JPH043007Y2 - - Google Patents

Info

Publication number
JPH043007Y2
JPH043007Y2 JP1986087348U JP8734886U JPH043007Y2 JP H043007 Y2 JPH043007 Y2 JP H043007Y2 JP 1986087348 U JP1986087348 U JP 1986087348U JP 8734886 U JP8734886 U JP 8734886U JP H043007 Y2 JPH043007 Y2 JP H043007Y2
Authority
JP
Japan
Prior art keywords
base material
reaction tube
plasma
waveguide
goniometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1986087348U
Other languages
English (en)
Japanese (ja)
Other versions
JPS62198277U (enrdf_load_html_response
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986087348U priority Critical patent/JPH043007Y2/ja
Publication of JPS62198277U publication Critical patent/JPS62198277U/ja
Application granted granted Critical
Publication of JPH043007Y2 publication Critical patent/JPH043007Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP1986087348U 1986-06-09 1986-06-09 Expired JPH043007Y2 (enrdf_load_html_response)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986087348U JPH043007Y2 (enrdf_load_html_response) 1986-06-09 1986-06-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986087348U JPH043007Y2 (enrdf_load_html_response) 1986-06-09 1986-06-09

Publications (2)

Publication Number Publication Date
JPS62198277U JPS62198277U (enrdf_load_html_response) 1987-12-17
JPH043007Y2 true JPH043007Y2 (enrdf_load_html_response) 1992-01-31

Family

ID=30944471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986087348U Expired JPH043007Y2 (enrdf_load_html_response) 1986-06-09 1986-06-09

Country Status (1)

Country Link
JP (1) JPH043007Y2 (enrdf_load_html_response)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6054996A (ja) * 1983-09-07 1985-03-29 Natl Inst For Res In Inorg Mater ダイヤモンドの合成法
JPS6054995A (ja) * 1983-09-07 1985-03-29 Natl Inst For Res In Inorg Mater ダイヤモンドの合成法

Also Published As

Publication number Publication date
JPS62198277U (enrdf_load_html_response) 1987-12-17

Similar Documents

Publication Publication Date Title
US8747560B2 (en) System and method for pedestal adjustment
EP1061155B1 (en) Vacuum processing apparatus
US5749966A (en) Process for depositing diamond and refractory materials
JPH0346437B2 (enrdf_load_html_response)
EP0423498B1 (en) Method of and apparatus for synthesizing hard material
JPH043007Y2 (enrdf_load_html_response)
US5292371A (en) Microwave plasma CVD apparatus comprising dual plungers for two-dimension plasma position adjustment
JPH0978240A (ja) 硬質炭素被膜形成装置及び硬質炭素被膜形成基板の製造方法
US2445132A (en) Apparatus for determining electrical axis of quartz crystals
JP4113547B2 (ja) 配向層形成装置および配向層形成方法
JPS6054995A (ja) ダイヤモンドの合成法
JP2973472B2 (ja) プラズマcvd装置
JPH01137621A (ja) 気相成長装置
JP3161788B2 (ja) ダイヤモンド膜合成装置
JPS6027692A (ja) インプロセスモニタ可能な気相エピタキシヤル成長用化学反応装置
JPS63117993A (ja) ダイヤモンドの気相合成法
JPH03174397A (ja) 硬質物質の合成方法およびその合成装置
JPH03202467A (ja) 高周波プラズマ素材プロセッシング装置
JP2838414B2 (ja) ダイヤモンドコーティング装置
JPH04369833A (ja) 薄膜製造方法及び薄膜製造装置
EP0330708A1 (en) Apparatus for forming thin films
JPS63249330A (ja) マイクロ波プラズマcvd装置
JPH01270596A (ja) ダイヤモンド被膜の析出形成方法
JPH01103830A (ja) プラズマcvd装置
KR200317518Y1 (ko) 초음파 가공장치