JP2608758B2 - Method for producing titanium oxide thin film forming material - Google Patents

Method for producing titanium oxide thin film forming material

Info

Publication number
JP2608758B2
JP2608758B2 JP63122602A JP12260288A JP2608758B2 JP 2608758 B2 JP2608758 B2 JP 2608758B2 JP 63122602 A JP63122602 A JP 63122602A JP 12260288 A JP12260288 A JP 12260288A JP 2608758 B2 JP2608758 B2 JP 2608758B2
Authority
JP
Japan
Prior art keywords
acid
thin film
titanium oxide
oxide thin
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63122602A
Other languages
Japanese (ja)
Other versions
JPH0214820A (en
Inventor
宏 松林
徹 松本
貞夫 西
Original Assignee
富士チタン工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士チタン工業株式会社 filed Critical 富士チタン工業株式会社
Priority to JP63122602A priority Critical patent/JP2608758B2/en
Publication of JPH0214820A publication Critical patent/JPH0214820A/en
Application granted granted Critical
Publication of JP2608758B2 publication Critical patent/JP2608758B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/003Compounds containing elements of Groups 4 or 14 of the Periodic Table without C-Metal linkages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemically Coating (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は光学的に透明で基板との付着性に優れた酸化
チタン薄膜を形成するゾル状材料の製造方法に関する。
TECHNICAL FIELD The present invention relates to a method for producing a sol-like material for forming a titanium oxide thin film which is optically transparent and has excellent adhesion to a substrate.

(従来の技術) 酸化チタンの透明薄膜はガラス又はプラスチツクの表
面に、光の反射防止、特定波長の光の吸収、透過、反射
等の機能を有する光学薄膜を形成する際の高屈折膜とし
て用いられている。又、近年酸化チタン薄膜を用いた光
触媒、センサー等の開発も盛んに行われている。
(Prior art) A transparent thin film of titanium oxide is used as a high-refractive-index film when forming an optical thin film having functions of preventing reflection of light, absorbing, transmitting, and reflecting light of a specific wavelength on the surface of glass or plastic. Has been. In recent years, photocatalysts, sensors, and the like using a titanium oxide thin film have been actively developed.

酸化チタン薄膜の形成方法として化学蒸着法、真空蒸
着法、スパツター法等が知られているが、いずれの方法
も装置が複雑で作業性も劣り、また大面積の薄膜を得る
には不適であり、コストも高い。これに対してデイツプ
法は基板を液状の薄膜形成材料に浸漬して引き上げて焼
成する方法であり、スプレー法は加熱した基板上に液を
スプレーする方法であり、簡単な装置で大面積の薄膜を
形成させることができる。
Known methods for forming a titanium oxide thin film include a chemical vapor deposition method, a vacuum vapor deposition method, and a sputter method. However, any of these methods has a complicated apparatus, is inferior in workability, and is not suitable for obtaining a large-area thin film. , The cost is also high. On the other hand, the dipping method is a method of immersing the substrate in a liquid thin film forming material, pulling it up and baking it, and the spraying method is a method of spraying the liquid on a heated substrate. Can be formed.

酸化チタンの液状薄膜形成材料(以下デイツプコート
材と呼ぶ)としては一般にチタンのアルコキシドから調
製されたものが用いられるが、可燃性又は有害な有機溶
剤を多量に含有するので使用時に安全面及び衛生面で十
分な対応が必要である。有機溶剤を含まない材料として
チタニヤゾルが市販されているが、これは微粒子の酸化
チタン又はチタン酸の水性懸濁物であり、これを用いて
薄膜を形成させた場合、基板との付着性の良い膜が得ら
れないという問題がある。又、両者とも共通の問題点と
して、貯蔵中に粘度が高くなつたり、沈殿物を形成する
等の経時変化が生じる。
As a material for forming a liquid thin film of titanium oxide (hereinafter referred to as a dip coating material), a material prepared from an alkoxide of titanium is generally used. However, since it contains a large amount of flammable or harmful organic solvents, safety and hygiene in use are considered. It is necessary to take sufficient measures. Although titania sol is commercially available as a material containing no organic solvent, this is an aqueous suspension of fine particles of titanium oxide or titanic acid, and when a thin film is formed using this, good adhesion to the substrate is obtained. There is a problem that a film cannot be obtained. Further, as a problem common to both of them, there is a change with time such as an increase in viscosity during storage and formation of a precipitate.

(発明が解決しようとする課題) 本発明の目的は可燃性、有毒、刺激性の揮発物質を含
まず、貯蔵時の経時変化もなく、透明性、付着性に優れ
た酸化チタン薄膜を形成しうるデイツプコート材の製造
方法を提供することにある。
(Problems to be Solved by the Invention) An object of the present invention is to form a titanium oxide thin film which does not contain flammable, toxic and irritating volatile substances, does not change with time during storage, and is excellent in transparency and adhesion. An object of the present invention is to provide a method for producing a dip coat material.

(課題を解決するための手段) 本発明はチタン酸ゲルとシュウ酸、クエン酸、酒石
酸、乳酸、マレイン酸、マロン酸、グリコール酸、リン
ゴ酸から選ばれる有機酸の1種以上を反応させることを
特徴とするゾル状のチタン酸からなる酸化チタン薄膜形
成材料の製造方法に係る。
(Means for Solving the Problems) The present invention is to react a titanate gel with one or more organic acids selected from oxalic acid, citric acid, tartaric acid, lactic acid, maleic acid, malonic acid, glycolic acid, and malic acid. The present invention relates to a method for producing a titanium oxide thin film-forming material comprising sol-form titanic acid.

本発明においてチタン酸としては公知の各種のものが
使用できるが、例えばチタンの硫酸塩又は塩化物とアン
モニア、水酸化アルカリ、炭酸アルカリと反応させて得
られるゲル状のチタン酸が適しており、加熱して加水分
解させたチタン酸は反応性に乏しいので好ましくない。
チタン酸は水で洗浄して不純物を十分に除き、好ましく
は過ケーク状又はスラリー状で有機酸と反応させる。
As the titanic acid in the present invention, various known ones can be used.For example, a gel-form titanic acid obtained by reacting a sulfate or chloride of titanium with ammonia, an alkali hydroxide, or an alkali carbonate is suitable. Titanic acid hydrolyzed by heating is not preferred because it has poor reactivity.
The titanic acid is washed with water to sufficiently remove impurities, and is preferably reacted with the organic acid in the form of a cake or slurry.

チタン酸と反応させる有機酸はシユウ酸、クエン酸、
酒石酸、乳酸、マレイン酸、マロン酸、グリコール酸、
リンゴ酸の水溶性有機酸であり、これらの1種又は2種
以上を使用することができる。本反応は常温で行うのが
望ましいが、70℃程度まで加温することもできる。有機
酸の量はTiO2換算1モルに対して、約0.1〜2モルの範
囲が好ましい。0.1モル未満及び2モルを越えて有機酸
を加えて調製したデイツプコート材を用いて成膜すると
膜の付着性及び硬度が低く、実用面で問題を生じる。チ
タン酸と有機酸との反応は通常、攪拌下で行い、反応液
の外観及び粘度が一定するまで保持する。その後、過
して実用に供する。
Organic acids to react with titanic acid are oxalic acid, citric acid,
Tartaric acid, lactic acid, maleic acid, malonic acid, glycolic acid,
It is a water-soluble organic acid of malic acid, and one or more of these can be used. This reaction is desirably performed at room temperature, but can be heated to about 70 ° C. The amount of the organic acid is preferably in the range of about 0.1 to 2 mol based on 1 mol of TiO 2 . When a film is formed using a dip coating material prepared by adding an organic acid in an amount of less than 0.1 mol or more than 2 mol, adhesion and hardness of the film are low, which causes a problem in practical use. The reaction between the titanic acid and the organic acid is usually carried out with stirring, and the reaction solution is maintained until the appearance and viscosity become constant. After that, pass it and put it to practical use.

チタン酸と有機酸の反応において重要なのは、反応さ
せた液がチタン酸のコロイド粒子が分散した状態、即ち
ゾルの外観を示すことである。有機酸量が少ないと沈殿
物を生じ、又有機酸量が多くなるとゾルというよりはむ
しろ溶液に近い外観を呈し、いずれもデイツプコート材
としては好ましくない。
What is important in the reaction between titanic acid and an organic acid is that the reacted liquid shows a state in which colloidal particles of titanic acid are dispersed, that is, the appearance of a sol. When the amount of the organic acid is small, a precipitate is formed, and when the amount of the organic acid is large, the appearance is more like a solution rather than a sol, and both are not preferable as the depth coat material.

本発明の方法によつて得られたデイツプコート材を用
いて基板上に薄膜を形成する手段として、通常行われて
いるデイツプ法、スプレー法、スピンナー法等を適用す
ることができ、又、デイツプコート材の変質を起こさな
い程度にアルコール等の溶剤を添加して用いることもで
きる。更に、液の粘度調整及び安定性増大を目的として
メチルセルロース、ゼラチン、ポリビニルアルコール等
の水溶性有機高分子化合物を添加することもできる。本
発明において基板上に形成された薄膜は次いで必要に応
じ乾燥された後、焼成される。乾燥は室温〜200℃程
度、又焼成は約400〜900℃程度又はそれ以上で行うのが
好ましい。この焼成過程で有機酸は炭酸ガスと水に変化
して揮発し、酸化チタン薄膜中には残存しない。
As a means for forming a thin film on a substrate using the deep coat material obtained by the method of the present invention, a usual dip method, a spray method, a spinner method, or the like can be applied. A solvent such as an alcohol can be added to such an extent that no deterioration occurs. Further, for the purpose of adjusting the viscosity of the liquid and increasing the stability, a water-soluble organic high molecular compound such as methylcellulose, gelatin, or polyvinyl alcohol can be added. In the present invention, the thin film formed on the substrate is then dried, if necessary, and then fired. Drying is preferably performed at room temperature to about 200 ° C., and firing is preferably performed at about 400 to 900 ° C. or higher. During this firing process, the organic acid changes to carbon dioxide gas and water and volatilizes, and does not remain in the titanium oxide thin film.

上記で得られた酸化チタンの透明薄膜はガラス又はプ
ラスチックの表面に、光の反射防止、特定波長の光の吸
収、透過、反射等の機能を有する光学薄膜を形成する際
の高屈折膜として、或いは光触媒、センサー等として有
用である。
The transparent thin film of titanium oxide obtained above is on the surface of glass or plastic, as a high-refractive-index film when forming an optical thin film having functions such as antireflection of light, absorption of light of a specific wavelength, transmission, and reflection. Alternatively, it is useful as a photocatalyst, a sensor, or the like.

(発明の効果) 本発明は可燃性、刺激性の揮発物質を含まず、貯蔵時
の経時変化もなくて、透明性、付着性の優れた酸化チタ
ン薄膜を形成しうるデイツプコート材の製造方法を提供
することができる。
(Effects of the Invention) The present invention provides a method for producing a dip coat material which does not contain flammable and irritating volatile substances, does not change over time during storage, and can form a titanium oxide thin film having excellent transparency and adhesion. Can be provided.

(実 施 例) 以下、実施例により本発明を詳細に説明するが、本発
明はこれら実施例に限定されるものではない。
(Examples) Hereinafter, the present invention will be described in detail with reference to examples, but the present invention is not limited to these examples.

実施例1〜11及び比較例1 四塩化チタンの水溶液(TiO250g/)に攪拌下でアン
モニア水(25%)を徐々に加えてpHを5.5に調整し、チ
タン酸ゲルを沈殿させた。このスラリーを別した後、
ゲル中に塩素が認められなくなるまで水を注加して過
洗浄を行つた。得られたゲルのTiO2含有量は10.3%であ
つた。
Examples 1 to 11 and Comparative Example 1 Aqueous ammonia (25%) was gradually added to an aqueous solution of titanium tetrachloride (TiO 2 50 g /) with stirring to adjust the pH to 5.5, thereby precipitating a titanate gel. After separating this slurry,
The gel was overwashed by pouring water until no chlorine was found in the gel. The obtained gel had a TiO 2 content of 10.3%.

上述のチタン酸ゲル777g(TiO2として1.0モルを含
む)に水500gを加えてリパルプし、第1表に示したよう
な各種の有機酸を加えて室温で3日間攪拌した。その後
過し、デイツプコート材を得た。いずれの場合も液は
透明ではなくゾルの外観を示し、放置しても沈殿物を生
成しなかつた。
500 g of water was added to 777 g of the titanic acid gel (containing 1.0 mol of TiO 2 ) for repulping, various organic acids shown in Table 1 were added, and the mixture was stirred at room temperature for 3 days. After that, a deep coat material was obtained. In all cases, the liquid was not transparent and showed the appearance of a sol, and no precipitate was formed even when left standing.

(1)安定性試験 得られたデイツプコート材を室温で3ケ月間放置した
場合の外観の変化及び粘度を調べ、さらに成膜試験を行
つて、貯蔵による経時変化を調べた。
(1) Stability test The obtained deep-coat material was examined for changes in appearance and viscosity when left at room temperature for 3 months, and a film-forming test was further conducted to examine changes over time due to storage.

(2)成膜試験 表面を洗浄したマイクロスライドガラスを、TiO2濃度
を3%に調整したデイツプコート液に浸漬し、10cm/分
の速度で引き上げ、100℃で30分間乾燥後、500℃で30分
間焼成した。膜の付着性評価はセロテープを膜面に密着
させた後、引き剥したときに膜が剥離しないものを良と
し、一部でも剥離した場合を不良とした。又硬度評価は
カミソリの刃を膜面に斜めに当て一定の力で押し付けな
がらスライドさせたときに傷がつかないものを良とし、
つくものを不良とした。
(2) Film-forming test The surface-washed microslide glass was immersed in a dip coating solution whose TiO 2 concentration was adjusted to 3%, pulled up at a speed of 10 cm / min, dried at 100 ° C for 30 minutes, and then at 500 ° C for 30 minutes. Bake for minutes. The adhesiveness of the film was evaluated as good when the cellophane tape was adhered to the film surface and then the film was not peeled when peeled off, and poor when the film was partially peeled off. Also, for hardness evaluation, those that do not get scratched when sliding while pressing the razor blade diagonally against the film surface with a constant force are good,
The one that got rid of was considered defective.

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】チタン酸ゲルとシュウ酸、クエン酸、酒石
酸、乳酸、マレイン酸、マロン酸、グリコール酸、リン
ゴ酸から選ばれる有機酸の1種以上を反応させることを
特徴とするゾル状のチタン酸からなる酸化チタン薄膜形
成材料の製造方法。
1. A sol-like composition comprising reacting a titanate gel with one or more organic acids selected from oxalic acid, citric acid, tartaric acid, lactic acid, maleic acid, malonic acid, glycolic acid and malic acid. A method for producing a titanium oxide thin film forming material comprising titanic acid.
【請求項2】酸化チタン換算1モルに対して有機酸を約
0.1〜2モル使用する請求項1記載の酸化チタン薄膜形
成材料の製造方法。
2. An organic acid is added to about 1 mol of titanium oxide.
2. The method for producing a titanium oxide thin film forming material according to claim 1, wherein the material is used in an amount of 0.1 to 2 mol.
JP63122602A 1988-03-23 1988-05-19 Method for producing titanium oxide thin film forming material Expired - Fee Related JP2608758B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63122602A JP2608758B2 (en) 1988-03-23 1988-05-19 Method for producing titanium oxide thin film forming material

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63-70366 1988-03-23
JP7036688 1988-03-23
JP63122602A JP2608758B2 (en) 1988-03-23 1988-05-19 Method for producing titanium oxide thin film forming material

Publications (2)

Publication Number Publication Date
JPH0214820A JPH0214820A (en) 1990-01-18
JP2608758B2 true JP2608758B2 (en) 1997-05-14

Family

ID=26411527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63122602A Expired - Fee Related JP2608758B2 (en) 1988-03-23 1988-05-19 Method for producing titanium oxide thin film forming material

Country Status (1)

Country Link
JP (1) JP2608758B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2883761B2 (en) * 1991-12-06 1999-04-19 工業技術院長 Antibacterial growth inhibitor
JP3726366B2 (en) * 1996-08-06 2005-12-14 昭和電工株式会社 Fluorescent lamp
EP1083152B1 (en) 1998-05-14 2006-01-25 Showa Denko Kabushiki Kaisha Titanium oxide sol, thin film, and processes for producing these
KR100630285B1 (en) 1998-08-19 2006-09-29 쇼와 덴코 가부시키가이샤 Finely particulate titanium-containing substance, coating fluid containing the same, processes for producing these, and molded article having thin film comprising the substance
NZ505774A (en) * 2000-07-17 2002-12-20 Ind Res Ltd Oxalate stabilised titania solutions and coating compositions and catalysts formed therefrom

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61283629A (en) * 1985-06-10 1986-12-13 Nippon Shokubai Kagaku Kogyo Co Ltd Plastic composite material
US4778671A (en) * 1986-07-14 1988-10-18 Corning Glass Works Preparation of unagglomerated metal oxide particles with uniform particle size

Also Published As

Publication number Publication date
JPH0214820A (en) 1990-01-18

Similar Documents

Publication Publication Date Title
EP0850203B1 (en) Titanium dioxide-based photocatalytic coating substrate, and titanium dioxide-based organic dispersions
JP4335446B2 (en) Titanium oxide sol, thin film and method for producing them
AU748451B2 (en) Process for depositing optical layers
JPS6366904B2 (en)
JP2001511107A (en) Tantalum oxide-based inorganic polymer material having high refractive index and mechanical abrasion resistance, method for producing the same, and optical material containing the polymer
WO2000010921A1 (en) Finely particulate titanium-containing substance, coating fluid containing the same, processes for producing these, and molded article having thin film comprising the substance
JP2003231827A (en) Fog-resistant coating material, fog-resistant coated film and fog-resistant optical member
EP1153999B1 (en) Photocatalytic coating composition and product having thin photocatalytic film
AU2006234416B2 (en) Coating agent for optical instrument
US5911965A (en) Process for producing tungsten oxide
JPH08313705A (en) Anti-clouding article and its production
JP2608758B2 (en) Method for producing titanium oxide thin film forming material
US4323598A (en) Method of coating glass surface with heat-reflecting metal oxide film
GB2350841A (en) Titanium oxide precursor coating composition
EP0400796B1 (en) Anti-reflective coating comprising light metal fluorides
US6733580B2 (en) Inorganic film-forming coating composition, preparation method thereof and inorganic film-forming method
US4322363A (en) Method for making dibutyltin difluoride
JP2001058825A (en) Coating agent for forming inorganic film, its production and formation of the same inorganic film
JPH0260397B2 (en)
JPH06136162A (en) Formation of thin metal oxide film
JP2812121B2 (en) Optical article manufacturing method
JP2000001340A (en) Production of hydrophilic coating
JP7551319B2 (en) Anti-Fog Agent
JP4687009B2 (en) Anti-fogging article and manufacturing method thereof
JPH0367978B2 (en)

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees