JPH0444363U - - Google Patents
Info
- Publication number
- JPH0444363U JPH0444363U JP8643990U JP8643990U JPH0444363U JP H0444363 U JPH0444363 U JP H0444363U JP 8643990 U JP8643990 U JP 8643990U JP 8643990 U JP8643990 U JP 8643990U JP H0444363 U JPH0444363 U JP H0444363U
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- arc
- anode
- cathode
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 239000007921 spray Substances 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
Landscapes
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案の一実施例を表す薄膜生成装置
の側断面図である。
図中、１は陽極、２は陰極、４は薄膜、５は基
板、６はアーク、７は大電力パルス放電手段、１
２はガス状の薄膜生成材料、１３はガス供給手段
である。
FIG. 1 is a side sectional view of a thin film generating apparatus representing an embodiment of the present invention. In the figure, 1 is an anode, 2 is a cathode, 4 is a thin film, 5 is a substrate, 6 is an arc, 7 is a high power pulse discharge means, 1
2 is a gaseous thin film forming material, and 13 is a gas supply means.
Claims (1)
料を供給してプラズマ状態にし、これを基板上に
吹き付けて薄膜として堆積させる薄膜生成装置に
おいて、筒体状の陽極と、その中心部に配置され
た陰極と、該陰極と上記陽極との間にパルス状の
高電圧を印加し、これら電極を溶融・気化させつ
つ電極間にアークを発生させる大電力パルス放電
手段と、夫々異なつたガス状薄膜生成材料を上記
アーク中に供給するガス供給手段とを備えたこと
を特徴とする薄膜生成装置。 In a thin film generation device that supplies a gaseous thin film generation material into the arc between the cathode and anode to create a plasma state and sprays it onto a substrate to deposit it as a thin film, a cylindrical anode and a cylindrical anode placed at its center are used. a high-power pulse discharge means that applies a pulsed high voltage between the cathode and the anode to generate an arc between the electrodes while melting and vaporizing these electrodes; A thin film generating device comprising a gas supply means for supplying a thin film generating material into the arc.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8643990U JP2503591Y2 (en) | 1990-08-20 | 1990-08-20 | Thin film generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8643990U JP2503591Y2 (en) | 1990-08-20 | 1990-08-20 | Thin film generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0444363U true JPH0444363U (en) | 1992-04-15 |
| JP2503591Y2 JP2503591Y2 (en) | 1996-07-03 |
Family
ID=31818106
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8643990U Expired - Lifetime JP2503591Y2 (en) | 1990-08-20 | 1990-08-20 | Thin film generator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2503591Y2 (en) |
-
1990
- 1990-08-20 JP JP8643990U patent/JP2503591Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2503591Y2 (en) | 1996-07-03 |
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