JPH04325911A - Magnetic head - Google Patents

Abstract

PURPOSE:To improve a recording capacity by constituting thin laminated films in such a manner that the number of layer increases in order of a part near a working gap, a part to be applied with winding and a back gap part. CONSTITUTION:Nonmagnetic substrates 2, 2 are joined to each other, thin nonmagnetic insulating films 10, 10 to each other, the 1st thin laminated films 11, 11 to each other, the 2nd thin laminated films 12, 12 to each other, thin nonmagnetic insulating films 10', 10' to each other, and nonmagnetic substrates 2', 2' to each other respectively via low melting glass 14 to constitute 1st and 2nd core half bodies 9a, 9b. The glass (g) positioned between the films 11 and 11 functions as the working gap (g). The number of the layers of the films 11, 11 is 2 layers near the front gap, 3 layers in the part to be applied with the winding and 4 layers in the entire area of the back gap. The number of layers of the films 12, 12 is one layer in the part to be applied with the winding and 2 layers in the entire area on the back gap side. The films 12, 12 are not formed in the part near the front gap. Since the number of the layers near the gap (g) is decreased in this way, strong recording magnetic fields are generated.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head installed in a high-density magnetic recording device such as a VTR.

0002

2. Description of the Related Art Conventionally, magnetic heads used in high-density magnetic recording devices such as high-quality VTRs that handle high-frequency, wide-band signals have been disclosed, for example, in Japanese Patent Application Laid-open No. 119709/1983 (
There is a laminated core type magnetic head as shown in G11B5/127).

FIG. 12 is a perspective view of a conventional laminated core magnetic head.

[0004] 1a and 1b are first and second core halves, respectively. The first and second core halves 1a and 1b each have metal magnetic thin films 3, 3 such as sendust, and nonmagnetic insulating thin films 4, such as SiO2, on nonmagnetic substrates 2, 2 such as crystallized glass, respectively.
On the laminated thin films 5, 5, non-magnetic substrates 2', 2' are bonded and fixed with high melting point glasses 6, 6. The first and second core halves 1a and 1b are butted against each other so that the gap-forming surfaces, in which the end surfaces of the laminated thin films 5 and 5 are exposed, face each other with a low melting point glass 7 interposed therebetween, and the low melting point glass 7 is bonded and fixed by melting and solidifying. At this time, the low melting point glass 7 functions as a working gap g. Further, 8 is a winding groove formed in the gap forming surface of the second core half.

In the magnetic head having the above structure, the laminated thin film 5,
Since the film thickness of 5 corresponds to the track width of the working gap g, if the track is made narrower, the problem arises that the magnetic path becomes narrower and the recording ability decreases.

As shown in FIG. 13, a magnetic head that solves the above-mentioned problem is constructed by making the thickness of the laminated thin films 5, 5 larger than the track width in areas other than the vicinity of the operating gap g, and operating the laminated thin films 5, 5. A structure narrowed toward the gap g has been proposed.

However, even in the magnetic head with this structure, as shown in FIG. 13, the magnetic path cross-sectional area of the laminated thin films 5, 5 becomes narrow in the back gap portion, so the magnetic resistance in this portion increases, and the reproduction efficiency decreases. A problem arises in that the value decreases.

[0008]

SUMMARY OF THE INVENTION The present invention has been devised in view of the drawbacks of the conventional examples described above, and even when the working gap is made into a narrow track, the magnetic resistance at the back gap portion does not increase. It is an object of the present invention to provide a magnetic head having a structure that prevents a decrease in recording performance.

[0009]

[Means for Solving the Problems] The magnetic head of the present invention includes:
The laminated thin film is applied to the area near the operating gap, the area where the winding is applied,
The structure is characterized in that the number of layers increases in the order of the back gap portion.

0010

According to the above structure, since the number of layers of the laminated thin film in the vicinity of the working gap is smaller than in other parts, a strong recording magnetic field is generated due to the magnetic flux narrowing effect, and the recording performance is improved. In addition, since the number of laminated thin film layers in the back gap section is greater than the number of laminated thin film layers in the vicinity of the working gap, that is, in the front gap section, the magnetic resistance at the back gap section with respect to the front gap section becomes smaller, resulting in improved reproduction efficiency. improves.

[0011]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings.

FIG. 1 is a perspective view showing the external appearance of the magnetic head of this embodiment, and FIG. 2 is a perspective view showing the shape of the laminated thin film of the magnetic head. I will omit the explanation.

In the magnetic head of this embodiment, the nonmagnetic substrates 2 and 2 constituting the first and second core halves 9a and 9b, respectively,
The part of the inner surface facing the medium is coated with SiO2, Al
Nonmagnetic insulating thin films 10 and 1 made of 2O3, Ti, Cr, etc.
0 is deposited. The non-magnetic insulating thin film 10, 1
0 is formed so that the film thickness is thicker in the vicinity of the front gap than in other parts. Among the inner surfaces of the non-magnetic substrates 2, 2, on the back gap side where the non-magnetic insulating thin films 10, 10 are not adhered, and on the entire area of the non-magnetic insulating thin films 10, 10, a metal magnetic thin film 3, such as Sendust, is applied. 3 and non-magnetic insulating thin films 4, 4 made of SiO2 or the like are deposited. The upper surfaces of the first laminated thin films 11, 11 are flush over the entire area. The number of layers of the first laminated thin films 11, 11 is two layers in the vicinity of the front gap and three layers in the portion where the winding is applied.
There are four layers throughout the back gap side.

[0014] Also, on the inner surface of the non-magnetic substrate 2'2' constituting the first and second core halves 9a and 9b, on the side facing the medium, SiO2, Al2O3, Ti, C
Non-magnetic insulating thin films 10', 10' made of R or the like are deposited. The non-magnetic insulating thin films 10', 10' are formed so as to be thicker in the vicinity of the front gap than in other parts. The non-magnetic substrates 2', 2'
A portion of the inner surface of the back gap side where the non-magnetic insulating thin films 10', 10' are not adhered, and a portion of the non-magnetic insulating thin films 10', 10' other than the area near the front gap are coated with sendust or the like. Metal magnetic thin film 3, 3 and SiO2
A second laminated thin film 12 consisting of non-magnetic insulating thin films 4, 4, etc.
, 12 are deposited. Said second laminated thin film 12
The upper surface of the non-magnetic insulating thin films 10', 10' is flush with the upper surface of the thicker portion near the front gap. The number of layers of the second laminated thin films 12, 12 is one layer in the part where the winding is applied, and two layers in the entire back gap side, and the second laminated thin films 12, 12 are in the vicinity of the front gap. Not formed.

[0015] The non-magnetic substrates 2, 2 and the non-magnetic substrate 2'
, 2', the first laminated thin films 11, 11 and the second laminated thin films 12, 12 are butted against each other with high melting point glasses 13, 13 in between, and the high melting point glasses 13, 1
3 is bonded and fixed by melting and solidifying the first and second
They form core halves 9a and 9b. The number of laminated thin films of the first and second core halves 9a and 9b constituted by the first and second laminated thin films 11, 11, 12, and 12 is two layers in the vicinity of the front gap, and two layers in the vicinity of the front gap, and two layers in the vicinity of the front gap. There are 4 layers in the applied area and 6 layers in the back gap area. In the first and second core halves 9a and 9b, the first laminated thin films 11 and 11 are exposed on the front gap side, and the first and second thin films are exposed on the back gap side.
The exposed gap-forming surfaces of the laminated thin films 11, 11, 12, and 12 are butted against each other with a low melting point glass 14 in between, and are bonded and fixed by melting and solidifying the low melting point glass 14. ing. At this time, the first
The second core halves 9a, 9b include the nonmagnetic substrates 2, 2, the nonmagnetic insulating thin films 10, 10, and the first laminated thin films 11, 1.
1, the second laminated thin films 12, 12, the non-magnetic insulating thin films 10', 10', and the non-magnetic substrates 2', 2' face each other with the low melting point glass 14 interposed therebetween. A low melting point glass 14 located between the laminated thin films 11 and 11 of
functions as a working gap g, and the track width of the working gap g is approximately 10 μm. As is clear from FIG. 2, the second laminated thin films 12, 12 face each other only on the back gap side, and do not face each other on the front gap side.

Next, a method of manufacturing the above magnetic head will be explained.

First, as shown in FIG. 3, a metal magnetic thin film 3 is deposited on a predetermined portion of the upper surface of the nonmagnetic substrate 2 by a thin film forming technique such as sputtering, vapor deposition, or CVD, and an etching process technique.

Next, as shown in FIG.
A non-magnetic insulating thin film 10 is deposited on a portion of the upper surface where the metal magnetic thin film 3 is not formed by a thin film forming technique such as sputtering, vapor deposition, or CVD, and a flattening technique such as polishing or etching. At this time, the upper surfaces of the metal magnetic thin film 3 and the nonmagnetic insulating thin film 10 are flush with each other, and both film thicknesses are 5 μm.

Next, as shown in FIG. 5, a film with a thickness of 0.1 μm is formed over the entire upper surface of the metal magnetic thin film 3 and the nonmagnetic insulating thin film 10.
After depositing and forming the non-magnetic insulating thin film 4, sputtering and vapor deposition are performed on a portion of the upper surface of the non-magnetic insulating thin film 4 above the non-magnetic insulating thin film 10 formed in the process of FIG. A nonmagnetic insulating thin film 10 is deposited and formed using thin film forming techniques such as , CVD, and etching techniques.

Next, as shown in FIG. 6, a portion of the upper surface of the nonmagnetic insulating thin film 4 where the nonmagnetic insulating thin film 10 is not formed is subjected to thin film forming techniques such as sputtering, vapor deposition, and CVD, as well as polishing and etching. A metal magnetic thin film 3 is deposited and formed using a flattening technique such as the above. At this time, the upper surfaces of the metal magnetic thin film 3 and the nonmagnetic insulating thin film 10 are flush with each other, and both film thicknesses are 5 μm. That is, the upper surfaces of the metal magnetic thin film 3 and the nonmagnetic insulating thin film 10 are at a height of approximately 10 μm from the upper surface of the nonmagnetic substrate 2.

Next, as shown in FIG. 7, the upper surfaces of the metal magnetic thin film 3 and the nonmagnetic insulating thin film 10 are alternately coated with a 0.1 μm thick nonmagnetic insulating thin film 4 and a 5 μm thick metal magnetic thin film 3. A laminated thin film having a two-layer structure is formed by deposition. Through the above steps, the first laminated substrate 15 having the first laminated thin film 11 having a four-layer structure at its thickest portion is formed.

Further, the second laminated substrate 16 having the second laminated thin film 12 shown in FIG. 8 is formed through the steps shown in FIGS. 3 to 6 described above.

Next, the first laminated substrate 15 and the second
High melting point glass 1 is placed on the upper surface of one of the laminated substrates 16.
After forming the layer 3 by sputtering etc., as shown in FIG.
As shown in FIG.
, the second laminated thin films 11 and 12 are the high melting point glass 1
3, and the high melting point glass 13 is melted and solidified to be bonded and fixed to form the block 1.
form 7.

Next, the block 17 is drawn along the dashed line A-A.
' to form a core block half 18 as shown in FIG.

Next, the cut surface of the core block half 18 is mirror-polished along the dashed lines BB' and CC'. On the surface formed by polishing and removal along the dashed-dotted line BB', only the two first laminated thin films of the laminated thin film are exposed, forming a gap forming surface. Also, the dashed line C
- On the surface formed by polishing and removal along C',
All laminated thin films are exposed.

Next, a set of core block halves that have been subjected to the mirror polishing removal process described above is prepared, and as shown in FIG. is deposited by sputtering etc.,
A winding groove 8 is formed in the gap forming surface of the other core block half 18b.

Thereafter, the set of core block halves 18
The gap forming surfaces of a and 18b are the low melting point glass 1
4 and are joined and fixed by melting and solidifying the low melting point glass 14 to form an integral body, and then the integrated product is cut along the dashed line D-D', and the cut product is The magnetic head of this embodiment shown in FIG. 1 is completed by performing shape processing such as rounding on the surface in contact with the medium.

In the magnetic head of this embodiment as described above,
The laminated thin film in the vicinity of the working gap g is the thinnest with a two-layer structure, and the laminated thin film in other parts is larger than the track width of the working gap g and has a four-layer or six-layer structure, so that the magnetic flux is Due to the narrowing effect, a strong recording magnetic field is generated near the working gap g, and the magnetic medium can be sufficiently magnetized even when the track is narrowed. Furthermore, in the back gap region, the laminated thin film has a six-layer structure and is the thickest and has a large magnetic path cross-sectional area, so the magnetic resistance is reduced and the reproduction efficiency is improved. Moreover, in the magnetic head of this example, the laminated thin film in the part where the winding is applied has a four-layer structure and is smaller than the back gap part, so the inductance does not increase and the usable frequency band does not decrease. .

In the above-described embodiment, the working gap g is formed of the low melting point glass 14 for bonding and fixing the first and second core halves 9a, 9b. It goes without saying that the present invention is also applicable to magnetic heads, etc., in which g is separately formed of an oxide insulating thin film such as SiO2.

[0030]

According to the present invention, it is possible to provide a magnetic head with improved recording characteristics due to the magnetic flux narrowing effect without reducing reproduction efficiency.

[Brief explanation of drawings]

FIG. 1 is a perspective view showing the appearance of a magnetic head.

FIG. 2 is a perspective view showing the shape of laminated thin films of a magnetic head.

FIG. 3 is a perspective view showing a method of manufacturing a magnetic head.

FIG. 4 is a perspective view showing a method of manufacturing a magnetic head.

FIG. 5 is a perspective view showing a method of manufacturing a magnetic head.

FIG. 6 is a perspective view showing a method of manufacturing a magnetic head.

FIG. 7 is a perspective view showing a method of manufacturing a magnetic head.

FIG. 8 is a perspective view showing a method of manufacturing a magnetic head.

FIG. 9 is a perspective view showing a method of manufacturing a magnetic head.

FIG. 10 is a perspective view showing a method of manufacturing a magnetic head.

FIG. 11 is a perspective view showing a method of manufacturing a magnetic head.

FIG. 12 is a perspective view showing the appearance of a conventional magnetic head.

FIG. 13 is a perspective view showing the shape of a laminated thin film of a conventional magnetic head.

[Explanation of symbols]

2, 2' Non-magnetic substrate 3 Metal magnetic thin film 4 Non-magnetic insulating thin film 8 Winding groove 9a First core half 9b Second core half 11 First laminated thin film 12 Second laminated thin film 14 Low melting point glass g Operating gap

Claims (1)

[Claims] 1. Consists of a pair of first and second core halves having a laminated thin film of a metal magnetic thin film and a nonmagnetic insulating thin film between non-magnetic substrates, the laminated thin film of the first and second core halves having In a magnetic head in which gap-forming surfaces whose end surfaces are exposed are abutted against each other via a gap spacer, and an operating gap is formed at the abutted portion, the laminated thin film is wound in the vicinity of the operating gap. The magnetic head is characterized by a structure in which the number of layers increases in the order of the backgap section and the back gap section.