JPH0427665B2 - - Google Patents
Info
- Publication number
- JPH0427665B2 JPH0427665B2 JP63299294A JP29929488A JPH0427665B2 JP H0427665 B2 JPH0427665 B2 JP H0427665B2 JP 63299294 A JP63299294 A JP 63299294A JP 29929488 A JP29929488 A JP 29929488A JP H0427665 B2 JPH0427665 B2 JP H0427665B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- particles
- slit
- ion beam
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002245 particle Substances 0.000 claims description 64
- 238000010884 ion-beam technique Methods 0.000 claims description 16
- 238000004969 ion scattering spectroscopy Methods 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 description 31
- 230000007935 neutral effect Effects 0.000 description 17
- 102100027340 Slit homolog 2 protein Human genes 0.000 description 11
- 101710133576 Slit homolog 2 protein Proteins 0.000 description 11
- 238000001228 spectrum Methods 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
Landscapes
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63299294A JPH02145947A (ja) | 1988-11-26 | 1988-11-26 | イオン散乱分光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63299294A JPH02145947A (ja) | 1988-11-26 | 1988-11-26 | イオン散乱分光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02145947A JPH02145947A (ja) | 1990-06-05 |
| JPH0427665B2 true JPH0427665B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-05-12 |
Family
ID=17870666
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63299294A Granted JPH02145947A (ja) | 1988-11-26 | 1988-11-26 | イオン散乱分光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02145947A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2926666B2 (ja) * | 1991-05-13 | 1999-07-28 | 株式会社島津製作所 | 直衝突イオン散乱分光装置 |
| US6674075B2 (en) * | 2002-05-13 | 2004-01-06 | Applied Materials, Inc. | Charged particle beam apparatus and method for inspecting samples |
| KR101041661B1 (ko) | 2003-07-30 | 2011-06-14 | 어플라이드 머티리얼즈 이스라엘 리미티드 | 다중 검출기들을 갖는 스캐닝 전자 현미경 및 다중 검출기기반 이미징을 위한 방법 |
| US7842933B2 (en) | 2003-10-22 | 2010-11-30 | Applied Materials Israel, Ltd. | System and method for measuring overlay errors |
-
1988
- 1988-11-26 JP JP63299294A patent/JPH02145947A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02145947A (ja) | 1990-06-05 |