JPH0429659U - - Google Patents
Info
- Publication number
- JPH0429659U JPH0429659U JP6953390U JP6953390U JPH0429659U JP H0429659 U JPH0429659 U JP H0429659U JP 6953390 U JP6953390 U JP 6953390U JP 6953390 U JP6953390 U JP 6953390U JP H0429659 U JPH0429659 U JP H0429659U
- Authority
- JP
- Japan
- Prior art keywords
- reaction chamber
- discharge electrode
- roll
- metal body
- flexible metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 claims description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 2
- 239000002994 raw material Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図は、本考案の一実施例を示す断面図であ
つて、１は反応室、２は放電電極、３は供給ロー
ル、４は巻取ロール、５は可撓性金属体、８は基
板、９は高周波電源、１０はガス供給手段である
。
FIG. 1 is a sectional view showing one embodiment of the present invention, in which 1 is a reaction chamber, 2 is a discharge electrode, 3 is a supply roll, 4 is a take-up roll, 5 is a flexible metal body, and 8 is a 9 is a high frequency power source, and 10 is a gas supply means.
Claims (1)
、この放電電極に電力を供給する電源手段と、上
記反応室内に原料ガスを導入するガス供給手段と
を備え、上記反応室内に上記ガス供給手段より原
料ガスを導入した状態でグロー放電を生起するこ
とにより、上記放電電極と対向して上記反応室内
に配された基板上に膜を形成するプラズマＣＶＤ
装置において、上記放電電極が、可撓性金属体の
供給ロール、巻取ロール及び上記供給ロールから
繰り出され、上記巻取ロールとの間に張架された
上記可撓性金属体からなることを特徴とするプラ
ズマＣＶＤ装置。 A reaction chamber, a discharge electrode disposed in the reaction chamber, a power supply means for supplying electric power to the discharge electrode, and a gas supply means for introducing a raw material gas into the reaction chamber, the gas supply means being provided in the reaction chamber. Plasma CVD in which a film is formed on a substrate disposed in the reaction chamber facing the discharge electrode by generating glow discharge while introducing a raw material gas from the means.
In the device, the discharge electrode comprises a supply roll of a flexible metal body, a take-up roll, and the flexible metal body unwound from the supply roll and stretched between the take-up roll and the flexible metal body. Characteristic plasma CVD equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6953390U JPH0429659U (en) | 1990-06-28 | 1990-06-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6953390U JPH0429659U (en) | 1990-06-28 | 1990-06-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0429659U true JPH0429659U (en) | 1992-03-10 |
Family
ID=31604918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6953390U Pending JPH0429659U (en) | 1990-06-28 | 1990-06-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0429659U (en) |
-
1990
- 1990-06-28 JP JP6953390U patent/JPH0429659U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0921713A3 (en) | Plasma processing apparatus and method | |
| JPH0429659U (en) | ||
| KR910020204A (en) | Plasma CVD Equipment | |
| JPH0469465U (en) | ||
| JPS6413119U (en) | ||
| JPH01125529U (en) | ||
| JPH0477229U (en) | ||
| JPH0444363U (en) | ||
| JPS648614A (en) | Film formation of filamentary substrate | |
| JPS60179033U (en) | discharge electrode | |
| JPH0415832U (en) | ||
| JPS62110266U (en) | ||
| JPH0187529U (en) | ||
| JPH02114927U (en) | ||
| JPS62110264U (en) | ||
| JPS60106335U (en) | Plasma CVD equipment | |
| JPS6415375A (en) | Device for forming thin diamond-like carbon film | |
| JPH0355846U (en) | ||
| JPS63187326U (en) | ||
| JPH0444356U (en) | ||
| JPS63140064U (en) | ||
| JPS6453757U (en) | ||
| JPS61159368U (en) | ||
| JPH0374663U (en) | ||
| JPS62191100U (en) |