JPH04306861A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPH04306861A
JPH04306861A JP3070912A JP7091291A JPH04306861A JP H04306861 A JPH04306861 A JP H04306861A JP 3070912 A JP3070912 A JP 3070912A JP 7091291 A JP7091291 A JP 7091291A JP H04306861 A JPH04306861 A JP H04306861A
Authority
JP
Japan
Prior art keywords
semiconductor
semiconductor substrate
wafer
processing
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3070912A
Other languages
Japanese (ja)
Inventor
Yoshihiro Kazueda
數枝 義弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP3070912A priority Critical patent/JPH04306861A/en
Publication of JPH04306861A publication Critical patent/JPH04306861A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30Computing systems specially adapted for manufacturing

Abstract

PURPOSE:To provide a method of manufacturing a semiconductor device which is enhanced in working and production efficiency. CONSTITUTION:A semiconductor manufacturing device 1 is provide with a wafer ID recognition section 3 inside. The wafer ID recognition section 3 recognizes the wafer ID of the semiconductor substrate which is not processed yet, and inquires the condition of processings to which the substrate is subjected from the host computer 11. The host computer 11 gives the processing conditions of a controller 9 provided inside the semiconductor device 11. The controller 9 which is given processing conditions directs a processing section 4 to execute processing according to the given conditions. By this setup, a semiconductor manufacturing device can be enhanced in production efficiency.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は半導体基板を認識して、
半導体基板に応じた加工処理条件にて半導体基板を加工
する半導体装置の製造方法に関するものである。
[Industrial Application Field] The present invention recognizes a semiconductor substrate,
The present invention relates to a method for manufacturing a semiconductor device in which a semiconductor substrate is processed under processing conditions depending on the semiconductor substrate.

【0002】0002

【従来の技術】半導体装置の製造過程において半導体基
板の加工を実施する半導体製造装置に半導体基板を投入
する場合、半導体基板が複数枚格納されているカセット
を投入し、カセットに格納されている半導体基板の全数
を同一加工処理条件にて一括加工を実施する方法がとら
れている。
2. Description of the Related Art When semiconductor substrates are loaded into semiconductor manufacturing equipment that processes semiconductor substrates in the process of manufacturing semiconductor devices, a cassette containing a plurality of semiconductor substrates is loaded, and the semiconductors stored in the cassette are A method is used in which all the substrates are processed at once under the same processing conditions.

【0003】半導体基板をカセット単位にて加工するこ
とにより半導体基板の装置間の移動工数の削減や半導体
製造装置に対する加工処理条件の設定の回数を削減する
ことが可能となり、現在多くの半導体製造装置の半導体
基板供給部にてカセット単位の投入が可能となっている
By processing semiconductor substrates in cassette units, it is possible to reduce the number of steps required to move semiconductor substrates between devices and to reduce the number of times processing conditions must be set for semiconductor manufacturing equipment. It is possible to input cassette units at the semiconductor substrate supply section.

【0004】従来の半導体装置の製造方法では、カセッ
トを一つの管理単位とし、このカセットに格納されてい
る半導体基板の全数は、同一の半導体装置に加工される
。すなわち半導体製造装置における加工処理を実施する
場合においては、半導体製造装置に対して処理を実施す
るカセットに応じた加工処理条件を設定することにより
カセットに格納されている全数の半導体基板を同一加工
処理条件にて加工を実施する。
In the conventional semiconductor device manufacturing method, a cassette is used as one management unit, and all the semiconductor substrates stored in this cassette are processed into the same semiconductor device. In other words, when performing processing in semiconductor manufacturing equipment, all semiconductor substrates stored in the cassette can be processed in the same manner by setting processing conditions for the semiconductor manufacturing equipment according to the cassette to be processed. Processing will be carried out under the following conditions.

【0005】[0005]

【発明が解決しようとする課題】このような従来の半導
体装置の製造方法では、一つのカセットを一つの半導体
装置の製造単位とし、同一の半導体装置を大量に製造す
る方法として有効であった。
SUMMARY OF THE INVENTION In such a conventional semiconductor device manufacturing method, one cassette is used as a manufacturing unit of one semiconductor device, and it is effective as a method for manufacturing a large number of the same semiconductor devices.

【0006】しかしながら、少量の半導体装置を製造す
る場合であっても一つのカセットには同一半導体装置を
製造する半導体基板の格納が必要となるため、一つのカ
セットに格納される半導体基板の枚数が少量となり、半
導体製造装置の稼働時間を一定とした場合、一つのカセ
ットに格納されている半導体基板の枚数が少量であると
、一つのカセットに多くの半導体基板が格納されている
場合と比較して、カセット交換回数の増加および加工処
理条件の設定回数の増加を招く。すなわち半導体装置の
製造効率が低下するという問題があった。
However, even when manufacturing a small amount of semiconductor devices, it is necessary to store semiconductor substrates for manufacturing the same semiconductor device in one cassette, so the number of semiconductor substrates stored in one cassette is limited. If the number of semiconductor substrates stored in one cassette is small and the operating time of the semiconductor manufacturing equipment is constant, then the number of semiconductor substrates stored in one cassette is smaller than the number of semiconductor substrates stored in one cassette. This results in an increase in the number of cassette exchanges and an increase in the number of processing conditions settings. In other words, there is a problem in that the manufacturing efficiency of semiconductor devices is reduced.

【0007】本発明は上記課題を解決するものであり、
生産効率を向上することのできる半導体装置の製造方法
を提供することを目的とする。
[0007] The present invention solves the above problems,
An object of the present invention is to provide a method for manufacturing a semiconductor device that can improve production efficiency.

【0008】[0008]

【課題を解決するための手段】この目的を達成するため
に本発明の半導体装置の製造方法は、半導体基板に半導
体基板の一枚ずつを認識するためのウエハIDを付し、
そのウエハIDを半導体基板の加工前に認識し、その認
識情報に基づいた加工処理条件を用いて各半導体基板の
加工を実施するものである。
[Means for Solving the Problems] In order to achieve this object, the method for manufacturing a semiconductor device of the present invention includes attaching a wafer ID to a semiconductor substrate for recognizing each semiconductor substrate,
The wafer ID is recognized before processing the semiconductor substrate, and each semiconductor substrate is processed using processing conditions based on the recognition information.

【0009】[0009]

【作用】この構成によって、半導体基板の一枚ずつを認
識し、半導体基板の一枚ずつに応じた半導体装置の製造
が可能となるため、一つのカセットに複数の異なる半導
体装置を製造する半導体基板を格納して半導体装置の製
造を実施することが可能となる。すなわち多くの種類の
半導体装置を少量生産する半導体装置の製造方法におい
て半導体装置の生産効率を向上することができる。
[Operation] With this configuration, it is possible to recognize each semiconductor substrate one by one and manufacture semiconductor devices according to each semiconductor substrate, so a semiconductor substrate can be used to manufacture a plurality of different semiconductor devices in one cassette. It becomes possible to manufacture semiconductor devices by storing the information. That is, the production efficiency of semiconductor devices can be improved in a semiconductor device manufacturing method that produces many types of semiconductor devices in small quantities.

【0010】0010

【実施例】以下、本発明の一実施例について図1および
図2を参照しながら説明する。
Embodiment An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.

【0011】図1は本発明の一実施例における半導体装
置の製造方法の構成を示すものである。図1において、
1は半導体製造装置であり、2は半導体基板が格納され
ているカセットから半導体基板を供給する半導体基板供
給部、3は半導体基板に付された文字,数字,記号等の
ウエハIDを認識するウエハID認識部、4は半導体基
板の加工を実施する加工部、5は加工が終了した半導体
基板をカセットに回収する半導体基板回収部、6は半導
体基板供給部2からウエハID認識部3までの半導体基
板の搬送を実施する搬送部、7はウエハID認識部3か
ら加工部4までの半導体基板の搬送を実施する搬送部、
8は加工部4にて加工された半導体基板を半導体基板回
収部5までの搬送を実施する搬送部、9は半導体製造装
置のコントロールを実施するコントローラである。コン
トローラ9は通信回線10より半導体装置の製造に関す
る情報を処理するホストコンピュータ11に接続されて
いる。
FIG. 1 shows the configuration of a method for manufacturing a semiconductor device according to an embodiment of the present invention. In Figure 1,
1 is a semiconductor manufacturing device; 2 is a semiconductor substrate supply unit that supplies semiconductor substrates from a cassette in which semiconductor substrates are stored; and 3 is a wafer that recognizes wafer IDs such as letters, numbers, and symbols attached to semiconductor substrates. ID recognition section; 4 is a processing section that processes semiconductor substrates; 5 is a semiconductor substrate collection section that collects processed semiconductor substrates into cassettes; 6 is a semiconductor section from semiconductor substrate supply section 2 to wafer ID recognition section 3; a transport unit that transports the substrate; 7 is a transport unit that transports the semiconductor substrate from the wafer ID recognition unit 3 to the processing unit 4;
Reference numeral 8 denotes a transport unit that transports the semiconductor substrate processed in the processing unit 4 to the semiconductor substrate recovery unit 5, and 9 a controller that controls the semiconductor manufacturing apparatus. The controller 9 is connected through a communication line 10 to a host computer 11 that processes information regarding the manufacture of semiconductor devices.

【0012】図2は、図1の半導体装置の製造方法を説
明するための流れ図である。以上のように構成された本
実施例の半導体装置の製造方法について、以下その動作
を説明する。
FIG. 2 is a flowchart for explaining a method of manufacturing the semiconductor device of FIG. The operation of the method for manufacturing the semiconductor device of this embodiment configured as described above will be described below.

【0013】まず、半導体基板回収部5に半導体基板が
格納されていないカセットを投入する。これは、加工が
終了した半導体基板を回収するためのものである。次に
、半導体基板が格納されているカセットを半導体基板供
給部2に投入する。
First, a cassette containing no semiconductor substrates is loaded into the semiconductor substrate recovery section 5. This is for recovering semiconductor substrates that have been processed. Next, the cassette containing the semiconductor substrates is put into the semiconductor substrate supply section 2.

【0014】コントローラ9は半導体基板供給部2に対
して半導体基板の供給の開始を指示する(図2のステッ
プ21)。
The controller 9 instructs the semiconductor substrate supply section 2 to start supplying semiconductor substrates (step 21 in FIG. 2).

【0015】半導体基板供給部2の半導体基板は搬送部
6によりウエハID認識部3に搬送される。ウエハID
認識部3は半導体基板を受け取るとオリエンテーション
フラットなどを利用して半導体基板の位置合わせを実施
した後に半導体基板に付されているウエハIDの認識を
実施する(同ステップ22)。
The semiconductor substrates in the semiconductor substrate supply section 2 are transferred to the wafer ID recognition section 3 by the transfer section 6 . Wafer ID
When the recognition unit 3 receives the semiconductor substrate, it aligns the semiconductor substrate using an orientation flat or the like, and then recognizes the wafer ID attached to the semiconductor substrate (step 22).

【0016】ウエハIDを認識したウエハID認識部3
はコントローラ9に対して認識したウエハIDを報告す
る。コントローラ9は通信回線10を通してホストコン
ピュータ11に対してウエハID認識部3が認識した半
導体基板を加工処理するための加工処理条件を問い合わ
せる(同ステップ23)。
Wafer ID recognition unit 3 that recognizes the wafer ID
reports the recognized wafer ID to the controller 9. The controller 9 inquires of the host computer 11 through the communication line 10 regarding processing conditions for processing the semiconductor substrate recognized by the wafer ID recognition unit 3 (step 23).

【0017】ホストコンピュータ11はウエハIDの情
報を基に該当する半導体基板を加工する場合に使用すべ
き加工処理条件を判断し、使用すべき加工処理条件を決
定する(同ステップ24)。
The host computer 11 determines the processing conditions to be used when processing the corresponding semiconductor substrate based on the information of the wafer ID, and determines the processing conditions to be used (step 24).

【0018】ホストコンピュータ11は、通信回線10
を通してコントローラ9に対して加工処理条件を指示す
る(同ステップ25)。
[0018] The host computer 11 has a communication line 10.
The processing conditions are instructed to the controller 9 through the controller 9 (step 25).

【0019】加工処理条件の指示を受けたコントローラ
9は、前回の半導体基板を加工した加工処理条件と、こ
れから加工すべき加工処理条件が同一のものであるか比
較し、加工処理条件の交換の必要性を判断する(同ステ
ップ26)。
The controller 9, which has received the instructions for the processing conditions, compares the processing conditions under which the previous semiconductor substrate was processed and the processing conditions to be processed from now on to see if they are the same, and determines whether or not to exchange the processing conditions. The necessity is determined (step 26).

【0020】前回の加工処理条件とこれから加工すべき
加工処理条件が同一の内容であった場合は、搬送部7に
対してウエハID認識部3に存在する半導体基板を加工
部4に搬送するように指示すると供に、加工部4に対し
て加工処理を実施するように指示する。
If the previous processing conditions and the processing conditions to be processed from now on are the same, the transfer section 7 is instructed to transfer the semiconductor substrate present in the wafer ID recognition section 3 to the processing section 4. At the same time, it also instructs the processing unit 4 to carry out the processing.

【0021】前回の加工処理条件と、これから加工すべ
き加工処理条件が異なるものであった場合は、加工部4
に対して加工処理条件の交換を指示し、加工部4は加工
処理条件の交換を実施する(同ステップ27)。加工処
理が可能な環境が整い、半導体基板の加工が可能となっ
た後に、搬送部7に対してウエハID認識部3に存在す
る半導体基板を加工部4に搬送するように指示をする。
[0021] If the previous processing conditions and the processing conditions to be processed from now on are different, the processing section 4
The processing section 4 instructs to exchange the processing conditions, and the processing section 4 executes the exchange of the processing conditions (step 27). After the environment for processing is prepared and the semiconductor substrate can be processed, the transfer section 7 is instructed to transfer the semiconductor substrate present in the wafer ID recognition section 3 to the processing section 4.

【0022】半導体基板を受け取った加工部4は、設定
されている加工処理条件により半導体基板の加工処理を
実施する(同ステップ28)。
The processing unit 4 that receives the semiconductor substrate processes the semiconductor substrate according to the set processing conditions (step 28).

【0023】コントローラ9は、ウエハID認識部3に
半導体基板が存在しなくなった時点で、半導体基板供給
部2に投入されているカセット内部の半導体基板存在認
識を実施し、カセットの内部に半導体基板が存在する場
合、半導体基板供給部2に対して半導体基板の供給を指
示する。半導体基板供給部2のカセット内部に半導体基
板が存在しなければ現在ウエハID認識部3に存在する
半導体基板が半導体基板回収部5に回収された時点で、
半導体基板供給部2に投入されたカセットに格納されて
いた半導体基板の全数の加工が終了したと判断し、加工
処理を終了する(同ステップ29)。
When no semiconductor substrate exists in the wafer ID recognition unit 3, the controller 9 recognizes the presence of a semiconductor substrate inside the cassette loaded into the semiconductor substrate supply unit 2, and detects the semiconductor substrate inside the cassette. If there is, the semiconductor substrate supply section 2 is instructed to supply the semiconductor substrate. If there is no semiconductor substrate inside the cassette of the semiconductor substrate supply section 2, when the semiconductor substrate currently present in the wafer ID recognition section 3 is collected by the semiconductor substrate recovery section 5,
It is determined that all the semiconductor substrates stored in the cassettes loaded into the semiconductor substrate supply section 2 have been processed, and the processing is ended (step 29).

【0024】以上のように本実施例によれば、半導体基
板供給部2と加工部4の間にウエハID認識部3に設け
てウエハIDを認識し、ホストコンピュータ11に対し
て半導体基板一枚毎に加工処理条件の問い合わせを自動
的に実することにより、一つのカセットに複数の種類の
半導体装置を製造する半導体基板が格納されている場合
においても、自動的に半導体装置の製造を実施すること
ができる。
As described above, according to this embodiment, the wafer ID recognition section 3 is provided between the semiconductor substrate supply section 2 and the processing section 4 to recognize the wafer ID, and one semiconductor substrate is sent to the host computer 11. By automatically inquiring about the processing conditions for each process, even when a single cassette contains semiconductor substrates for manufacturing multiple types of semiconductor devices, semiconductor devices can be manufactured automatically. be able to.

【0025】[0025]

【発明の効果】以上のように本発明は、半導体基板に付
されたウエハIDを、半導体製造装置における加工処理
の実施前に認識し、半導体基板を一枚ずつ自動的に処理
条件を交換し加工処理を実施することにより、半導体製
造装置の稼働効率を向上させ、生産効率を著しく向上さ
せることができる優れた半導体装置の製造方法を提供で
きる。
[Effects of the Invention] As described above, the present invention recognizes the wafer ID attached to a semiconductor substrate before processing it in a semiconductor manufacturing device, and automatically exchanges processing conditions for each semiconductor substrate one by one. By performing the processing, it is possible to provide an excellent semiconductor device manufacturing method that can improve the operating efficiency of semiconductor manufacturing equipment and significantly improve production efficiency.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明の一実施例の半導体装置の製造方法を実
施する装置の概略構成図
FIG. 1 is a schematic configuration diagram of an apparatus for carrying out a method for manufacturing a semiconductor device according to an embodiment of the present invention.

【図2】同半導体装置の製造方法の動作を示す流れ図[Figure 2] Flowchart showing the operation of the method for manufacturing the semiconductor device

【符号の説明】[Explanation of symbols]

1      半導体製造装置 2      半導体基板供給部 3      ウエハID認識部 4      加工部 5      半導体基板回収部 6      搬送部 7      搬送部 8      搬送部 9      コントローラ 10    通信回線 11    ホストコンピュータ 1 Semiconductor manufacturing equipment 2 Semiconductor substrate supply section 3 Wafer ID recognition unit 4      Processing section 5 Semiconductor substrate recovery department 6     Transfer section 7      Transport section 8      Transport section 9 Controller 10 Communication line 11 Host computer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  各半導体基板に、それぞれの半導体基
板を認識することができる文字,数字,記号等のウエハ
IDを付し、そのウエハIDを半導体基板の加工前に認
識し、その認識した情報に基づいた各半導体基板の加工
処理条件を用いて、前記各半導体基板の加工を実施する
ことを特徴とする半導体装置の製造方法。
Claim 1: A wafer ID such as letters, numbers, symbols, etc. that can be used to recognize each semiconductor substrate is attached to each semiconductor substrate, and the wafer ID is recognized before processing the semiconductor substrate, and the recognized information is provided. A method for manufacturing a semiconductor device, characterized in that each semiconductor substrate is processed using processing conditions for each semiconductor substrate based on the following.
JP3070912A 1991-04-03 1991-04-03 Manufacture of semiconductor device Pending JPH04306861A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3070912A JPH04306861A (en) 1991-04-03 1991-04-03 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3070912A JPH04306861A (en) 1991-04-03 1991-04-03 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPH04306861A true JPH04306861A (en) 1992-10-29

Family

ID=13445202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3070912A Pending JPH04306861A (en) 1991-04-03 1991-04-03 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPH04306861A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016203362A (en) * 2015-04-28 2016-12-08 株式会社ディスコ Processing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016203362A (en) * 2015-04-28 2016-12-08 株式会社ディスコ Processing device

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