JPH0435896B2 - - Google Patents

Info

Publication number
JPH0435896B2
JPH0435896B2 JP27180584A JP27180584A JPH0435896B2 JP H0435896 B2 JPH0435896 B2 JP H0435896B2 JP 27180584 A JP27180584 A JP 27180584A JP 27180584 A JP27180584 A JP 27180584A JP H0435896 B2 JPH0435896 B2 JP H0435896B2
Authority
JP
Japan
Prior art keywords
data
origin
aperture
shaping
control method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP27180584A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61150327A (ja
Inventor
Kanji Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP27180584A priority Critical patent/JPS61150327A/ja
Publication of JPS61150327A publication Critical patent/JPS61150327A/ja
Publication of JPH0435896B2 publication Critical patent/JPH0435896B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
JP27180584A 1984-12-25 1984-12-25 可変成形ビ−ム制御方法 Granted JPS61150327A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27180584A JPS61150327A (ja) 1984-12-25 1984-12-25 可変成形ビ−ム制御方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27180584A JPS61150327A (ja) 1984-12-25 1984-12-25 可変成形ビ−ム制御方法

Publications (2)

Publication Number Publication Date
JPS61150327A JPS61150327A (ja) 1986-07-09
JPH0435896B2 true JPH0435896B2 (enrdf_load_stackoverflow) 1992-06-12

Family

ID=17505093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27180584A Granted JPS61150327A (ja) 1984-12-25 1984-12-25 可変成形ビ−ム制御方法

Country Status (1)

Country Link
JP (1) JPS61150327A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS61150327A (ja) 1986-07-09

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term