutes or more. Examples and comparative examples of the present invention will be described in detail below. Add 400 g of zinc oxide powder to aqueous solution 1 containing titanium hydrofluoric acid at a concentration of 3 mol/h and stir.

【表】【table】

【表】 た後、未溶解の酸化亜鉛を瀘紙を用いて取除き、
瀘液を4つに分け、それぞれに水を添加し、チタ
ンフツ化水素酸の濃度が3.0、2.0、1.0、および
0.3モル/である4種の溶液を調整した。この
チタンフツ化水素酸の濃度が3.0、2.0、1.0及び
0.3モルの各溶液を3〜6等分し、各溶液に厚み
2mm、大きさ20mm×50mmのガラスを浸漬し、その
後ホウ酸を第1表に示す量を加えて40℃に維持
し、16時間後にガラスサンプルを浸漬液から取出
した。 この後ガラスサンプルを水洗し、120℃の熱風
循環乾燥機で乾燥し、形成された酸化チタン膜の
厚味をタリサーフで測定した結果と溶液の観察結
果を第1表に示した。第1表から明らかなよう
に、比較例によるときはガラス表面に酸化チタン
膜の形成ができなかつたり、ガラス表面がエツチ
ングされたりするが、本発明によればガラス表面
に均一な厚みの酸化チタン膜を形成できることが
わかる。
[Table] After that, remove undissolved zinc oxide using filter paper,
Divide the filtrate into four parts, add water to each part, and adjust the titanium hydrofluoric acid concentration to 3.0, 2.0, 1.0, and
Four solutions of 0.3 mol/ml were prepared. The concentration of this titanium hydrofluoric acid is 3.0, 2.0, 1.0 and
Divide 0.3 mol of each solution into 3 to 6 equal parts, immerse a glass with a thickness of 2 mm and a size of 20 mm x 50 mm in each solution, then add boric acid in the amount shown in Table 1 and maintain it at 40 ° C. After a period of time, the glass sample was removed from the immersion liquid. Thereafter, the glass sample was washed with water and dried in a hot air circulating dryer at 120°C. The thickness of the formed titanium oxide film was measured using Talysurf, and the results of observation of the solution are shown in Table 1. As is clear from Table 1, when using the comparative example, a titanium oxide film could not be formed on the glass surface or the glass surface was etched, but according to the present invention, a titanium oxide film with a uniform thickness was formed on the glass surface. It can be seen that a film can be formed.

Claims (1)

【特許請求の範囲】[Claims] 1 1当り1.0モル以下のチタンフツ化水素酸
(H2TiF6)を含む酸化亜鉛を飽和した水溶液に、
ホウ酸を1当り0.4乃至1.0モルを添加すると共
にガラスを浸漬することにより酸化チタン膜被覆
ガラスを製造する方法。
1 Into an aqueous solution saturated with zinc oxide containing 1.0 mol or less of titanium hydrofluoric acid (H 2 TiF 6 ),
A method for producing glass coated with a titanium oxide film by adding 0.4 to 1.0 mol of boric acid per unit and immersing the glass.
JP1516183A 1983-02-01 1983-02-01 Method for producing glass coated with titanium oxide film Granted JPS59141441A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1516183A JPS59141441A (en) 1983-02-01 1983-02-01 Method for producing glass coated with titanium oxide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1516183A JPS59141441A (en) 1983-02-01 1983-02-01 Method for producing glass coated with titanium oxide film

Publications (2)

Publication Number Publication Date
JPS59141441A JPS59141441A (en) 1984-08-14
JPH0367978B2 true JPH0367978B2 (en) 1991-10-24

Family

ID=11881073

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1516183A Granted JPS59141441A (en) 1983-02-01 1983-02-01 Method for producing glass coated with titanium oxide film

Country Status (1)

Country Link
JP (1) JPS59141441A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4688115B2 (en) * 1999-11-29 2011-05-25 スタンレー電気株式会社 Method for forming film in liquid phase

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2541269B2 (en) * 1987-08-27 1996-10-09 日本板硝子株式会社 Method of manufacturing oxide thin film
JP2785433B2 (en) * 1990-03-30 1998-08-13 日本板硝子株式会社 Method for producing titanium oxide coating
EP0861805B1 (en) * 1996-09-13 2004-04-07 Hoya Corporation Process for preparing thin film of titanium oxide and photodecomposition catalyst

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4688115B2 (en) * 1999-11-29 2011-05-25 スタンレー電気株式会社 Method for forming film in liquid phase

Also Published As

Publication number Publication date
JPS59141441A (en) 1984-08-14

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