JPH0434868B2 - - Google Patents

Info

Publication number
JPH0434868B2
JPH0434868B2 JP57097781A JP9778182A JPH0434868B2 JP H0434868 B2 JPH0434868 B2 JP H0434868B2 JP 57097781 A JP57097781 A JP 57097781A JP 9778182 A JP9778182 A JP 9778182A JP H0434868 B2 JPH0434868 B2 JP H0434868B2
Authority
JP
Japan
Prior art keywords
ccd
signal charges
vertical
transfer
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57097781A
Other languages
Japanese (ja)
Other versions
JPS58215177A (en
Inventor
Okio Yoshida
Nozomi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP57097781A priority Critical patent/JPS58215177A/en
Publication of JPS58215177A publication Critical patent/JPS58215177A/en
Publication of JPH0434868B2 publication Critical patent/JPH0434868B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/148Charge coupled imagers
    • H01L27/14831Area CCD imagers

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Description

【発明の詳細な説明】 〔発明の属する技術分野〕 この発明は電子式静止画記録再生装置(電子カ
メラ)の駆動方式に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field to Which the Invention Pertains] The present invention relates to a driving method for an electronic still image recording/reproducing device (electronic camera).

〔従来技術とその問題点〕[Prior art and its problems]

固体撮像装置の一種にインターライン転送方式
CCDイメージセンサがある。以下、これをIT−
CCDと略称する。第1図にこのIT−CCDイメー
ジ・センサの概略構成図を示す。図において1ij
(i=1,2,…,m、j=1,2,…n)はマ
トリツクス配列された感光部であり、光電極変換
して得られた信号電荷を蓄積する、例えばホトダ
イオード等からなる。該感光部1ijの配列に沿つ
て該感光部1ijで光電変換され、その後蓄積され
た信号電荷を読出すための垂直CCD2iと感光
部1ijで光電変換された過剰な信号電荷を除去す
るためのオーバフロードレイン(ever flw
drain:OFD)4がある。そして該OFD4と感光
部1ij間に過剰信号電荷を確実にOFD4より除去
するためのオーバフロー制御電極5iが設けられ
ている。前記感光部1ijで蓄積された信号電荷は
前記垂直CCD2iに移された後、1列ごと図中
に示された水平CCD3に移され、次に該水平
CCD3内を転送せしめた後、時系列に出力部6
より読出す。垂直CCD2i及び水平CCD3は単
相、2相、3相または4相クロツクパルスを転送
電極に印加せしめることによつて信号電荷の転送
を行なわせしめることができる。
Interline transfer method is a type of solid-state imaging device
There is a CCD image sensor. Below, this is IT-
It is abbreviated as CCD. Figure 1 shows a schematic diagram of this IT-CCD image sensor. In the figure, 1ij
(i = 1, 2, . . . , m, j = 1, 2, . . . n) are photosensitive parts arranged in a matrix, and are made of, for example, photodiodes, which accumulate signal charges obtained by photoelectrode conversion. A vertical CCD 2i for reading out the signal charges photoelectrically converted and then accumulated in the photosensitive parts 1ij along the arrangement of the photosensitive parts 1ij, and an overflow for removing excess signal charges photoelectrically converted in the photosensitive parts 1ij. drain (ever flw
drain: OFD) 4. An overflow control electrode 5i is provided between the OFD 4 and the photosensitive portion 1ij to reliably remove excess signal charges from the OFD 4. The signal charge accumulated in the photosensitive section 1ij is transferred to the vertical CCD 2i, and then transferred column by column to the horizontal CCD 3 shown in the figure.
After transferring the contents of CCD 3, the output section 6
Read more. The vertical CCD 2i and the horizontal CCD 3 can transfer signal charges by applying single-phase, two-phase, three-phase or four-phase clock pulses to the transfer electrodes.

このIT−CCDイメージセンサでは感光部1ijで
信号電荷の蓄積を行なつている間、隣に設けられ
た垂直CCD2iでは前フイールドの信号電荷を
1列ごと水平CCD3に転送せしめて読出してい
るため、例えば水平CCD3に対して一番遠くに
ある感光部111,121,…1m1にある信号電荷は
該固体撮像装置に実際の蓄積時間に加えてほぼ1
フイールド期間に近い時間滞在することになる。
そして、これらの感光部に蓄積された信号電荷が
垂直CCD2iにより読出され、次のフイールド
の信号電荷が感光部1ijより垂直CCD2iへ転送
される前においては、該垂直CCD2i中には何
ら信号電荷は残存されてはならない。しかし、実
際には感光部に入射された光により固体撮像装置
を形成している半導体基板内で信号電荷が形成さ
れるため、該半導体基板内を拡散した少量の信号
電荷が垂直CCD2iへ漏れ込んでしまう。この
少量の信号電荷の漏れ込みは再生画像上垂直方向
の輝線即ち垂直スミヤを発生する。これは高い輝
度の被写体を撮像した際に顕著に現われるため著
しく画質を変化させる。この垂直スミヤを軽減さ
せるために、垂直ブランキング期間において感光
部1ijから信号電荷を垂直CCD2iへ転送させる
前に高速で前述した垂直スミヤの原因となる漏れ
電荷を掃き出す方式が、従来ビデオ・カメラ用の
固体撮像素子の駆動方式に採用されている。
In this IT-CCD image sensor, while signal charges are accumulated in the photosensitive section 1ij, the adjacent vertical CCD 2i transfers the signal charges of the previous field column by column to the horizontal CCD 3 and reads them out. For example , the signal charges in the photosensitive parts 1 11 , 1 21 , .
You will stay there for a time close to the field period.
The signal charges accumulated in these photosensitive areas are read out by the vertical CCD 2i, and before the signal charges of the next field are transferred from the photosensitive area 1ij to the vertical CCD 2i, there are no signal charges in the vertical CCD 2i. Must not be left behind. However, in reality, signal charges are formed within the semiconductor substrate forming the solid-state imaging device due to light incident on the photosensitive section, so a small amount of signal charges diffused within the semiconductor substrate leak into the vertical CCD 2i. It's gone. This small amount of leakage of signal charges causes bright lines in the vertical direction on the reproduced image, that is, vertical smear. This becomes noticeable when capturing an image of a subject with high brightness, so it significantly changes the image quality. In order to reduce this vertical smear, there is a method that sweeps away the leakage charge that causes the vertical smear at high speed before transferring the signal charge from the photosensitive section 1ij to the vertical CCD 2i during the vertical blanking period. It has been adopted as a drive method for solid-state image sensors.

上記方式は連続撮像を目的とした固体撮像素子
のスミアなどの偽信号の防止法である。
The above method is a method for preventing false signals such as smear from a solid-state image sensor intended for continuous imaging.

一方、最近注目されている電子式静止画記録再
生装置(以下電子カメラと略称)においては、光
学または電気的シヤツタを用いて所望の一定時間
の撮像を行なうことが多く、この撮像に適合する
スミアの防止方法が望まれる。
On the other hand, electronic still image recording and reproducing devices (hereinafter referred to as electronic cameras), which have been attracting attention recently, often use optical or electric shutters to capture images for a desired fixed period of time. A method to prevent this is desired.

〔発明の目的〕[Purpose of the invention]

本発明は上述した電子カメラ等の固体撮像装置
に適した垂直スミアやクロス・トークなどの偽信
号を防止する駆動方式を提供する事を目的とす
る。
An object of the present invention is to provide a drive method suitable for solid-state imaging devices such as the above-mentioned electronic cameras, which prevents false signals such as vertical smear and cross talk.

〔発明の概要〕[Summary of the invention]

本発明は電子カメラ等において、シヤツタ開放
期間の光入射の露光期間を含む所望の期間にわた
り、垂直CCD部の各転送電極下のポテンシヤル
井戸を全面にわたつて同じ深さに形成しておき、
基板内で発生したキヤリアをそのポテンシヤル井
戸の中に捕え、これらの捕獲されたキヤリアを掃
き出し動作により排出せしめた後に、感光セルの
有効信号となる蓄積された信号電荷を読み出して
映像信号とする駆動方式である。
The present invention provides an electronic camera or the like in which potential wells are formed at the same depth over the entire surface of the vertical CCD section under each transfer electrode over a desired period including the exposure period of light incidence during the shutter open period.
A drive that captures carriers generated within the substrate in its potential well, and after discharging these captured carriers by a sweeping operation, reads out the accumulated signal charge that becomes an effective signal of the photosensitive cell and converts it into a video signal. It is a method.

〔発明の効果〕〔Effect of the invention〕

本発明により、電子カメラの撮像において、ス
ミアを防止した良好な画質を確保出来る。また水
平方向の隣接画素間にて、クロス・トークが少な
くかつ、解像度の高い良好な画像を得る事ができ
る。
According to the present invention, good image quality that prevents smearing can be ensured in imaging with an electronic camera. Further, it is possible to obtain a good image with high resolution and less cross talk between adjacent pixels in the horizontal direction.

〔発明の実施例〕[Embodiments of the invention]

本発明の実施例を図面を用いて説明する。 Embodiments of the present invention will be described using the drawings.

第2図は第1図のIT−CCDイメージ・センサ
の水平方向の断面図である。p形Si基板11に拡
散やイオン・インプランテーシヨンにより形成し
たn形領域からなるホト・ダイオード12と垂直
転送CCD13が各感光セルの構成要素として配
置されている。さらに、nで示すオーバー・フ
ロー・ドレイン14が設けられている。垂直転送
CCCD13の上部にはポリSiからなる転送電極1
5,16がある。転送電極15は、ホト・ダイオ
ードから垂直CCDへのトランスフアーゲートも
兼ねている例である。さらに、SiO2などの絶縁
膜17を介して上部に光シールドとなるAl電極
18が形成される。このAl電極は、図ではホ
ト・ダイオードからオーバー・フロードレインへ
のバリヤをコントロールする電極を兼ねている例
を示す。
FIG. 2 is a horizontal cross-sectional view of the IT-CCD image sensor of FIG. A photodiode 12 consisting of an n-type region formed on a p-type Si substrate 11 by diffusion or ion implantation and a vertical transfer CCD 13 are arranged as constituent elements of each photosensitive cell. Additionally, an overflow drain 14, designated n, is provided. vertical transfer
On the top of the CCCD 13 is a transfer electrode 1 made of poly-Si.
There are 5 and 16. In this example, the transfer electrode 15 also serves as a transfer gate from the photodiode to the vertical CCD. Further, an Al electrode 18 serving as a light shield is formed on the top with an insulating film 17 such as SiO 2 interposed therebetween. The figure shows an example in which this Al electrode also serves as an electrode that controls the barrier from the photodiode to the overflow drain.

ホト・ダイオードに入射した光のうち19−1
で示す光はホト・ダイオードの点線で示す空乏層
内で吸収されて、キヤリアを発生する。このキヤ
リアは接合内のため、有効な信号電荷として蓄積
される。一方、19−2で示す光は基板内部でキ
ヤリヤを発生する。このキヤリヤは基板内部に特
定の電界が形成されていない場合には、任意の方
向へ拡散してゆく。図では左方へ拡散した例を示
し、あらかじめCCDの転送電極に印加しておい
た電圧により形成された点線で示すポテンシヤル
井戸の中に捕えられる。
19-1 of the light incident on the photodiode
The light shown by is absorbed in the depletion layer of the photodiode shown by the dotted line, generating carriers. Since this carrier is within the junction, it is accumulated as an effective signal charge. On the other hand, the light indicated by 19-2 generates a carrier inside the substrate. This carrier diffuses in any direction unless a specific electric field is formed inside the substrate. The figure shows an example of diffusion to the left, where it is captured in a potential well shown by a dotted line formed by a voltage applied to the transfer electrode of the CCD in advance.

第3図は垂直CCDの断面図を示す。第1図の
垂直CCDの垂直方向における展開図であり、4
相駆動の2層ポリSi電極構成の埋め込み形CCD
の例を示す。
Figure 3 shows a cross-sectional view of a vertical CCD. This is a developed view in the vertical direction of the vertical CCD in FIG.
Embedded CCD with phase-driven two-layer poly-Si electrode configuration
Here is an example.

また第4図は本発明の駆動方式の電気パルスの
位相関係を示す図である。前述の第3図または第
2図と共にその動作を説明する。
Further, FIG. 4 is a diagram showing the phase relationship of electric pulses in the driving method of the present invention. The operation will be explained with reference to FIG. 3 or FIG. 2 mentioned above.

時刻t=t0において転送電極φ116−1,φ2
5−1,φ316−2及びφ415−2にそれぞれ
例えば垂直転送時における転送電極電圧のハイ・
レベル電圧VHを印加する。これにより垂直転送
CCDの下部に点線で示す空のポテンシヤル井戸
が連続して形成される。この期間にt=t1にて光
学シヤツタ等により撮像すべき被写体光像をIT
−CCDに導く。光入射により発生したキヤリヤ
のうち前述の如くホト・ダイオードの空乏層内で
発生したキヤリヤは信号電荷として、その場で蓄
積され、空乏層外で発生したキヤリヤの一部は拡
散の途中で転送電極下のポテンシヤル井戸で捕え
られる。転送電極下のポテンシヤル井戸が深く形
成できれば隣接の画素へ拡散してゆくキヤリヤの
ほとんどを捕える事になり、クロス・トークを防
止する事が出来る。光入射が無くなり、発生した
キヤリヤが殆んどいずれかの空乏層内に捕えられ
た時刻のt=t2において、転送電極を高速の4相
駆動として掃き出し動作を開始する。十分に掃き
出し動作を行なつた後にt=t3にて、ホト・ダイ
オードに蓄積された信号電荷をφ3,φ4に高電圧
VTを与えて垂直CCD側へ転送する。t=t4以後
は、垂直CCDに転送された信号電荷をφ1〜φ4
それぞれVH,VLのパルスにて4相駆動で水平
CCDへ転送する動作となり、図に示さないが、
水平CCDを通り、アンプを通して外部へ信号出
力として取り出される。
At time t=t 0 , the transfer electrodes φ 1 16-1, φ 2 1
5-1, φ 3 16-2, and φ 4 15-2, for example, the high transfer electrode voltage during vertical transfer.
Apply level voltage VH . This allows vertical transfer
A series of empty potential wells are formed at the bottom of the CCD, indicated by dotted lines. During this period, at t= t1 , the object light image to be captured by an optical shutter, etc. is IT.
- Lead to CCD. Among the carriers generated by light incidence, the carriers generated within the depletion layer of the photodiode as described above are accumulated on the spot as signal charges, and some of the carriers generated outside the depletion layer are transferred to the transfer electrode during diffusion. Captured in the lower potential well. If the potential well under the transfer electrode can be formed deeply, it will capture most of the carrier that diffuses to adjacent pixels, making it possible to prevent cross talk. At time t= t2 , when no light is incident and most of the generated carriers are trapped in one of the depletion layers, the transfer electrodes are driven in high-speed four-phase mode and a sweep operation is started. After sufficiently sweeping out the signal charge at t=t 3 , the signal charge accumulated in the photodiode is applied to φ 3 and φ 4 at a high voltage.
Apply V T and transfer to the vertical CCD side. After t= t4 , the signal charges transferred to the vertical CCD are horizontally driven by 4-phase drive with pulses of VH and VL for φ1 to φ4 , respectively.
The operation is to transfer to the CCD, and although it is not shown in the figure,
The signal passes through the horizontal CCD and is output as a signal to the outside through an amplifier.

上記実施例に示す如く、第4図の間欠露光では
露光時に垂直CCDが信号電荷を運ばない事と同
CCDの下部のポテンシヤル井戸に混入したキヤ
リヤをあらかじめ垂直掃き出しにて排出してしま
うために従来の連続露光に対応する連続撮像にお
ける垂直スミアは防止できる。また、隣接の画素
へキヤリヤが洩れ込むクロス・トークも改善でき
る。
As shown in the above embodiment, the intermittent exposure in Fig. 4 is equivalent to the fact that the vertical CCD does not carry signal charges during exposure.
Since the carrier mixed in the potential well at the bottom of the CCD is vertically swept out in advance, vertical smearing during continuous imaging corresponding to conventional continuous exposure can be prevented. In addition, crosstalk caused by carriers leaking into adjacent pixels can also be improved.

〔発明の他の実施例〕[Other embodiments of the invention]

上記実施例では露光中の転送電極電圧をVH
したが、これに限らず、VTの電圧以下の高い電
圧であれば良い。また、掃き出し駆動は4相駆動
のみならず、単相,2相,3相等のクロツクパル
スで動作させても良い事は勿論である。
In the above embodiment, the transfer electrode voltage during exposure is set to VH , but the voltage is not limited to this, and any voltage as high as the voltage of V T may be used. Furthermore, it goes without saying that the sweeping drive is not limited to four-phase drive, but may also be operated by single-phase, two-phase, three-phase, etc. clock pulses.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はインターライン転送形CCDの概略構
成図、第2図は本発明のインターライン転送形
CCDの駆動方式を説明する水平断面図、第3図
は同じく垂直断面図、第4図は本発明の駆動方式
のパルス電圧波形を示す図である。 1ij…感光部、2i…垂直CCD、3…水平
CCD、4…オーバー・フロー・ドレイン、5i
…オーバー・フロー・ドレイン制御電極、6…出
力部、11…p型Si基板、12,13…n+層、1
4…n層、15−1,15−2…第一層ポリSi
電極、16−1,16−2…第二層ポリSi電極、
17…SiO2、18…Al。
Figure 1 is a schematic diagram of an interline transfer type CCD, and Figure 2 is an interline transfer type CCD according to the present invention.
FIG. 3 is a horizontal cross-sectional view illustrating the driving method of the CCD, FIG. 3 is a vertical cross-sectional view, and FIG. 4 is a diagram showing the pulse voltage waveform of the driving method of the present invention. 1ij...Photosensitive part, 2i...Vertical CCD, 3...Horizontal
CCD, 4...overflow drain, 5i
...overflow drain control electrode, 6...output section, 11...p-type Si substrate, 12, 13...n + layer, 1
4...n layer, 15-1, 15-2...first layer poly-Si
Electrode, 16-1, 16-2... second layer poly-Si electrode,
17... SiO2 , 18...Al.

Claims (1)

【特許請求の範囲】[Claims] 1 シヤツター開放期間にわたる光入射によつて
半導体基板内に生成した信号電荷を蓄積するため
に設けられた互いに独立した複数の感光セルと、
これらの感光セルに蓄積された信号電荷を読み出
すための複数の垂直読み出し部と、これらの垂直
読み出し部からの信号電荷を読み出すための水平
読み出し部とを有する電子カメラにおいて、前記
シヤツター開放期間を含む所望の期間にわたり、
前記垂直読み出し部の各転送電極下のポテンシヤ
ル井戸を全面にわたつて同じ深さにせしめる如く
前記各転送電極に一定の電圧を印加し、その後、
前記ポテンシヤル井戸に捕えられたキヤリアを掃
き出し動作により排出せしめた後、感光セルに蓄
積された信号電荷を読み出して映像信号とする事
を特徴とする電子カメラの駆動方式。
1. A plurality of mutually independent photosensitive cells provided for accumulating signal charges generated in a semiconductor substrate by light incidence over a shutter open period;
In an electronic camera having a plurality of vertical readout sections for reading out signal charges accumulated in these photosensitive cells and a horizontal readout section for reading out signal charges from these vertical readout sections, including the shutter open period. over a desired period of time,
Applying a constant voltage to each of the transfer electrodes so as to make the potential wells under each transfer electrode of the vertical readout part have the same depth over the entire surface, and then,
A driving method for an electronic camera, characterized in that after the carrier trapped in the potential well is discharged by a sweeping operation, the signal charge accumulated in the photosensitive cell is read out and converted into a video signal.
JP57097781A 1982-06-09 1982-06-09 Driving system of solidstate image pickup device Granted JPS58215177A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57097781A JPS58215177A (en) 1982-06-09 1982-06-09 Driving system of solidstate image pickup device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57097781A JPS58215177A (en) 1982-06-09 1982-06-09 Driving system of solidstate image pickup device

Publications (2)

Publication Number Publication Date
JPS58215177A JPS58215177A (en) 1983-12-14
JPH0434868B2 true JPH0434868B2 (en) 1992-06-09

Family

ID=14201364

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57097781A Granted JPS58215177A (en) 1982-06-09 1982-06-09 Driving system of solidstate image pickup device

Country Status (1)

Country Link
JP (1) JPS58215177A (en)

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JPS60233986A (en) * 1984-05-07 1985-11-20 Toshiba Corp Drive method of solid-state image pickup device

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JPS5324721A (en) * 1976-08-20 1978-03-07 Fujitsu Ltd Blooming preventing method for pick up elements

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JPS5324721A (en) * 1976-08-20 1978-03-07 Fujitsu Ltd Blooming preventing method for pick up elements

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