JPH0426942A - Production of magneto-optical recording medium - Google Patents
Production of magneto-optical recording mediumInfo
- Publication number
- JPH0426942A JPH0426942A JP13327690A JP13327690A JPH0426942A JP H0426942 A JPH0426942 A JP H0426942A JP 13327690 A JP13327690 A JP 13327690A JP 13327690 A JP13327690 A JP 13327690A JP H0426942 A JPH0426942 A JP H0426942A
- Authority
- JP
- Japan
- Prior art keywords
- magneto
- sputter etching
- protective film
- recording medium
- optical recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000000992 sputter etching Methods 0.000 claims abstract description 27
- 230000001681 protective effect Effects 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 9
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 9
- 150000003624 transition metals Chemical class 0.000 claims abstract description 9
- 239000011261 inert gas Substances 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 11
- 239000003989 dielectric material Substances 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 4
- 230000005415 magnetization Effects 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000003475 lamination Methods 0.000 description 2
- 101100269496 Alcaligenes faecalis aioA gene Proteins 0.000 description 1
- 229910018182 Al—Cu Inorganic materials 0.000 description 1
- 229910018575 Al—Ti Inorganic materials 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- -1 TbFeC. o Chemical class 0.000 description 1
- QQHSIRTYSFLSRM-UHFFFAOYSA-N alumanylidynechromium Chemical compound [Al].[Cr] QQHSIRTYSFLSRM-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は光磁気記録媒体の製造方法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for manufacturing a magneto-optical recording medium.
情報の消去および誉き換えが可能な光磁気記録媒体は、
一般に＜１ 、透明基板上に保護ａ％垂直磁気異方性を
有する磁性膜および保護膜をこの順に積層し次構造を有
するか、または上記の保護膜上にさらに反射膜を積層し
た構造を有している。Magneto-optical recording media that allow information to be erased and replaced are
In general, <1, a magnetic film having a protective a% perpendicular magnetic anisotropy and a protective film are laminated in this order on a transparent substrate, or a reflective film is further laminated on the above protective film. are doing.
光磁気記録媒体の磁性膜としては、希土類元素と遷移金
属とのアモルファス合金が好ましく、例えばＴｂＦｅＣ
ｏ 、 ＮｄＤｙＦｅＣｏ 、 ＧｄＴｂＦｅ すどノ
合金が用いられている。The magnetic film of the magneto-optical recording medium is preferably an amorphous alloy of rare earth elements and transition metals, such as TbFeC.
o, NdDyFeCo, and GdTbFe sudono alloys are used.
光磁気記録媒体におけるオーバーライド方式としては、
磁性膜の温度かそのキュリー温度以上になる工うな一定
の強度を有するレーザ光照射下で、電磁石などにより磁
性膜に与える外部磁界の向きを情報に応じて反転させる
ことにより記録する磁界変調方式が採用されることが多
い。上記の希土類元素と遷移金属とのアモルファス合金
からなる磁性膜を備える光磁気記録媒体を用いて磁界変
調方式によりオーバーライドを行う際に印加される外部
磁界は１通常、２００〜４０００ｅの範囲である。As an override method for magneto-optical recording media,
A magnetic field modulation method that records by reversing the direction of an external magnetic field applied to a magnetic film using an electromagnet or the like according to information under laser light irradiation with a certain intensity that does not exceed the temperature of the magnetic film or its Curie temperature. Often adopted. The external magnetic field applied when performing override by a magnetic field modulation method using a magneto-optical recording medium having a magnetic film made of an amorphous alloy of a rare earth element and a transition metal described above is usually in the range of 200 to 4000 e.
磁性膜か有する磁化の向きか一定の方向になるように初
期化され九九磁気記録媒体に印加される外部磁界と記録
された情報を再生して得られるＣＮＲとの関係を第４図
に示す。第４図においｔＣＮＲが飽和する外部磁界（以
下、これを飽和磁界と称する）をＨ８で表し、ＣＮＲか
０になる外部磁界（以下、これを消失磁界と称する）を
ＨＯで表す。Figure 4 shows the relationship between the external magnetic field applied to a magnetic recording medium that is initialized so that the magnetization direction of the magnetic film is in a constant direction and the CNR obtained by reproducing recorded information. . In FIG. 4, the external magnetic field at which tCNR is saturated (hereinafter referred to as the saturation magnetic field) is represented by H8, and the external magnetic field at which the CNR becomes 0 (hereinafter referred to as the vanishing magnetic field) is represented by HO.
磁界変調方式によりオーバーライドを行う際。When performing override using magnetic field modulation method.
飽和磁界と消失磁界との間で外部磁界の向きを反転させ
る必要がある。したがって飽和磁界と消失磁界との差（
以下、これを反転磁界と称する）が小さい光磁気記録媒
体を用いることが、反転する磁界の幅が小さく、オーバ
ーライドの高速化、電磁石の軽量化が可能になる点で好
適である。It is necessary to reverse the direction of the external magnetic field between the saturation magnetic field and the vanishing magnetic field. Therefore, the difference between the saturation magnetic field and the vanishing magnetic field (
It is preferable to use a magneto-optical recording medium with a small reversal magnetic field (hereinafter referred to as a reversal magnetic field) because the width of the reversal magnetic field is small, enabling faster override and lighter electromagnets.
光磁気記録媒体への情報の記録時における磁性膜および
その周辺の磁化の向きを表す模式図を第５図に示す。第
５図に示すように、情報の記録時にレーザ光が照射され
る領域には、電磁石などによる外部磁界Ｈｅｘと、レー
ザ光照射領域の周囲にあり、消去方向の磁化を有する磁
性膜による反磁界）１ｄとが加わる。上記の消失磁界は
反磁界を打ち消すだけの大きさが必要であり、上記の反
転磁界の大きさは反磁界の大きさに依存する。FIG. 5 is a schematic diagram showing the direction of magnetization of the magnetic film and its surroundings when information is recorded on a magneto-optical recording medium. As shown in Fig. 5, the area that is irradiated with laser light when recording information is exposed to an external magnetic field Hex from an electromagnet, etc., and a demagnetizing field from a magnetic film that is magnetized in the erasing direction and is located around the laser beam irradiation area. )1d is added. The above-mentioned vanishing magnetic field needs to be large enough to cancel out the demagnetizing field, and the magnitude of the above-mentioned reversal magnetic field depends on the magnitude of the demagnetizing field.
反磁界を小さくするためには、補償組成になるように希
土類元素と遷移金属との組成比を調整して磁性膜を形成
することが必要であるが、組成比のずれが生じやすいた
めに、補償組成を有する磁性膜を安定して形成すること
は困難である。In order to reduce the demagnetizing field, it is necessary to form a magnetic film by adjusting the composition ratio of rare earth elements and transition metals so as to have a compensating composition. It is difficult to stably form a magnetic film having a compensating composition.
本発明の目的は、磁界変調方式によってオーバーライド
を行うに適した光磁気記録媒体を容易に製造する方法を
提供することにある。An object of the present invention is to provide a method for easily manufacturing a magneto-optical recording medium suitable for overriding using a magnetic field modulation method.
本発明によれば、上記の目的は、基板上に誘電体からな
る保護膜と、希土類元素および遷移金属を含む磁性膜と
が積層されてなる構造を備える光磁気記録媒体を製造す
るにあ念す、基板上に上記の保護膜を積層したのちに、
スパッタエツチングに際して投入される電力密度ω［Ｗ
／ｌＡ ）とスパッタエツチング時間ｔ ［ｓｅｅ 〕
との積積層ｔ（以下。According to the present invention, the above object is aimed at manufacturing a magneto-optical recording medium having a structure in which a protective film made of a dielectric material and a magnetic film containing a rare earth element and a transition metal are laminated on a substrate. After laminating the above protective film on the substrate,
The power density ω[W
/lA) and sputter etching time t [see]
Lamination with lamination t (below).
表面を不活性ガスを用いてスパッタエツチングし。Sputter etching the surface using an inert gas.
ついで保護膜上に上記の磁性膜を形成することを特徴と
する光磁気記録媒体の製造方法を提供することにより達
成される。This is achieved by providing a method for manufacturing a magneto-optical recording medium, which is characterized in that the above-mentioned magnetic film is then formed on the protective film.
上記の電力密度はスパッタエツチングに際Ｌ６Ｃ投入さ
れる電力を基板の面積で除することにより得られる値で
ある。The above power density is a value obtained by dividing the power input to L6C during sputter etching by the area of the substrate.
以下、実施例により本発明を具体的に説明する。 Hereinafter, the present invention will be specifically explained with reference to Examples.
実施例１
本発明により製造される光磁気記録媒体の１例の概略断
面図を第１図に示す。第１因に示す断面構造を有する光
磁気記録媒体は、基板１上に、誘電体からなる保護膜２
、希土類元素と遷移金属とを含む磁性ｆｆ１３．誘電体
からなる保護膜４．および反射膜５が順次積層されてな
る。情＠を記録。Example 1 A schematic cross-sectional view of one example of a magneto-optical recording medium manufactured according to the present invention is shown in FIG. A magneto-optical recording medium having the cross-sectional structure shown in the first factor has a protective film 2 made of a dielectric material on a substrate 1.
, magnetic ff13. containing rare earth elements and transition metals. Protective film made of dielectric material4. and a reflective film 5 are sequentially laminated. Record @.
再生または消去するために基板１１ｔｌｌから光が照射
される。Light is irradiated from the substrate 11tll for reproduction or erasing.
ポリカーボネート樹脂からなる基板ｌ上に、５ｉｓｏＮ
ｓｏ （原子数比）からなる保ｉ１１膜２（膜厚：１１
００人） 、 Ｔｂ１ｓ＋Ｆｅ７ｓＣｏｓ （原子数比
）からなる磁性膜３（膜厚：２００人） 、 ５ｉｓｏ
Ｎ５ｏ （原子数比）からなる保護膜４（膜厚： ３５
０人）およびＡ１９７Ｔｉｓ（原子数比プからなる反射
膜５（膜厚：ａｓｏＡ）が順次積層されてなる第１図に
示す断面構造を有する光磁気記録媒体を製造するにあた
り、基板１上に保護膜２を形成し几のちに、 Ａｒガス
をガス圧が０．１ Ｐａになるように導入し、スパッタ
エツチングに際し７て投入する電力密度ωおよびスパッ
タエツチング時間ｔを変えて保′ａ膜２の表面をスパッ
タエツチングし、ついで磁性膜３を形成する。得られた
光磁気記録媒体が有する消失磁界を測定し。5isoN on the substrate l made of polycarbonate resin.
I11 film 2 (film thickness: 11
00 people), magnetic film 3 consisting of Tb1s+Fe7sCos (atomic ratio) (film thickness: 200 people), 5iso
Protective film 4 (film thickness: 35
In manufacturing a magneto-optical recording medium having the cross-sectional structure shown in FIG. 1, in which a reflective film 5 (thickness: asoA) consisting of A197Tis and A197Tis (atomic ratio P) is sequentially laminated, a protective layer is placed on the substrate 1. After forming the film 2, Ar gas was introduced so that the gas pressure was 0.1 Pa, and the power density ω input in step 7 during sputter etching and the sputter etching time t were changed to change the thickness of the protective film 2. The surface is sputter-etched, and then a magnetic film 3 is formed.The vanishing magnetic field of the obtained magneto-optical recording medium is measured.
スパッタエツチング強度と消失磁界との関係を第２図に
示す８第２図より明らかなように、 ２Ｏ（Ｗと
・・／ｃＪ以上のスパッタエツチング強度で保護膜２の
表面をスパッタエツチングすることによって小さな消失
磁界を有する光磁気記録媒体が伜ら九る。第２図に示す
測定点［）〜（ｆ）（ｉ、それぞれ第１表に示す電力密
度ω［、Ｗ／ｉ ）およびスパッタエツチング時間ｔ
（ｓｅｅ ）でスパッタエツチングして得られ九九磁気
記録媒体についての測定結果である。The relationship between the sputter etching intensity and the vanishing magnetic field is shown in Fig. 2.8 As is clear from Fig. 2, by sputter etching the surface of the protective film 2 with a sputter etching intensity of 2O(W.../cJ or higher), A magneto-optical recording medium with a small vanishing magnetic field is produced.Measurement points [) to (f) (i) shown in Fig. 2, power density ω[, W/i] and sputter etching time shown in Table 1, respectively. t
These are the measurement results for a magnetic recording medium obtained by sputter etching in (see).
第 １ 表
スパッタエツチング強度を変えて得られる光磁気記録媒
体について、磁性膜３が有する磁化の向きが一定の方向
になるように初期化された光磁気記録媒体に記録の定め
に印加される外部磁界と記録された情報を再生して得ら
れるＣＮＲとの関係を第３図に示す。第３図に示す実＃
（ｅ）および破線げ）はそれぞれ第１表に示す測定点１
ｅ）および（ｆ）における条件でスパッタエツチングし
て得られる光磁気記録媒体による沖」定結果である。第
３図から明らかなように、スパッタエツチング！！ｌｌ
［が１４７〔Ｗ・ｓｅｃ／ｍ）でるる場合には、３００
０ｅ以上の外部磁界に対するＣＮＲが低下し、これによ
ってジッターが感化する。な２％測定は線速１０ｍ／Ｓ
。Table 1 Concerning magneto-optical recording media obtained by varying the sputter etching intensity, an external voltage applied to the magneto-optical recording medium to determine recording is initialized so that the direction of magnetization of the magnetic film 3 is in a constant direction. FIG. 3 shows the relationship between the magnetic field and the CNR obtained by reproducing recorded information. Actual number shown in Figure 3
(e) and dashed line) are measurement points 1 shown in Table 1, respectively.
These are the results of measurements using a magneto-optical recording medium obtained by sputter etching under the conditions in e) and (f). As is clear from Figure 3, sputter etching! ! ll
If [ is 147 [W・sec/m], then 300
The CNR for external magnetic fields above 0e decreases, which makes jitter sensitive. 2% measurement is at a linear speed of 10 m/s
.
記録周波数３．７ Ｎ１）１ｚ 、デユーティ−３０−
１記鍮に用いるレーザ元のパワー９ｍＷの条件で記録さ
れ九情報を再生して行つ几。Recording frequency: 3.7 N1) 1z, duty: 30-
1. A device that reproduces 9 information recorded under the conditions of the laser source power used for the brass of 9mW.
以上のことより明らかなように、基板上に形成された保
１１Ｍ２の表面をスパッタエツチング強匿が２ ｕ 〜
１３ Ｏ（Ｗ−５ｓｅｃ／ｃｙＡ）の範囲になるように
スパッタエツチングし、ついで磁性＠３を積層して得ら
れ九九磁気記録媒体は磁界変調方式によるオーバーライ
ドに通すゐ。消失磁界が特に小さく。As is clear from the above, the surface of the substrate 11M2 formed on the substrate is strongly etched by sputter etching.
13 O (W-5 sec/cyA), and then the magnetic recording medium obtained by laminating magnetic@3 is subjected to override using a magnetic field modulation method. The vanishing magnetic field is particularly small.
しかもジッターか良好でめる光磁気記録媒体を祷るため
には、スパッタエツチング強［ｔ−４（Ｊ〜１８０（Ｗ
−ｓｅｅ ／ｃｙＡ ）の範囲η・ら遇ぶことが好ま
しい。またスパッタエツチングする際の電力密度は０．
２〜０．４（Ｗ／ｄ）の範囲におることが、スパッタエ
ツチングに蒙する時間か短かく、シかζ基板の直置上昇
によるガス放出か少ない点で針筒しい。また。Moreover, in order to obtain a magneto-optical recording medium with good jitter control, strong sputter etching [t-4 (J~180 (W)
-see/cyA) preferably in the range η·. Also, the power density during sputter etching is 0.
A range of 2 to 0.4 (W/d) is advantageous in that the time required for sputter etching is short and the amount of gas released due to direct lifting of the substrate is small. Also.
スパッタエツチングに要する時間は５０〜３００ ｔｒ
ｅＣの範囲にあることが、同様の理由により好ましヘス
バッタエツチングに際しτ導入される不活性ガスとして
はＡｒガスのほかに、 Ｎｅガス、にガス、Ｋｒガスな
どが用いられる。不活性ガスは、通常、ガス圧が０．０
５〜０．４ Ｐａの範囲になるように導入される。The time required for sputter etching is 50 to 300 tr.
For the same reason, it is preferable for the inert gas to be in the eC range.In addition to Ar gas, Ne gas, Kr gas, etc. are used as the inert gas introduced during the Hesbutter etching. Inert gas usually has a gas pressure of 0.0.
The pressure is introduced to be in the range of 5 to 0.4 Pa.
上記の基板ｌとしてアモルファスポリオレフィン樹脂、
ポリメチルメタクリレート樹脂、エポキシ樹脂、カラス
などを用いることもできる。保護膜２および保護膜４を
形成する誘電体はＳｉＮのほかに、 ＡＩＮ％Ａｌ５ｉ
Ｎ、 Ａｌ５ｉＯＮ、 Ｓｉｎ、 ＺｎＳなどであって
もよい。磁性膜３としてｉｊ ＴｂＦｅ、 ＴｂＤｙＦ
ｅ。Amorphous polyolefin resin as the above substrate l,
Polymethyl methacrylate resin, epoxy resin, glass, etc. can also be used. In addition to SiN, the dielectric material forming the protective film 2 and the protective film 4 is AIN%Al5i.
N, Al5iON, Sin, ZnS, etc. may be used. ij TbFe, TbDyF as the magnetic film 3
e.
ＧｄＤｙＦｅ、 ＧｄＴｂＦｅ、 ＧｄＦｅＣｏなどの
希土類元素と遷移金属とからなるアモルファス合金また
は、これらの希土類元素と遷移金属にＣｒ、Ｔｉなどが
添加されてなるアモルファス合金が用いられる。反射膜
５を形成する材料としては、 Ａｕ、 Ａｌ、 Ａｇ。An amorphous alloy made of a rare earth element such as GdDyFe, GdTbFe, or GdFeCo and a transition metal, or an amorphous alloy made of a rare earth element and a transition metal to which Cr, Ti, etc. are added is used. Examples of materials for forming the reflective film 5 include Au, Al, and Ag.
ム
Ｐｔ、 Ａｌ−Ｔｉ曾金、Ａｌ−Ｃｒ合金、ＡＩ−＃＊
合金、Ａｌ−Ｃｕ台金などが用いられる。Mu Pt, Al-Ti alloy, Al-Cr alloy, AI-#*
An alloy, an Al-Cu base metal, etc. are used.
第１図に示した断面構造を有する光磁気記録媒体が有す
る保ａ膜、磁性膜および反射膜の膜厚はこれらの光字的
特性および熱伝導率に応じ１設定することができるが、
保護膜２の膜厚が４００〜１２００人の範囲にあり、磁
性膜３の膜厚７が１００〜４００人の範囲にあり、保護
膜４の膜厚が３００〜１２００人の範囲にあり５反射膜
５の膜厚が２００〜８００人の範囲にある場合が好まし
い。The film thicknesses of the a-retaining film, magnetic film, and reflective film included in the magneto-optical recording medium having the cross-sectional structure shown in FIG. 1 can be set according to their optical characteristics and thermal conductivity.
The thickness of the protective film 2 is in the range of 400 to 1200 μm, the thickness 7 of the magnetic film 3 is in the range of 100 to 400 μm, and the thickness of the protective film 4 is in the range of 300 to 1200 μm. It is preferable that the thickness of the membrane 5 is in the range of 200 to 800 people.
本発明により製造される光磁気記録媒体は、保護膜４お
よび／または反射膜５を備えていないものも含まれるか
、保護Ｒ４を備える光磁気記録媒体は耐高温・高湿性を
有している点で好適であり、〔発明の効果〕
不発明によれは、＠界変調方式によってオーバーライド
を行うに適した光磁気記録媒体が容易に製造される。The magneto-optical recording medium manufactured according to the present invention includes those not provided with the protective film 4 and/or the reflective film 5, or the magneto-optical recording medium provided with the protection R4 has high temperature and high humidity resistance. [Effects of the Invention] According to the invention, a magneto-optical recording medium suitable for overriding by the @ field modulation method can be easily manufactured.
第１図は本発明により製造される光磁気記録媒体の１例
の概略断面図、第２図はスパッタエツチング強度と消失
磁界との関係を示す図、第３図は初期化された光磁気記
録媒体に記録の几めに印加される外部磁界と記録された
情報を再生して得られるＣＮＲとの関係を示す図、第４
図は上記の外部磁界とＣＮＲとの関係を表す模式図、第
５図は光磁気記録媒体への情報の記録時における磁性膜
およびその周辺の磁化の向きを表す模式図である。
１・・・基板、２，４・・・保護膜、３・・・磁性膜。
５・・・反射膜、ＵＳ・・・飽和磁界、 Ｈａ・・・消
失磁界、Ｈａ・・・外部磁界、 Ｈｄ・・・反磁界。
特許出願人 株式会社 り ラ しFIG. 1 is a schematic cross-sectional view of an example of a magneto-optical recording medium manufactured according to the present invention, FIG. 2 is a diagram showing the relationship between sputter etching intensity and disappearing magnetic field, and FIG. 3 is a diagram showing an initialized magneto-optical recording medium. A fourth diagram showing the relationship between the external magnetic field applied to the medium during recording and the CNR obtained by reproducing the recorded information.
The figure is a schematic diagram showing the relationship between the above-mentioned external magnetic field and CNR, and FIG. 5 is a schematic diagram showing the direction of magnetization of the magnetic film and its surroundings when information is recorded on the magneto-optical recording medium. 1... Substrate, 2, 4... Protective film, 3... Magnetic film. 5... Reflective film, US... Saturation magnetic field, Ha... Vanishing magnetic field, Ha... External magnetic field, Hd... Demagnetizing field. Patent applicant RiRa Shi Co., Ltd.
Claims (1)
移金属を含む磁性膜とが積層されてなる構造を備える光
磁気記録媒体を製造するにあたり、基板上に上記の保護
膜を積層したのちに、スパッタエッチングに際して投入
される電力密度ω〔Ｗ／ｃｍ＾２〕とスパッタエッチン
グ時間ｔ〔ｓｅｃ〕との積ω・ｔが２０〜１３０〔Ｗ・
ｓｅｃ／ｃｍ＾２〕の範囲になるように保護膜の表面を
不活性ガスを用いてスパッタエッチングし、ついで保護
膜上に上記の磁性膜を形成することを特徴とする光磁気
記録媒体の製造方法。[Claims] In manufacturing a magneto-optical recording medium having a structure in which a protective film made of a dielectric material and a magnetic film containing a rare earth element and a transition metal are laminated on a substrate, the above-mentioned protective film is placed on the substrate. After laminating the films, the product ω・t of the power density ω [W/cm^2] input during sputter etching and the sputter etching time t [sec] is 20 to 130 [W・
sec/cm^2] on the surface of the protective film using an inert gas, and then forming the above-mentioned magnetic film on the protective film. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13327690A JP2843418B2 (en) | 1990-05-22 | 1990-05-22 | Method for manufacturing magneto-optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13327690A JP2843418B2 (en) | 1990-05-22 | 1990-05-22 | Method for manufacturing magneto-optical recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0426942A true JPH0426942A (en) | 1992-01-30 |
| JP2843418B2 JP2843418B2 (en) | 1999-01-06 |
Family
ID=15100851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13327690A Expired - Fee Related JP2843418B2 (en) | 1990-05-22 | 1990-05-22 | Method for manufacturing magneto-optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2843418B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06267126A (en) * | 1993-03-17 | 1994-09-22 | Nec Corp | Production of magneto-optical recording medium and recording medium |
-
1990
- 1990-05-22 JP JP13327690A patent/JP2843418B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06267126A (en) * | 1993-03-17 | 1994-09-22 | Nec Corp | Production of magneto-optical recording medium and recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2843418B2 (en) | 1999-01-06 |
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